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1. 发明授权

US06780569B1 Post-development treatment of patterned photoresist to promote cross-linking of polymer chains 有权
标题翻译：显影处理图案化的光致抗蚀剂以促进聚合物链的交联
公开(公告)号：US06780569B1
公开(公告)日：2004-08-24
申请号：US10068282
申请日：2002-02-04
申请人： Eric Hudson , Reza Sadjadi , Daxing Ren , Wan-Lin Chen , Douglas Keil , Peter Cirigliano
发明人： Eric Hudson , Reza Sadjadi , Daxing Ren , Wan-Lin Chen , Douglas Keil , Peter Cirigliano
IPC分类号： G03F700
CPC分类号： G03F7/40
摘要： A method for creating semiconductor devices is provided. A photoresist layer is provided on a wafer. The photoresist layer is patterned. Polymers in the patterned photoresist layer are chemically cross-linked by exposure to at least one reactive chemical. The pattern in the photoresist layer is transferred to the wafer. A reaction chamber for processing a wafer with a patterned layer of photoresist material, wherein the photoresist material was patterned by exposing the photoresist material using light of a wavelength less than 248 nm is provided. A chamber is provided with a central cavity. A wafer support for supporting the wafer in the central cavity is provided. A cross-linking reactive chemical source in fluid contact with the chamber and which provides a reactive chemical which causes cross-linking of the photoresist is provided.
摘要翻译：提供了一种用于制造半导体器件的方法。在晶片上设置光致抗蚀剂层。对光致抗蚀剂层进行图案化。图案化光致抗蚀剂层中的聚合物通过暴露于至少一种反应性化学物质而被化学交联。光致抗蚀剂层中的图案被转印到晶片上。一种用于处理具有图案化的光致抗蚀剂材料层的晶片的反应室，其中通过使用波长小于248nm的光暴露光致抗蚀剂材料来对光致抗蚀剂材料进行图案化。腔室设有中心腔。提供了用于在中心腔中支撑晶片的晶片支撑件。提供了与室流体接触并提供引起光致抗蚀剂交联的反应性化学物质的交联反应性化学源。

2. 发明授权

US07498269B2 Cleaning methods for silicon electrode assembly surface contamination removal 失效
标题翻译：硅电极组件表面污染清除方法
公开(公告)号：US07498269B2
公开(公告)日：2009-03-03
申请号：US11812793
申请日：2007-06-21
申请人： Daxing Ren , Hong Shih
发明人： Daxing Ren , Hong Shih
IPC分类号： H01L21/302
CPC分类号： B08B3/08 , C11D3/3947 , C11D7/10 , C11D7/265 , C11D11/0047 , Y10S134/902
摘要： Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.
摘要翻译：控制或消除电极组合接合材料可能的化学侵蚀的硅电极组件去污清洗方法和解决方案包括氟化铵，过氧化氢，乙酸，任选的乙酸铵和去离子水。

3. 发明申请

US20070068629A1 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof 有权
标题翻译：具有改进的颗粒性能的主动加热铝挡板部件及其使用和制造方法
公开(公告)号：US20070068629A1
公开(公告)日：2007-03-29
申请号：US11232991
申请日：2005-09-23
申请人： Hong Shih , G. Peng , Daxing Ren
发明人： Hong Shih , G. Peng , Daxing Ren
IPC分类号： C23F1/00 , B23H9/00
CPC分类号： H01L21/3065 , C23C16/4401 , C25D11/04 , H01J37/32623 , H01J37/32633 , H01L21/02041 , H01L21/67069
摘要： An actively heated aluminum baffle component such as a thermal control plate or baffle ring of a showerhead electrode assembly of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer during plasma processing compared to an identically shaped component having a Type III anodized surface.
摘要翻译：主动加热的铝制挡板部件，例如等离子体处理室的喷头电极组件的热控制板或挡板环，具有通过电抛光工艺形成的暴露的外部氧化铝层。暴露的外部氧化铝层使得与等离子体处理相比，具有III型阳极氧化表面的相同形状的部件相比，由于铝组分和外部氧化铝层在等离子体处理期间经受的差异热应力而产生的缺陷和颗粒最小化。

