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71. 发明授权

EP2310914B1 TELECENTRICITY CORRECTOR FOR MICROLITHOGRAPHIC PROJECTION SYSTEM 有权
公开(公告)号：EP2310914B1
公开(公告)日：2018-12-26
申请号：EP09788838.2
申请日：2009-06-25
申请人： Corning Incorporated
发明人： CORNELL, Jim, D. , MALACH, Joseph, D. , MICHALOSKI, Paul, F. , WEBB, James, E.
IPC分类号： G03F7/20 , G02B13/22 , G02B27/42 , G02B27/00
CPC分类号： G03F7/70191 , G02B13/22 , G02B27/0043 , G02B27/4222
摘要： A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.

72. 发明授权

EP1615067B1 OPTICAL ELEMENT, OPTICAL SYSTEM, LASER DEVICE, EXPOSURE DEVICE, MASK TESTING DEVICE, AND CRYSTAL PROCESSING DEVICE 失效转让
标题翻译：光学元件，光学系统，激光装置，曝光装置和晶体MASKENPRÜFEINRICHTUNG处理装置
公开(公告)号：EP1615067B1
公开(公告)日：2015-09-23
申请号：EP04722409.2
申请日：2004-03-22
申请人： Nikon Corporation
发明人： MIWA, Satoshi, c/o Nikon Corporation
IPC分类号： G02F1/35 , H01L21/027 , B23K26/02 , G02B3/06 , G03F7/20 , G02B27/00
CPC分类号： G03F7/70958 , G02B3/06 , G02B27/0043 , G02F1/353 , G02F1/3532 , G02F2001/354 , G03F7/70025 , G03F7/70575 , G03F7/70666 , G03F7/708 , G03F7/70825 , G03F7/70941 , G03F7/70983
摘要： The generatrix directions of cylindrical lenses 11a and 11b are perpendicular to the optical axis, and are perpendicular to each other. As a result, the optical system combining the cylindrical lenses 11a and 11b can achieve the same optical effect as a spherical lens. This system is characterized by the fact that since the respective lenses are cylindrical lenses, there is no shift in the optical axis even if the lenses are moved in the generatrix direction. For example, in cases where scratches on the lenses have become conspicuous, the useful life of the laser device can be extended by moving the lenses in the generatrix direction (direction indicated by the arrow) by means of a moving mechanism (not shown in the figures), e.g., a stage equipped with a micrometer, and using unused portions of the lenses.

73. 发明公开

EP2598947A1 EUV EXPOSURE APPARATUS 有权
标题翻译： EUV-BELICHTUNGSGERÄT
公开(公告)号：EP2598947A1
公开(公告)日：2013-06-05
申请号：EP11740883.1
申请日：2011-07-28
申请人： Carl Zeiss SMT GmbH , ASML Netherlands B.V.
发明人： BAER, Norman , LOERING, Ulrich , NATT, Oliver , WITTICH, Gero , LAUFER, Timo , KUERZ, Peter , LIMBACH, Guido , HEMBACHER, Stefan , WALTER, Holger , KWAN, Yim-Bun-Patrick , HAUF, Markus , STICKEL, Franz-Josef , VAN SCHOOT, Jan
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译：具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件包括主体和用于将掩模版上的物场投影到基板上的图像场上的反射表面，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括在相应的零交叉温度下具有温度依赖的热膨胀系数为零的材料，并且其中零交叉温度之间的差的绝对值更多超过6K。

74. 发明授权

EP1647863B1 Lithographic apparatus, device manufacturing method 有权
标题翻译：光刻设备，一种用于制造器件的方法
公开(公告)号：EP1647863B1
公开(公告)日：2009-03-04
申请号：EP05256041.4
申请日：2005-09-28
申请人： ASML Netherlands B.V.
发明人： Mulkens, Johannes Catharinus H. , De Boeij, Wilhelmus Petrus , Kohler, Carsten Andreas
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966

