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    • 1. 发明申请
    • Method For Fabricating Thin Films
    • 薄膜制造方法
    • US20090246530A1
    • 2009-10-01
    • US12401967
    • 2009-03-11
    • Makoto MurakamiZhendong HuYong CheBing LiuYuzuru UeharaZhenlin Liu
    • Makoto MurakamiZhendong HuYong CheBing LiuYuzuru UeharaZhenlin Liu
    • B32B9/04C23C14/28C23C14/30B05B5/025
    • C23C14/08C23C14/083C23C14/086C23C14/14C23C14/28C23C14/54Y10T428/31504
    • A method of pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. In various embodiments a ‘burst’ mode of ultrashort pulsed laser ablation and deposition is provided. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical system for delivering a focused onto the target surface with an appropriate energy density, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
    • 脉冲激光沉积(PLD)的方法,其能够将形成膜的形态从纳米颗粒聚集体的形态连续调节到没有颗粒和液滴的平滑薄膜。 可以使用本发明的各种实施方案合成的材料包括但不限于金属,合金,金属氧化物和半导体。 在各种实施例中,提供了超短脉冲激光烧蚀和沉积的“突发”模式。 通过控制脉冲串模式参数,例如脉冲数和每个脉冲之间的脉冲之间的时间间隔,脉冲串重复频率和激光能量密度来实现电影形态的调整。 该系统包括超短脉冲激光器,用于以适当的能量密度传递聚焦到目标表面上的光学系统,以及真空室,其中靶和基底被安装在其中,背景气体及其压力被适当地调整。