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11. 发明授权

US11531848B2 Data processing apparatus, data processing method and semiconductor manufacturing apparatus 有权
公开(公告)号：US11531848B2
公开(公告)日：2022-12-20
申请号：US16959093
申请日：2019-07-26
申请人： Hitachi High-Tech Corporation
发明人： Masaki Ishiguro
IPC分类号： G06F119/18 , G06K9/62 , G06N20/00 , G06F30/27 , G06F7/24
摘要： A data processing apparatus in which a trade-off between over-learning prevention and calculation load prevention is eliminated when creating a model formula is provided. The data processing apparatus includes: a recording unit that records electronic data; and a computing unit that performs computing using the electronic data, in which the computing unit includes a feature amount selection unit used for computing, and the feature amount selection unit performs feature amount selection including: a first step (S101) of ranking feature amounts and rearranging the feature amounts from top; a second step (S103) of creating a plurality of data groups using only a part of the feature amounts according to the order; a third step (S104) of calculating a value that is an index for evaluating prediction performance of a regression or classification problem using each of the data groups using only a part of the feature amounts; a fourth step (S105) of deleting feature amounts based on the calculated prediction performance index; and a fifth step (S106) of updating the order of the feature amounts, which are feature amounts other than the deleted feature amount, using the prediction performance index, in which the second step to the fifth steps are iterated (S102) until an optimal value of the prediction performance index calculated in the third step is no longer updated.

12. 发明授权

US11520944B2 System and method for modeling of parts with lattice structures 有权
公开(公告)号：US11520944B2
公开(公告)日：2022-12-06
申请号：US15776948
申请日：2015-11-25
申请人： Siemens Industry Software Inc.
发明人： George Allen , Nurcan Gecer Ulu , Louis Komzsik , Lucia Mirabella , Suraj Ravi Musuvathy
IPC分类号： G06F30/00 , B33Y50/00 , G06F119/18
摘要： Methods for modeling of parts with lattice structures and corresponding systems and computer-readable mediums. A method includes receiving a model of an object to be manufactured. The method includes receiving a user specification of a void region within the model to create a lattice. The method includes performing a trimming operation to create a trimmed lattice by tessellating void surfaces and grouping together at least one row of connected rods to be treated as a single entity.

13. 发明授权

US11513442B2 Method of determining control parameters of a device manufacturing process 有权
公开(公告)号：US11513442B2
公开(公告)日：2022-11-29
申请号：US16644206
申请日：2018-08-22
申请人： ASML NETHERLANDS B.V.
发明人： Wim Tjibbo Tel , Mark John Maslow , Koenraad Van Ingen Schenau , Patrick Warnaar , Abraham Slachter , Roy Anunciado , Simon Hendrik Celine Van Gorp , Frank Staals , Marinus Jochemsen
IPC分类号： G03F7/00 , G03F1/00 , G06T7/00 , H01L21/00 , G06F30/20 , G21K5/00 , G03F7/20 , H01L21/66 , G06F119/18
摘要： A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments.

14. 发明授权

US11506984B2 Simulation of lithography using multiple-sampling of angular distribution of source radiation 有权
公开(公告)号：US11506984B2
公开(公告)日：2022-11-22
申请号：US15567606
申请日：2016-05-13
申请人： ASML Netherlands B.V.
发明人： Duan-Fu Stephen Hsu , Rafael C. Howell , Jianjun Jia
IPC分类号： G03F7/20 , G06F30/367 , G06F119/18
摘要： A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.

15. 发明授权

US11499945B2 Digital twin model inversion for testing 有权
公开(公告)号：US11499945B2
公开(公告)日：2022-11-15
申请号：US17585343
申请日：2022-01-26
申请人： Vibrant Corporation
发明人： Leanne Jauriqui , Thomas Kohler , Alexander J. Mayes , Julieanne Heffernan , Richard Livings , Eric Biedermann
IPC分类号： G01N29/44 , G01N29/04 , G01N29/52 , G06F30/20 , G06F30/13 , G06F30/17 , G06F30/23 , G06F119/18 , G06F119/02
摘要： Creation and use of a digital twin instance (DTI) for a physical instance of the part. The DTI may be created by a model inversion process such that model parameters are iterated until a convergence criterion related to a physical resonance inspection result and a digital resonance inspection result is satisfied. The DTI may then be used in relation to part evaluation including through simulated use of the part. The physical instance of the part may be evaluated by way of the DTI or the DTI may be used to generate maintenance schedules specific to the physical instance of the part.