75. 发明公开

EP2000840A2 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：优化项目项目，BELICHTUNGSVORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG VON VORRICHTUNGEN
公开(公告)号：EP2000840A2
公开(公告)日：2008-12-10
申请号：EP07737991.5
申请日：2007-03-08
申请人： Nikon Corporation
发明人： TAKAHASHI, Tomowaki
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G02B27/0043 , G02B17/0657 , G03F7/70233
摘要： A projection optical system, which has a relatively large image side numerical aperture of, for instance, 0.45 or larger, and can inspect the surface-shape error of a reflection surface with a prescribed accuracy. The projection optical system is provided with a first reflecting image-forming optical system (G1) for forming an intermediate image of a first surface based on light from a first surface (4), and a second reflecting image-forming optical system (G2) for forming a reduced image on a second surface (7) based on light from the intermediate image. The first reflecting image-forming optical system (G1) is provided with a first concave reflective mirror (M1), a second convex reflective mirror (M2), a third reflective mirror (M3) and a fourth concave reflective mirror (M4). The second reflecting image-forming optical system (G2) is provided with a fifth concave reflective mirror (M5), a sixth reflective mirror (M6), a seventh convex reflective mirror (M7) and an eighth concave reflective mirror (M8) . The conditions of 1 0 0 is the maximum object height on the first surface.
摘要翻译：投影光学系统，具有例如0.45以上的相对大的像侧数值孔径，并且可以以规定的精度检查反射面的表面形状误差。投影光学系统设置有用于基于来自第一表面（4）的光形成第一表面的中间图像的第一反射成像光学系统（G1）和第二反射成像光学系统（G2）用于基于来自中间图像的光在第二表面（7）上形成缩小图像。第一反射成像光学系统（G1）设置有第一凹面反射镜（M1），第二凸出反射镜（M2），第三反射镜（M3）和第四凹面反射镜（M4）。第二反射成像光学系统（G2）设置有第五凹面反射镜（M5），第六反射镜（M6），第七凸起反射镜（M7）和第八凹面反射镜（M8）。满足1

76. 发明公开

EP1355140A4 IMAGING CHARACTERISTICS MEASURING METHOD, IMAGING CHARACTERIATICS ADJUSTING METHOD, EXPOSURE METHOD AND SYSTEM, PROGRAM AND RECORDING MEDIUM, AND DEVICE PRODUCING METHOD 审中-公开
标题翻译： “测量图像性能的方法，方法调整图像属性的曝光方法和系统，程序和记录介质及零部件生产过程”
公开(公告)号：EP1355140A4
公开(公告)日：2006-11-15
申请号：EP01272906
申请日：2001-12-27
申请人： NIPPON KOGAKU KK
发明人： TSUKAKOSHI TOSHIO
IPC分类号： G02B7/02 , G01J9/00 , G02B27/00 , G03F7/20
CPC分类号： G03F7/705 , G02B7/023 , G02B27/0043 , G02B27/0068 , G03F7/70258 , G03F7/70591 , G03F7/706
摘要： When actual measurement data of a wavefront aberration of a projection optical system (PL) is input, a main controller (50) calculates a targeted image forming characteristic of the projection optical system based on the data and a Zernike sensitivity table of the image forming characteristic that is made prior to the input. By using the Zernike sensitivity table, the targeted image forming characteristic can be calculated with only one measurement of wavefront aberration. Moreover, parameters that denote a relation between an adjustment of an adjustable specific optical element (131 to 134) and a change in the image forming characteristics of the projection optical system is obtained in advance, and are stored in advance in a storage unit (42). Then, when the measurement data of the image forming characteristic of the projection optical system is input, the main controller calculates a targeted adjustment amount of the specific optical element using a relation expression between the measurement data, the parameters, and the targeted adjustment amount of the specific optical element, and adjusts the specific optical element based on the calculation results.

