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1. 发明申请

US20060260641A1 Megasonic cleaning system with buffered cavitation method 审中-公开
标题翻译：具有缓冲空化法的超声波清洗系统
公开(公告)号：US20060260641A1
公开(公告)日：2006-11-23
申请号：US11489059
申请日：2006-07-18
申请人： Yi Wu , Cole Franklin , Brian Fraser , Thomas Nicolosi
发明人： Yi Wu , Cole Franklin , Brian Fraser , Thomas Nicolosi
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , Y10S438/906
摘要： An acoustic energy cleaning system and method which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer. In one embodiment, the invention includes combining a first frequency signal and a second frequency signal having a positive amplitude bias component so as to form a combined signal. The combined signal, which has a positive amplitude offset, is applied to a transducer system that converts the combined signal into acoustic waves. The acoustic waves can be applied to the object to be cleaned in a cleaning fluid.
摘要翻译：一种声能清洁系统和方法，其促进微气泡形成以有效清洁，同时缓冲微气泡生长，否则会破坏晶片。在一个实施例中，本发明包括组合第一频率信号和具有正振幅偏置分量的第二频率信号以形成组合信号。具有正振幅偏移的组合信号被施加到将组合信号转换成声波的换能器系统。声波可以在清洗液中施加到待清洁的物体上。

2. 发明申请

US20050161059A1 Megasonic cleaning using supersaturated cleaning solution 有权
标题翻译：超声波清洗使用过饱和清洗液
公开(公告)号：US20050161059A1
公开(公告)日：2005-07-28
申请号：US10864929
申请日：2004-06-10
申请人： Cole Franklin , Yi Wu , Brian Fraser
发明人： Cole Franklin , Yi Wu , Brian Fraser
IPC分类号： B08B3/00 , B08B7/00
CPC分类号： B08B3/12 , H01L21/67051 , Y10S438/906
摘要： A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
摘要翻译：用于超声波清洗一个或多个基板的方法和系统，其减少由兆声波能量引起的对基板的损坏。基板被支撑在处理室中，并与包括清洁液体的清洁溶液接触，所述清洗溶液包含溶解在清洗液体中的二氧化碳气体的清洗液体，其量使二氧化碳气体处于处理室内的条件的过饱和浓度。然后将兆声波能量传输到基板。清洁液可以防止因应用超声波/声能造成的损坏。另一方面，本发明是一种执行该方法的系统。本发明不限于二氧化碳，而是可以与任何气体一起使用，当这些气体溶解在清洁液体中时，可以保护基材免受应用兆声/声能的损害。

3. 发明申请

US20080230092A1 METHOD AND APPARATUS FOR SINGLE-SUBSTRATE CLEANING 审中-公开
标题翻译：单基板清洗方法及装置
公开(公告)号：US20080230092A1
公开(公告)日：2008-09-25
申请号：US11690405
申请日：2007-03-23
申请人： Alexander Sou-Kang Ko , Jianshe Tang , Brian J. Brown , Richard R. Endo , Steven Verhaverbeke , Cole Franklin , Dennis J. Yost , Runzi Chang
发明人： Alexander Sou-Kang Ko , Jianshe Tang , Brian J. Brown , Richard R. Endo , Steven Verhaverbeke , Cole Franklin , Dennis J. Yost , Runzi Chang
IPC分类号： B08B3/00
CPC分类号： B08B7/00 , B08B3/024 , B08B3/08 , H01L21/67051
摘要： A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially uniform static liquid layer over a substrate surface by atomizing the viscous liquid with an inert gas in a two-phase nozzle. In another embodiment of the present invention, after a layer of the cleaning solution is formed over the substrate to be cleaned, acoustic energy is applied to the substrate to improve the cleaning efficiency. In a further embodiment, cleaning solution precipitates are avoided by dispensing de-ionized water with a spray nozzle to gradually dilute the cleaning solution prior to dispensing de-ionized water with a stream nozzle.
摘要翻译：对单基板清洗装置及其使用方法进行说明。在本发明的一个实施例中，通过在两相喷嘴中用惰性气体雾化粘性液体，以小体积分配液体清洗溶液以在基板表面上形成基本均匀的静态液体层。在本发明的另一个实施方案中，在将清洁溶液层形成在要清洁的基底上之后，将声能施加到基底以提高清洁效率。在另一个实施方案中，通过用喷嘴分配去离子水以在用流喷嘴分配去离子水之前逐渐稀释清洁溶液来避免清洁溶液沉淀物。

