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1. 再颁专利

USRE41220E1 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements 有权
标题翻译：极紫外线软X射线投影光刻法和光刻元件
公开(公告)号：USRE41220E1
公开(公告)日：2010-04-13
申请号：US11880425
申请日：2000-07-10
申请人： Claude L. Davis Jr. , Kenneth E. Hrdina
发明人： Claude L. Davis Jr. , Kenneth E. Hrdina
IPC分类号： G21K1/06
CPC分类号： B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/07 , C03B2201/42 , G02B5/0891 , G02B17/0615 , G02B17/0636 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.
摘要翻译：用于制造集成电路和形成具有极小特征尺寸的图案的投影光刻方法包括用于产生和引导来自极紫外线软X射线源（38）的极紫外线软X射线辐射λ的照明子系统（36） ; 由照射级产生的极紫外线软X射线辐射λ照射的掩模台（22）和掩模台（22）包括当被辐射λ照射时的图案。保护子系统包括具有辐射敏感表面的反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷表面（32）和印刷媒体对象晶片。

2. 发明授权

US06988377B2 Method for making extreme ultraviolet lithography structures 有权
公开(公告)号：US06988377B2
公开(公告)日：2006-01-24
申请号：US10302347
申请日：2002-11-22
申请人： James J. Bernas , Bradley F. Bowden , Kenneth E. Hrdina
发明人： James J. Bernas , Bradley F. Bowden , Kenneth E. Hrdina
IPC分类号： C03B19/06
CPC分类号： C03C3/06 , B33Y80/00 , C03B19/06 , C03B2201/42 , C03C2201/42 , C03C2203/10
摘要： A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

3. 发明授权

US06468374B1 Method of making silica glass honeycomb structure from silica soot extrusion 有权
标题翻译：由二氧化硅烟灰挤出制造石英玻璃蜂窝结构的方法
公开(公告)号：US06468374B1
公开(公告)日：2002-10-22
申请号：US09502251
申请日：2000-02-17
申请人： Gitimoy Kar , Kenneth E. Hrdina , John F. Wight, Jr. , C. Charles Yu
发明人： Gitimoy Kar , Kenneth E. Hrdina , John F. Wight, Jr. , C. Charles Yu
IPC分类号： C04B3514
CPC分类号： G02B6/02347 , B01D63/066 , B01D71/027 , B01D71/04 , C02F1/32 , C03B19/025 , C03B19/06 , C03B23/047 , C03B23/06 , C03B23/065 , C03B32/00 , C03B37/0124 , C03B2203/14 , C03B2203/42 , G02B6/02357 , G02B6/02371 , G02B6/02376 , Y10T428/24149 , Y10T428/24165
摘要： The present invention describes an extrusion process for manufacturing a glass honeycomb structure having a variety of shapes and sizes depending on its ultimate application. Unlike prior art honeycomb structures made from ceramics, the inventive glass honeycomb can be readily viscously bent and/or redrawn. Furthermore, the inventive honeycomb structure is lightweight, yet able to support heavy loads on its end faces. Therefore, the inventive honeycomb can be used as a light-weight support for such objects as mirrors. These honeycombs can be used singularly or in aggregates to provide such support. Embodiments are described wherein the mass of the honeycomb is further reduced by removing select portions of the honeycomb without deleteriously impacting its ability for load bearing.
摘要翻译：本发明描述了一种用于制造具有各种形状和尺寸的玻璃蜂窝结构体的挤出方法，这取决于其最终应用。不同于由陶瓷制成的现有技术的蜂窝结构体，本发明的玻璃蜂窝体可容易地被粘着弯曲和/或重新拉伸。此外，本发明的蜂窝结构是轻质的，但是能够支撑其端面上的重负载。因此，本发明的蜂窝体可以用作诸如反射镜的物体的轻质支撑体。这些蜂蜜可以单独使用或以聚集体形式提供这种支持。描述了通过除去蜂窝的选择部分而进一步减小蜂窝体的质量的实施例，而不会有害地影响其承载能力。

