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1. 发明授权

US07279046B2 Method and apparatus for aligning patterns on a substrate 失效
标题翻译：用于对准衬底上的图案的方法和装置
公开(公告)号：US07279046B2
公开(公告)日：2007-10-09
申请号：US10366717
申请日：2003-02-14
申请人： Raymond K. Eby , Michael Nelson , Igor Touzov
发明人： Raymond K. Eby , Michael Nelson , Igor Touzov
IPC分类号： B05C11/10
CPC分类号： G01Q40/00 , Y10S977/854
摘要： A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
摘要翻译：用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息，以及将第一位置信息存储在存储区域中。在用第二SPM尖端替换第一SPM尖端之后，识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移，并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与第一个SPM尖端按照计算出的位移。

2. 发明授权

US08043652B2 Method and apparatus for aligning patterns on a substrate 失效
标题翻译：用于对准衬底上的图案的方法和装置
公开(公告)号：US08043652B2
公开(公告)日：2011-10-25
申请号：US11852978
申请日：2007-09-10
申请人： Raymond K. Eby , Michael Nelson , Igor Touzov
发明人： Raymond K. Eby , Michael Nelson , Igor Touzov
IPC分类号： C23C16/52 , B05D5/00
CPC分类号： G01Q40/00 , Y10S977/854
摘要： A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
摘要翻译：用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息，以及将第一位置信息存储在存储区域中。在用第二SPM尖端替换第一SPM尖端之后，识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移，并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与第一个SPM尖端按照计算出的位移。

3. 发明申请

US20080147346A1 METHOD AND APPARATUS FOR ALIGNING PATTERNS ON A SUBSTRATE 失效
标题翻译：用于在基板上对准图案的方法和装置
公开(公告)号：US20080147346A1
公开(公告)日：2008-06-19
申请号：US11852978
申请日：2007-09-10
申请人： Raymond K. Eby , Michael Nelson , Igor Touzov
发明人： Raymond K. Eby , Michael Nelson , Igor Touzov
IPC分类号： G01B21/16
CPC分类号： G01Q40/00 , Y10S977/854
摘要： A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
摘要翻译：用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息，以及将第一位置信息存储在存储区域中。在用第二SPM尖端替换第一SPM尖端之后，识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移，并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与第一个SPM尖端按照计算出的位移。

4. 发明授权

US07762638B2 Methods and apparatus for ink delivery to nanolithographic probe systems 失效
标题翻译：用于墨水输送到纳米光刻探针系统的方法和装置
公开(公告)号：US07762638B2
公开(公告)日：2010-07-27
申请号：US11399621
申请日：2006-04-07
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B41J2/005
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

5. 发明授权

US07034854B2 Methods and apparatus for ink delivery to nanolithographic probe systems 失效
标题翻译：用于墨水输送到纳米光刻探针系统的方法和装置
公开(公告)号：US07034854B2
公开(公告)日：2006-04-25
申请号：US10705776
申请日：2003-11-12
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B41J2/005
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

6. 发明申请

US20050035983A1 Methods and apparatus for ink delivery to nanolithographic probe systems 失效
标题翻译：用于墨水输送到纳米光刻探针系统的方法和装置
公开(公告)号：US20050035983A1
公开(公告)日：2005-02-17
申请号：US10705776
申请日：2003-11-12
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B05C1/00 , B05D5/00 , B43L25/00 , G01D15/16 , G01N20060101 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

7. 发明申请

US20100242765A1 METHODS AND APPARATUS FOR INK DELIVERY TO NANOLITHOGRAPHIC PROBE SYSTEMS 审中-公开
标题翻译：用于墨水输送到纳米扫描探针系统的方法和装置
公开(公告)号：US20100242765A1
公开(公告)日：2010-09-30
申请号：US12732570
申请日：2010-03-26
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B41N3/00 , B41J2/015
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

8. 发明申请

US20070008390A1 Methods and apparatus for ink delivery to nanolithographic probe systems 失效
标题翻译：用于墨水输送到纳米光刻探针系统的方法和装置
公开(公告)号：US20070008390A1
公开(公告)日：2007-01-11
申请号：US11399621
申请日：2006-04-07
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B41J2/175
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。通道可以打开或关闭。亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。墨水流量可以用视频监控。疏水材料层可用于防止交叉污染。微量注射器可用于填充储存器。可以使用卫星储层来防止气泡形成。

9. 外观设计

USD734554S1 Helmet 有权
公开(公告)号：USD734554S1
公开(公告)日：2015-07-14
申请号：US29475449
申请日：2013-12-03
申请人： Eric Crane , Michael Nelson , Kip Arnette , Scott Layton , Matt Capozzi
设计人： Eric Crane , Michael Nelson , Kip Arnette , Scott Layton , Matt Capozzi

10. 发明授权

US08549241B2 Method and system for frequent checkpointing 有权
公开(公告)号：US08549241B2
公开(公告)日：2013-10-01
申请号：US12683288
申请日：2010-01-06
申请人： Daniel J. Scales , Pratap Subrahmanyam , Ganesh Venkitachalam , Michael Nelson
发明人： Daniel J. Scales , Pratap Subrahmanyam , Ganesh Venkitachalam , Michael Nelson
IPC分类号： G06F12/16
CPC分类号： G06F11/2023 , G06F11/1438 , G06F11/1484 , G06F11/2097 , G06F2201/84
摘要： A virtualization platform provides fault tolerance for a primary virtual machine by continuously transmitting checkpoint information of the primary virtual machine to a collector process, such as a backup virtual machine. When implemented on a hardware platform comprising a multi-processor that supports nested page tables, the virtualization platform leverages the nested page table support to quickly identify memory pages that have been modified between checkpoints. The backup virtual machine provides feedback information to assist the virtualization platform in identifying candidate memory pages for transmitting actual modifications to the memory pages rather than the entire memory page as part of the checkpoint information. The virtualization platform further maintains a modification history data structure to identify memory pages that can be transmitted simultaneous with the execution of the primary virtual machine rather than while the primary virtual machine has been stunned.

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