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1. 发明申请

WO2009132023A3 PHOTOSENSITIVE HARDMASK FOR MICROLITHOGRAPHY 审中-公开
标题翻译：用于微结构的感光硬体
公开(公告)号：WO2009132023A3
公开(公告)日：2010-01-28
申请号：PCT/US2009041282
申请日：2009-04-21
申请人： BREWER SCIENCE INC , XU HAO , MERCADO RAMIL-MARCELO L , GUERRERO DOUGLAS J
发明人： XU HAO , MERCADO RAMIL-MARCELO L , GUERRERO DOUGLAS J
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/039 , G03F7/091 , G03F7/094 , Y10S430/114 , Y10S430/128 , Y10S430/151 , Y10T428/24612 , Y10T428/24851 , Y10T428/24893
摘要： New hardmask compositions comprising non-polymeric, metal-conlaining nanoparticles dispersed or dissolved in a solvent system and methods of using those compositions as hardmask lavcrs in microelectronic structures are provided. The compositions arc photosensitive and capable of being rendered developer soluble upon exposure to radiation. The inventive hardmask layer is patterned simultaneously with the photoresist layer and provides plasma etch resistance for subsequent pattern transfer.
摘要翻译：提供了包含分散或溶解在溶剂体系中的非聚合金属 - 纳米颗粒的新硬掩模组合物，以及使用这些组合物作为微电子结构中的硬掩模液体的方法。组合物光敏并且能够在暴露于辐射时使显影剂变得可溶。本发明的硬掩模层与光致抗蚀剂层同时被图案化，并为随后的图案转印提供等离子体耐蚀刻性。

2. 发明申请

WO2009132023A2 PHOTOSENSITIVE HARDMASK FOR MICROLITHOGRAPHY 审中-公开
标题翻译：用于微结构的感光硬体
公开(公告)号：WO2009132023A2
公开(公告)日：2009-10-29
申请号：PCT/US2009/041282
申请日：2009-04-21
申请人： BREWER SCIENCE INC. , XU, Hao , MERCADO, Ramil-Marcelo, L. , GUERRERO, Douglas, J.
发明人： XU, Hao , MERCADO, Ramil-Marcelo, L. , GUERRERO, Douglas, J.
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/039 , G03F7/091 , G03F7/094 , Y10S430/114 , Y10S430/128 , Y10S430/151 , Y10T428/24612 , Y10T428/24851 , Y10T428/24893
摘要： New hardmask compositions comprising non-polymeric, metal-conlaining nanoparticles dispersed or dissolved in a solvent system and methods of using those compositions as hardmask lavcrs in microelectronic structures are provided. The compositions arc photosensitive and capable of being rendered developer soluble upon exposure to radiation. The inventive hardmask layer is patterned simultaneously with the photoresist layer and provides plasma etch resistance for subsequent pattern transfer.
摘要翻译：提供了包含分散或溶解在溶剂体系中的非聚合金属 - 纳米纳米颗粒的新硬掩模组合物，以及使用这些组合物作为微电子结构中的硬掩模液体的方法。组合物光敏并且能够在暴露于辐射时使显影剂变得可溶。本发明的硬掩模层与光致抗蚀剂层同时被图案化，并为随后的图案转印提供等离子体耐蚀刻性。

3. 发明申请

WO2009059031A3 PHOTOIMAGEABLE BRANCHED POLYMER 审中-公开
公开(公告)号：WO2009059031A3
公开(公告)日：2009-05-07
申请号：PCT/US2008/081831
申请日：2008-10-30
申请人： BREWER SCIENCE INC. , XU, Hao , MERCADO, Ramil-Marcelo, L. , GUERRERO, Douglas, J. , MEADOR, Jim, D.
发明人： XU, Hao , MERCADO, Ramil-Marcelo, L. , GUERRERO, Douglas, J. , MEADOR, Jim, D.
IPC分类号： C08G65/30 , C08G65/48 , C08J3/28 , G03F7/038 , G03F7/16
摘要： Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).

