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1. 发明授权

US06730256B1 Stereolithographic patterning with interlayer surface modifications 失效
标题翻译：具有层间表面改性的立体光刻图案
公开(公告)号：US06730256B1
公开(公告)日：2004-05-04
申请号：US09923164
申请日：2001-08-06
申请人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
发明人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
IPC分类号： B29C3508
CPC分类号： G03F7/70416 , B29C64/40 , B29C71/0009 , B29C2035/0838 , B29C2791/005 , B29K2105/0073 , B29K2995/0073 , B29K2995/0092 , B33Y10/00 , G03F7/0037
摘要： Methods for the preparation of multilayered resists include exposure of the a first layer to radiation followed by exposure to an oxidizing agent. The oxidizing agent alters the surface characteristics of the first resist layer such that it is rendered more hydrophilic than the original resist layer. A second layer of resist is then applied to the oxidized surface of the first resist layer and exposed to radiation. This process can be repeated for thousands of coating layers, thereby permitting stereolithographic patterning of parts and construction of micromachines. A final treatment with a dissolution solution will dissolve unwanted resist material. Dependent upon the type of resist material used in the multilayered resist, the dissolution solution can remove the radiation exposed areas, e.g., a positive resist, or remove unexposed areas, e.g., a negative resist.
摘要翻译：制备多层抗蚀剂的方法包括将第一层暴露于辐射，然后暴露于氧化剂。氧化剂改变第一抗蚀剂层的表面特性，使其比原始抗蚀剂层变得更亲水。然后将第二层抗蚀剂施加到第一抗蚀剂层的氧化表面并暴露于辐射。该过程可以重复数千个涂层，从而允许部件的立体光刻图案和微机械的构造。用溶解溶液的最终处理将溶解不需要的抗蚀剂材料。取决于在多层抗蚀剂中使用的抗蚀剂材料的类型，溶解溶液可以去除辐射暴露区域，例如正性抗蚀剂，或去除未曝光的区域，例如负性抗蚀剂。

2. 发明授权

US06777170B1 Stereolithographic patterning by variable dose light delivery 失效
标题翻译：通过可变剂量光输送的立体光刻图案
公开(公告)号：US06777170B1
公开(公告)日：2004-08-17
申请号：US09922974
申请日：2001-08-06
申请人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
发明人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
IPC分类号： G03F700
CPC分类号： G03F7/00 , B29C64/40 , B29K2995/0073 , G03F7/0037 , G03F7/70416
摘要： Methods for the preparation of multilayered resists are described. A first layer of photoresist is deposited onto a substrate. First portions of the first layer are exposed to a first dose of radiant energy. A second layer of photoresist is deposited at atop the first layer and second portions of the second layer are exposed to a second varied dose of radiant energy. The dose is modulated over different portions of a layer to preferentially enhance development within the interior of the structure to reduce total development times.
摘要翻译：描述制备多层抗蚀剂的方法。第一层光致抗蚀剂沉积在基底上。第一层的第一部分暴露于第一剂量的辐射能。第二层光致抗蚀剂沉积在第一层的顶部，第二层的第二部分暴露于第二变化量的辐射能。剂量在层的不同部分进行调节，以优先增强结构内部的发育，以减少总开发时间。

3. 发明授权

US06833234B1 Stereolithographic patterning with variable size exposure areas 失效
标题翻译：具有可变尺寸曝光区域的立体光刻图案
公开(公告)号：US06833234B1
公开(公告)日：2004-12-21
申请号：US09922973
申请日：2001-08-06
申请人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
发明人： Theodore M. Bloomstein , Roderick R. Kunz , Stephen T. Palmacci
IPC分类号： G03F700
CPC分类号： G03F7/00 , B29C64/40 , B29K2995/0073 , G03F7/0037
摘要： Methods for the preparation of multilayered resists are described. To efficiently pattern large contiguous areas rapidly, a procedure has been developed using spot-size modulation of the focused laser beam to more efficiently pattern interior portions. Critical portions at the perimeter are patterned at high resolutions. The spot-size is progressively increased towards the interior allowing a controlled transition to coarser spot-sizes without impacting the exposure dose in critical portions. Patterning times are significantly reduced since in effect shells are patterned. An algorithm is defined to subdivide a layer into different zones, determine the appropriate focused spot-sizes used for each zone, and define the laser scan trace within a zone to enable efficient patterning of broad areas in positive tone resists.
摘要翻译：描述制备多层抗蚀剂的方法。为了有效地模拟大的连续区域，已经开发了使用聚焦激光束的聚焦尺寸调制以更有效地模制内部部分的程序。周边的临界部分以高分辨率图案化。斑点尺寸逐渐增加到内部，允许可控过渡到较粗的斑点尺寸，而不影响临界部分中的曝光剂量。图案化时间显着减少，因为实际上壳被图案化。定义一种算法来将图层细分为不同的区域，确定用于每个区域的合适的聚焦点尺寸，并在区域内定义激光扫描轨迹，以实现正色调抗蚀剂中广泛区域的有效图案化。

