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1. 发明授权

US5327718A Gas turbine apparatus and method of control thereof 失效
标题翻译：燃气轮机装置及其控制方法
公开(公告)号：US5327718A
公开(公告)日：1994-07-12
申请号：US933317
申请日：1992-08-21
申请人： Naohiko Iwata , Yasuhiko Otawara , Akira Shimura , Nobuyuki Iizuka , Isao Sato , Fumiyuki Hirose , Minoru Takaba , Yasutaka Komatsu , Hiraku Ikeda , Takeshi Iwamiya , Takeshi Ishida
发明人： Naohiko Iwata , Yasuhiko Otawara , Akira Shimura , Nobuyuki Iizuka , Isao Sato , Fumiyuki Hirose , Minoru Takaba , Yasutaka Komatsu , Hiraku Ikeda , Takeshi Iwamiya , Takeshi Ishida
IPC分类号： F02C9/16 , F02C7/228 , F02C9/00 , F02C9/28 , F23C99/00 , F23R3/12 , F23R3/26 , F23R3/28
CPC分类号： F23R3/12 , F02C7/228 , F02C9/28 , F23R3/26
摘要： A gas turbine apparatus has a gas turbine and a plurality of burners for providing combustion gas to drive the turbine. A flow control means of each burner for fuel or combustion air is adjusted by control means to control each said burner individually in dependence on a predetermined combustion characteristic of the respective burner. Sensed quantities relating to the combustion performance of the burners are input to the control means which adjusts the flow control means of each burner in dependence on the sensed quantities and the predetermined combustion characteristic of the respective burner.
摘要翻译：燃气轮机装置具有燃气轮机和用于提供燃烧气体以驱动涡轮机的多个燃烧器。用于燃料或燃烧空气的每个燃烧器的流量控制装置通过控制装置进行调节，以根据相应燃烧器的预定燃烧特性分别控制每个所述燃烧器。与燃烧器的燃烧性能相关的感测量被输入到根据感测量和各个燃烧器的预定燃烧特性来调节每个燃烧器的流量控制装置的控制装置。

2. 发明申请

US20060077368A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060077368A1
公开(公告)日：2006-04-13
申请号：US11285604
申请日：2005-11-23
申请人： Naohiko Iwata , Hideaki Sakamoto , Masaya Iwasaki , Ken Hattori , Masato Takahashi , Yutaka Endo , Yasuo Araki
发明人： Naohiko Iwata , Hideaki Sakamoto , Masaya Iwasaki , Ken Hattori , Masato Takahashi , Yutaka Endo , Yasuo Araki
IPC分类号： G03B27/42
CPC分类号： G03F7/70833 , G03F7/709
摘要： The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.
摘要翻译：该曝光系统包括投影光学系统，其将从掩模发射的曝光光照射到基板上，支撑投影光学系统的第一支撑构件和支撑第一支撑构件的支撑结构，其中支撑构件支撑第一支撑构件在比第一支撑构件支撑投影光学系统的位置高的位置处。

3. 发明授权

US07397534B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07397534B2
公开(公告)日：2008-07-08
申请号：US11285604
申请日：2005-11-23
申请人： Naohiko Iwata , Hideaki Sakamoto , Masaya Iwasaki , Ken Hattori , Masato Takahashi , Yutaka Endo , Yasuo Araki
发明人： Naohiko Iwata , Hideaki Sakamoto , Masaya Iwasaki , Ken Hattori , Masato Takahashi , Yutaka Endo , Yasuo Araki
IPC分类号： G03B27/42 , G03B27/52 , G03B27/62
CPC分类号： G03F7/70833 , G03F7/709
摘要： The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.
摘要翻译：该曝光系统包括投影光学系统，其将从掩模发射的曝光光照射到基板上，支撑投影光学系统的第一支撑构件和支撑第一支撑构件的支撑结构，其中支撑构件支撑第一支撑构件在比第一支撑构件支撑投影光学系统的位置高的位置处。