77. 发明公开

EP1647863A2 Lithographic apparatus, device manufacturing method 有权
标题翻译：石版画家Apparat，Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1647863A2
公开(公告)日：2006-04-19
申请号：EP05256041.4
申请日：2005-09-28
申请人： ASML Netherlands B.V.
发明人： Mulkens, Johannes Catharinus H. , De Boeij, Wilhelmus Petrus , Kohler, Carsten Andreas
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.
摘要翻译：为了补偿光刻投影装置中的掩模的双折射，测量掩模的双折射并将其作为双折射数据存储在数据存储装置中。双折射补偿元件设置在光刻投影设备的光路中。将补偿元件的适当调整确定为最佳地减小掩模双折射对基板水平的偏振状态的影响。

78. 发明授权

EP1217412B1 Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschliesslich aus Linsen positiver Brechkraft und Verfahren zur Herstellung mikrostrukturierter Bauteile mit einem solchen Objektiv 有权
标题翻译：具有第一透镜组，用于制造微结构元件包括正电源和过程的透镜仅具有这样的透镜光刻物镜
公开(公告)号：EP1217412B1
公开(公告)日：2006-03-08
申请号：EP01128878.4
申请日：2001-12-05
申请人： Carl Zeiss SMT AG
发明人： Schuster, Karl-Heinz , Epple, Alexander, Dr.
IPC分类号： G02B13/14 , G02B13/24 , G03F7/20
CPC分类号： G03F7/70241 , G02B9/14 , G02B13/0095 , G02B13/143 , G02B13/24 , G02B27/0043

79. 发明公开

EP1489451A1 Hoch geöffnetes Projektionsobjektiv 有权
标题翻译： HochgeöffnetesProjektionsobjektiv
公开(公告)号：EP1489451A1
公开(公告)日：2004-12-22
申请号：EP04014036.0
申请日：2004-06-16
申请人： Jos. Schneider Optische Werke GmbH
发明人： Schaub, Udo
IPC分类号： G02B27/00 , G02B9/64 , G02B13/18 , G03B21/12 , G03B21/14 , G02B13/16
CPC分类号： G02B27/0025 , G02B9/64 , G02B13/16 , G02B13/18 , G02B27/0043
摘要： Es wird ein sechslinsiges Kinoprojektionsobjektiv beschrieben, dem eine asphärisierte planparallele Platte (10) leinwandseitig vorgesetzt ist. Diese Anordnung erlaubt die kostengünstige Konstruktion eines Kinoprojektionsobjektivs mit einer relativen Öffnung von 1:1,7 mit sehr guten Abbildungseigenschaften. Die hohe relative Öffnung erhöht die Lichtausnutzung und führt dadurch zu Energie- und Kosteneinsparungen. Ferner kann das Projektionsobjektiv sowohl für das Cinemascope- als auch für das Breitwand-Format verwendet werden, wobei die Helligkeitsunterschiede durch eine variable Blende (14) ausgeglichen werden.
摘要翻译：投影透镜装置具有光轴（26）和平面平行板（10,56）。通过使板在光轴方向上增厚或变薄来形成平面平行的偏离，以形成非球面平板。然后按从放大图像到物体的顺序形成以下光学元件。第一个元件是非球面平面平行板。接下来是第一正透镜，然后是第二正透镜。其次是第三和第四负透镜，然后是第五和第六正透镜。

80. 发明授权

EP0952490B1 Lens barrel and projection aligner 有权
标题翻译：透镜安装件和投影仪对准组件
公开(公告)号：EP0952490B1
公开(公告)日：2004-07-14
申请号：EP99108057.3
申请日：1999-04-23
申请人： CANON KABUSHIKI KAISHA
发明人： Sudoh, Yuji
IPC分类号： G03F7/20 , G03F9/00 , G02B7/00 , G02B7/02
CPC分类号： G03F7/70241 , G02B7/02 , G02B27/0043 , G02B27/4222 , G02B27/4277 , G03F7/70258 , G03F7/70825

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