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1. 发明申请

US20220093434A1 SUPPORTING SHELF MODULE AND WAFER CONTAINER USING SAME 有权
公开(公告)号：US20220093434A1
公开(公告)日：2022-03-24
申请号：US17406116
申请日：2021-08-19
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , EN-NIEN SHEN , YUNG-CHIN PAN , CHENG-EN CHUNG , PO-TING LEE , WEI-CHIEN LIU , TZU-WEI HUANG
IPC分类号： H01L21/673
摘要： A supporting shelf module includes a plurality of plastic supporting plates parallelly arranged in a height direction, and at least one pair of metal-made connectors located at two opposite ends of the supporting plates in the height direction. The connectors in one pair are correspondingly located in two horizontal planes perpendicular to the height direction. A wafer container is also disclosed, which includes a container body having at least two sets of the supporting shelf modules mounted therein, at least two top retaining brackets and at least two bottom retaining grooves provided on an inward side of a top and a bottom panel of the container body, respectively. The supporting shelf module has upper ends engaged with the top retaining brackets and lower ends engaged with and limited to the bottom retaining grooves in an engaging direction. Thus, the tolerance problem of the conventional wafer shelf can be solved.

2. 发明申请

US20220080441A1 SHIELDING JIG 有权
公开(公告)号：US20220080441A1
公开(公告)日：2022-03-17
申请号：US17163451
申请日：2021-01-31
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , EN-NIEN SHEN , YUNG-CHIN PAN , SHIH-FENG WU
IPC分类号： B05B12/20 , F16J15/06
摘要： The present invention discloses a shielding jig which mainly comprises an adjustment unit, a positioning unit and a sealing unit. The adjustment unit is configured and engaged between the positioning unit and the sealing unit. Therefore, a first actuation surface of the adjustment unit matches with a second actuation surface of the sealing unit, resulting in expansion of the sealing unit. This expansion makes the shielding jig be able to shade and seal any workpiece.

3. 发明申请

US20140137890A1 METHOD AND SYSTEM FOR CLEANING PHOTOMASKS 有权
标题翻译：清洁光电子的方法和系统
公开(公告)号：US20140137890A1
公开(公告)日：2014-05-22
申请号：US13762499
申请日：2013-02-08
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： YUNG-CHIN PAN
IPC分类号： B08B7/04
CPC分类号： B08B3/10 , B08B1/00 , G03F1/82
摘要： A method for cleaning photomasks includes the following steps: provided a cleansing device having a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is use to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. As least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination. The instant disclosure also provides a system for cleaning photomasks.
摘要翻译：一种清洁光掩模的方法包括以下步骤：提供一种具有洗涤单元的清洁装置。具有饱和洗涤表面的洗涤单元用于用倾斜分配的流体清洁光掩模。以这种方式，去除了松散的污染物。在洗涤表面的周边上形成至少一个倾斜表面以形成沟槽区域，使得流体可以在清洁之后立即从光掩模中流出，以防再次污染。本公开还提供了一种用于清洁光掩模的系统。

4. 发明申请

US20220093437A1 SUBSTRATE CONTAINER WITH ENHANCED FLOW FIELD THEREIN 有权
公开(公告)号：US20220093437A1
公开(公告)日：2022-03-24
申请号：US17197064
申请日：2021-03-10
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , EN-NIEN SHEN , YUNG-CHIN PAN , CHIH-MING LIN , WEI-CHIEN LIU , CHENG-EN CHUNG , PO-TING LEE , JYUN-YAN JIANG
IPC分类号： H01L21/677 , H01L21/67 , B65D47/32
摘要： A substrate container with enhanced flow field therein includes a box, at least one offset inflation mechanism and at least one gas diffusion mechanism. The offset inflation mechanism is disposed outside internal receiving space of the box. The offset inflation mechanism has a gaseous chamber extending in the same direction as a bottom panel. The gas diffusion mechanism includes a base, a partition wall and at least one diffusion member. The base masks an outlet of the gaseous chamber to form an auxiliary gaseous chamber. The partition wall extends perpendicularly to the bottom panel to form a vertical first gas channel in communication with the auxiliary gaseous chamber. The diffusion member and the partition wall together define a second gas channel. The partition wall has at least one gap whereby the first gas channel and the second gas channel are in communication with each other.

5. 发明申请

US20140137347A1 PHOTOMASK CLEANING DEVICE 有权
标题翻译： PHOTOMASK清洁装置
公开(公告)号：US20140137347A1
公开(公告)日：2014-05-22
申请号：US13761236
申请日：2013-02-07
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： YUNG-CHIN PAN
IPC分类号： G03F7/20
CPC分类号： G03F1/82
摘要： A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.
摘要翻译：光掩模清洁装置包括台，流体分配器，擦洗单元，盖和定影单元。流体分配器包括对应于洗涤单元设置的直接分配单元和倾斜分配单元，其倾斜地将水喷射到光掩模上。可以通过倾斜分配单元和洗涤单元的组合应用来去除大部分颗粒。

6. 发明申请

US20220013391A1 SUBSTRATE CARRIER LATCHING STRUCTURE 有权
公开(公告)号：US20220013391A1
公开(公告)日：2022-01-13
申请号：US17163450
申请日：2021-01-31
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , YUNG-CHIN PAN , WEI-CHIAN LIU
IPC分类号： H01L21/673
摘要： The invention discloses a substrate carrier latching structure, which mainly comprises a top portion, a cover and a detachable module. The top portion is disposed on the enclosure of a substrate carrier, and the cover is connected to the top portion via a detachable module. As such, the excessive stress on the substrate carrier is avoided to maintain the integrity of substrates stored in the inner portion of the substrate carrier.

