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1. 发明授权

US5403701A Method of forming small geometry patterns on piezoelectric membrane films 失效
标题翻译：在压电薄膜上形成小几何图案的方法
公开(公告)号：US5403701A
公开(公告)日：1995-04-04
申请号：US085848
申请日：1993-06-30
申请人： Paul Lum , Belinda J. Kendle , Michael Greenstein
发明人： Paul Lum , Belinda J. Kendle , Michael Greenstein
IPC分类号： G03F7/26 , G03F7/00 , G03F7/38 , H01L41/22 , H01L41/26 , H05K3/04
CPC分类号： G03F7/38 , G03F7/00 , H01L41/29 , H05K3/048
摘要： A method of patterning interconnect lines on a flexible membrane film of piezoelectric material includes securing the membrane film to a temporary support structure to allow direct patterning of the interconnect lines. A barrier plane is deposited onto the membrane film. A photoresist then coats the barrier plane. In a subsequent step of photolithographically exposing the photoresist, the barrier plane acts as a screen to prevent radiation from reaching the membrane film. The barrier film is also used as a focusing and alignment structure during photolithographic exposure. Optionally, the resulting structure is soaked in chlorobenzene, with the barrier plane functioning to prevent diffusion of the chlorobenzene through the back side of the porous membrane film to form undesired development-retarding regions of the photoresist. Openings are formed in the photoresist during a development step. A metallic interconnect layer is then deposited. A portion of the interconnect layer enters the openings in the photoresist for deposit onto the barrier plane. The barrier plane ensures proper adhesion of the interconnect layer. Lift-off techniques remove the photoresist and unwanted portions of the interconnect layer. The remaining portions of the interconnect layer provide an etch mask for patterning the barrier plane.
摘要翻译：在压电材料的柔性膜膜上构图互连线的方法包括将膜膜固定到临时支撑结构以允许互连线的直接图案化。屏障平面沉积在膜膜上。然后，光致抗蚀剂涂覆屏障平面。在光刻曝光光刻胶的后续步骤中，屏障平面用作屏幕以防止辐射到达膜膜。在光刻曝光期间，阻挡膜也用作聚焦和对准结构。任选地，将所得结构浸泡在氯苯中，其中屏障平面用于防止氯苯通过多孔膜膜的背面扩散以形成光致抗蚀剂的不期望的显影延迟区域。在显影步骤中在光致抗蚀剂中形成开口。然后沉积金属互连层。互连层的一部分进入光致抗蚀剂中的开口以沉积到屏障平面上。屏障平面确保互连层的适当粘附。剥离技术去除了光致抗蚀剂和互连层的不想要的部分。互连层的其余部分提供用于图案化屏障平面的蚀刻掩模。

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