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11. 发明申请

US20090029092A1 OPTICAL INFORMATION RECORDING MEDIUM 审中-公开
标题翻译：光信息记录介质
公开(公告)号：US20090029092A1
公开(公告)日：2009-01-29
申请号：US11909579
申请日：2006-03-23
申请人： Kousuke Watanabe , Tetsuya Watanabe , Keita Takahashi , Kazutoshi Katayama , Chisato Obara
发明人： Kousuke Watanabe , Tetsuya Watanabe , Keita Takahashi , Kazutoshi Katayama , Chisato Obara
IPC分类号： G11B7/246 , B32B3/02
CPC分类号： G11B7/249 , G11B7/245 , G11B7/246 , G11B7/2467 , G11B7/2478 , G11B7/2492 , G11B7/2495 , G11B7/2498 , G11B7/2531 , G11B7/2532 , G11B7/2533 , G11B7/2534 , G11B7/2535 , G11B7/256 , G11B7/259 , G11B2007/24612
摘要： The invention provides an optical information recording medium having a recording layer capable of recording information by irradiating the recording layer with a laser beam of 440 nm or less.In the optical information recording medium, the recording layer contains an oxonol dye represented by formula (1), and a counter cation (Yt+) of this dye is a cationic dye having an absorption maximum in a range of longer wavelengths than an absorption maximum of an anionic part of the oxonol dye. In the formula, A, B, C and D each represents an electron-withdrawing group. A and B or C and D may be combined with each other to form a ring. If these are not combined with each other, these are electron-withdrawing groups in which the sum of Hammett's σp values of A and B and the sum of Hammett's σp values of C and D are each greater than 0.6. R represents a substituent group on methine carbon, and m represents an integer of 0 to 1. n represents an integer of 0 to 2m+1. If n is 2 or greater, a plurality of R's may be different from each other, and R and R may be combined together to form a ring. Yt+ represents a t-valent cation, and t represents an integer of 1 to 4.
摘要翻译：本发明提供了一种光信息记录介质，其具有能够通过用440nm或更小的激光照射记录层来记录信息的记录层。在光学信息记录介质中，记录层含有由式（1）表示的氧杂菁染料，该染料的抗衡阳离子（Yt +）是具有比最大吸收波长更长的波长的吸收最大值的阳离子染料氧杂菁染料的阴离子部分。在该式中，A，B，C和D各自表示吸电子基团。 A和B或C和D可以彼此组合以形成环。如果这些不相互结合，则这些是吸电子基团，其中A和B的Hammett sigmap值之和以及C和D的Hammett sigmap值之和大于0.6。 R表示次甲基碳上的取代基，m表示0〜1的整数.n表示0〜2m + 1的整数。如果n为2以上，则多个R可以相互不同，R和R可以组合在一起形成环。 Yt +表示t价阳离子，t表示1〜4的整数。

12. 发明授权

US07411207B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US07411207B2
公开(公告)日：2008-08-12
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

13. 发明申请

US20080100620A1 Image Processor, Game Machine and Image Processing Method 有权
标题翻译：图像处理器，游戏机和图像处理方法
公开(公告)号：US20080100620A1
公开(公告)日：2008-05-01
申请号：US11661585
申请日：2005-05-25
申请人： Nobuki Nagai , Tetsuya Watanabe , Yusuke Iida , Takahisa Suzuki
发明人： Nobuki Nagai , Tetsuya Watanabe , Yusuke Iida , Takahisa Suzuki
IPC分类号： G06T17/00
CPC分类号： A63F3/00643 , A63F2009/2476 , A63F2250/28 , A63F2300/1093 , A63F2300/69
摘要： An image processing technology for displaying a real object and a virtual object associated with each other is provided. An image analysis apparatus according to the present invention changes a motion pattern of the virtual object depending on the actual movement of the real object. The change detector 110 detects temporal state change in the motion pattern of the real object captured by an imaging apparatus and the display controller 120 reads a motion pattern from the motion pattern storage 122 based on the event generated by the state change of an image. The display pattern controller 122 controls display mode of the virtual object using the read motion pattern.
摘要翻译：提供了一种用于显示彼此相关联的实际对象和虚拟对象的图像处理技术。根据本发明的图像分析装置根据实际物体的实际移动来改变虚拟对象的运动模式。改变检测器110检测由成像装置拍摄的实际物体的运动模式的时间状态变化，并且显示控制器120基于由图像的状态改变产生的事件从运动图案存储器122读取运动图案。显示模式控制器122使用读取的运动模式来控制虚拟对象的显示模式。