4. 发明授权

US5316555A Molten carbonate fuel cell electrolyte toughening 失效
标题翻译：熔融碳酸盐燃料电池电解质增韧
公开(公告)号：US5316555A
公开(公告)日：1994-05-31
申请号：US970563
申请日：1992-11-03
申请人： Estela T. Ong , Kenneth E. Hrdina
发明人： Estela T. Ong , Kenneth E. Hrdina
IPC分类号： H01M8/02 , H01M8/14 , H01M27/20
CPC分类号： H01M8/0295 , H01M2008/147 , H01M2300/0051 , Y02E60/526 , Y10T29/49108
摘要： A porous matrix of lithium aluminate particles for molten alkali metal carbonates electrolytes having about 5 to about 50 volume percent, based upon the volume of the solids, of electrically non-conductive, active electrolyte compatible fibers having an average diameter of about 1 to about 50 microns and an average length greater than about 5 times the average diameter. Such matrices reduce matrix cracking upon loading with molten carbonates active electrolyte and provide high surface area over long term fuel cell operation.
摘要翻译：一种用于熔融碱金属碳酸盐电解质的铝酸锂颗粒的多孔基体，其具有基于固体体积约5至约50体积％的非导电的，活性电解质相容的纤维，其平均直径为约1至约50 平均长度大于平均直径的5倍。这样的基质在加入熔融碳酸酯活性电解质并在长期燃料电池操作中提供高表面积时减少基体开裂。

5. 发明授权

US5206095A Carbonate fuel cell anodes 失效
标题翻译：碳酸盐燃料电池阳极
公开(公告)号：US5206095A
公开(公告)日：1993-04-27
申请号：US495277
申请日：1990-03-19
申请人： Rafael A. Donado , Kenneth E. Hrdina , Robert J. Remick
发明人： Rafael A. Donado , Kenneth E. Hrdina , Robert J. Remick
IPC分类号： H01M4/86 , H01M4/88 , H01M8/14
CPC分类号： H01M4/8857 , H01M4/8621 , H01M4/8885 , H01M8/142 , H01M2004/8684 , H01M2008/147 , H01M2300/0051 , H01M4/8647 , Y02E60/526 , Y02P70/56
摘要： A molten alkali metal carbonates fuel cell porous anode of lithium ferrite and a metal or metal alloy of nickel, cobalt, nickel/iron, cobalt/iron, nickel/iron/aluminum, cobalt/iron/aluminum and mixtures thereof wherein the total iron content including ferrite and iron of the composite is about 25 to about 80 percent, based upon the total anode, provided aluminum when present is less than about 5 weight percent of the anode. A process for production of the lithium ferrite containing anode by slipcasting.

6. 再颁专利

USRE40586E1 Reduced striae extreme ultra violet elements 有权
标题翻译：减少条纹极端的紫外线元素
公开(公告)号：USRE40586E1
公开(公告)日：2008-11-25
申请号：US11880424
申请日：2007-07-20
申请人： Kenneth E. Hrdina , John E. Maxon , Brent R. Mclean
发明人： Kenneth E. Hrdina , John E. Maxon , Brent R. Mclean
IPC分类号： C03C3/06 , C03C3/076 , G21K1/06 , G02B5/08 , G02B5/10
CPC分类号： B82Y10/00 , B82Y40/00 , C03B19/1446 , C03B19/1484 , C03B2201/42 , C03B2207/62 , C03B2207/66 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/40 , G03F1/24 , G03F7/70958
摘要： Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
摘要翻译：公开了含有二氧化钛的二氧化硅玻璃体和具有低水平条纹的极紫外线元件。还公开了用于制造和测量玻璃元件和极紫外元件中的条纹的方法和装置。

7. 发明授权

US06542224B2 Silica-based light-weight EUV lithography stages 失效
公开(公告)号：US06542224B2
公开(公告)日：2003-04-01
申请号：US09943466
申请日：2001-08-30
申请人： Bradford G. Ackerman , Bradley F. Bowden , Claude L. Davis, Jr. , Kenneth E. Hrdina
发明人： Bradford G. Ackerman , Bradley F. Bowden , Claude L. Davis, Jr. , Kenneth E. Hrdina
IPC分类号： G03B2758
CPC分类号： G03F7/70716 , G03F7/70216 , G03F7/708
摘要： A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.

