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11. 发明授权

US08758527B2 Gear material for an enhanced rotorcraft drive system 失效
标题翻译：用于增强旋翼航空器驱动系统的齿轮材料
公开(公告)号：US08758527B2
公开(公告)日：2014-06-24
申请号：US11611173
申请日：2006-12-15
申请人： Tapas K. Mukherji , Michael E. Dandorph , Bruce D. Hansen , Edward J. Karedes
发明人： Tapas K. Mukherji , Michael E. Dandorph , Bruce D. Hansen , Edward J. Karedes
IPC分类号： C23C8/00 , C23C8/22 , C21D9/32
CPC分类号： C23C8/22 , C21D9/32 , C23C8/26 , C23C8/34
摘要： A surface processing method includes the step of increasing a surface hardness of a metal having a nominal composition that includes about 0.21-0.25 wt % carbon, about 2.9-3.3 wt % chromium, about 11-12 wt % nickel, about 13-14 wt % cobalt, about 1.1-1.3 wt % molybdenum, and a balance of iron from a first hardness to a second hardness. For example, the method is used to produce a surface-hardened component that includes a core section having a first hardness between about 51 HRC and 55 HRC and a case section having a second hardness that is greater than the first hardness.
摘要翻译：表面处理方法包括提高具有标称组成的金属的表面硬度的步骤，其包括约0.21-0.25重量％的碳，约2.9-3.3重量％的铬，约11-12重量％的镍，约13-14重量％约钴，约1.1-1.3重量％的钼，余量的铁由第一硬度至第二硬度。例如，该方法用于生产表面硬化部件，其包括具有在约51HRC和55HRC之间的第一硬度的芯部分和具有大于第一硬度的第二硬度的壳部分。

12. 发明授权

US08753755B2 Body comprising hard face structure and method for making same 有权
标题翻译：包括硬面结构的本体及其制造方法
公开(公告)号：US08753755B2
公开(公告)日：2014-06-17
申请号：US13808107
申请日：2011-07-06
申请人： Igor Yuri Konyashin , Bernd Heinrich Ries , Frank Friedrich Lachmann , Kersten Heinrich Schafer
发明人： Igor Yuri Konyashin , Bernd Heinrich Ries , Frank Friedrich Lachmann , Kersten Heinrich Schafer
IPC分类号： B32B15/04 , B32B15/18 , C23C8/00 , B28D1/26 , B22F7/00 , B22F7/06 , B22F7/08
CPC分类号： B28D1/28 , B22F7/04 , B32B15/013 , C22C29/08 , C23C8/60 , C23C26/00 , C23C26/02 , C23C30/00 , E21C35/183 , E21C2035/1813
摘要： A body, such as a pick tool for cutting coal, includes a steel substrate and a hard face structure fused to the steel substrate. The hard face structure includes at least 1 weight percent Si, at least 5 weight percent Cr and at least 40 weight percent W. Substantially the balance of the hard face structure includes carbon and an iron group metal M selected from Fe, Co, Ni and alloy combinations of these elements. The hard face structure includes a plurality of elongate or platelike micro-structures having a mean length of at least 1 micron, a plurality of nano-particles having a mean size of less than 200 nanometers, and a binder material.
摘要翻译：诸如用于切割煤的拾取工具的主体包括钢基底和与钢基底熔合的硬面结构。硬面结构包括至少1重量％的Si，至少5重量％的Cr和至少40重量％的W。硬面结构的平衡基本上包括碳和选自Fe，Co，Ni的铁族金属M和这些元素的合金组合。硬面结构包括平均长度为至少1微米的多个细长或板状微结构，平均尺寸小于200纳米的多个纳米颗粒和粘合剂材料。

13. 发明授权

US08663753B2 High throughput multi-wafer epitaxial reactor 有权
标题翻译：高通量多晶圆外延反应堆
公开(公告)号：US08663753B2
公开(公告)日：2014-03-04
申请号：US13664332
申请日：2012-10-30
申请人： Crystal Solar, Incorporated
发明人： Visweswaren Sivaramakrishnan , Kedarnath Sangam , Tirunelveli S. Ravi , Andrzej Kaszuba , Quoc Vinh
IPC分类号： C23C8/00 , C23C16/00
CPC分类号： C23C16/481 , C23C16/0209 , C23C16/455 , C23C16/4582 , C23C16/46 , C23C16/463 , C23C16/54 , C30B25/105 , C30B25/12 , C30B29/06
摘要： An epitaxial reactor enabling simultaneous deposition of thin films on a multiplicity of wafers is disclosed. During deposition, a number of wafers are contained within a wafer sleeve comprising a number of wafer carrier plates spaced closely apart to minimize the process volume. Process gases flow preferentially into the interior volume of the wafer sleeve, which is heated by one or more lamp modules. Purge gases flow outside the wafer sleeve within a reactor chamber to minimize wall deposition. In addition, sequencing of the illumination of the individual lamps in the lamp module may further improve the linearity of variation in deposition rates within the wafer sleeve. To improve uniformity, the direction of process gas flow may be varied in a cross-flow configuration. Combining lamp sequencing with cross-flow processing in a multiple reactor system enables high throughput deposition with good film uniformities and efficient use of process gases.
摘要翻译：公开了一种能够在多个晶片上同时沉积薄膜的外延反应器。在沉积期间，许多晶片被包含在晶片套筒内，其包括间隔开的多个晶片承载板，以最小化处理体积。工艺气体优先流入由一个或多个灯模块加热的晶片套筒的内部容积。吹扫气体在反应器室内的晶片套筒外部流动，以最小化壁沉积。此外，灯模组中各灯的照明顺序可以进一步提高晶片套筒内沉积速率变化的线性。为了改善均匀性，工艺气体流动的方向可以在横流构型中变化。将灯排序与多反应器系统中的交叉流处理相结合，可实现高通量沉积，具有良好的膜均匀性和有效利用工艺气体。