7. 发明申请

US20140291942A1 CHUCK STRUCTURE FOR SUBSTRATE CLEANSING EQUIPMENT 审中-公开
标题翻译：衬底清洗设备的结构
公开(公告)号：US20140291942A1
公开(公告)日：2014-10-02
申请号：US13889548
申请日：2013-05-08
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： AN-PANG WANG , YUNG-CHIN PAN , SHENG-HSIEN YU , TSUNG YI YANG
IPC分类号： H01L21/687
CPC分类号： H01L21/68785 , Y10T279/34
摘要： The present invention provides a chuck structure for substrate cleansing equipment, which comprises a base and at least a pair of clipping members. The pair of clipping members is disposed on both corresponding sides of the base, respectively. Each clipping member has a plurality of holes on a surface thereof. When the pair of clipping members moves towards the base, it clips a substrate such as a photomask, a wafer, or other semiconductor substrate. The surfaces of the clipping members having the plurality of holes are against the substrate for reducing the contact area between the clipping members and the substrate. Thereby, the static charges generated on the substrate by the friction between the clipping members and the substrate can be avoided, which can reduce the damages on the substrate due to electrostatic discharge effectively.
摘要翻译：本发明提供了一种用于基板清洁设备的卡盘结构，其包括基部和至少一对夹持构件。该对夹持件分别设置在基座的相应侧上。每个夹持构件在其表面上具有多个孔。当一对夹持构件朝向底座移动时，其夹紧诸如光掩模，晶片或其它半导体衬底的衬底。具有多个孔的夹持构件的表面抵靠基板，用于减小夹持构件和基板之间的接触面积。因此，可以避免由于夹持部件和基板之间的摩擦而在基板上产生的静电荷，这可以有效地减少由于静电放电对基板的损伤。

8. 发明申请

US20140150824A1 AIR-BLOWN CLEANING SYSTEM FOR PHOTOMASKS AND METHOD THEREOF 有权
标题翻译：用于光电子的空气清洁系统及其方法
公开(公告)号：US20140150824A1
公开(公告)日：2014-06-05
申请号：US13762541
申请日：2013-02-08
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： YUNG-CHIN PAN , TSUNG-YI YANG , LIANG-WEI LAI
IPC分类号： B08B5/00
CPC分类号： B08B5/02 , B08B13/00 , G03F1/82
摘要： An air-blown cleaning system for cleaning a photomask includes an image capturing module, an identification and control module, and an air knife device. The image capturing module captures an image of the photomask and divided the image into a plurality of sections for the identification and control module to identify particular sections with contaminants for subsequent cleaning and to store such data into a database. The air knife device includes at least one air knife module which receives data from the database and controls the air knife module to air blow the particular sections with contaminants. The instant disclosure also includes a method of air blow cleaning for cleaning a photomask.
摘要翻译：用于清洁光掩模的吹风清洁系统包括图像捕获模块，识别和控制模块以及气刀装置。图像捕获模块捕获光掩模的图像，并将该图像划分成用于识别和控制模块的多个部分，以识别具有污染物的特定部分用于随后的清洁并将这些数据存储到数据库中。气刀装置包括至少一个气刀模块，其从数据库接收数据并控制气刀模块用特定部分对污染物进行吹气。本公开还包括用于清洁光掩模的吹气清洁的方法。

9. 发明申请

US20220089327A1 CENTRAL SUPPORT DEVICE FOR SUPPORTING PLATE-SHAPED OBJECT AND STORAGE APPARATUS FOR STORING PLATE-SHAPED OBJECT 有权
公开(公告)号：US20220089327A1
公开(公告)日：2022-03-24
申请号：US17160331
申请日：2021-01-27
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , EN-NIEN SHEN , YUNG-CHIN PAN , CHIH-MING LIN , CHENG-EN CHUNG , PO-TING LEE
IPC分类号： B65D25/10
摘要： A central support device for supporting plate-shaped objects and a storage apparatus for storing the plate-shaped objects are provided and adapted to regulate the heights of support elements and confine front ends thereof to a specified range. The central support device includes a casing, the support elements and height adjustment elements. Partition portions each having a dent portions are disposed at the casing and arranged in the heightwise direction, with a support element receiving slot defined between every two adjacent partition portions. Bottom sides of the dent portions slope in the heightwise direction. One end of each support element is connected to a bottom portion of a corresponding support element receiving slot. The height adjustment elements are disposed in the dent portions, respectively, and extend in the heightwise direction to form top ends for supporting the support elements. The storage apparatus also includes the central support device.

10. 发明申请

US20220089325A1 MODULARIZED LARGE-SIZED CARRIER 有权
公开(公告)号：US20220089325A1
公开(公告)日：2022-03-24
申请号：US17381216
申请日：2021-07-21
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： MING-CHIEN CHIU , EN-NIEN SHEN , YUNG-CHIN PAN , CHENG-EN CHUNG , PO-TING LEE , WEI-CHIEN LIU , TZU-WEI HUANG
IPC分类号： B65D21/08 , B65D21/02
摘要： A modularized large-sized carrier includes at least two body modules, at least one hermetic seal component and a back board. The body modules are connected to each other peripherally and arranged in a depth direction. The hermetic seal component surrounds junctions of the body modules. The back board is disposed behind the last one of the body modules. The modularized large-sized carrier overcomes existing carrier size limitations otherwise caused by injection molding machines and continuously expands in the depth direction to thereby enlarge the airtight storage space of the carrier.

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