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1. 发明申请

US20190076801A1 SYSTEM AND METHOD FOR MICRO DOSING 审中-公开
公开(公告)号：US20190076801A1
公开(公告)日：2019-03-14
申请号：US16111546
申请日：2018-08-24
申请人： Jeff Miller , Leland Fleming , Lewis Stern , Satish Puran , Richard Branscombe
发明人： Jeff Miller , Leland Fleming , Lewis Stern , Satish Puran , Richard Branscombe
IPC分类号： B01F5/10 , B67C3/20 , F04B43/12 , B01F15/00
CPC分类号： B01F5/10 , B01F15/00389 , B01F2003/0028 , B67C3/208 , F04B43/12
摘要： A system and method of micro dosing containers on a conveying system is disclosed. The system includes a mixing tank to maintain suspended solids in a mixture; a dosing assembly to inject micro-doses of the mixture into bottles; a recirculation assembly to circulate the mixture from the supply tank to the dosing assembly and back to the supply tank; a power and controls operation assembly to supply the system with power, to provide the system with electromechanical control and/or to provide a user interface; and a stand to hold at least the supply tank, the portable dosing assembly, the recirculation assembly and/or the power and/or controls operation assembly.

2. 发明申请

US20130062359A1 SENSORY AROMA GLASS 审中-公开
标题翻译：感官AROMA玻璃
公开(公告)号：US20130062359A1
公开(公告)日：2013-03-14
申请号：US13610793
申请日：2012-09-11
申请人： Lewis Stern , Meara Kelley , Tim Ryan
发明人： Lewis Stern , Meara Kelley , Tim Ryan
IPC分类号： B65D25/00
CPC分类号： A47G19/2205 , A47G19/2211 , A47G2400/045 , Y10T29/53
摘要： A sensory aroma glass is disclosed. According to one embodiment, an apparatus comprises a fluid barrier; and a fluid container designed for containing a fluid. The fluid barrier is in contact with the rim or internal or external sidewall of the fluid container. The fluid barrier extends into the fluid container. The fluid barrier has an opening that allows aroma of the fluid to escape from the fluid container without allowing the fluid to escape from the fluid container.
摘要翻译：公开了感官香气玻璃。根据一个实施例，一种装置包括流体屏障; 以及设计用于容纳流体的流体容器。流体屏障与流体容器的边缘或内部或外部侧壁接触。流体屏障延伸到流体容器中。流体屏障具有允许流体的香味从流体容器逸出而不允许流体从流体容器逸出的开口。

3. 发明授权

US09271589B2 Sensory aroma glass 有权
标题翻译：感官香气玻璃
公开(公告)号：US09271589B2
公开(公告)日：2016-03-01
申请号：US13610793
申请日：2012-09-11
申请人： Lewis Stern , Meara Kelley , Tim Ryan
发明人： Lewis Stern , Meara Kelley , Tim Ryan
IPC分类号： B65D25/00 , A47G19/22
CPC分类号： A47G19/2205 , A47G19/2211 , A47G2400/045 , Y10T29/53
摘要： A sensory aroma glass is disclosed. According to one embodiment, an apparatus comprises a fluid barrier; and a fluid container designed for containing a fluid. The fluid barrier is in contact with the rim or internal or external sidewall of the fluid container. The fluid barrier extends into the fluid container. The fluid barrier has an opening that allows aroma of the fluid to escape from the fluid container without allowing the fluid to escape from the fluid container.
摘要翻译：公开了感官香气玻璃。根据一个实施例，一种装置包括流体屏障; 以及设计用于容纳流体的流体容器。流体屏障与流体容器的边缘或内部或外部侧壁接触。流体屏障延伸到流体容器中。流体屏障具有允许流体的香味从流体容器逸出而不允许流体从流体容器逸出的开口。

4. 发明授权

US08281954B2 Sensory aroma glass 有权
标题翻译：感官香气玻璃
公开(公告)号：US08281954B2
公开(公告)日：2012-10-09
申请号：US12618455
申请日：2009-11-13
申请人： Lewis Stern , Meara Kelley , Tim Ryan
发明人： Lewis Stern , Meara Kelley , Tim Ryan
IPC分类号： A47G19/22
CPC分类号： A47G19/2205 , A47G19/2211 , A47G2400/045 , Y10T29/53
摘要： A sensory aroma glass is disclosed. According to one embodiment, an apparatus comprises a fluid barrier; and a fluid container designed for containing a fluid. The fluid barrier is in contact with the rim or internal or external sidewall of the fluid container. The fluid barrier extends into the fluid container. The fluid barrier has an opening that allows aroma of the fluid to escape from the fluid container without allowing the fluid to escape from the fluid container.
摘要翻译：公开了感官香气玻璃。根据一个实施例，一种装置包括流体屏障; 以及设计用于容纳流体的流体容器。流体屏障与流体容器的边缘或内部或外部侧壁接触。流体屏障延伸到流体容器中。流体屏障具有允许流体的香味从流体容器逸出而不允许流体从流体容器逸出的开口。