14. 发明申请

US20070265797A1 METHOD AND ITS APPARATUS FOR INSPECTING PARTICLES OR DEFECTS OF A SEMICONDUCTOR DEVICE 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US20070265797A1
公开(公告)日：2007-11-15
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G06F15/00
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

15. 发明申请

US20070165212A1 System for monitoring foreign particles, process processing apparatus and method of electronic commerce 失效
标题翻译：电子商务监控系统，工艺处理装置及电子商务方法
公开(公告)号：US20070165212A1
公开(公告)日：2007-07-19
申请号：US11727037
申请日：2007-03-23
申请人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
发明人： Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , Y02P90/04 , Y02P90/14 , Y02P90/18 , Y02P90/265
摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
摘要翻译：用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

16. 发明授权

US07244091B2 Robot arm mechanism 有权
标题翻译：机器人手臂机构
公开(公告)号：US07244091B2
公开(公告)日：2007-07-17
申请号：US11287366
申请日：2005-11-28
申请人： Hiroki Mori , Tetsuya Watanabe , Chohei Okuno
发明人： Hiroki Mori , Tetsuya Watanabe , Chohei Okuno
IPC分类号： B25J17/00
CPC分类号： B25J9/1065 , Y10S414/13 , Y10T74/20329
摘要： Herein disclosed is a robot arm mechanism comprising a first arm link mechanism and a second arm link mechanism, a robot arm driving mechanism for driving the first arm link mechanism and the second arm link mechanism, and a link retaining mechanism for pivotably retaining the first arm link mechanism and the second arm link mechanism, in which a third arm link and a fourth arm link of the first arm link mechanism are kept forward in a first rotation direction, in which the first arm link mechanism and the second arm link mechanism are extended, thereby enabling to prevent the quadric crank chain constituting the robot arm mechanism from being flattened out while the first arm link mechanism and the second arm link mechanism are extended, and improving resistance to deformation, in comparison with the conventional robot arm mechanism.
摘要翻译：这里公开了一种机器人手臂机构，包括第一臂连杆机构和第二臂连杆机构，用于驱动第一臂连杆机构和第二臂连杆机构的机器人手臂驱动机构，以及连杆保持机构，用于可枢转地保持第一臂连杆机构和第二臂连杆机构，其中第一臂连杆机构的第三臂连杆和第四臂连杆沿第一旋转方向保持向前，第一臂连杆机构和第二臂连杆机构延伸从而与传统的机器人手臂机构相比，能够防止构成机器人臂机构的二次曲柄链在第一臂连杆机构和第二臂连杆机构伸长的同时被平坦化，并且提高耐变形性。

17. 发明申请

US20070146697A1 APPARATUS AND METHOD FOR TESTING DEFECTS 失效
标题翻译：测试缺陷的装置和方法
公开(公告)号：US20070146697A1
公开(公告)日：2007-06-28
申请号：US11681996
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/88
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.
摘要翻译：缺陷检查装置包括：用狭缝状激光器对物体进行倾斜照明的照明光学单元;第一检测光学单元，用于检测由所述狭缝状激光的照射而从物体反射的光形成的第一图像;以及反射在基本上垂直于物体的表面的第一方向上;第二检测光学单元，用于检测由通过照射狭缝状激光而从物体反射的光形成的第二图像，并以与第二方向倾斜的第二方向反射对象物的表面的正常方向，处理从第一检测光学单元输出的信号的图像信号处理单元和从第二检测光学单元输出的信号，以及输出单元，其输出由图像信号处理单元处理的信息。

