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1. 发明申请

WO2011007901A1 PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：WO2011007901A1
公开(公告)日：2011-01-20
申请号：PCT/JP2010/062483
申请日：2010-07-16
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders (SH 2 ) and (SH 3 ) temporarily holding a sheet (S) are minutely driven in the — Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (-Z side) of the holding surface of the sheet holder (SH 1 ). Accordingly, an appropriate tension is applied to the sheet (S) in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet (S) is fixed onto the holding surface of the sheet holder (SH 1 ). That is, in the state where an XY two-dimensional tension is applied to a separate area (SA i ) of the sheet (S) a rear surface portion corresponding to the separate area (SA i ) of the sheet (S) is changed in accordance with the flat shape of the holding surface of the sheet holder (SH 1 ). In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material (S) is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材（S）的六个辅助片材保持器（SH2）和（SH3）通过控制装置在-Z轴方向上被微小地驱动，使得其保持面位于稍微低于（-Z侧）的片保持器（SH1）的保持面。因此，在片材（S）的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得片材（S）的中心部分固定在片材保持器的保持面上 SH1）。也就是说，在将XY二维张力施加到片材（S）的分离区域（SAi）的状态下，与片材（S）的分离区域（SAi）对应的后表面部分根据具有片保持器（SH1）的保持面的平坦形状。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材（S）的规定区域对应的后表面部分根据平坦的基准面而变化，被平坦化。此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

2. 发明申请

WO2011007896A1 PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案形成装置，图案形成方法及装置制造方法
公开(公告)号：WO2011007896A1
公开(公告)日：2011-01-20
申请号：PCT/JP2010/062292
申请日：2010-07-14
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： When a segmented region (SA i ) of a sheet (S) is scan-exposed, a stage (SST 1 ) adsorbs, at a standby position at the +X end portion of a scan region (AS), a rear surface portion corresponding to the segmented region (SA i ) of the sheet (S) onto a holding surface of a sheet holder (SH 1 ), and moves in the X axis direction (the -X direction) with a predetermined stroke in synchronization with a mask (a mask stage). At this time, illumination beams corresponding to the parts of a pattern of the mask are irradiated onto the sheet (S) via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region (SA i ), a stage (SST2) moves to a standby position within the XY plane. After the stage (SST 2 ) adsorbs a rear surface portion corresponding to the next segmented region (SA i+1 ) of the sheet (S) onto a holding surface of a sheet holder (SH 1 ), an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern.
摘要翻译：当片（S）的分割区域（SA）被扫描曝光时，台（SST1）在扫描区域（AS）的+ X端部的待机位置处吸附与片材（S）的分割区域（SAi）到片材保持器（SH1）的保持表面上，并且与掩模（掩模台）同步地以预定行程沿X轴方向（-X方向）移动，。此时，通过投影光学系统将对应于掩模图案的部分的照明光束照射到片材（S）上。由此，图案被转印（形成）。在分割区域（SAi）上进行扫描曝光后，舞台（SST2）移动到XY平面内的待机位置。在阶段（SST2）之后，将对应于片材（S）的下一分割区域（SAi + 1）的后表面部分吸附到片材保持器（SH1）的保持表面上，通过扫描曝光方法类似于上述，从而形成图案。

3. 发明申请

WO2011081220A1 SUBSTRATE CASE AND SUBSTRATE ACCOMMODATION APPARATUS 审中-公开
标题翻译：基板壳体和基板接纳装置
公开(公告)号：WO2011081220A1
公开(公告)日：2011-07-07
申请号：PCT/JP2010/073899
申请日：2010-12-28
申请人： NIKON CORPORATION , MIZUTANI Hideo , KIUCHI Tohru , KAWAGUCHI Toru , MASUKAWA Takashi
发明人： MIZUTANI Hideo , KIUCHI Tohru , KAWAGUCHI Toru , MASUKAWA Takashi
IPC分类号： B65H75/14 , H01L21/673 , B65H18/02
CPC分类号： H01L21/67126 , B65H75/28 , B65H75/285 , B65H2405/421 , B65H2601/25 , H01L21/67363
摘要： A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.
摘要翻译：基板壳体包括：轴部，卷绕具有进行电路制造工艺的电路区域的片状基板; 以及盖部，其以卷绕在所述轴部的状态容纳所述基板，所述轴部具有在所述基板的卷绕开始部保持与所述电路区域不同的区域的保持部。

4. 发明申请

WO2010104162A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：WO2010104162A1
公开(公告)日：2010-09-16
申请号：PCT/JP2010/054163
申请日：2010-03-05
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism (SC) that moves a first portion of a belt-shaped substrate (SH) that has photosensitivity in a first heading (-X direction) along a first direction (X direction) and moves a second portion of the substrate in a second heading (+X direction) along the first direction, a stage mechanism (MS) that holds a mask (M) and moves it in a third heading (+Y direction) along a second direction (Y direction) in synchronization with the movement of the substrate, and a projection optical system (PL). The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构（SC），该移动机构使沿着第一方向（-X方向）移动具有第一标题（-X方向）的光敏性的带状基板（SH）的第一部分 X方向）移动并沿着第一方向在第二方位（+ X方向）上移动基板的第二部分，保持掩模（M）并在第三方向（+ Y方向）上移动的阶段机构（MS）沿着与基板的移动同步的第二方向（Y方向）和投影光学系统（PL）。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

