专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US09472431B2 Thin wafer shipper 有权
标题翻译：薄晶圆托运人
公开(公告)号：US09472431B2
公开(公告)日：2016-10-18
申请号：US13583886
申请日：2011-03-11
申请人： Barry Gregerson , Jason Steffens , Russ V. Raschke
发明人： Barry Gregerson , Jason Steffens , Russ V. Raschke
IPC分类号： H01L21/673 , H01L21/67
CPC分类号： H01L21/67369 , H01L21/67383 , H01L21/67386
摘要： An improved wafer support mechanism in a wafer container useful for carrying a plurality of axially aligned thin mostly circular wafer substrates. The container includes a cassette that has a plurality of adjacently disposed teeth for receiving the substrates, wherein each rib member is continuous from the cassette open top to the cassette open bottom, a removable top cover portion, a removable bottom cover portion, a cushion assembly removably attached to the container top cover and another cushion assembly removably located in the container bottom cover and held in place by the weight of the wafer cassette. The top cushions are formed of individual segments having an extended lead-in feature at the end of each segment, spring sections in each segment and each segment has a V-shaped cross section to receive the wafer edge. The top and bottom cushions are installed in the top and bottom container covers respectively, and extend the wafer support to approximately the entire circumference of each wafer.
摘要翻译：晶片容器中的改进的晶片支撑机构，其用于承载多个轴向排列的薄的大多圆形晶片基板。容器包括具有多个相邻设置的用于接收基板的齿的盒，其中每个肋构件从盒开口顶部连续到盒开口底部，可移除顶盖部分，可移除底盖部分，衬垫组件可移除地附接到容器顶盖和可移除地位于容器底盖中的另一个缓冲组件，并通过晶片盒的重量保持在适当位置。顶部衬垫由在每个段的末端处具有延伸的引入特征的每个段形成，每个段中的弹簧部分和每个段具有用于接收晶片边缘的V形横截面。顶部和底部底座分别安装在顶部和底部容器盖中，并且将晶片支撑件延伸到每个晶片的大致整个圆周。

92. 发明授权

US09399989B2 System and method for a pump with onboard electronics 有权
标题翻译：具有车载电子设备的泵的系统和方法
公开(公告)号：US09399989B2
公开(公告)日：2016-07-26
申请号：US14019163
申请日：2013-09-05
申请人： Entegris, Inc.
发明人： James Cedrone , George Gonnella , Iraj Gashgaee
IPC分类号： F04B53/16 , F04B43/04 , F04B7/00 , F04B9/02 , F04B13/00 , F04B23/06 , F04B49/06 , F04B53/22 , F04B53/06
CPC分类号： F04B43/04 , F04B7/0076 , F04B9/02 , F04B13/00 , F04B23/06 , F04B49/065 , F04B53/06 , F04B53/16 , F04B53/22 , F04B2201/0201 , F04B2201/0601 , F04B2205/03 , Y10T29/49236 , Y10T137/87885
摘要： Embodiments of the present invention provide pumps with features to reduce form factor and increase reliability and serviceability. Additionally, embodiments of the present invention provide features for gentle fluid handling characteristics. Embodiments of the present invention can include a pump having onboard electronics and features to prevent heat from the onboard electronics from degrading process fluid or otherwise negatively impacting pump performance. Embodiments may also include features for reducing the likelihood that fluid will enter an electronics housing.
摘要翻译：本发明的实施例提供具有减小形状因素并提高可靠性和可服务性的特征的泵。此外，本发明的实施例提供了用于温和流体处理特性的特征。本发明的实施例可以包括具有车载电子设备和特征的泵，其特征在于防止车载电子器件的热量降解过程流体或以其他方式不利地影响泵的性能。实施例还可以包括用于降低流体进入电子设备壳体的可能性的特征。

93. 发明授权

US09359480B2 Non-dewetting porous membranes 有权
标题翻译：非去湿多孔膜
公开(公告)号：US09359480B2
公开(公告)日：2016-06-07
申请号：US13262743
申请日：2010-03-31
申请人： Alketa Gjoka , Ven Anantha Raman , Matthias Gebert , Claudio Oldani , Alessandro Ghielmi
发明人： Alketa Gjoka , Ven Anantha Raman , Matthias Gebert , Claudio Oldani , Alessandro Ghielmi
IPC分类号： B01D71/32 , B01D65/00 , B01D69/02 , C08J3/09 , B01D65/10 , B01D67/00 , B01D69/12
CPC分类号： C08J3/098 , B01D65/10 , B01D67/0006 , B01D67/0088 , B01D69/02 , B01D69/125 , B01D71/32 , B01D71/36 , B01D2323/02 , B01D2323/30 , B01D2323/40 , B01D2325/20 , B01D2325/36 , C08J2327/12 , C08J2327/18
摘要： Microporous membrane composites that are non-dewetting are disclosed. These microporous membrane composites are wet with solutions of methanol and water and are non-dewetting following autoclave treatment in water. The microporous membrane composites comprise a microporous membrane support that is coated with a crosslinked ionomer comprising hydrophilic groups. Compared to the microporous membrane support, the microporous membrane composite has a flow loss on average in isopropyl alcohol of less than 82%.
摘要翻译：公开了不去湿的微孔膜复合材料。这些微孔膜复合物用甲醇和水的溶液润湿，并且在水中经过高压釜处理后不进行除湿。微孔膜复合材料包括涂覆有包含亲水基团的交联离聚物的微孔膜载体。与微孔膜相比，微孔膜复合材料在异丙醇中的流动损失平均小于82％。

