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    • 11. 发明授权
    • Nonvolatile semiconductor device
    • 非易失性半导体器件
    • US08976593B2
    • 2015-03-10
    • US13453152
    • 2012-04-23
    • Dae-Il ChoiJin-Su ParkByoung-Sung YooJae-Ho Lee
    • Dae-Il ChoiJin-Su ParkByoung-Sung YooJae-Ho Lee
    • G11C16/04G11C16/24G11C16/30
    • G11C16/0483G11C16/24G11C16/30
    • A nonvolatile memory device includes a plurality of global word lines, a voltage pump configured to generate a plurality of voltages, a control unit configured to divide the plurality of global word lines into a first group and a second group in response to an input row address and generate control signals, a first selection unit configured to output at least two different voltages that are to be applied to global word lines of the first group, a second selection unit configured to output a voltage that is to be applied to global word lines of the second group, and a third selection unit configured to apply output voltages of the first selection unit to the global word lines of the first group, and apply an output voltage of the second selection unit to the global word lines of the second group.
    • 非易失性存储器件包括多个全局字线,配置为产生多个电压的电压泵,配置成响应于输入行地址将多个全局字线分成第一组和第二组的控制单元 并产生控制信号;第一选择单元,被配置为输出要施加到第一组的全局字线的至少两个不同的电压;第二选择单元,被配置为输出要施加到第一组的全局字线的电压; 第二组和第三选择单元,被配置为将第一选择单元的输出电压施加到第一组的全局字线,并将第二选择单元的输出电压施加到第二组的全局字线。
    • 14. 发明授权
    • Method for fabricating semiconductor device
    • 制造半导体器件的方法
    • US08921189B2
    • 2014-12-30
    • US12005438
    • 2007-12-26
    • Jae-Seon YuSang-Rok Oh
    • Jae-Seon YuSang-Rok Oh
    • H01L21/28H01L27/105
    • H01L27/105H01L27/1052
    • A method for fabricating a semiconductor device including a first region and a second region, wherein pattern density of etch target patterns formed in the second region is lower than that of etch target patterns formed in the first region includes providing a substrate including the first region and the second region, forming an etch target layer over the substrate, forming a hard mask layer over the etch target layer, etching the hard mask layer to form a first and a second hard mask pattern in the first and the second regions, respectively, reducing a width of the second hard mask pattern formed in the second region and etching the etch target layer using the first hard mask pattern and the second hard mask pattern having the reduced width as an etch barrier to form the etch target patterns in the first and the second regions.
    • 一种用于制造包括第一区域和第二区域的半导体器件的方法,其中形成在所述第二区域中的蚀刻目标图案的图案密度低于在所述第一区域中形成的蚀刻目标图案的图案密度,包括提供包括所述第一区域的衬底和 所述第二区域在所述衬底上形成蚀刻目标层,在所述蚀刻目标层上形成硬掩模层,蚀刻所述硬掩模层以分别在所述第一区域和所述第二区域中形成第一和第二硬掩模图案, 所述第二硬掩模图案的宽度形成在所述第二区域中,并且使用所述第一硬掩模图案蚀刻所述蚀刻目标层,并且所述第二硬掩模图案具有减小的宽度作为蚀刻阻挡层,以在所述第一和/ 第二区域。
    • 19. 发明授权
    • Data input circuit of nonvolatile memory device
    • 非易失性存储器件的数据输入电路
    • US08780645B2
    • 2014-07-15
    • US13226585
    • 2011-09-07
    • Jong Tai ParkWon Sub Song
    • Jong Tai ParkWon Sub Song
    • G11C7/10
    • G11C29/846G11C29/824
    • The data input circuit of a nonvolatile memory device includes a redundancy multiplexer configured to selectively output normal data and redundancy data to an internal global data line in response to a redundancy signal, a plurality of pipe registers coupled to the internal global data line and configured to latch normal data or redundancy data received through the internal global data line in response to a plurality of respective latch signals, and an output multiplexer configured to sequentially output the latched data in response to a plurality of selection signals.
    • 非易失性存储器件的数据输入电路包括:冗余多路复用器,被配置为响应于冗余信号,选择性地向内部全局数据线输出正常数据和冗余数据;耦合到内部全局数据线的多个管状寄存器, 响应于多个相应的锁存信号,锁存通过内部全局数据线接收的正常数据或冗余数据;以及输出多路复用器,被配置为响应多个选择信号顺序地输出锁存的数据。