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    • 92. 发明申请
    • WARPAGE REDUCTION IN STRUCTURES WITH ELECTRICAL CIRCUITRY
    • 电路结构中的波纹减少
    • US20160293556A1
    • 2016-10-06
    • US15181861
    • 2016-06-14
    • Invensas Corporation
    • Cyprian Emeka UZOH
    • H01L23/00H01L21/66H01L21/78H01L21/3205
    • H01L23/562H01L21/32051H01L21/78H01L22/12H01L24/03H01L24/05H01L24/06H01L2224/0345H01L2224/05124H01L2224/05181H01L2924/12042H01L2924/00
    • To reduce warpage in at least one area of a wafer, a stress/warpage management layer (810) is formed to over-balance and change the direction of the existing warpage. For example, if the middle of the area was bulging up relative to the area's boundary, the middle of the area may become bulging downward, or vice versa. Then the stress/warpage management layer is processed to reduce the over-balancing. For example, the stress/management layer can be debonded from the wafer at selected locations, or recesses can be formed in the layer, or phase changes can be induced in the layer. In other embodiments, this layer is tantalum-aluminum that may or may not over-balance the warpage; this layer is believed to reduce warpage due to crystal-phase-dependent stresses which dynamically adjust to temperature changes so as to reduce the warpage (possibly keeping the wafer flat through thermal cycling). Other features are also provided.
    • 为了减少晶片的至少一个区域中的翘曲,形成应力/翘曲管理层(810)以使现有翘曲的方向超平衡并改变。 例如,如果该地区的中部相对于该地区的边界膨胀,该区域的中部可能会向下膨胀,反之亦然。 然后处理压力/翘曲管理层以减少过度平衡。 例如,应力/管理层可以在选定位置从晶片剥离,或者可以在层中形成凹陷,或者可以在该层中引起相变。 在其它实施例中,该层是钽 - 铝,其可能或可能不会使翘曲过度平衡; 这一层被认为是由于结晶相依赖的应力而减少翘曲,其动态地适应温度变化,以减少翘曲(可能通过热循环保持晶片平坦)。 还提供其他功能。