4. 发明授权

US5119859A Steam governing valve 失效
标题翻译：蒸汽调节阀
公开(公告)号：US5119859A
公开(公告)日：1992-06-09
申请号：US489105
申请日：1990-03-06
申请人： Takeshi Sato , Seiki Taketomo , Isao Fujita , Naohiko Iwata
发明人： Takeshi Sato , Seiki Taketomo , Isao Fujita , Naohiko Iwata
IPC分类号： F01D17/10 , F01D17/14
CPC分类号： F01D17/145 , Y10T137/86968 , Y10T137/86976
摘要： A steam governing valve includes a valve body constituting a main valve together with a main valve seat formed on a casing body and having a smaller valve seat inside thereof, a valve rod movable in the valve body in an axial direction of the valve and constituting a smaller valve together with the smaller valve seat, a sleeve arranged in the casing body and guiding the valve body in an axial direction, and a pressure chamber defined by the casing body, the valve body and the sleeve. The pressure chamber communicates with an entrance chamber through a clearance provided on the sliding portions of the sleeve and valve body, and the main valve is opened by lifting the valve rod beyond the fully open position of the smaller valve. The valve body is formed on the cylindrical outer surface thereof with a plurality of axially extending grooves arranged at equal intervals in a circumferential direction. The sleeve is formed with a plurality of steam passages at positions opposite to the axially extending grooves and the pressure chamber communicates with the entrance chamber through the steam passages and the axially extending grooves when the valve body is lifted beyond a predetermined valve opening degree.
摘要翻译：蒸汽调节阀包括构成主阀的阀体以及形成在壳体上的主阀座，并且在其内部具有较小的阀座;阀杆，其可沿阀的轴向方向在阀体中移动并构成阀较小的阀与较小的阀座一起，套筒布置在壳体中并沿轴向引导阀体，以及由壳体，阀体和套筒限定的压力室。压力室通过设置在套筒和阀体的滑动部分上的间隙与入口室连通，并且通过将阀杆提升到较小阀的完全打开位置来打开主阀。阀体在其圆柱形外表面上形成有沿圆周方向等间隔布置的多个轴向延伸槽。套筒在与轴向延伸槽相对的位置处形成有多个蒸汽通道，并且当阀体提升超过预定的阀开度时，压力室通过蒸汽通道和轴向延伸的凹槽与入口室连通。

5. 发明授权

US4500865A Fluid leakage detecting element 失效
标题翻译：流体泄漏检测元件
公开(公告)号：US4500865A
公开(公告)日：1985-02-19
申请号：US459211
申请日：1983-01-19
申请人： Yoshito Tanaka , Ken Ichiryu , Naohiko Iwata
发明人： Yoshito Tanaka , Ken Ichiryu , Naohiko Iwata
IPC分类号： B21D37/14 , G01L1/22 , G01M3/16 , G01N25/18 , G01N27/06 , G01N27/18 , H01C7/00 , G01N25/72 , H01C1/012
CPC分类号： G01N25/18 , G01L1/2287 , G01M3/16 , G01N27/18
摘要： A fluid leakage detecting element comprises a heat generating resistive member and a temperature compensating resistive member disposed on a substrate. Each of the resistive members is prepared in the form of a paste of a metal which has a high temperature coefficient and a high thermal conductivity and whose melting point is higher than the baking temperature of the substrate. These resistive members are printed in thick film form on the substrate which is sufficiently electrical insulating and has a high thermal conductivity.
摘要翻译：流体泄漏检测元件包括设置在基板上的发热电阻元件和温度补偿电阻元件。每个电阻构件以具有高温度系数和高导热性并且熔点高于基板的烘烤温度的金属膏的形式制备。这些电阻构件以厚膜形式印刷在基底上，该基片具有足够的电绝缘性并具有高导热性。