4. 发明授权

US07442114B2 Methods for silicon electrode assembly etch rate and etch uniformity recovery 有权
标题翻译：硅电极组件蚀刻速率和蚀刻均匀性恢复方法
公开(公告)号：US07442114B2
公开(公告)日：2008-10-28
申请号：US11019729
申请日：2004-12-23
申请人： Tuochuan Huang , Daxing Ren , Hong Shih , Catherine Zhou , Chun Yan , Enrico Magni , Bi Ming Yen , Jerome Hubacek , Dae J. Lim , Dougyong Sung
发明人： Tuochuan Huang , Daxing Ren , Hong Shih , Catherine Zhou , Chun Yan , Enrico Magni , Bi Ming Yen , Jerome Hubacek , Dae J. Lim , Dougyong Sung
IPC分类号： B24B1/00
CPC分类号： H01L21/67069 , B08B3/10 , B08B3/12 , B24C1/003 , H01J37/32605
摘要： Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
摘要翻译：用于清洁电极组件的方法，其可以用于在清洁之后蚀刻等离子体蚀刻室中的电介质材料，包括抛光电极组件的硅表面，优选从其中去除黑色硅污染物。

5. 发明授权

US07247579B2 Cleaning methods for silicon electrode assembly surface contamination removal 有权
标题翻译：硅电极组件表面污染清除方法
公开(公告)号：US07247579B2
公开(公告)日：2007-07-24
申请号：US11019727
申请日：2004-12-23
申请人： Daxing Ren , Hong Shih
发明人： Daxing Ren , Hong Shih
IPC分类号： H01L21/461
CPC分类号： B08B3/08 , C11D3/3947 , C11D7/10 , C11D7/265 , C11D11/0047 , Y10S134/902
摘要： Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.
摘要翻译：控制或消除电极组合接合材料可能的化学侵蚀的硅电极组件去污清洗方法和解决方案包括氟化铵，过氧化氢，乙酸，任选的乙酸铵和去离子水。

6. 发明申请

US20050106884A1 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon 有权
标题翻译：处理以除去游离碳的半导体衬底处理设备的碳化硅组分
公开(公告)号：US20050106884A1
公开(公告)日：2005-05-19
申请号：US10706938
申请日：2003-11-14
申请人： Daxing Ren
发明人： Daxing Ren
IPC分类号： C23C16/44 , H01J37/32 , H01L20060101 , H01L21/00 , H01L21/302 , H01L21/461
CPC分类号： H01L21/67069 , C23C16/4405 , C23C16/4407 , H01J37/32477 , H01J2237/022
摘要： Silicon carbide components of a plasma processing apparatus, methods of making the components, and methods of using the components during processing of semiconductor substrates to provide for reduced particle contamination of the substrates are provided. The silicon carbide components are made by a process that results in free-carbon in the components. The silicon carbide components are treated to remove the free-carbon from at least the surface.
摘要翻译：提供等离子体处理装置的碳化硅部件，制造部件的方法以及在半导体基板的加工期间使用部件以提供基板的减少的颗粒污染的方法。碳化硅组分通过在组分中产生游离碳的方法制成。处理碳化硅组分以从至少表面除去游离碳。

7. 发明申请

US20100138281A1 System and method for retail store shelf stock monitoring, predicting, and reporting 审中-公开
标题翻译：零售店货架监控，预测和报告的系统和方法
公开(公告)号：US20100138281A1
公开(公告)日：2010-06-03
申请号：US12590577
申请日：2009-11-10
申请人： Yinying Zhang , Daxing Ren
发明人： Yinying Zhang , Daxing Ren
IPC分类号： G06Q10/00 , G06Q30/00 , G06Q50/00
CPC分类号： G06Q10/087 , G06Q20/203
摘要： A system for retail store shelf stock status monitoring, predicting, and reporting that is capable of monitoring retail store current shelf stock capacity and shelf product freshness at product level, category level, department level, store level, and other product hierarchy levels. It is also capable of intelligently predicting future shelf stock status according to predicted future store sales activities. It uses shelf stock empty index, out-of-stock alert, shelf stock freshness, shelf stock expiration alert, and other shelf stock performance measures to present current shelf status, future shelf status, and past shelf stock performances through interactive store maps and other visual presentation means to optimally deliver retail store shelf stock performance information in real time. The system empowers store clerks, store managers, chain store management, and corporation analysts to monitor, review, and analyze store shelf stock status in real time from anywhere at any time.
摘要翻译：用于零售店货架状态监控，预测和报告的系统，其能够监视零售店目前的货架库存容量和产品级别，类别级别，部门级别，商店级别和其他产品层次结构级别的货架产品新鲜度。根据预测的未来商店销售活动，它还能够智能预测未来货架状态。它使用货架空指数，库存缺货警报，货架库存新鲜度，货架库存过期警报和其他货架库存绩效措施，以通过交互式商店地图和其他方式呈现当前货架状态，未来货架状态和过去货架库存性能视觉呈现意味着实时优化提供零售店货架库存绩效信息。该系统可以让店员，商店经理，连锁店管理和公司分析师随时从任何地方实时监控，审查和分析商店货架库存状况。