16. 发明授权

US11481664B2 Methods and systems for generating device-specific machine learning model 有权
公开(公告)号：US11481664B2
公开(公告)日：2022-10-25
申请号：US16122184
申请日：2018-09-05
申请人： General Electric Company
发明人： Subhrajit Roychowdhury , Naresh Iyer
IPC分类号： G06N20/00 , B33Y40/00 , B33Y50/02 , G06F30/23 , G06F119/18
摘要： A method of transferring operational parameter sets between different domains of additive manufacturing machines includes creating a first machine domain parameter set in a first machine domain, accessing a model of a second additive manufacturing in a second machine domain, creating a second machine domain parameter set by applying transfer learning techniques including learning differences between the first machine domain and the second machine domain, adjusting the first machine domain parameter set using the differences before incorporation into the second machine domain to obtain the second machine domain parameter set, the second machine domain parameter set representing operational settings for the second additive manufacturing machine, the second additive manufacturing machine producing a product sample, determining if the product sample is within quality assurance metrics, and if the product sample is not within the quality assurance metrics, adjusting the second machine domain parameter set.

17. 发明授权

US11455435B2 Conversion of geometry to boundary representation with facilitated editing for computer aided design and 2.5-axis subtractive manufacturing 有权
公开(公告)号：US11455435B2
公开(公告)日：2022-09-27
申请号：US16679065
申请日：2019-11-08
申请人： Autodesk, Inc.
发明人： Karl Darcy Daniel Willis , Nigel Jed Wesley Morris , Andreas Linas Bastian , Adrian Adam Thomas Butscher , Daniele Grandi , Suguru Furuta , Joseph George Lambourne , Tristan Ward Barback , Martin Cvetanov Marinov , Marco Amagliani , Jingyang John Chen , Michael Andrew Smell , Brian M. Frank , Hooman Shayani , Christopher Michael Wade , Nandakumar Santhanam
IPC分类号： G06F30/00 , G06T17/20 , G06F119/18
摘要： Methods, systems, and apparatus, including medium-encoded computer program products, for computer aided design of physical structures using data format conversion (e.g., of output(s) from generative design processes) and user interface techniques that facilitate the production of 3D models of physical structures that are readily usable with 2.5-axis subtractive manufacturing, include: modifying smooth curves, which have been fit to contours representing discrete height layers of an object, to facilitate the 2.5-axis subtractive manufacturing; preparing an editable model of the object using a parametric feature history, which includes a sketch feature, to combine extruded versions of the smooth curves to form a 3D model of the object in a boundary representation format; reshaping a subset of the smooth curves responsive to user input with respect to the sketch feature; and replaying the parametric feature history to reconstruct the 3D model of the object, as changed by the user input.

18. 发明授权

US11449659B2 Lithography-based pattern optimization 有权
公开(公告)号：US11449659B2
公开(公告)日：2022-09-20
申请号：US16868298
申请日：2020-05-06
申请人： Synopsys, Inc.
发明人： Thomas Cecil
IPC分类号： G06F30/30 , G06F30/398 , G06F30/39 , G06F119/18
摘要： An example is a method. An electronic representation of a design of an integrated circuit to be manufactured on a semiconductor die is obtained. The design of the integrated circuit includes layers. The electronic representation includes initial polygons. Polygon topological skeletons of the initial polygons of the target layer are generated. A space topological skeleton in a space between the polygon topological skeletons is generated. A connected network comprising network edges is generated. Each network edge is connected between a respective polygon topological skeleton and the space topological skeleton. A transformation of the polygon topological skeletons is performed, by one or more processors, based on the network edges, a spacing specification for a spacing between polygons, and respective specified widths associated with the initial polygons by perturbing the polygon topological skeletons.

19. 发明授权

US11371965B2 Digital twin model inversion for testing 有权
公开(公告)号：US11371965B2
公开(公告)日：2022-06-28
申请号：US17291746
申请日：2020-07-09
申请人： VIBRANT CORPORATION
发明人： Leanne Jauriqui , Thomas Köhler , Alexander J. Mayes , Julieanne Heffernan , Richard Livings , Eric Biedermann
IPC分类号： G01N29/00 , G06F30/20 , G06F30/13 , G06F30/17 , G01N29/44 , G01N29/04 , G01N29/52 , G06F119/18 , G06F119/02
摘要： Creation and use of a digital twin instance (DTI) for a physical instance of the part. The DTI may be created by a model inversion process such that model parameters are iterated until a convergence criterion related to a physical resonance inspection result and a digital resonance inspection result is satisfied. The DTI may then be used in relation to part evaluation including through simulated use of the part. The physical instance of the part may be evaluated by way of the DTI or the DTI may be used to generate maintenance schedules specific to the physical instance of the part.

20. 发明授权

US11347926B2 Optical mode optimization for wafer inspection 有权
公开(公告)号：US11347926B2
公开(公告)日：2022-05-31
申请号：US17121174
申请日：2020-12-14
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Bing-Siang Chao
IPC分类号： G06F30/398 , G03F7/20 , H01L21/66 , G06F111/06 , G06F30/30 , G06F119/18 , G06F119/22
摘要： According to some embodiments, the present disclosure provides a method for determining wafer inspection parameters. The method includes identifying an area of interest in an IC design layout, performing an inspection simulation on the area of interest by generating a plurality of simulated optical images from the area of interest using a plurality of optical modes, and selecting, based on the simulated optical images, at least one of the optical modes to use for inspecting an area of a wafer that is fabricated based on the area of interest in the IC design layout.

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