专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09746856B2 Multi-hole orifice plate for flow control, and flow controller using the same 有权
公开(公告)号：US09746856B2
公开(公告)日：2017-08-29
申请号：US14785789
申请日：2014-04-09
申请人： FUJIKIN INCORPORATED
发明人： Kaoru Hirata , Atsushi Hidaka , Masaaki Nagase , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino , Katsuyuki Sugita , Takashi Hirose
IPC分类号： G01F1/42 , F16L55/027 , G05D7/06
CPC分类号： G05D7/0635 , F16L55/02718
摘要： A multi-hole orifice plate for flow control includes an orifice plate for controlling the flow rate of a fluid, wherein the opening area of one orifice necessary for the passage of a predetermined flow rate of fluid is divided to provide a plurality of orifices having a total opening area equal to said opening area.

2. 发明申请

US20150322567A1 RAW MATERIAL VAPORIZATION AND SUPPLY APPARATUS 有权
标题翻译：原材料蒸发和供应装置
公开(公告)号：US20150322567A1
公开(公告)日：2015-11-12
申请号：US14650496
申请日：2013-11-20
申请人： FUJIKIN INCORPORATED
发明人： Atsushi Hidaka , Masaaki Nagase , Satoru Yamashita , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/448 , F22B1/28 , F17C9/02
CPC分类号： C23C16/4485 , C23C16/4481 , C23C16/4482 , C23C16/52 , F17C9/02 , F22B1/284 , F22B1/285
摘要： The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
摘要翻译：本发明提供一种原料蒸发供给装置，其包括原料容纳槽，用于蒸发从液体接收罐供给的液体的蒸发器，用于调节来自蒸发器的原料气体的流量的流量控制装置，以及用于加热蒸发器，高温压力型流量控制装置和连接到这些装置的流路的所需部分的加热装置，其中Al 2 O 3钝化处理，Cr 2 O 3钝化处理或FeF 2钝化处理被施加到液体接触至少任何原料接收罐，蒸发器，流量控制装置，连接这些部件装置的流动通道或设置在流体中的开关阀的金属表面的零件或气体接触部分段落。

3. 发明授权

US10604840B2 Liquid level indicator and liquid raw material vaporization feeder 有权
公开(公告)号：US10604840B2
公开(公告)日：2020-03-31
申请号：US15525479
申请日：2015-11-02
申请人： FUJIKIN INCORPORATED
发明人： Atsushi Hidaka , Masaaki Nagase , Kaoru Hirata , Satoru Yamashita , Keiji Hirao , Kouji Nishino , Nobukazu Ikeda
IPC分类号： H01L21/31 , C23C16/455 , B01J4/00 , G01F23/24 , C23C16/448 , G01F23/26 , H01L21/67 , G01F23/22
摘要： To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.

4. 发明申请

US20170364099A1 FLOW CONTROL SYSTEM WITH BUILD-DOWN SYSTEM FLOW MONITORING 审中-公开
公开(公告)号：US20170364099A1
公开(公告)日：2017-12-21
申请号：US15632615
申请日：2017-06-26
申请人： FUJIKIN INCORPORATED
发明人： Masaaki Nagase , Atsushi Hidaka , Kouji Nishino , Nobukazu Ikeda
IPC分类号： G05D7/06 , G01F1/36 , G01F15/00
CPC分类号： G05D7/0635 , G01F1/36 , G01F15/005 , Y10T137/7737
摘要： To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.

5. 发明授权

US09556518B2 Raw material gas supply apparatus for semiconductor manufacturing equipment 有权
标题翻译：半导体制造设备用原料气供应装置
公开(公告)号：US09556518B2
公开(公告)日：2017-01-31
申请号：US14150263
申请日：2014-01-08
申请人： FUJIKIN INCORPORATED
发明人： Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/448 , C23C16/455 , C23C16/52
CPC分类号： C23C16/448 , C23C16/4485 , C23C16/45561 , C23C16/52 , Y10T137/86485
摘要： A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
摘要翻译：原料气体供给装置包括液体原料气体供给源，储存液体原料的源罐，将来自液体原料的含有液体原料蒸汽的原料气体从原料罐供给到处理室的气体分配通路，安装在所述气体通路的上游侧的自动压力调节器，其中，所述自动压力调节器使所述原料气体的供给压力保持在设定值，所述供给气体切换阀安装在所述气体通路的下游侧，打开和关闭气体通道，设置在阀的入口侧或出口侧中的至少一个上的孔，其中孔口调节原料气体的流速，恒温加热装置加热源罐，气体通道，阀门和孔口达到设定温度。