5. 发明申请

WO2010047203A1 METHOD FOR MEASURING EXPANSION/CONTRACTION, METHOD FOR PROCESSING SUBSTRATE, METHOD FOR PRODUCING DEVICE, APPARATUS FOR MEASURING EXPANSION/CONTRACTION, AND APPARATUS FOR PROCESSING SUBSTRATE 审中-公开
标题翻译：用于测量扩展/承包的方法，用于处理基板的方法，用于生产设备的方法，用于测量扩展/承包的装置以及用于处理基板的装置
公开(公告)号：WO2010047203A1
公开(公告)日：2010-04-29
申请号：PCT/JP2009/066465
申请日：2009-09-14
申请人： NIKON CORPORATION , KIUCHI, Tohru , MIZUTANI, Hideo
发明人： KIUCHI, Tohru , MIZUTANI, Hideo
IPC分类号： B41J11/00 , B41J11/42 , B41J3/407
CPC分类号： B41J3/407 , B41J11/008 , B41J11/42
摘要： An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately.
摘要翻译：膨胀/收缩测量装置包括：输送部，其沿着基板的表面输送柔性基板; 检测部，其检测形成在所述基板上的第一和第二标记，同时沿着所述基板的输送方向彼此分离预定的间隔距离，并且根据所述基板的输送而移动到所述基板的第一和第二分别设置在基板的输送路径上的检测区域; 基板长度设定部，其将沿着第一和第二检测区域之间的输送路径的基板的长度设定为基准长度; 以及导出部，其基于第一和第二标记的检测结果，得出关于基板相对于输送方向的伸缩的信息。因此，可高精度地测量可膨胀/收缩基材的膨胀/收缩状态。

6. 发明专利

JPH0942299A DUSTPROOF TYPE ROLLING BEARING 失效
公开(公告)号：JPH0942299A
公开(公告)日：1997-02-10
申请号：JP18730595
申请日：1995-07-24
申请人： MIZUTANI HIDEO
发明人： MIZUTANI HIDEO
IPC分类号： F16C33/76 , F16C19/16
摘要： PROBLEM TO BE SOLVED: To perform reliable dust-proofing through single structure by a method wherein a seal for dustproof is attached to an inner ring and comprises a body seal part to close a gap and a tongue-form seal part advancing the back of a frame body. SOLUTION: A frame body 1 comprises a body 111 formed in an U-shape in cross section and the shape of an outline ring; and a bent piece part 112 formed in such a manner that a body is bent internally, and a gap is provided between the bent piece part 112 and a rise part 211 of the inner ring 2. A seal 6 for dustproof is attached to an inner ring 2 and comprises an annular body seal part 611 to close a gap; and a tongue-form seal part 613 advancing to the back of the bent piece part 112 and extended from a base end 612 to shield a gap. The seal 6 for dustproof is assembled through one action during manufacture of a rolling bearing. Thus, a gap between the frame body and the inner ring is reliably dust-proofed through single structure, structure is extremely simplified, manufacture is facilitated, and rationality is ensured.

7. 发明专利

JP2001145876A METHOD AND APPARATUS FOR TREATING PICKLES WASTE LIQUID 失效
公开(公告)号：JP2001145876A
公开(公告)日：2001-05-29
申请号：JP32988699
申请日：1999-11-19
申请人： MIZUTANI HIDEO
发明人： MIZUTANI HIDEO
IPC分类号： B01D53/38 , B01D53/81 , C02F1/00 , C02F1/04
摘要： PROBLEM TO BE SOLVED: To solve such a problem that there is a feature enabling the reutilization of salt or a refined liquid for pickling with salt in a conventional treatment method but operation is complicated and skill is required and cost increases because many kinds of various chemicals are used and, if the use of chemicals is reduced, many tanks become necessary and a process becomes complicated and a long time is required in treatment. SOLUTION: A pickles waste liquid is stirred at about 40-50 deg. in a primary tank in which enzyme is charged and moisture is evaporated to form a treated waste liquid which is, in turn, heated to 80-100 deg.C in a secondary tank in which enzyme is charged to be stirred and moisture is evaporated to form a secondary treated waste liquid increased in the concentration of salt and this secondary treated waste liquid is separated into a salt compoment and water by a separator. Therefore, by easy and simple operation requiring no experience, that is, by the heating operation of the enzyme added waste liquid, the treatment of the waste liquid of this kind can be performed.

8. 发明授权

US5424552A Projection exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5424552A
公开(公告)日：1995-06-13
申请号：US115517
申请日：1993-09-02
申请人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
发明人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
IPC分类号： G03F7/20 , G03F9/00 , G01N21/86
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70258 , G03F7/70883 , G03F7/70891 , G03F9/70 , G03F9/7034
摘要： A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.
摘要翻译：一种投影曝光装置，用于通过聚焦状态检测装置检测在投影光学系统的曝光区域中的两个或更多处的焦点状态。根据两个以上的焦点状态的检测结果，通过图像形成特性测量装置测量投影光学系统的图像形成特性。形成沿矢状方向延伸的第一图案和沿子午方向延伸的第二图案，使得通过透射这些图案的光束测量聚焦状态，因此获得像散，偏心或球面像差以进行校正。

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