4. 发明申请

US20070084481A1 System and method of cleaning substrates using a subambient process solution 审中-公开
标题翻译：使用次级工艺溶液清洗衬底的系统和方法
公开(公告)号：US20070084481A1
公开(公告)日：2007-04-19
申请号：US11544802
申请日：2006-10-06
申请人： Cole Franklin
发明人： Cole Franklin
IPC分类号： B08B3/12 , B08B6/00 , B08B3/00 , C23G1/00 , B08B7/00
CPC分类号： C23G5/00 , B08B3/10 , B08B3/12 , H01L21/02063 , H01L21/02071 , H01L21/67051
摘要： A system and method of cleaning a substrate utilizing sonic energy and a film of subambient gasified process solution that assists in reducing damage to the substrate. In one aspect, the invention is a method comprising: a) supporting a substrate in a substantially horizontal orientation; b) applying a solution comprising a liquid and a dissolved gas to a surface of the substrate so as to form a film of the solution on the surface of the substrate, the solution being at a subambient temperature; c) coupling a transmitter to the film of the solution, the transmitter acoustically coupled to a transducer for generating sonic energy; and d) applying sonic energy through the film of the solution and to the surface of the substrate via the transmitter. The method is especially useful in minimizing damage when cleaning substrates with a surface comprising a topography having technology nodes with a width less than 100 nanometers. The solution is most preferred to be at a temperature that results in the solution being at or near the solution's minimum specific volume, which for aqueous solution is at or near 4° C. In another aspect, the invention is system for cleaning a substrates that, through the use of at least two specially located temperature sensors, maintains the cleaning solution near its maximum density temperature when applied to the substrate(s) while ensuring that the solution does not freeze in the supply line.
摘要翻译：利用声能清洗衬底的系统和方法以及辅助减少对衬底的损伤的次级气化工艺溶液膜。一方面，本发明是一种方法，包括：a）以基本上水平的方向支撑基底; b）将包含液体和溶解气体的溶液施加到所述基板的表面，以在所述基板的表面上形成所述溶液的膜，所述溶液处于低于环境温度; c）将发射机耦合到解决方案的薄膜，声发射器耦合到用于产生声能的换能器; 以及d）通过所述溶液施加声能并通过所述发射器施加到所述衬底的表面。当使用具有宽度小于100纳米的技术节点的地形的表面清洁基底时，该方法特别有用。该溶液最优选处于导致溶液处于或接近溶液的最小比容的温度，其水溶液为或接近4℃。另一方面，本发明是用于清洁基材的系统通过使用至少两个特别定位的温度传感器，当将清洁溶液施加到基底上时将清洁溶液保持在其最大密度温度附近，同时确保溶液不会在供应管线中冻结。

5. 发明申请

US20070261716A1 SPRAY JET CLEANING APPARATUS AND METHOD 有权
标题翻译：喷射喷射清洁装置和方法
公开(公告)号：US20070261716A1
公开(公告)日：2007-11-15
申请号：US11745866
申请日：2007-05-08
申请人： Cole Franklin , Mark Rouillard , Yan Fan
发明人： Cole Franklin , Mark Rouillard , Yan Fan
IPC分类号： B08B7/00 , B08B3/00
CPC分类号： H01L21/67051 , B05B7/0483 , B08B3/02
摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.
摘要翻译：一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。加速单元具有用于将混合物喷射到基板表面上的加速通道。气体通道优选地相对于清洁加速通道成角度。

