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1. 发明授权

US07585598B2 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate 有权
标题翻译：二氧化钛掺杂石英玻璃和制备方法，EUV光刻元件和光掩模基板
公开(公告)号：US07585598B2
公开(公告)日：2009-09-08
申请号：US11634270
申请日：2006-12-06
申请人： Shigeru Maida , Motoyuki Yamada
发明人： Shigeru Maida , Motoyuki Yamada
IPC分类号： G03F1/00 , C03C3/06 , G02B1/00
CPC分类号： C03B19/1407 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1446 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2201/42 , G03F1/24 , G03F1/60 , G21K2201/067
摘要： A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
摘要翻译：在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

2. 发明申请

US20070134566A1 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate 有权
标题翻译：二氧化钛掺杂石英玻璃和制备方法，EUV光刻元件和光掩模基板
公开(公告)号：US20070134566A1
公开(公告)日：2007-06-14
申请号：US11634270
申请日：2006-12-06
申请人： Shigeru Maida , Motoyuki Yamada
发明人： Shigeru Maida , Motoyuki Yamada
IPC分类号： G02B6/42 , B32B15/00 , C03B37/018 , C03B8/00 , B32B17/06 , G03F1/00 , G02B6/26
CPC分类号： C03B19/1407 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1446 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2201/42 , G03F1/24 , G03F1/60 , G21K2201/067
摘要： A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
摘要翻译：在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

3. 发明授权

US07849711B2 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate 有权
标题翻译：二氧化钛掺杂石英玻璃和制备方法，EUV光刻元件和光掩模基板
公开(公告)号：US07849711B2
公开(公告)日：2010-12-14
申请号：US12512436
申请日：2009-07-30
申请人： Shigeru Maida , Motoyuki Yamada
发明人： Shigeru Maida , Motoyuki Yamada
IPC分类号： G03F1/00 , C03B19/06
CPC分类号： C03B19/1407 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1446 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2201/42 , G03F1/24 , G03F1/60 , G21K2201/067
摘要： A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
摘要翻译：含有3-12重量％二氧化钛的二氧化钛掺杂的石英玻璃，其二氧化钛浓度梯度小于或等于0.01重量％/μm，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

4. 发明授权

US06990836B2 Method of producing fluorine-containing synthetic quartz glass 有权
标题翻译：含氟合成石英玻璃的制造方法
公开(公告)号：US06990836B2
公开(公告)日：2006-01-31
申请号：US09789744
申请日：2001-02-22
申请人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
发明人： Shigeru Maida , Motoyuki Yamada , Hisatoshi Otsuka , Kazuo Shirota , Koji Matsuo
IPC分类号： C03B20/00
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
摘要： Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.
摘要翻译：合成石英玻璃是通过将来自燃烧器的二氧化硅形成原料气体，氢气，氧气和氟化合物气体从反应区域供给到反应区域而进行的，在反应区域中对二氧化硅形成原料气体进行火焰水解而形成微粒子的含氟二氧化硅，将二氧化硅微粒沉积在反应区中的可旋转基板上，以产生含氟多孔二氧化硅基质，并在含氟化合物气体的气氛中对多孔二氧化硅基质进行玻璃化。该方法使得能够低成本地制造与迄今为止已经实现的在真空紫外区域中对于光的透射率更高且更均匀的合成石英玻璃。

5. 发明申请

US20120258389A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 有权
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20120258389A1
公开(公告)日：2012-10-11
申请号：US13442550
申请日：2012-04-09
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
IPC分类号： G03F1/24 , C03B19/06
CPC分类号： G03F1/24 , C03B19/1415 , C03B19/1423 , C03B2201/42 , C03B2207/64 , C03C3/06 , C03C4/0085 , C03C4/08 , C03C2201/42 , C03C2203/42 , G03F1/50
摘要： On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.
摘要翻译：在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