5. 发明申请

US20060264063A1 Deposition of tensile and compressive stressed materials for semiconductors 有权
标题翻译：用于半导体的拉伸和压应力材料的沉积
公开(公告)号：US20060264063A1
公开(公告)日：2006-11-23
申请号：US11134981
申请日：2005-05-23
申请人： Lewis Stern , John Albright
发明人： Lewis Stern , John Albright
IPC分类号： H01L21/31
CPC分类号： H01L21/0217 , C23C16/345 , H01L21/02274 , H01L21/3185
摘要： A method of depositing tensile or compressively stressed silicon nitride on a substrate is described. Silicon nitride having a tensile stress with an absolute value of at least about 1200 MPa can be deposited from process gas comprising silicon-containing gas and nitrogen-containing gas, maintained in an electric field having a strength of from about 25 V/mil to about 300 V/mil. The electric field is formed by applying a voltage at a power level of less than about 60 Watts across electrodes that are spaced apart by a separation distance that is at least about 600 mils. Alternatively, silicon nitride having a compressive stress with an absolute value of at least about 2000 MPa can be formed in an electric field having a strength of from about 400 V/mil to about 800 V/mil.
摘要翻译：描述了在衬底上沉积拉伸或压应力氮化硅的方法。具有至少约1200MPa的绝对值的拉伸应力的氮化硅可以由包含含硅气体和含氮气体的工艺气体沉积，该工艺气体保持在具有约25V /密度的强度的电场至约 300 V / mil 通过以间隔至少约600密耳的间隔距离的电极施加功率水平小于约60瓦特的电压来形成电场。或者，具有绝对值至少约2000MPa的压缩应力的氮化硅可以在强度为约400V / mil至约800V / mil的电场中形成。

6. 发明授权

US07247582B2 Deposition of tensile and compressive stressed materials 有权
标题翻译：拉伸和压应力材料的沉积
公开(公告)号：US07247582B2
公开(公告)日：2007-07-24
申请号：US11134981
申请日：2005-05-23
申请人： Lewis Stern , John Albright
发明人： Lewis Stern , John Albright
IPC分类号： H01L21/31
CPC分类号： H01L21/0217 , C23C16/345 , H01L21/02274 , H01L21/3185
摘要： A method of depositing tensile or compressively stressed silicon nitride on a substrate is described. Silicon nitride having a tensile stress with an absolute value of at least about 1200 MPa can be deposited from process gas comprising silicon-containing gas and nitrogen-containing gas, maintained in an electric field having a strength of from about 25 V/mil to about 300 V/mil. The electric field is formed by applying a voltage at a power level of less than about 60 Watts across electrodes that are spaced apart by a separation distance that is at least about 600 mils. Alternatively, silicon nitride having a compressive stress with an absolute value of at least about 2000 MPa can be formed in an electric field having a strength of from about 400 V/mil to about 800 V/mil.
摘要翻译：描述了在衬底上沉积拉伸或压应力氮化硅的方法。具有至少约1200MPa的绝对值的拉伸应力的氮化硅可以由包含含硅气体和含氮气体的工艺气体沉积，该工艺气体保持在具有约25V /密度的强度的电场至约 300 V / mil 通过以间隔至少约600密耳的间隔距离的电极施加功率水平小于约60瓦特的电压来形成电场。或者，具有绝对值至少约2000MPa的压缩应力的氮化硅可以在强度为约400V / mil至约800V / mil的电场中形成。

