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    • 100. 发明授权
    • Monolithically integrated light emitting devices
    • 单片集成发光器件
    • US07535089B2
    • 2009-05-19
    • US11591657
    • 2006-11-01
    • Eugene A. Fitzgerald
    • Eugene A. Fitzgerald
    • H01L23/06
    • H01L27/14601H01L21/0245H01L21/0251H01L21/76254H01L21/8258H01L27/0605H01L27/144H01L27/1446H01L27/14683H01L27/15H01L27/156H01L31/0328H01L31/143H01L31/162H01L2924/0002Y10S438/933H01L2924/00
    • Methods and structures for monolithically integrating monocrystalline silicon and monocrystalline non-silicon materials and devices are provided. In one structure, a monolithically integrated semiconductor device structure comprises a silicon substrate and a first monocrystalline semiconductor layer disposed over the silicon substrate, wherein the first monocrystalline semiconductor layer has a lattice constant different from a lattice constant of relaxed silicon. The structure further includes an insulating layer disposed over the first monocrystalline semiconductor layer in a first region and a monocrystalline silicon layer disposed over the insulating layer in the first region. The structure includes at least one silicon-based electronic device including an element including at least a portion of the monocrystalline silicon layer. The structure also includes a second monocrystalline semiconductor layer disposed over at least a portion of the first monocrystalline semiconductor layer in a second region and absent from the first region, wherein the second monocrystalline semiconductor layer has a lattice constant different from the lattice constant of relaxed silicon. The structure includes at least one III-V light-emitting device including an active region including at least a portion of the second monocrystalline semiconductor layer.
    • 提供了单晶硅和单晶非硅材料和器件单片集成的方法和结构。 在一种结构中,单片集成半导体器件结构包括硅衬底和设置在硅衬底上的第一单晶半导体层,其中第一单晶半导体层具有与松弛硅的晶格常数不同的晶格常数。 该结构还包括设置在第一区域中的第一单晶半导体层上的绝缘层和设置在第一区域中的绝缘层上的单晶硅层。 该结构包括至少一个硅基电子器件,其包括至少部分单晶硅层的元件。 该结构还包括第二单晶半导体层,其设置在第二区域中的第一单晶半导体层的至少一部分上且不存在于第一区域中,其中第二单晶半导体层具有与松弛硅的晶格常数不同的晶格常数 。 该结构包括至少一个III-V发光器件,其包括包括第二单晶半导体层的至少一部分的有源区。