6. 发明申请

US20080239257A1 Stage Apparatus and Exposure Apparatus 审中-公开
标题翻译：舞台装置和曝光装置
公开(公告)号：US20080239257A1
公开(公告)日：2008-10-02
申请号：US11575044
申请日：2005-09-08
申请人： Shigeru Hagiwara , Naohiko Iwata , Masaya Iwasaki , Tadashi Hoshino , Chizuko Motoyama , Yuzo Kato
发明人： Shigeru Hagiwara , Naohiko Iwata , Masaya Iwasaki , Tadashi Hoshino , Chizuko Motoyama , Yuzo Kato
IPC分类号： G03B27/52
CPC分类号： G03F7/70775 , G03F7/70858
摘要： A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (28X, 28Y) that supply temperature controlled air (down flow), which comes from a +Z direction to a −Z direction, to a light path of a laser beam radiated from a laser interferometer onto moving mirrors (26X, 26Y) provided on a wafer stage (WST); and an air conditioning apparatus (29) that supplies temperature controlled air (lower layer side flow), which comes from a −Y direction to a +Y direction, to a space lower than the light path of the laser beam. Furthermore, an air conditioning apparatus (34), which supplied temperature controlled air to a light path of an autofocusing sensor composed of an irradiation optical system (33a) and a light receiving optical system (33b), is provided.
摘要翻译：能够高精度地测量台的位置，同时实现高产量的舞台装置和设置有舞台装置的曝光装置。舞台装置具有：将从+ Z方向到-Z方向的温度受控空气（下流）供给到辐射的激光束的光路的空调装置（28X，28Y）从激光干涉仪到设置在晶片台（WST）上的移动反射镜（26X，26Y）上; 以及将温度控制空气（下层侧流）从-Y方向向+ Y方向供给到比激光的光路低的空间的空调装置（29）。此外，提供了一种将温度控制的空气供给到由照射光学系统（33a）和光接收光学系统（33b）组成的自动聚焦传感器的光路的空调装置（34）。

7. 发明授权

US5877843A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5877843A
公开(公告)日：1999-03-02
申请号：US707218
申请日：1996-09-03
申请人： Shin-ichi Takagi , Naohiko Iwata
发明人： Shin-ichi Takagi , Naohiko Iwata
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70358 , G03F7/70691 , G03F7/70858 , G03F7/70866 , G03F7/70875
摘要： A scanning type exposure apparatus, which is used to expose a wafer with an image of a pattern on a reticle by synchronously moving the reticle and the wafer, comprises a second gas conditioner for circulating a temperature-controlled gas in a subsidiary chamber which encloses an optical path of an interferometer for measuring a position of a reticle stage. The apparatus comprises a third gas conditioner for supplying a temperature-controlled gas to an internal space of a pedestal including a wafer stage and an optical path of an interferometer for measuring a position of the wafer stage. A positional error of the stage, which would be otherwise caused by temperature-dependent fluctuation of the gas on the optical path of the interferometer, is reduced. A heat insulating material is installed on a top plate of the pedestal so as to intercept heat transfer from a heat source on the pedestal to the internal space of the pedestal. A tube may be arranged in the pedestal so that a temperature of the pedestal is adjusted by allowing a temperature-controlled fluid to flow therethrough.
摘要翻译：扫描式曝光装置，其用于通过同步移动掩模版和晶片，以掩模版上的图案的图像来曝光晶片，包括第二气体调节器，用于使附属室中的温度控制气体循环，用于测量标线片台的位置的干涉仪的光路。该装置包括第三气体调节器，用于将温度控制的气体提供给包括晶片台和用于测量晶片台位置的干涉仪的光路的基座的内部空间。由干涉仪的光路上的气体的温度相关的波动引起的阶段的位置误差减小。绝热材料安装在基座的顶板上，以便拦截从基座上的热源到基座的内部空间的热传递。管可以布置在基座中，使得通过允许温度控制的流体流过基座的温度来调节。

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