8. 发明授权

US07517803B2 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers 有权
标题翻译：具有降低等离子体反应室的金属杂质浓度的硅部件
公开(公告)号：US07517803B2
公开(公告)日：2009-04-14
申请号：US10950656
申请日：2004-09-28
申请人： Daxing Ren , Jerome S. Hubacek , Nicholas E. Webb
发明人： Daxing Ren , Jerome S. Hubacek , Nicholas E. Webb
IPC分类号： H01L21/302
CPC分类号： H01J37/32009 , C23C16/4407 , H01J37/3255
摘要： Silicon parts of a semiconductor processing apparatus containing low levels of metal impurities that are highly mobile in silicon are provided. The silicon parts include, for example, rings, electrodes and electrode assemblies. The silicon parts can reduce metal contamination of wafers processed in plasma atmospheres.
摘要翻译：提供了包含在硅中高度移动的低含量金属杂质的半导体处理装置的硅部件。硅部件包括例如环，电极和电极组件。硅部件可以减少在等离子体气氛中处理的晶片的金属污染。

9. 发明授权

US06846726B2 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers 失效
公开(公告)号：US06846726B2
公开(公告)日：2005-01-25
申请号：US10247722
申请日：2002-09-20
申请人： Daxing Ren , Jerome S. Hubacek , Nicholas E. Webb
发明人： Daxing Ren , Jerome S. Hubacek , Nicholas E. Webb
IPC分类号： H01L21/3065 , C23C16/44 , H01J37/32 , H01L21/205 , H01L21/46 , H01L21/301 , H01L21/78
CPC分类号： H01J37/32009 , C23C16/4407 , H01J37/3255
摘要： Silicon parts of a semiconductor processing apparatus containing low levels of metal impurities that are highly mobile in silicon are provided. The silicon parts include, for example, rings, electrodes and electrode assemblies. The silicon parts can reduce metal contamination of wafers processed in plasma atmospheres.

10. 发明申请

US20100205045A1 System and method for improving retail store customer loyalty 审中-公开
标题翻译：提高零售店客户忠诚度的系统和方法
公开(公告)号：US20100205045A1
公开(公告)日：2010-08-12
申请号：US12658276
申请日：2010-02-05
申请人： Yinying Zhang , Daxing Ren
发明人： Yinying Zhang , Daxing Ren
IPC分类号： G06Q30/00 , G06Q10/00 , G06Q99/00 , G06F3/01
CPC分类号： G06Q30/02 , G06Q30/0207 , G06Q30/0224 , G06Q30/0236 , G06Q30/0281 , G06Q30/0601 , G06Q90/20
摘要： A system and method for improving and maintaining retail store customer loyalty through providing customers with quality services, timely assistances, and conveniences in all stages of product shopping. The system provides a web parts based collaborative online platform for retailers, product manufacturers, and service providers to share resources, distribute coupons, promote products and services, and communicate with customers. It further provides shopping assistances to help customers selectively receive coupons, redeem coupons online, build shopping lists online, retrieve shopping list and shopping reminders, find product shelf locations, place online orders, and manage budgets and nutrition. The system has the capability to collect customer shopping activity data, automatically analyze customer product purchase preferences, recommend products and services, and deliver relevant coupons and advertisements to customers.
摘要翻译：通过在客户的各个阶段为客户提供优质的服务，及时的帮助和便利，提高和维护零售店客户忠诚度的系统和方法。该系统为零售商，产品制造商和服务提供商提供基于Web部件的协同在线平台，以共享资源，分发优惠券，促销产品和服务以及与客户沟通。它进一步提供购物帮助，帮助客户选择性地接收优惠券，在线兑换优惠券，在线建立购物清单，检索购物清单和购物提醒，查找产品货架位置，放置在线订单以及管理预算和营养。系统能够收集客户购物活动数据，自动分析客户产品购买偏好，推荐产品和服务，并向客户提供相关优惠券和广告。

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