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    • 13. 发明申请
    • Photosensitive dielectric film
    • 感光电介质膜
    • US20110017498A1
    • 2011-01-27
    • US12460975
    • 2009-07-27
    • John M. LaufferVoya R. MarkovichKostas I. Papathomas
    • John M. LaufferVoya R. MarkovichKostas I. Papathomas
    • H05K1/09C08J3/28B05D5/12
    • H05K3/4676H05K3/0023H05K2201/0209
    • A photosensitive dielectric composition adapted for forming a dielectric film layer for use in a circuitized substrate is provided according to one embodiment of the invention, the composition including an epoxide bearing component including at least one polyepoxide resin curable by electromagnetic radiation, a cyanate ester, a flexibilizer, a nanostructured toughener, a photoinitiator in a predetermined amount by weight of the resin component, and a ceramic filler, the photosensitive dielectric composition forming the dielectric film layer having no solvent therein. In an alternative embodiment, a heat activated dielectric composition is provided which is curable by heat and includes an epoxide bearing component including at least one polyepoxide resin curable by heat, a cyanate ester, a flexibilizer, a nanostructured toughener, a heat activated curing agent for accelerating reaction of the cyanate ester and polyepoxide resin components, and a ceramic filler. Methods of making circuitized substrates from the above compositions are also provided.
    • 根据本发明的一个实施方案提供一种适用于形成用于电路化基底的电介质膜层的光敏电介质组合物,该组合物包括含环氧化物的组分,该组分包括至少一种可通过电磁辐射固化的聚环氧树脂,氰酸酯, 增韧剂,纳米结构增韧剂,预定量的树脂组分的光引发剂和陶瓷填料,所述光敏介电组合物形成在其中不溶剂的电介质膜层。 在另一个实施方案中,提供热活化电介质组合物,其可通过加热固化,并且包括含环氧化物的组分,其包含至少一种可热固化的聚环氧树脂,氰酸酯,增韧剂,纳米结构增韧剂,热活化固化剂 加速氰酸酯和聚环氧树脂组分的反应,以及陶瓷填料。 还提供了从上述组合物制备电路化基底的方法。