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    • 14. 发明授权
    • Manufacturing method of semiconductor device
    • 半导体器件的制造方法
    • US08034721B2
    • 2011-10-11
    • US12717550
    • 2010-03-04
    • Masaru YamadaAkihiko Tsudumitani
    • Masaru YamadaAkihiko Tsudumitani
    • H01L21/302
    • H01L21/76232
    • A first film and a second film are formed on a semiconductor substrate in this order. A resist pattern is formed on the second film. An opening is formed by removing the second film exposed between the resist pattern at a state where the second film remains on the bottom. A first removal preventing film is formed on the side wall of the opening and the residual film is removed at a state where the projecting part of the second film protruding from the side wall to the opening remains. The first film exposed in the opening is removed. A second removal preventing film is formed on the first removal preventing film and the surface of the semiconductor substrate exposed in the opening is removed at a state where the projecting part of the semiconductor substrate protruding from the side wall to the opening remains and a round part is formed at the projecting part of the semiconductor substrate. The semiconductor substrate exposed in the opening is further removed.
    • 依次在半导体衬底上形成第一膜和第二膜。 在第二膜上形成抗蚀剂图案。 通过在第二膜保持在底部的状态下去除在抗蚀剂图案之间暴露的第二膜而形成开口。 在开口的侧壁上形成有第一去除防止膜,并且在从侧壁突出到开口的第二膜的突出部分残留的状态下,残留的膜被去除。 去除暴露在开口中的第一个薄膜。 在第一去除防止膜上形成第二防除膜,并且在从侧壁突出到开口的半导体衬底的突出部分残留的状态下,在开口中暴露的半导体衬底的表面被去除,并且圆形部分 形成在半导体衬底的突出部分。 在开口中暴露的半导体衬底被进一步去除。
    • 17. 发明授权
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US07446015B2
    • 2008-11-04
    • US11006665
    • 2004-12-08
    • Yasutoshi OkunoMasaru Yamada
    • Yasutoshi OkunoMasaru Yamada
    • H01L21/76
    • H01L21/31053H01L21/76229H01L27/0207
    • A semiconductor device includes a circuit formation region which is formed in a semiconductor substrate and includes a plurality of element formation regions surrounded by isolation regions, respectively. A stress effect relief region of a predetermined width is formed around the circuit formation region to relieve a stress effect of the isolation regions on the operation characteristics of elements formed in the element formation regions and a plurality of dummy features are formed in the stress effect relief region and other part of the circuit formation region than the element formation regions at predetermined distances, the dummy features having the same composition as the element formation regions and predetermined planar dimensions. The predetermined planar dimensions of the dummy features are defined by longitudinal and transverse dimensions most frequently found in the plurality of element formation regions formed in the circuit formation region or selected dimensions of the element formation regions. The predetermined distances between the dummy features are specified as the minimum allowable value in respect of the manufacture of the elements.
    • 半导体器件包括电路形成区域,其形成在半导体衬底中并且包括被隔离区包围的多个元件形成区域。 在电路形成区域的周围形成预定宽度的应力作用缓和区域,以减轻隔离区域对形成在元件形成区域中的元件的操作特性的应力作用,并且在应力效应释放中形成多个虚拟特征 区域和电路形成区域的其他部分比元件形成区域预定距离,虚拟特征具有与元件形成区域相同的组成和预定的平面尺寸。 虚拟特征的预定平面尺寸由在电路形成区域中形成的多个元件形成区域或元件形成区域的选定尺寸中最常见的纵向和横向尺寸限定。 虚拟特征之间的预定距离被指定为关于元件的制造的最小允许值。
    • 18. 发明授权
    • Oxygen concentration detector
    • 氧浓度检测仪
    • US5695625A
    • 1997-12-09
    • US597915
    • 1996-02-07
    • Masaru YamadaMasayuki Hiroshima
    • Masaru YamadaMasayuki Hiroshima
    • G01N27/41G01N27/407
    • G01N27/4076G01N27/4071
    • According to the present invention, an oxygen concentration detector includes a housing, a detecting element inserted into said housing and a cover for covering a top portion of said detecting element. The detecting element is made of solid electrolyte and includes an atmospheric chamber therein. The cover includes an air vent portion for introducing air into said atmospheric chamber of the detecting element. The detecting element includes an air introducing path open to the atmospheric chamber at a side wall of the detecting element. It is possible to provide an oxygen concentration detector capable of introducing the air into the atmospheric chamber and maintaining an oxygen concentration in the atmospheric chamber at the same level as an atmosphere constantly.
    • 根据本发明,氧浓度检测器包括壳体,插入到所述壳体中的检测元件和用于覆盖所述检测元件的顶部的盖。 检测元件由固体电解质制成,其中包括一个大气室。 所述盖包括用于将空气引入所述检测元件的所述大气室中的排气部。 检测元件包括在检测元件的侧壁处朝向大气室开口的空气引入路径。 可以提供能够将空气引入大气室并将大气室中的氧浓度保持在与大气恒定相同水平的氧浓度检测器。