8. 发明授权

US06465272B1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices 有权
标题翻译：极紫外线软X射线投影光刻法和掩模装置
公开(公告)号：US06465272B1
公开(公告)日：2002-10-15
申请号：US09615621
申请日：2000-07-13
申请人： Claude L. Davis, Jr. , Kenneth E. Hrdina , Robert Sabia , Harrie J. Stevens
发明人： Claude L. Davis, Jr. , Kenneth E. Hrdina , Robert Sabia , Harrie J. Stevens
IPC分类号： H01L2100
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G02B17/06 , G03F1/24 , G03F1/60 , G03F7/702 , G03F7/70233 , G03F7/70283 , G03F7/70891 , G03F7/70958 , Y10S438/947 , Y10S438/974
摘要： The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;. Providing the patterned reflective mask includes providing a Ti doped high purity SiO2 glass wafer with a patterned absorbing overlay overlaying the reflective multilayer coated Ti doped high purity SiO2 glass defect free wafer surface that has an Ra roughness≦0.15 nm. The method includes providing a projection sub-system and a print media subject wafer which has a radiation sensitive wafer surface wherein the projection sub-system projects the projected mask pattern from the patterned reflective mask onto the radiation sensitive wafer surface.
摘要翻译：本发明涉及反射掩模及其用于反射极紫外软x射线光子的用途，以使得能够使用极紫外线软X射线辐射投影光刻方法和系统来生产集成电路并形成具有极小特征尺寸的图案。投影光刻方法包括提供用于产生和引导来自极紫外线软X射线源的极紫外线软X射线辐射羔羊的照明子系统; 提供由由照明子系统产生的极紫外线软X射线辐射灯照亮的掩模子系统，并提供掩模子系统包括提供用于在被辐射线照射时形成投影掩模图案的图案化反射掩模。提供图案化的反射掩模包括提供Ti掺杂的高纯SiO 2玻璃晶片，其具有覆盖反射多层涂覆的Ti掺杂的高纯度SiO 2玻璃无缺陷晶片表面的图案化吸收层，其具有Ra粗糙度<= 0.15nm。该方法包括提供具有辐射敏感晶片表面的投影子系统和打印介质对象晶片，其中投影子系统将投影的掩模图案从图案化反射掩模投影到辐射敏感晶片表面上。

9. 发明授权

US06387511B1 Light weight porous structure 失效
标题翻译：重量轻的多孔结构
公开(公告)号：US06387511B1
公开(公告)日：2002-05-14
申请号：US09626630
申请日：2000-07-27
申请人： Kenneth E. Hrdina , Daniel R. Sempolinski , Michael H. Wasilewski , C. Charles Yu
发明人： Kenneth E. Hrdina , Daniel R. Sempolinski , Michael H. Wasilewski , C. Charles Yu
IPC分类号： B32B1706
CPC分类号： C03C11/007 , C03B19/08 , C03B19/14 , C03B19/1423 , C03B2201/42 , C03B2207/36 , C03B2207/62 , C03C11/00
摘要： These glass bodies are light weight porous structures such as a boules of high purity fused silica or ultra-low expansion glass. More specifically, the porous structures are supports for mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Several means of creating and controlling these seeds are available. The processes use incomplete combustion to create the bubbles. There are a number of different steps to create the incomplete combustion. One such step is a short distance between the hydrolysis flame and the glass precursor.
摘要翻译：这些玻璃体是轻质多孔结构，例如高纯度熔融石英或超低膨胀玻璃的泡沫。更具体地，多孔结构是用于镜面坯料的支撑件。以与制备高纯度熔凝石英相似的方法，利用纯二氧化硅或掺杂二氧化硅的火焰沉积制造多孔玻璃。泡沫或种子在放置期间在玻璃中形成。创建和控制这些种子的几种手段是可用的。这些过程使用不完全燃烧来产生气泡。有几个不同的步骤来创建不完全燃烧。一个这样的步骤是水解火焰和玻璃前体之间的短距离。

10. 发明授权

US06988378B1 Light weight porous structure 失效
标题翻译：重量轻的多孔结构
公开(公告)号：US06988378B1
公开(公告)日：2006-01-24
申请号：US09626634
申请日：2000-07-27
申请人： Kenneth E. Hrdina , John E. Maxon , Michael H. Wasilewski
发明人： Kenneth E. Hrdina , John E. Maxon , Michael H. Wasilewski
IPC分类号： C03B19/06
CPC分类号： C03B19/14 , C03B19/08 , C03B19/1469 , C03C1/026 , C03C11/007 , C03C17/22
摘要： These glass bodies are light weight porous structures such as a boules of high purity fused silica (HPFS). More specifically, the porous structures are supports for HPFS mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Finely divided silicon carbide (SiC) particles are used to form the bubbles. At least one layer of porous glass is formed in the boule.
摘要翻译：这些玻璃体是轻质多孔结构，例如高纯度熔融石英（HPFS）的聚合物。更具体地，多孔结构是用于HPFS镜面坯料的支撑件。以与制备高纯度熔凝石英相似的方法，利用纯二氧化硅或掺杂二氧化硅的火焰沉积制造多孔玻璃。泡沫或种子在放置期间在玻璃中形成。细分碳化硅（SiC）颗粒用于形成气泡。至少一层多孔玻璃形成在该坯料中。

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