94. 发明授权

US09347616B2 Refillable ampoule with purge capability 有权
标题翻译：具有清洗能力的可补充安瓿
公开(公告)号：US09347616B2
公开(公告)日：2016-05-24
申请号：US14119402
申请日：2012-05-24
申请人： Richard D. Chism , Andy Krell
发明人： Richard D. Chism , Andy Krell
IPC分类号： F16K27/00 , F17D1/04 , H01L21/67 , C23C16/44 , C23C16/448 , C23C16/455 , F17C13/04
CPC分类号： F17C13/04 , C23C14/48 , C23C16/44 , C23C16/4408 , C23C16/4482 , C23C16/45561 , F17C2205/0335 , F17D1/04 , G03F7/70 , H01L21/67017 , Y10T137/0318 , Y10T137/877
摘要： A fluid delivery system adapted to isolate an ampoule and/or process line during purge, including an inlet control valve connecting a source of pressurized gas to a refillable ampoule, an outlet control valve connecting the refillable ampoule to a location of use, a process control valve connecting a process line to the refillable ampoule, a process isolation valve, and a purge supply valve, e.g., a three-way purge supply valve, arranged between the process isolation valve and the process control valve. A method of purging a fluid delivery system is also disclosed, including closing a process isolation valve, connecting a process line to a refillable ampoule, supplying a purge gas through a purge supply valve, e.g., a three-way purge supply valve, and cycling open and close at least once a process control valve coupled to the process line. A manifold for use in refilling an ampoule and purging a fluid supply system is also described.
摘要翻译：流体输送系统，其适于在净化期间隔离安瓿和/或生产线，包括将加压气体源连接到可再填充的安瓿的入口控制阀，连接可再填充的安瓿与使用位置的出口控制阀，过程控制将过程管线连接到可再填充安瓿的阀门，过程隔离阀和布置在过程隔离阀和过程控制阀之间的净化供给阀，例如三通净化供给阀。还公开了一种清洗流体输送系统的方法，包括关闭过程隔离阀，将过程管线连接到可再填充的安瓿，通过净化供给阀（例如三通净化供给阀）和循环打开和关闭至少一次与过程管线相连的过程控制阀。还描述了用于重新灌注安瓿和清洗流体供应系统的歧管。

95. 发明申请

US20160141194A1 FRONT OPENING WAFER CONTAINER WITH WEIGHT BALLAST 审中-公开
标题翻译：前开放的带有重量的滚筒容器
公开(公告)号：US20160141194A1
公开(公告)日：2016-05-19
申请号：US14899423
申请日：2014-06-18
申请人： ENTEGRIS, INC.
发明人： Eric A. KIRKLAND , Barry GREGERSON , Eric S. OLSON , Christian ANDERSEN , Jason Todd STEFFENS , Ryan MUSEL , Karen ANDERSON
IPC分类号： H01L21/673
CPC分类号： H01L21/67379 , H01L21/67369 , H01L21/67376 , H01L21/67383 , H01L21/67386
摘要： Apparatuses and methods providing a ballast system for adjusting the center of gravity of a standardized front opening wafer container. Various embodiments of the disclosure present ballast systems that are low profile, do not require modifications to the shell of the wafer container, and can be retrofit to existing wafer carriers. In some embodiments, these capabilities are accomplished by a ballast that mounts to a kinematic coupling plate of the wafer container. In one embodiment, the ballasting can also provide sufficient counter force to the lifting forces associated with purging of the wafer container, thereby preventing “lift off” of the wafer container during purging operations. The ballasts can be removed for shipping of the wafer container, thereby decreasing shipping costs.
摘要翻译：提供用于调节标准化前开口晶片容器的重心的压载系统的装置和方法。本公开的各种实施例示出了低调的镇流器系统，不需要修改晶片容器的外壳，并且可以改造到现有的晶片载体。在一些实施例中，这些能力通过安装在晶片容器的运动耦合板上的镇流器来实现。在一个实施例中，压载还可以为与清洗晶片容器相关联的提升力提供足够的反作用力，从而防止在清洗操作期间晶片容器的“脱离”。可以移除镇流器用于运输晶片容器，从而降低运输成本。