18. 发明申请

US20070146696A1 APPARATUS AND METHOD FOR TESTING DEFECTS 失效
标题翻译：测试缺陷的装置和方法
公开(公告)号：US20070146696A1
公开(公告)日：2007-06-28
申请号：US11681981
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/88
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method for detecting defects on a specimen includes mounting a specimen on a table with which is movable, obliquely projecting a laser as a line onto a surface of the specimen, detecting with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks scattered light resulting from repetitive patterns formed on the specimen, processing a signal outputted from the image sensor to extract defects of the specimen, and a displaying information of defects extracted by the signal processor.
摘要翻译：一种检测试样缺陷的方法，其特征在于，将试样安装在可移动的台面上，将作为线的激光线倾斜投射到试样的表面上，用图像传感器检测由试样反射的光形成的光的图像通过滤波器，该滤波器阻挡由样本上形成的重复图案产生的散射光，处理从图像传感器输出的信号，提取样本的缺陷，以及由信号处理器提取的缺陷的显示信息。

19. 发明授权

US07230435B2 Capacitance measurement circuit 失效
标题翻译：电容测量电路
公开(公告)号：US07230435B2
公开(公告)日：2007-06-12
申请号：US10760449
申请日：2004-01-21
申请人： Tatsuya Kunikiyo , Tetsuya Watanabe , Toshiki Kanamoto , Kyoji Yamashita
发明人： Tatsuya Kunikiyo , Tetsuya Watanabe , Toshiki Kanamoto , Kyoji Yamashita
IPC分类号： G01R27/26 , G01R27/02
CPC分类号： G01R27/2605
摘要： A CBCM circuit is capable of separately measuring each component of a measuring target capacitance. A node (N1) is electrically connected to a terminal (P2) between the drains of PMOS and NMOS transistors (MP2, MN2). As a target capacitance forming part, a coupling capacitance (Cc) is formed between the node (N1) and a node (N2). The node (N2) is connected to a pad (58) through the terminal (P2) and an NMOS transistor (MN3), and a node (N3) is connected to a terminal (P3) between the drains of PMOS and NMOS transistors (MP1, MN1). A reference capacitance (Cref) is formed at the node (N3) as a dummy capacitance. Currents (Ir, It) supplied from a power source to the nodes (N3, N1) are measured with current meters (61, 62), respectively and a current (Im) induced from the node (N2) and flowing to a ground level is measured with a current meter (63).
摘要翻译： CBCM电路能够单独测量测量目标电容的每个分量。节点（N 1）电连接到PMOS和NMOS晶体管（MP 2，MN 2）的漏极之间的端子（P 2）。作为目标电容形成部，在节点（N 1）和节点（N 2）之间形成耦合电容（C SUB）。节点（N 2）经由端子（P 2）和NMOS晶体管（MN 3）连接到焊盘（58），并且节点（N 3）连接到端子（N 3）之间的端子（P 3） PMOS和NMOS晶体管（MP 1，MN 1）。在节点（N 3）处形成参考电容（C SUB）作为虚拟电容。分别用电流计（61,62）从电源向节点（N 3，N 1）提供的电流（I，R，I，T）使用电流计（63）测量从节点（N 2）感应并流到地平面的电流（I SUB）。

20. 发明授权

US07115892B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
公开(公告)号：US07115892B2
公开(公告)日：2006-10-03
申请号：US11302847
申请日：2005-12-13
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/4738 , G01N21/8806 , G01N21/93 , G01N21/94 , G01N21/9501 , G01N2015/1486 , G01N2015/1493
摘要： Conventionally, a particle/defect inspection apparatus outputs a total number of detected particles/defects as the result of detection. For taking countermeasures to failures in manufacturing processes, the particles/defects detected by the inspection apparatus are analyzed. Since the inspection apparatus outputs a large number of detected particles/defects, an immense time is required for analyzing the detected particles/defects, resulting in a delay in taking countermeasures to a failure in the manufacturing processes. In the present invention, an apparatus for optically inspecting particles or defects relates a particle or defect size to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.

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