4. 发明申请

US20100089443A1 PHOTON PROCESSING WITH NANOPATTERNED MATERIALS 审中-公开
标题翻译：光子加工与纳米材料
公开(公告)号：US20100089443A1
公开(公告)日：2010-04-15
申请号：US12566278
申请日：2009-09-24
申请人： Theodore M. Bloomstein , Roderick R. Kunz , Theodore M. Lyszczarz , Vladimir Bulovic
发明人： Theodore M. Bloomstein , Roderick R. Kunz , Theodore M. Lyszczarz , Vladimir Bulovic
IPC分类号： H01L31/0256 , H01L31/0236 , H01L31/0216 , H01L31/18
CPC分类号： H01L51/447 , H01L31/0236 , H01L51/0096 , H01L51/4246 , Y02E10/549
摘要： Methods, devices, and compositions related to organic solar cells, sensors, and other photon processing devices are disclosed. In some aspects, an organic semiconducting composition is formed with nano-sized features, e.g., a layer conforming to a shape exhibiting nano-sized tapered features. Such structures can be formulated as an organic n-type and/or an organic p-type layer incorporated in a device that exhibits enhanced conductor mobility relative to conventional structures such as planar layered formed organic semiconductors. The nanofeatures can be formed on an exciton blocking layer (“EBL”) surface, with an organic semiconducting layer deposited thereon to conform with the EBL's surface features. A variety of material possibilities are disclosed, as well as a number of different configurations. Such organic structures can be used to form flexible solar cells in a roll-out format.
摘要翻译：公开了与有机太阳能电池，传感器和其他光子处理装置有关的方法，装置和组合物。在一些方面，有机半导体组合物形成有纳米尺寸的特征，例如符合呈纳米尺寸锥形特征的形状的层。这种结构可以配制成结合在相对于常规结构如平面层状形成的有机半导体的表现出增强的导体迁移率的器件中的有机n型和/或有机p型层。纳米尺度可以在激子阻挡层（“EBL”）表面上形成，其上沉积有机半导体层以符合EBL的表面特征。公开了各种材料的可能性，以及许多不同的配置。这种有机结构可用于以滚出格式形成柔性太阳能电池。

5. 发明授权

US06794109B2 Low abosorbing resists for 157 nm lithography 失效
标题翻译：低吸收光阻抗157 nm光刻
公开(公告)号：US06794109B2
公开(公告)日：2004-09-21
申请号：US09791252
申请日：2001-02-23
申请人： Theodore H. Fedynyshyn , Roderick R. Kunz , Michael Sworin , Roger Sinta
发明人： Theodore H. Fedynyshyn , Roderick R. Kunz , Michael Sworin , Roger Sinta
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0046 , Y10S430/108 , Y10S430/115
摘要： The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at least one monomeric unit having an aromatic moiety. The monomeric unit further includes at least a group, such as an electron withdrawing group, attached to the aromatic moiety. The attached group includes at least one CF bond. The polymer further includes an acidic hydroxyl group. A photoresist composition of the invention can have an absorbance in a range of 1-5 &mgr;m−1 at 157 nm, rendering it particularly suitable for use as a single layer resist in 157 nm lithography.
摘要翻译：本发明提供了在波长小于约248nm的光刻中使用的光刻胶材料。更具体地说，本发明的光致抗蚀剂特别适用于157nm光刻。本发明的光致抗蚀剂组合物包括具有至少一个具有芳族部分的单体单元的聚合物。单体单元还包括至少一个与芳族部分连接的基团，例如吸电子基团。所附组包括至少一个CF键。聚合物还包括酸性羟基。本发明的光致抗蚀剂组合物可以在157nm处具有在1-5mum -1的范围内的吸光度，使其特别适合用作157nm光刻中的单层抗蚀剂。