7. 发明申请

US20060105106A1 Tensile and compressive stressed materials for semiconductors 审中-公开
标题翻译：用于半导体的拉伸和压应力材料
公开(公告)号：US20060105106A1
公开(公告)日：2006-05-18
申请号：US11055936
申请日：2005-02-11
申请人： Mihaela Balseanu , Kee Jung , Lihua Huang , Li-Qun Xia , Rongping Wang , Derek Witty , Lewis Stern , Martin Seamons , Hichem M'Saad , Michael Kwan
发明人： Mihaela Balseanu , Kee Jung , Lihua Huang , Li-Qun Xia , Rongping Wang , Derek Witty , Lewis Stern , Martin Seamons , Hichem M'Saad , Michael Kwan
IPC分类号： C23C16/00 , B05D3/00 , H05H1/24
CPC分类号： H01L21/0217 , C23C16/345 , C23C16/5096 , C23C16/56 , H01J37/32082 , H01L21/02274 , H01L21/3105 , H01L21/3185 , H01L2924/0002 , H01L2924/00
摘要： A stressed film is formed on a substrate. The substrate is placed in a process zone and a plasma is formed of a process gas provided in the process zone, the process gas having silicon-containing gas and nitrogen-containing gas. A diluent gas such as nitrogen can also be added. The as-deposited stressed material can be exposed to ultraviolet radiation or electron beams to increase the stress value of the deposited material. In addition or in the alternative, a nitrogen plasma treatment can be used to increase the stress value of the material during deposition. Pulsed plasma methods to deposit stressed materials are also described.
摘要翻译：在基板上形成应力膜。将基板放置在处理区中，并且等离子体由设置在处理区中的工艺气体形成，工艺气体具有含硅气体和含氮气体。还可以加入稀释气体如氮气。沉积的应力材料可以暴露于紫外线辐射或电子束以增加沉积材料的应力值。另外或替代地，可以使用氮等离子体处理来增加沉积期间材料的应力值。还描述了用于沉积应力材料的脉冲等离子体方法。

8. 发明授权

US09440205B1 System and method for micro dosing 有权
标题翻译：微量给药系统和方法
公开(公告)号：US09440205B1
公开(公告)日：2016-09-13
申请号：US13594675
申请日：2012-08-24
申请人： Jeff Miller , Leland Fleming , Lewis Stern , Satish Puran , Richard Branscombe
发明人： Jeff Miller , Leland Fleming , Lewis Stern , Satish Puran , Richard Branscombe
IPC分类号： B01F5/10
CPC分类号： B65B3/12 , B01F5/104 , B67C3/00 , G01F11/32
摘要： A system and method of micro dosing containers on a conveying system is disclosed. The system includes a supply tank to maintain suspended solids in a mixture; a dosing assembly to inject micro-doses of the mixture into bottles; a recirculation assembly to circulate the mixture from the supply tank to the dosing assembly and back to the supply tank; a power and controls operation assembly to supply the system with power, to provide the system with electromechanical control and/or to provide a user interface; and a stand to hold at least the supply tank, the portable dosing assembly, the recirculation assembly and/or the power and/or controls operation assembly.
摘要翻译：公开了一种在输送系统上的微量给料容器的系统和方法。该系统包括用于将悬浮固体保持在混合物中的供应罐; 将微量剂量的混合物注入瓶中的计量组件; 再循环组件，用于将混合物从供应罐循环到计量组件并返回到供应罐; 电力和控制操作组件以向系统供电，向系统提供机电控制和/或提供用户界面; 以及至少容纳供应罐，便携式计量组件，再循环组件和/或动力和/或控制操作组件的支架。

9. 发明申请

US20110114654A1 Sensory Aroma Glass 有权
标题翻译：感官香薰玻璃
公开(公告)号：US20110114654A1
公开(公告)日：2011-05-19
申请号：US12618455
申请日：2009-11-13
申请人： Lewis Stern , Meara Kelley , Tim Ryan
发明人： Lewis Stern , Meara Kelley , Tim Ryan
IPC分类号： A47G19/22 , B23P19/04
CPC分类号： A47G19/2205 , A47G19/2211 , A47G2400/045 , Y10T29/53
摘要： A sensory aroma glass is disclosed. According to one embodiment, an apparatus comprises a fluid barrier; and a fluid container designed for containing a fluid. The fluid barrier is in contact with the rim or internal or external sidewall of the fluid container. The fluid barrier extends into the fluid container. The fluid barrier has an opening that allows aroma of the fluid to escape from the fluid container without allowing the fluid to escape from the fluid container.
摘要翻译：公开了感官香气玻璃。根据一个实施例，一种装置包括流体屏障; 以及设计用于容纳流体的流体容器。流体屏障与流体容器的边缘或内部或外部侧壁接触。流体屏障延伸到流体容器中。流体屏障具有允许流体的香味从流体容器逸出而不允许流体从流体容器逸出的开口。

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