6. 发明申请

US20080017219A1 TRANSDUCER ASSEMBLY INCORPORATING A TRANSMITTER HAVING THROUGH HOLES, AND METHOD AND SYSTEM FOR CLEANING A SUBSTRATE UTILIZING THE SAME 审中-公开
标题翻译：包含通过孔的发射器的传感器组件以及用于清洁使用其的基板的方法和系统
公开(公告)号：US20080017219A1
公开(公告)日：2008-01-24
申请号：US11777252
申请日：2007-07-12
申请人： Cole Franklin
发明人： Cole Franklin
IPC分类号： B08B3/12 , H04R1/00
CPC分类号： B08B3/12
摘要： An apparatus, system and method for processing a substrate utilizing sonic energy. In one aspect, the invention utilizes a transmitter having through holes to dampen sonic energy that may damage the substrate. In other aspects, the through holes of the transmitter can be adapted to introduce a liquid solution having bubbles of a controlled size into the meniscus that couples the transmitter to the surface of a substrate to be cleaned to further dampen the sonic energy. IN one embodiment, the invention is a system for processing a substrate comprising: a rotary support for supporting a substrate in a substantially horizontal orientation; a transducer assembly comprising a transmitter and a transducer adapted to generate sonic energy, the transducer acoustically coupled to the transmitter; a plurality of internal passageways extending through the transmitter from holes in a first outer surface of the transmitter to holes in a second outer surface of the transmitter; and the transducer assembly positioned so that so that a portion of the vibration transmitter is adjacent to and spaced from a surface of a substrate on the rotary support so that when a liquid is applied to the surface of the substrate, a film of the liquid couples the portion of the transmitter to the surface of the substrate.
摘要翻译：一种利用声能处理衬底的装置，系统和方法。一方面，本发明利用具有通孔的发射器来抑制可能损坏衬底的声能。在其他方面，变送器的通孔可以适于将具有受控尺寸的气泡的液体溶液引入弯液面，将弯管液连接到待清洁的基底的表面以进一步抑制声能。在一个实施例中，本发明是用于处理衬底的系统，包括：用于以基本上水平的方向支撑衬底的旋转支撑件; 传感器组件，包括发射器和适于产生声能的换能器，所述换能器声耦合到所述发射器; 多个内部通道，其通过所述发射器从所述发射器的第一外表面中的孔延伸到所述发射器的第二外表面中的孔; 并且所述换能器组件被定位成使得所述振动发射器的一部分与所述旋转支撑件上的基板的表面相邻并间隔开，使得当将液体施加到所述基板的表面时，发射器的一部分到基板的表面。

7. 发明授权

US07946299B2 Spray jet cleaning apparatus and method 有权
标题翻译：喷射式喷射清洗装置及方法
公开(公告)号：US07946299B2
公开(公告)日：2011-05-24
申请号：US11745866
申请日：2007-05-08
申请人： Cole Franklin , Mark Rouillard , Yan Fan
发明人： Cole Franklin , Mark Rouillard , Yan Fan
IPC分类号： B08B3/04
CPC分类号： H01L21/67051 , B05B7/0483 , B08B3/02
摘要： A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine to form a mixture at the atomizing area. The accelerating unit has an acceleration passage for spraying the mixture onto a substrate surface. The gas passages are preferably angled with respect to the cleaning acceleration passage.
摘要翻译：一种喷雾清洁装置，具有具有至少一个气体通道的雾化单元和汇聚到雾化区域中的至少一个清洁流体通道。流过气体通道的气体和流过清洗流体通道的清洗流体在雾化区域结合形成混合物。加速单元具有用于将混合物喷射到基板表面上的加速通道。气体通道优选地相对于清洁加速通道成角度。

8. 发明申请

US20080087304A1 SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE UTILIZING A GAS STREAM FOR PARTICLE REMOVAL 审中-公开
标题翻译：用于处理使用气体流进行颗粒物去除的基板的系统和方法
公开(公告)号：US20080087304A1
公开(公告)日：2008-04-17
申请号：US11841427
申请日：2007-08-20
申请人： Cole Franklin , Mark Roullard , Yan Fan
发明人： Cole Franklin , Mark Roullard , Yan Fan
IPC分类号： B08B3/10 , B08B3/12
CPC分类号： H01L21/67051 , H01L21/02057
摘要： A system and method of processing a substrate. The method and system applies a liquid to a surface of the substrate so as to form a film of the liquid on the surface of the substrate, wherein a boundary layer exists at the interface of the surface and the film of the liquid. The cleaning system then applies a force that penetrates the boundary layer so as to create a localized area on the surface of the substrate that is substantially free of the liquid. The application of the force in combination with the liquid removes particles from the surface of the substrate.
摘要翻译：一种处理衬底的系统和方法。该方法和系统将液体施加到基板的表面，以在基板的表面上形成液体的膜，其中边界层存在于液体的表面和膜的界面处。清洁系统然后施加穿透边界层的力，以便在基本上不含液体的基底表面上产生局部区域。与液体组合施加的力从基板表面去除颗粒。

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