6. 发明授权

US06239428B1 Ion mobility spectrometers and methods 有权
标题翻译：离子迁移谱仪和方法
公开(公告)号：US06239428B1
公开(公告)日：2001-05-29
申请号：US09517041
申请日：2000-03-02
申请人： Roderick R. Kunz
发明人： Roderick R. Kunz
IPC分类号： H01J4940
CPC分类号： G01N27/622
摘要： Ion mobility spectrometer systems and methods of using such systems are disclosed. The systems and methods can combine two different ionization techniques (e.g., proton affinity ionization and electron transfer ionization) to provide enhanced detection sensitivity and/or detection selectivity of certain target compounds.
摘要翻译：公开了离子迁移谱仪系统和使用这种系统的方法。系统和方法可以组合两种不同的电离技术（例如，质子亲和电离和电子转移电离）以提供某些目标化合物的增强的检测灵敏度和/或检测选择性。

7. 发明授权

US08198095B2 Detection of materials via nitrogen oxide 有权
标题翻译：通过氮氧化物检测材料
公开(公告)号：US08198095B2
公开(公告)日：2012-06-12
申请号：US13152622
申请日：2011-06-03
申请人： John J. Zayhowski , Mordechai Rothschild , Charles M. Wynn , Roderick R. Kunz
发明人： John J. Zayhowski , Mordechai Rothschild , Charles M. Wynn , Roderick R. Kunz
IPC分类号： G01N21/64 , G01N21/00 , G21K5/00
CPC分类号： G01N21/75 , G01J3/10 , G01N21/6402 , Y10T436/147777 , Y10T436/173076 , Y10T436/177692
摘要： Methods and devices for detecting the presence of a NO forming material (e.g., a material that can form, or is, a nitrogen monoxide molecule) are disclosed based on detection of fluorescence exhibited by NO molecules in a first vibrationally excited state of a ground electronic state. Such excited NO molecules can be formed, for example, when small amounts of explosives are photodissociated. By inducing fluorescence of the material, a distinct signature of the explosive can be detected. Such techniques can be performed quickly and with a significant standoff distance, which can add to the invention's utility. In another aspection of the invention, methods and apparatus for generating electromagnetic radiation are disclosed. Such methods and apparatus can be used in conjunction with any detection method disclosed herein.
摘要翻译：基于在地面电子学的第一振动激发状态中NO分子的荧光的检测来公开用于检测NO形成材料（例如，可以形成或是一氧化氮分子的材料）的存在的方法和装置州。例如当少量的爆炸物被光分解时，可以形成这样的激发的NO分子。通过诱导材料的荧光，可以检测到爆炸物的不同标志。这样的技术可以快速执行并具有显着的间隔距离，这可以增加本发明的效用。在本发明的另一个方面，公开了用于产生电磁辐射的方法和装置。这些方法和装置可以结合本文公开的任何检测方法使用。

8. 发明授权

US07955855B2 Detection of materials via nitrogen oxide 有权
标题翻译：通过氮氧化物检测材料
公开(公告)号：US07955855B2
公开(公告)日：2011-06-07
申请号：US12500880
申请日：2009-07-10
申请人： Mordechai Rothschild , Charles M. Wynn , John J. Zayhowski , Roderick R. Kunz
发明人： Mordechai Rothschild , Charles M. Wynn , John J. Zayhowski , Roderick R. Kunz
IPC分类号： G01N21/64 , G01N21/00 , G01T1/20 , G21G4/00
CPC分类号： G01N21/75 , G01J3/10 , G01N21/6402 , Y10T436/147777 , Y10T436/173076 , Y10T436/177692
摘要： Methods and devices for detecting the presence of a NO forming material (e.g., a material that can form, or is, a nitrogen monoxide molecule) are disclosed based on detection of fluorescence exhibited by NO molecules in a first vibrationally excited state of a ground electronic state. Such excited NO molecules can be formed, for example, when small amounts of explosives are photodissociated. By inducing fluorescence of the material, a distinct signature of the explosive can be detected. Such techniques can be performed quickly and with a significant standoff distance, which can add to the invention's utility. In another aspection of the invention, methods and apparatus for generating electromagnetic radiation are disclosed. Such methods and apparatus can be used in conjunction with any detection method disclosed herein.
摘要翻译：基于在地面电子学的第一振动激发状态中NO分子的荧光的检测来公开用于检测NO形成材料（例如，可以形成或是一氧化氮分子的材料）的存在的方法和装置州。例如当少量的爆炸物被光分解时，可以形成这样的激发的NO分子。通过诱导材料的荧光，可以检测到爆炸物的不同标志。这样的技术可以快速执行并具有显着的间隔距离，这可以增加本发明的实用性。在本发明的另一个方面，公开了用于产生电磁辐射的方法和装置。这些方法和装置可以结合本文公开的任何检测方法使用。

