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1. 发明申请

WO2011007901A1 PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：WO2011007901A1
公开(公告)日：2011-01-20
申请号：PCT/JP2010/062483
申请日：2010-07-16
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders (SH 2 ) and (SH 3 ) temporarily holding a sheet (S) are minutely driven in the — Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (-Z side) of the holding surface of the sheet holder (SH 1 ). Accordingly, an appropriate tension is applied to the sheet (S) in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet (S) is fixed onto the holding surface of the sheet holder (SH 1 ). That is, in the state where an XY two-dimensional tension is applied to a separate area (SA i ) of the sheet (S) a rear surface portion corresponding to the separate area (SA i ) of the sheet (S) is changed in accordance with the flat shape of the holding surface of the sheet holder (SH 1 ). In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material (S) is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材（S）的六个辅助片材保持器（SH2）和（SH3）通过控制装置在-Z轴方向上被微小地驱动，使得其保持面位于稍微低于（-Z侧）的片保持器（SH1）的保持面。因此，在片材（S）的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得片材（S）的中心部分固定在片材保持器的保持面上 SH1）。也就是说，在将XY二维张力施加到片材（S）的分离区域（SAi）的状态下，与片材（S）的分离区域（SAi）对应的后表面部分根据具有片保持器（SH1）的保持面的平坦形状。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材（S）的规定区域对应的后表面部分根据平坦的基准面而变化，被平坦化。此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

2. 发明申请

WO2010104162A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：WO2010104162A1
公开(公告)日：2010-09-16
申请号：PCT/JP2010/054163
申请日：2010-03-05
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism (SC) that moves a first portion of a belt-shaped substrate (SH) that has photosensitivity in a first heading (-X direction) along a first direction (X direction) and moves a second portion of the substrate in a second heading (+X direction) along the first direction, a stage mechanism (MS) that holds a mask (M) and moves it in a third heading (+Y direction) along a second direction (Y direction) in synchronization with the movement of the substrate, and a projection optical system (PL). The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构（SC），该移动机构使沿着第一方向（-X方向）移动具有第一标题（-X方向）的光敏性的带状基板（SH）的第一部分 X方向）移动并沿着第一方向在第二方位（+ X方向）上移动基板的第二部分，保持掩模（M）并在第三方向（+ Y方向）上移动的阶段机构（MS）沿着与基板的移动同步的第二方向（Y方向）和投影光学系统（PL）。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

3. 发明申请

WO2011007896A1 PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案形成装置，图案形成方法及装置制造方法
公开(公告)号：WO2011007896A1
公开(公告)日：2011-01-20
申请号：PCT/JP2010/062292
申请日：2010-07-14
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： When a segmented region (SA i ) of a sheet (S) is scan-exposed, a stage (SST 1 ) adsorbs, at a standby position at the +X end portion of a scan region (AS), a rear surface portion corresponding to the segmented region (SA i ) of the sheet (S) onto a holding surface of a sheet holder (SH 1 ), and moves in the X axis direction (the -X direction) with a predetermined stroke in synchronization with a mask (a mask stage). At this time, illumination beams corresponding to the parts of a pattern of the mask are irradiated onto the sheet (S) via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region (SA i ), a stage (SST2) moves to a standby position within the XY plane. After the stage (SST 2 ) adsorbs a rear surface portion corresponding to the next segmented region (SA i+1 ) of the sheet (S) onto a holding surface of a sheet holder (SH 1 ), an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern.
摘要翻译：当片（S）的分割区域（SA）被扫描曝光时，台（SST1）在扫描区域（AS）的+ X端部的待机位置处吸附与片材（S）的分割区域（SAi）到片材保持器（SH1）的保持表面上，并且与掩模（掩模台）同步地以预定行程沿X轴方向（-X方向）移动，。此时，通过投影光学系统将对应于掩模图案的部分的照明光束照射到片材（S）上。由此，图案被转印（形成）。在分割区域（SAi）上进行扫描曝光后，舞台（SST2）移动到XY平面内的待机位置。在阶段（SST2）之后，将对应于片材（S）的下一分割区域（SAi + 1）的后表面部分吸附到片材保持器（SH1）的保持表面上，通过扫描曝光方法类似于上述，从而形成图案。

4. 发明申请

WO2011081220A1 SUBSTRATE CASE AND SUBSTRATE ACCOMMODATION APPARATUS 审中-公开
标题翻译：基板壳体和基板接纳装置
公开(公告)号：WO2011081220A1
公开(公告)日：2011-07-07
申请号：PCT/JP2010/073899
申请日：2010-12-28
申请人： NIKON CORPORATION , MIZUTANI Hideo , KIUCHI Tohru , KAWAGUCHI Toru , MASUKAWA Takashi
发明人： MIZUTANI Hideo , KIUCHI Tohru , KAWAGUCHI Toru , MASUKAWA Takashi
IPC分类号： B65H75/14 , H01L21/673 , B65H18/02
CPC分类号： H01L21/67126 , B65H75/28 , B65H75/285 , B65H2405/421 , B65H2601/25 , H01L21/67363
摘要： A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.
摘要翻译：基板壳体包括：轴部，卷绕具有进行电路制造工艺的电路区域的片状基板; 以及盖部，其以卷绕在所述轴部的状态容纳所述基板，所述轴部具有在所述基板的卷绕开始部保持与所述电路区域不同的区域的保持部。

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