6. 发明申请

US20140216339A1 RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS 审中-公开
标题翻译：原料气化和供应装置
公开(公告)号：US20140216339A1
公开(公告)日：2014-08-07
申请号：US14170953
申请日：2014-02-03
申请人： FUJIKIN INCORPORATED
发明人： Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/448
CPC分类号： C23C16/4485
摘要： A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control.
摘要翻译：一种原料蒸发和供给装置，包括：原料储存在其中的原料罐，将原料气体从原料罐的内部空间供给到处理室的原料气体供给流路，压力型流速率控制系统，其沿着供给通道的方式安装，并且控制供给到处理室的原料气体的流量;以及恒温加热单元，其加热源箱，供给通道和压力型流量控制系统达到设定温度，其中在压力型流量控制系统进行流量控制的同时，将源槽内部空间部分中产生的原料气体供给到处理室。

7. 发明授权

US10646844B2 Vaporization supply apparatus 有权
公开(公告)号：US10646844B2
公开(公告)日：2020-05-12
申请号：US15565696
申请日：2016-04-11
申请人： FUJIKIN INCORPORATED
发明人： Atsushi Hidaka , Masaaki Nagase , Kaoru Hirata , Katsuyuki Sugita , Takatoshi Nakatani , Satoru Yamashita , Kouji Nishino , Nobukazu Ikeda , Keiji Hirao
IPC分类号： B01J4/00 , B01J7/02 , C23C16/52 , H01L21/31 , C23C16/448 , H01L21/3213 , H01L21/67 , H01L21/205
摘要： A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.

8. 发明授权

US09994955B2 Raw material vaporization and supply apparatus 有权
公开(公告)号：US09994955B2
公开(公告)日：2018-06-12
申请号：US14650496
申请日：2013-11-20
申请人： FUJIKIN INCORPORATED
发明人： Atsushi Hidaka , Masaaki Nagase , Satoru Yamashita , Kouji Nishino , Nobukazu Ikeda
IPC分类号： F22B1/28 , F24H1/18 , C23C16/448 , F17C9/02 , C23C16/52
CPC分类号： C23C16/4485 , C23C16/4481 , C23C16/4482 , C23C16/52 , F17C9/02 , F22B1/284 , F22B1/285
摘要： The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.

9. 发明申请

US20170327949A1 LIQUID LEVEL INDICATOR AND LIQUID RAW MATERIAL VAPORIZATION FEEDER 审中-公开
公开(公告)号：US20170327949A1
公开(公告)日：2017-11-16
申请号：US15525479
申请日：2015-11-02
申请人： FUJIKIN INCORPORATED
发明人： Atsushi Hidaka , Masaaki Nagase , Kaoru Hirata , Satoru Yamashita , Keiji Hirao , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/455 , G01F23/26 , H01L21/67 , H01L21/31 , C23C16/448
CPC分类号： C23C16/45561 , B01J4/00 , C23C16/448 , C23C16/4481 , G01F23/22 , G01F23/247 , G01F23/26 , H01L21/31 , H01L21/67248
摘要： [Problem] To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened.[Means for Resolution] The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.

10. 发明授权

US09733649B2 Flow control system with build-down system flow monitoring 有权
公开(公告)号：US09733649B2
公开(公告)日：2017-08-15
申请号：US14404418
申请日：2013-04-15
申请人： FUJIKIN INCORPORATED
发明人： Masaaki Nagase , Atsushi Hidaka , Kouji Nishino , Nobukazu Ikeda
IPC分类号： G01F15/00 , G01F1/36 , G05D7/06
CPC分类号： G05D7/0635 , G01F1/36 , G01F15/005 , Y10T137/7737
摘要： To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式