4. 发明申请

WO2008022245A1 ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS 审中-公开
标题翻译：用于多种绘图过程的反反射成像层
公开(公告)号：WO2008022245A1
公开(公告)日：2008-02-21
申请号：PCT/US2007/076078
申请日：2007-08-16
申请人： BREWER SCIENCE INC. , GUERRERO, Douglas, J. , MERCADO, Ramil-Marcelo
发明人： GUERRERO, Douglas, J. , MERCADO, Ramil-Marcelo
IPC分类号： H01L21/027
CPC分类号： H01L21/0274 , G03F7/0035 , G03F7/0392 , G03F7/168
摘要： Novel methods of double patterning a photosensitive resin composition are provided, The methods involve applying the photosensitive composition to a substrate and thermally crosslinking the composition. The crosslinked layer can be used to provide reflection control. Upon exposure to light, the crosslinked polymer (or oligomer or monomer) in the compositions will decrosslinlc, rendering the light-exposed portions soluble in typical photoresist developing solutions (e.g., alkaline developers). Advantageously, the crosslinked portions of the composition remain insoluble in the solvent used to form the photosensitive composition. As a result, the coating, lithographic, and or developing steps can be repeated multiple times in varying order, depending upon the particular process, without destroying earlier-formed patterns.
摘要翻译：提供了一种双重图案化感光性树脂组合物的新方法。该方法包括将光敏组合物施加到基底上并使组合物热交联。交联层可用于提供反射控制。曝光时，组合物中的交联聚合物（或低聚物或单体）将脱色，使光曝光部分可溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）。有利地，组合物的交联部分保持不溶于用于形成光敏组合物的溶剂中。结果，涂层，光刻和/或显影步骤可以根据特定的工艺以不同的顺序重复多次，而不会破坏早期形成的图案。

5. 发明申请

WO2005111719A3 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS 审中-公开
标题翻译：使用乙烯基交联剂的抗反射涂层
公开(公告)号：WO2005111719A3
公开(公告)日：2006-11-09
申请号：PCT/US2005012851
申请日：2005-04-15
申请人： BREWER SCIENCE INC , GUERRERO DOUGLAS J , COX ROBERT C , WEIMER MARC W
发明人： GUERRERO DOUGLAS J , COX ROBERT C , WEIMER MARC W
IPC分类号： G03F7/095 , C07C43/166 , C08J3/24 , C08J3/28 , C08J5/18 , G03C1/492 , G03C1/494 , G03F7/039 , G03F7/09 , G03F7/11
CPC分类号： G03F7/091 , C07C43/166 , G03F7/039 , G03F7/0392 , G03F7/094 , G03F7/11 , G03F7/168 , G03F7/40 , Y10S438/952 , Y10T428/31667 , Y10T428/31699 , Y10T428/31935
摘要： Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新型的湿显影抗反射涂层组合物和使用这些组合物的方法。组合物包含具有酸官能团并且与交联剂和光酸产生剂一起溶解在溶剂体系中的聚合物和/或低聚物。优选的酸官能团是羧酸，而优选的交联剂是乙烯基醚交联剂。在使用中，将组合物施加到基底上并进行热交联。曝光时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

6. 发明申请

WO2010080789A3 SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY 审中-公开
公开(公告)号：WO2010080789A3
公开(公告)日：2010-07-15
申请号：PCT/US2010/020199
申请日：2010-01-06
申请人： BREWER SCIENCE INC. , LIN, Qin , PULIGADDA, Rama , CLAYPOOL, James , GUERRERO, Douglas, J. , SMITH, Brian
发明人： LIN, Qin , PULIGADDA, Rama , CLAYPOOL, James , GUERRERO, Douglas, J. , SMITH, Brian
IPC分类号： H01L21/027 , G03F7/20
摘要： Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.

7. 发明申请

WO2010080789A2 SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY 审中-公开
标题翻译：用于双重和三维图案的旋转间隔材料
公开(公告)号：WO2010080789A2
公开(公告)日：2010-07-15
申请号：PCT/US2010020199
申请日：2010-01-06
申请人： BREWER SCIENCE INC , LIN QIN , PULIGADDA RAMA , CLAYPOOL JAMES , GUERRERO DOUGLAS J , SMITH BRIAN
发明人： LIN QIN , PULIGADDA RAMA , CLAYPOOL JAMES , GUERRERO DOUGLAS J , SMITH BRIAN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01L21/0337 , C08G77/20 , G03F7/40 , H01L21/0338 , H01L21/3121
摘要： Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.
摘要翻译：提供了新的双重和三重图案化方法。所述方法包括将可收缩的组合物应用于图案化的模板结构（例如，具有线的结构）并加热组合物。可收缩组合物被选择为具有使其在加热期间收缩的性质，从而在图案化模板结构上形成共形层。然后蚀刻该层以留下预间隔结构，其包含来自图案的特征，其中可收缩组合物的残余物邻近特征侧壁。功能被删除，留下了一倍的模式。在替代实施例中，可以在模板结构上形成特征之前执行额外蚀刻步骤，从而允许图案增加三倍而不是加倍。