6. 发明授权

US09346700B2 Titania-doped quartz glass and making method 有权
标题翻译：二氧化钛掺杂石英玻璃及其制备方法
公开(公告)号：US09346700B2
公开(公告)日：2016-05-24
申请号：US13569429
申请日：2012-08-08
申请人： Shigeru Maida , Hisatoshi Otsuka
发明人： Shigeru Maida , Hisatoshi Otsuka
IPC分类号： C03B19/14 , C03C3/06 , G03F1/24 , B82Y10/00 , B82Y40/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/81 , C03C3/06 , C03C2201/42 , C03C2203/42 , Y02P40/57
摘要： Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.
摘要翻译：通过混合提供硅的反应物气体和提供钛的反应物气体，在200-400℃下预热反应气体混合物，并对混合物进行氧化或火焰水解，制造掺杂二氧化钛的石英玻璃。在EUV光反射表面的有效区域中，玻璃的基底不具有体积至少为30,000nm 3的凹陷缺陷，适用于EUV光刻。

7. 发明授权

US09067814B2 Method of producing synthetic quartz glass for excimer laser 有权
标题翻译：制备用于准分子激光的合成石英玻璃的方法
公开(公告)号：US09067814B2
公开(公告)日：2015-06-30
申请号：US12688332
申请日：2010-01-15
申请人： Shigeru Maida , Hisatoshi Otsuka
发明人： Shigeru Maida , Hisatoshi Otsuka
IPC分类号： C03B20/00 , C03B19/14
CPC分类号： C03B19/1453 , C03B19/1469 , C03B2201/075 , C03B2201/21 , C03B2207/20 , Y02P40/57
摘要： Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400° C., inclusive, to 900° C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900° C., inclusive, to 1100° C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100° C. to a transparent-vitrification temperature.
摘要翻译：公开了一种通过在真空烧结炉中在氧氢火焰中使二氧化硅原料进行气相水解或氧化分解而获得的目标二氧化硅微粒上沉积以制备准分子激光的合成石英玻璃的方法，以形成多孔二氧化硅基质材料，玻璃化多孔二氧化硅基材，以及对玻璃化材料进行热成型，退火处理和氢掺杂处理，其中多孔二氧化硅基材的玻璃化包括：（a）将真空压力保持在或低于20.0Pa，温度范围为400℃，至900℃，独占; （b）在900℃以上至1100℃的温度范围内保持真空压力为10.0Pa以下的工序。和（c）在1100℃的温度范围内保持真空压力等于或低于3.0Pa的步骤至透明玻璃化温度。

8. 发明授权

US07935648B2 Titania-doped quartz glass for nanoimprint molds 有权
标题翻译：用于纳米压印模具的二氧化钛掺杂石英玻璃
公开(公告)号：US07935648B2
公开(公告)日：2011-05-03
申请号：US12133007
申请日：2008-06-04
申请人： Shigeru Maida , Hisatoshi Otsuka
发明人： Shigeru Maida , Hisatoshi Otsuka
IPC分类号： C03C3/06 , C03C3/076
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C3/06 , C03C4/0085 , C03C2201/11 , C03C2201/12 , C03C2201/42 , C03C2203/44 , C03C2203/52
摘要： In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds.
摘要翻译：在纳米压印光刻中，掺杂二氧化钛的石英玻璃在0℃和250℃之间具有-300至300ppb /℃的CTE，在25℃下的CTE分布高达100ppb /℃ C.适用于纳米压印模具。

9. 发明申请

US20120058419A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 有权
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20120058419A1
公开(公告)日：2012-03-08
申请号：US13223808
申请日：2011-09-01
申请人： Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
发明人： Shigeru Maida , Hisatoshi Otsuka , Osamu Sekizawa , Naoki Yanagisawa
IPC分类号： C03C14/00 , G03F1/00 , C03B19/00
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/62 , C03B2207/64 , C03C4/0085 , C03C2201/21 , C03C2201/42
摘要： A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.
摘要翻译：通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

10. 发明申请

US20110159413A1 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD 审中-公开
标题翻译： TITANIA-DOPED QUARTZ玻璃和制造方法
公开(公告)号：US20110159413A1
公开(公告)日：2011-06-30
申请号：US12967175
申请日：2010-12-14
申请人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
发明人： Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
IPC分类号： G03F1/00 , C03B19/00 , C03C3/04
CPC分类号： G03F7/2008 , B82Y10/00 , B82Y40/00 , C03B19/1423 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03B2207/06 , C03B2207/12 , C03B2207/36 , C03C3/06 , C03C2201/06 , G03F1/24
摘要： A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.
摘要翻译：在900℃热处理100小时时，OH基浓度小于或等于100ppm的二氧化钛掺杂石英玻璃适合作为EUV光刻元件。

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