9. 发明申请

US20100047916A1 DETECTION OF MATERIALS VIA NITROGEN OXIDE 有权
标题翻译：通过氮氧化物检测材料
公开(公告)号：US20100047916A1
公开(公告)日：2010-02-25
申请号：US12500880
申请日：2009-07-10
申请人： Mordechai Rothschild , Charles M. Wynn , John J. Zayhowski , Roderick R. Kunz
发明人： Mordechai Rothschild , Charles M. Wynn , John J. Zayhowski , Roderick R. Kunz
IPC分类号： G01N21/64 , G21G4/00 , G01T1/20
CPC分类号： G01N21/75 , G01J3/10 , G01N21/6402 , Y10T436/147777 , Y10T436/173076 , Y10T436/177692
摘要： Methods and devices for detecting the presence of a NO forming material (e.g., a material that can form, or is, a nitrogen monoxide molecule) are disclosed based on detection of fluorescence exhibited by NO molecules in a first vibrationally excited state of a ground electronic state. Such excited NO molecules can be formed, for example, when small amounts of explosives are photodissociated. By inducing fluorescence of the material, a distinct signature of the explosive can be detected. Such techniques can be performed quickly and with a significant standoff distance, which can add to the invention's utility. In another aspection of the invention, methods and apparatus for generating electromagnetic radiation are disclosed. Such methods and apparatus can be used in conjunction with any detection method disclosed herein.
摘要翻译：基于在地面电子学的第一振动激发状态中NO分子的荧光的检测来公开用于检测NO形成材料（例如，可以形成或是一氧化氮分子的材料）的存在的方法和装置州。例如当少量的爆炸物被光分解时，可以形成这样的激发的NO分子。通过诱导材料的荧光，可以检测到爆炸物的不同标志。这样的技术可以快速执行并具有显着的间隔距离，这可以增加本发明的效用。在本发明的另一个方面，公开了用于产生电磁辐射的方法和装置。这些方法和装置可以结合本文公开的任何检测方法使用。

10. 发明授权

US5891959A Polymeric anti-reflective compounds 失效
标题翻译：聚合抗反射化合物
公开(公告)号：US5891959A
公开(公告)日：1999-04-06
申请号：US788211
申请日：1997-01-27
申请人： Roderick R. Kunz
发明人： Roderick R. Kunz
IPC分类号： C08L61/06 , C08L61/10 , C09D133/12 , G03F7/038 , G03F7/09 , C08L25/16 , C08L63/00
CPC分类号： G03F7/091 , C09D133/12 , G03F7/038 , C08L61/06
摘要： Anti-reflective coatings and methods for forming these anti-reflective coatings are disclosed that have a polymer chemistry and optical characteristics suitable for suppressing the light that reflects off a circuit substrate during a photo-lithographic process. These anti-reflective coatings include a phenolic polymer material and an epoxide-containing polymer material that can be combined in a select proportion to form a thermally curable polymeric anti-reflective coating. The select proportions of the combined materials tailors the optical characteristic of the anti-reflective coating to attenuate energy about a select range of wavelengths.
摘要翻译：公开了用于形成这些抗反射涂层的抗反射涂层和方法，其具有适合于抑制在光刻工艺期间从电路基板反射的光的聚合物化学性质和光学特性。这些抗反射涂层包括酚醛聚合物材料和含环氧化物的聚合物材料，其可以以选择的比例组合以形成可热固化的聚合物抗反射涂层。组合材料的选择比例调整了抗反射涂层的光学特性，以在选择的波长范围内衰减能量。

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