8. 发明申请

WO2005111719A2 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS 审中-公开
标题翻译：使用乙烯基交联剂的抗反射涂层
公开(公告)号：WO2005111719A2
公开(公告)日：2005-11-24
申请号：PCT/US2005/012851
申请日：2005-04-15
申请人： BREWER SCIENCE INC. , GUERRERO, Douglas, J. , COX, Robert, C. , WEIMER, Marc, W.
发明人： GUERRERO, Douglas, J. , COX, Robert, C. , WEIMER, Marc, W.
IPC分类号： G03C1/492
CPC分类号： G03F7/091 , C07C43/166 , G03F7/039 , G03F7/0392 , G03F7/094 , G03F7/11 , G03F7/168 , G03F7/40 , Y10S438/952 , Y10T428/31667 , Y10T428/31699 , Y10T428/31935
摘要： Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新型的湿显影抗反射涂层组合物和使用这些组合物的方法。组合物包含具有酸官能团并且与交联剂和光酸产生剂一起溶解在溶剂体系中的聚合物和/或低聚物。优选的酸官能团是羧酸，而优选的交联剂是乙烯基醚交联剂。在使用中，将组合物施加到基底上并进行热交联。曝光时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

9. 发明申请

WO2009059031A2 PHOTOIMAGEABLE BRANCHED POLYMER 审中-公开
标题翻译：可光照分支聚合物
公开(公告)号：WO2009059031A2
公开(公告)日：2009-05-07
申请号：PCT/US2008081831
申请日：2008-10-30
申请人： BREWER SCIENCE INC , XU HAO , MERCADO RAMIL-MARCELO L , GUERRERO DOUGLAS J , MEADOR JIM D
发明人： XU HAO , MERCADO RAMIL-MARCELO L , GUERRERO DOUGLAS J , MEADOR JIM D
IPC分类号： C08G65/30 , C08G65/48 , C08J3/28 , G03F7/038 , G03F7/16
CPC分类号： G03F7/091 , C08L25/18 , Y10S430/151
摘要： Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新颖的显影剂可溶的抗反射涂层组合物和使用这些组合物的方法。该组合物包含与多官能乙烯基醚反应形成支化聚合物或低聚物的多官能酸。在使用中，将组合物施加到基材上并热交联。在曝光和曝光后烘烤后，固化的聚合物/低聚物将发生解交联和解聚，使该层溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

10. 发明申请

WO2008109198A1 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS 审中-公开
标题翻译：使用乙烯基交联剂的抗反射涂层
公开(公告)号：WO2008109198A1
公开(公告)日：2008-09-12
申请号：PCT/US2008/051948
申请日：2008-01-24
申请人： BREWER SCIENCE INC. , GUERRERO, Douglas, J. , MERCADO, Ramil-Marcelo, L.
发明人： GUERRERO, Douglas, J. , MERCADO, Ramil-Marcelo, L.
IPC分类号： G03F7/11
CPC分类号： G03F7/091 , G03F7/0392
摘要： Novel, developer soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker, a photoacid generator, and optionally a chromophore. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light (and optionally a post exposure bake), the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers). In one embodiment, the compositions can be used to form ion implant areas in microelectronic substrates.
摘要翻译：提供了新颖的开发可溶性抗反射涂层组合物和使用这些组合物的方法。组合物包含具有酸官能团并与交联剂，光致酸发生剂和任选的发色团一起溶解在溶剂体系中的聚合物和/或低聚物。优选的酸官能团是羧酸，而优选的交联剂是乙烯基醚交联剂。在使用中，将组合物施用于基材并进行热交联。在曝光（和任选地曝光后烘烤）时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。在一个实施方案中，组合物可用于在微电子衬底中形成离子注入区域。

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