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    • 6. 发明专利
    • VARIABLE DISPERSION COMPENSATOR
    • JP2003264505A
    • 2003-09-19
    • JP2002064392
    • 2002-03-08
    • FURUKAWA ELECTRIC CO LTD
    • MIMURA YUTAKAIN DAIRETSU
    • G02B26/00G02B5/28H04B10/2507H04B10/2525H04B10/02H04B10/18
    • PROBLEM TO BE SOLVED: To variably perform flexible and fine dispersion compensation and to variably perform dispersion compensation with small insertion loss so as not to give a change in the transmitting characteristic of a used band. SOLUTION: The variable dispersion compensator is provided with an etalon E1 wherein a group delay characteristic to a wavelength with the range of a used wavelength can be approximated downward by a convex quadratic function, an etalon E2 wherein a group delay characteristic to a wavelength within the range of the used frequency can be approximated upward by a convex quadratic function, a Peltier element 6 provided at the reflection side of the etalon E1, and a power supply 7 and a temperature control part 8 for controlling the heating and cooling of the Peltier element 6, changes the optical thickness of an etalon plate 12 by heating or cooling the Peltier element 6 controlled by the temperature control part 8 to wavelength-shift the group delay characteristic of the etalon E1, and combines the respective group delay characteristics of the etalons E1 and E2 with the passage of an optical signal to perform variable dispersion compensation. COPYRIGHT: (C)2003,JPO
    • 8. 发明专利
    • OPTICAL FILTER AND METHOD FOR MANUFACTURING OPTICAL FILTER
    • JP2002228833A
    • 2002-08-14
    • JP2001023700
    • 2001-01-31
    • FURUKAWA ELECTRIC CO LTD
    • ABE HIROYUKIMIMURA YUTAKAMIZUNO KAZUYASU
    • C23C14/54G02B1/10G02B1/11G02B5/28
    • PROBLEM TO BE SOLVED: To manufacture an optical filter having accurate optical film thickness by accurately controlling the optical film thickness of films deposited on a substrate. SOLUTION: While a film 4 is deposited on a substrate 3, at least one of the optical characteristics of energy transmittance and energy reflectance when a film deposited on the substrate 3 is irradiated with monitor light is represented by f (t) as a function of time t with a theoretical constant ak (k is an integer >=0) based on the theoretical formulae of optical characteristics, wherein the time t represents the film deposition period from the preliminarily determined referential time. During the film 4 is deposited, the real optical characteristics are occasionally measured by irradiating the film 4 with the monitor light at time t, and the theoretical constant ak is corrected to obtain a proper constant ak' so as to minimize the difference between the measured value and the theoretical value of the optical characteristics calculated from the function f (t). The time of reaching the determined film thickness when the optical film thickness of the deposited film 4 reaches the preliminarily determined thickness is predicted based on the proper constant ak', and the film deposition is stopped at the time of reaching the determined film thickness to obtain the optical filter.
    • 9. 发明专利
    • OPTICAL FILTER AND METHOD FOR MANUFACTURING THE OPTICAL FILTER
    • JP2001305337A
    • 2001-10-31
    • JP2000127178
    • 2000-04-27
    • FURUKAWA ELECTRIC CO LTD
    • ABE HIROYUKIMIMURA YUTAKAMIZUNO KAZUYASU
    • C23C14/00G01B11/06G02B5/28
    • PROBLEM TO BE SOLVED: To exactly control the optical film thickness of a film to be deposited on a substrate for a product, and to manufacture an optical filter having an exact optical film thickness. SOLUTION: The related data between the optical film thickness of the film to be deposited on a monitor substrate 2 and the reflectivity of the film are obtained previously for each film material, and are set as thickness control data. The data of the correction factor for correcting the deviation between the optical film thickness of the film to be deposited on the monitor substrate 2 and the optical film thickness to be deposited on the substrate 3 for a product are previously obtained for each film material in correspondence with the wavelength of monitor light when the substrate 3 for a product and the monitor substrate 2 are placed in a film deposition area 7, respectively and film deposition is performed simultaneously on the substrates, and the data are sets as data for film thickness correction factor. When performing the film deposition of the film for a product on the substrate 3 for a product, the reflectivity of the film on the monitor substrate 2 is measured by performing the film deposition simultaneously also on the monitor substrate 2. The film deposition is stopped when a measured value reaches the reflectivity of the thickness control data corresponding to the optical film thickness corrected with the data for film thickness correction factor.