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1. 发明申请

US20160085144A1 EXTREME ULTRAVIOLET (EUV) POD HAVING MARKS 有权
标题翻译：极品ULTRAVIOLET（EUV）POD有标记
公开(公告)号：US20160085144A1
公开(公告)日：2016-03-24
申请号：US14862334
申请日：2015-09-23
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： WEI-YEN CHEN , CHENG-JU LEE , LONG-MING LU , CHENG-HSIN CHEN , TIEN-JUI LIN
IPC分类号： G03F1/22
CPC分类号： G03F1/22 , G03F1/42 , G03F1/66
摘要： The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
摘要翻译：本发明涉及具有标记的EUV舱，其包括掩模舱和设置在掩模舱上的一个或多个标记。处理机的一个或多个传感器用于检测一个或多个标记。通过包括一个或多个标记，可以改变由一个或多个传感器可检测的掩模盒的一个或多个区域的表面粗糙度。一个或多个传感器向掩模盒发射光，其将光反射到一个或多个传感器。一个或多个传感器接收来自掩模盒的反射光，并判断由反射光产生的电压是否落在标记的反射范围内。因此，可以确认一个或多个传感器对应于一个或多个构件。

2. 发明申请

US20150340260A1 WAFER TRANSPORT SYSTEM AND METHOD FOR OPERATING THE SAME 有权
标题翻译： WAFER运输系统及其操作方法
公开(公告)号：US20150340260A1
公开(公告)日：2015-11-26
申请号：US14556233
申请日：2014-11-30
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： HUI-MING PAO , CHENG-HSIN CHEN , PO-TING LEE , MING-CHIEN CHIU , TIEN-JUI LIN
IPC分类号： H01L21/677 , H01L21/68 , H01L21/687 , H01L21/673
CPC分类号： H01L21/67748 , H01L21/67259 , H01L21/67353 , H01L21/67393 , H01L21/6773 , H01L21/67736 , H01L21/67778 , H01L21/68 , H01L21/687
摘要： The present invention relates to a wafer transport system and a method of operating the same. The wafer transport system comprises at least one semiconductor apparatus, a track, a transfer device, a positioning device, a carrier and a cleaning device. The wafer transport system transports wafers along the at least one semiconductor apparatus via the carrier riding on the track. The transfer device transfers the wafers from the carrier to the at least one semiconductor apparatus. The positioning device identifies and controls the position of the carrier on the track. The cleaning device maintains the cleanliness of the wafers. The present invention provides advantages for improving the yield rate of a wafer, shortening the fabrication time of a wafer, and offering the flexibility and the extendibility to a wafer transport system.
摘要翻译：本发明涉及晶片输送系统及其操作方法。晶片传送系统包括至少一个半导体装置，轨道，传送装置，定位装置，载体和清洁装置。晶片传送系统经由载体骑在轨道上沿着至少一个半导体装置输送晶片。传送装置将晶片从载体传送到至少一个半导体装置。定位装置识别和控制载体在轨道上的位置。清洁装置保持晶片的清洁度。本发明提供了提高晶片的成品率，缩短晶片的制造时间以及提供对晶片输送系统的灵活性和可扩展性的优点。

3. 发明申请

US20140194050A1 GAS PURIFIER FOR WAFER SUBSTRATE ACCOMMODATING UNIT 审中-公开
标题翻译：用于散热器底座调节单元的气体净化器
公开(公告)号：US20140194050A1
公开(公告)日：2014-07-10
申请号：US13834796
申请日：2013-03-15
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： MING-MO LO , CHENG-HSIN CHEN , TIEN-JUI LIN
IPC分类号： F24F7/04
CPC分类号： F24F7/04 , H01L21/67393
摘要： A gas purifier to be applied on a wafer substrate accommodating unit with an inlet hole includes an outer tube and an inner tube. The outer tube is disposed on the wafer substrate accommodating unit and has a plurality of first gas filling apertures. One end of the inner tube is a closed end and the other end is an open end. The inner tube has a plurality of second gas filling apertures, and its open end is interconnected with the inlet hole. The inner tube is movably disposed within the outer tube between a first operating position and second operating position. The second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and interconnected with the first gas filling apertures when the inner tube is at a second operating position.
摘要翻译：要施加在具有入口孔的晶片衬底容纳单元上的气体净化器包括外管和内管。外管设置在晶片衬底容纳单元上，并具有多个第一气体填充孔。内管的一端是封闭端，另一端是开口端。内管具有多个第二气体填充孔，其开口端与入口孔相互连接。内管可移动地设置在第一操作位置和第二操作位置之间的外管内。当内管处于第一操作位置时，第二气体填充孔相应地构造成外管的内壁，并且当内管处于第二操作位置时与第一气体填充孔互连。