96. 发明授权

US09340878B2 TPIR apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same 有权
标题翻译：用于监测六氟化钨处理以检测气相成核的TPIR装置及其利用方法和系统
公开(公告)号：US09340878B2
公开(公告)日：2016-05-17
申请号：US13375053
申请日：2010-05-28
申请人： Jose I. Arno , Joseph R. Despres , Shkelqim Letaj , Steven M. Lurcott , Thomas H. Baum , Peng Zou
发明人： Jose I. Arno , Joseph R. Despres , Shkelqim Letaj , Steven M. Lurcott , Thomas H. Baum , Peng Zou
IPC分类号： G01N31/00 , C23C16/52 , G01N21/3504 , C23C16/14
CPC分类号： C23C16/52 , C23C16/14 , C23C16/455 , G01N21/3504
摘要： Apparatus and method for monitoring a vapor deposition installation in which a gas mixture can undergo gas phase nucleation (GPN) and/or chemically attack the product device, under process conditions supportive of such behavior. The apparatus includes a radiation source arranged to transmit source radiation through a sample of the gas mixture, and a thermopile detector assembly arranged to receive output radiation resulting from interaction of the source radiation with the gas mixture sample, and to responsively generate an output indicative of onset of the gas phase nucleation and/or chemical attack when such onset occurs. Such monitoring apparatus and methodology is useful in tungsten CVD processing to achieve high rate tungsten film growth without GPN or chemical attack.
摘要翻译：用于监测气相沉积装置的装置和方法，其中气体混合物可以在支持这种行为的工艺条件下经历气相成核（GPN）和/或化学侵蚀产品装置。该装置包括被布置成通过气体混合物的样本传送源辐射的辐射源，以及布置成接收由源辐射与气体混合物样品的相互作用产生的输出辐射的热电堆检测器组件，并且响应地产生指示发生这种发生时气相成核和/或化学侵蚀的发生。这种监测装置和方法在钨CVD处理中可用于实现无GPN或化学侵蚀的高速钨膜生长。

97. 发明申请

US20160089655A1 PVDF PYROLYZATE ADSORBENT AND GAS STORAGE AND DISPENSING SYSTEM UTILIZING SAME 有权
标题翻译：聚偏二氟乙烯吸附剂和气体储存和分配系统
公开(公告)号：US20160089655A1
公开(公告)日：2016-03-31
申请号：US14961793
申请日：2015-12-07
申请人： Entegris, Inc.
发明人： Shaun M. Wilson , Edward A. Sturm
IPC分类号： B01J20/20 , C23C16/44 , B01J20/28 , B01D53/02 , F17C11/00 , B01J20/30
CPC分类号： B01J20/20 , B01D53/02 , B01D2253/102 , B01D2253/202 , B01D2256/18 , B01D2257/2027 , B01D2257/204 , B01D2257/2047 , B01D2257/40 , B01J20/28011 , B01J20/28016 , B01J20/28042 , B01J20/28078 , B01J20/2808 , B01J20/28083 , B01J20/3078 , C23C16/4405 , F17C11/00 , Y02C20/10 , Y10T137/0318 , Y10T137/8593
摘要： A polyvinylidene fluoride (PVDF) pyrolyzate adsorbent is described, having utility for storing gases in an adsorbed state, and from which adsorbed gas may be desorbed to supply same for use. The PVDF pyrolyzate adsorbent can be of monolithic unitary form, or in a bead, powder, film, particulate or other finely divided form. The adsorbent is particularly suited for storage and supply of fluorine-containing gases, such as fluorine gas, nitrogen trifluoride, carbo-fluoride gases, and the like. The adsorbent may be utilized in a gas storage and dispensing system, in which the adsorbent is contained in a supply vessel, from which sorbate gas can be selectively dispensed.
摘要翻译：描述了聚偏二氟乙烯（PVDF）热解物吸附剂，其具有用于在吸附状态下储存气体的效用，并且吸附的气体可从其吸附以供给其供使用。 PVDF热解物吸附剂可以是整体单一形式，或者是珠，粉末，薄膜，颗粒或其它细碎形式。吸附剂特别适用于氟气，三氟化氮，碳氟化物气体等含氟气体的储存和供给。吸附剂可以用在气体储存和分配系统中，其中吸附剂包含在供应容器中，可以从其中选择性地分配山梨酸气体。