4. 发明申请

US20140291198A1 RETICLE POD HAVING GAS GUIDING APPARATUS 有权
标题翻译：具有气体导向装置的物品
公开(公告)号：US20140291198A1
公开(公告)日：2014-10-02
申请号：US13889498
申请日：2013-05-08
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： PAO-YI LU , TIEN-JUI LIN
IPC分类号： H01L21/673
CPC分类号： H01L21/67359 , H01L21/67393
摘要： The present invention relates to a reticle pod having gas guiding apparatus. The gas guiding apparatus communicates with at least an inlet of the reticle pod and comprises a first outlet corresponding to a first gas flowing space of the reticle pod and a second outlet corresponding to a second gas flowing space. When the inlet supplies a high-purity gas to the gas guiding apparatus, the high-purity gas will flows through the gas guiding apparatus, and flow to the first and second gas flowing spaces via the first and second outlets, respectively to distribute uniformly in the first and second gas flowing spaces. In addition, the cleaning efficiency on the reticle is improved; the contact between the reticle and air can be avoided for protecting the reticle. Thereby, the usage of the high-purity gas is reduced, and the filling efficiency of the high-purity gas is enhanced.
摘要翻译：本发明涉及一种具有气体引导装置的标线盒。气体引导装置与标线舱的至少一个入口连通，并且包括对应于标线舱的第一气体流动空间的第一出口和对应于第二气体流动空间的第二出口。当入口向气体引导装置供应高纯度气体时，高纯度气体将流过气体引导装置，并且经由第一和第二出口分别流到第一和第二气体流动空间，以均匀地分布在第一和第二气体流动空间。另外，掩模版的清洗效率提高; 可以避免掩模版和空气之间的接触，以保护光罩。由此，降低了高纯度气体的使用，提高了高纯度气体的填充效率。

5. 发明申请

US20140238896A1 SUBSTRATE CONTAINER HAVING LIMIT STRUCTURE 审中-公开
标题翻译：具有极限结构的基座容器
公开(公告)号：US20140238896A1
公开(公告)日：2014-08-28
申请号：US13863526
申请日：2013-04-16
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： CHI-TE HUANG , CHIEN-FENG WANG , SHAO-WEI LU , TIEN-JUI LIN
IPC分类号： H01L21/673
CPC分类号： H01L21/67383
摘要： A substrate container having a limit structure includes a box, at least one limit structure and a door. The limit structure is disposed on a side wall of the box and has a plurality of limit grooves. Each limit groove has a first inclined surface and a second inclined surface. The angle of inclination of the second inclined plane relative to a horizontal plane corresponds to a coefficient of friction between materials of the substrate and the limit structure to lower the friction between the substrate and the second inclined plane of the limit groove, so that the substrate can ascend along the second inclined plane to get into the limit groove for the door to be closed smoothly. Through the limit structure to position the substrate, the present invention can prevent the substrate from shaking in the substrate container.
摘要翻译：具有限制结构的基底容器包括一个盒子，至少一个限制结构和一个门。极限结构设置在箱体的侧壁上并且具有多个限位槽。每个限制槽具有第一倾斜表面和第二倾斜表面。第二倾斜面相对于水平面的倾斜角度对应于基板材料与极限结构之间的摩擦系数，以降低基板与限制槽的第二倾斜平面之间的摩擦，使得基板可以沿着第二倾斜平面上升，进入限位槽，使门平稳地关闭。通过定位基板的极限结构，本发明可以防止基板在基板容器中摇动。

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