98. 发明授权

US09269582B2 Cluster ion implantation of arsenic and phosphorus 有权
标题翻译：砷和磷的簇离子注入
公开(公告)号：US09269582B2
公开(公告)日：2016-02-23
申请号：US14006662
申请日：2012-03-22
申请人： Oleg Byl , Chongying Xu , William Hunks , Richard S. Ray
发明人： Oleg Byl , Chongying Xu , William Hunks , Richard S. Ray
IPC分类号： H01L21/265 , H01J37/317
CPC分类号： H01L21/265 , H01J37/3171 , H01J2237/08 , H01L21/26513 , H01L21/26566
摘要： An ion implantation method, in which a dopant source composition is ionized to form dopant ions, and the dopant ions are implanted in a substrate. The dopant source composition includes cluster phosphorus or cluster arsenic compounds, for achieving P- and/or As-doping, in the production of doped articles of manufacture, e.g., silicon wafers or precursor structures for manufacturing microelectronic devices.
摘要翻译：一种离子注入方法，其中掺杂剂源组合物被离子化以形成掺杂剂离子，并且掺杂剂离子注入到衬底中。掺杂剂源组合物包括聚磷或聚集砷化合物，用于在制造掺杂制品例如硅晶片或用于制造微电子器件的前体结构的生产中实现P-和/或As掺杂。

99. 发明申请

US20150357152A1 ION IMPLANTATION SYSTEM AND METHOD 审中-公开
标题翻译：离子植入系统和方法
公开(公告)号：US20150357152A1
公开(公告)日：2015-12-10
申请号：US14827783
申请日：2015-08-17
申请人： Entegris, Inc.
发明人： Edward E. Jones , Sharad N. Yedave , Ying Tang , Barry Lewis Chambers , Robert Kaim , Joseph D. Sweeney , Oleg Byl , Peng Zou
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01L21/265 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/3171 , H01J37/32055 , H01J37/32412 , H01J37/32449 , H01J2237/006 , H01J2237/022
摘要： An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, equilibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.
摘要翻译：一种离子注入系统和方法，用于提供掺杂剂气体进料管线中的掺杂气体的冷却，以通过例如使用诸如B2F4的硼源材料或BF3的其他替代物来通过电弧室发热来防止掺杂气体的加热和分解。描述了各种电弧室热管理布置，以及等离子体性质，特定流量布置，清洁过程，功率管理，平衡偏移，提取光学优化，流动通道沉积物检测和源寿命优化等方面的改进，以实现高效率离子注入系统的操作。

100. 发明授权

US09186650B2 Adsorbent having utility for CO2 capture from gas mixtures 有权
标题翻译：用于从气体混合物中捕获CO 2的吸附剂
公开(公告)号：US09186650B2
公开(公告)日：2015-11-17
申请号：US13857385
申请日：2013-04-05
申请人： Entegris, Inc.
发明人： J. Donald Carruthers , Melissa A. Petruska , Shaun M. Wilson , Edward A. Sturm
IPC分类号： B01J20/20 , B01D53/02 , B01J20/28 , C12M1/00 , B01D53/62 , C01B31/08 , B01D53/047 , B01D53/04 , B01D53/053
CPC分类号： B01D53/04 , B01D53/02 , B01D53/0462 , B01D53/0476 , B01D53/053 , B01D53/62 , B01D2253/102 , B01D2253/202 , B01D2253/304 , B01D2253/308 , B01D2253/311 , B01D2256/245 , B01D2257/504 , B01D2258/05 , B01J20/20 , B01J20/28011 , B01J20/28016 , B01J20/3078 , C01B32/30 , C12M47/18 , Y02C10/04 , Y02C10/08 , Y02P20/152 , Y02P20/59 , Y10T428/2982
摘要： A carbon pyrolyzate adsorbent is described that is selective for carbon dioxide in contact with gas mixtures including carbon dioxide and methane. The adsorbent has a carbon dioxide adsorbent capacity at 1 bar pressure of greater than 50 cm3 carbon dioxide per gram of adsorbent at 273K, a methane adsorption capacity at 1 bar pressure of less than 35 cm3 methane per gram of adsorbent at 21° C., and a bulk density of greater than 0.55 gram per cubic centimeter of volume. Such adsorbent can be utilized, for example, for biogas upgrading, natural gas purification, coal bed methane purification, and refining operations.
摘要翻译：描述了对于与包括二氧化碳和甲烷在内的气体混合物接触的二氧化碳是选择性的碳热解物吸附剂。吸附剂在1巴压力下的二氧化碳吸附容量大于每立方克273克吸附剂的二氧化碳超过50立方厘米，1巴压力下的甲烷吸附容量小于35厘米3甲烷/克吸附剂在21℃，并且体积密度大于0.55克/立方厘米体积。这种吸附剂可以用于例如沼气提质，天然气净化，煤层气净化和精炼操作。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式