14. 发明授权

US08658255B2 Methods for making environmental barrier coatings and ceramic components having CMAS mitigation capability 有权
标题翻译：制造具有CMAS缓解能力的环保屏障涂层和陶瓷部件的方法
公开(公告)号：US08658255B2
公开(公告)日：2014-02-25
申请号：US12340013
申请日：2008-12-19
申请人： Glen Harold Kirby , Brett Allen Boutwell , Ming Fu , Bangalore Aswatha Nagaraj , Brian Thomas Hazel
发明人： Glen Harold Kirby , Brett Allen Boutwell , Ming Fu , Bangalore Aswatha Nagaraj , Brian Thomas Hazel
IPC分类号： C23C4/04 , B05D1/36 , C23C8/00 , H05H1/02 , H05H1/24
CPC分类号： C23C28/042 , C04B41/009 , C04B41/4584 , C04B41/52 , C04B41/89 , C23C4/11 , C04B41/5096 , C04B41/5035 , C04B41/5024 , C04B41/5037 , C04B41/4539 , C04B41/5027 , C04B41/4582 , C04B41/4531 , C04B41/4537 , C04B35/195 , C04B35/565 , C04B35/584 , C04B35/806
摘要： Methods of making components having calcium magnesium aluminosilicate (CMAS) mitigation capability involving providing a component; applying an environmental barrier coating to the component, the environmental barrier coating having a separate CMAS mitigation layer including a CMAS mitigation composition selected from rare earth elements, rare earth oxides, zirconia, hafnia partially or fully stabilized with alkaline earth or rare earth elements, zirconia partially or fully stabilized with alkaline earth or rare earth elements, magnesium oxide, cordierite, aluminum phosphate, magnesium silicate, and combinations thereof.
摘要翻译：制备具有钙镁铝硅酸盐（CMAS）减轻能力的组分的方法涉及提供组分; 将环境屏障涂层施加到部件上，环境屏障涂层具有单独的CMAS缓解层，其包括选自稀土元素，稀土氧化物，氧化锆，部分或完全用碱土金属或稀土元素稳定的半导体材料的CMAS缓和组合物，氧化锆部分或完全用碱土金属或稀土元素稳定，氧化镁，堇青石，磷酸铝，硅酸镁及其组合。

15. 发明授权

US08657959B2 Apparatus for atomic layer deposition on a moving substrate 失效
标题翻译：用于原子层沉积在移动衬底上的装置
公开(公告)号：US08657959B2
公开(公告)日：2014-02-25
申请号：US12970198
申请日：2010-12-16
申请人： Geoffrey Nunes , Richard Dale Kinard
发明人： Geoffrey Nunes , Richard Dale Kinard
IPC分类号： C23C16/00 , B05C11/00 , H01L21/469 , C23C8/00
CPC分类号： C23C16/545 , C23C16/4412 , C23C16/45551 , C23C16/45574 , C23C16/45582
摘要： An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Zg to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Zfc to the flow therethrough. The restrictor is sized such that the impedance Zfc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Zg. The impedance Zfc has a friction factor f. The restrictor in the precursor delivery channel is sized such that the impedance Zfc has a friction factor f that is less than 100, and preferably less than 10.
摘要翻译：用于在移动的衬底上原子层沉积材料的装置包括用于沿着预定的平面或弯曲行进路径移动衬底的输送装置和具有至少一个前体输送通道的涂布条。前体输送通道将包含要沉积在基底上的材料的流体传导到行进路径。当使用时，沿着行进路径移动的基板限定了前体输送通道的出口端和基底之间的间隙。间隙限定了来自前体输送通道的流体流动的阻抗Zg。流量限制器设置在前体输送通道内，其向穿过其中的流动呈现预定阻抗Zfc。限流器的尺寸使得阻抗Zfc为阻抗Zg至少五（5）倍，更优选为至少十五（15）倍。阻抗Zfc具有摩擦系数f。前体输送通道中的限制器的尺寸使得阻抗Zfc的摩擦系数f小于100，优选小于10。

16. 发明申请

US20130261735A1 MAGNESIUM ALLOY IMPLANTS WITH CONTROLLED DEGRADATION 有权
标题翻译：具有控制降解的镁合金植入物
公开(公告)号：US20130261735A1
公开(公告)日：2013-10-03
申请号：US13436538
申请日：2012-03-30
申请人： Stephen D. Pacetti , Yunbing Wang , Ni Ding
发明人： Stephen D. Pacetti , Yunbing Wang , Ni Ding
IPC分类号： A61F2/82 , C23C8/42 , C23C8/80 , C23C8/00
CPC分类号： A61F2/915 , A61F2/82 , A61F2210/0004 , A61F2210/0009 , A61F2240/001 , A61F2250/003 , A61F2310/00041 , A61L31/022 , A61L31/086 , A61L31/088 , A61L31/10 , A61L31/124 , A61L31/148 , A61L2300/416 , A61L2300/606 , A61L2400/18 , B22D21/007 , B22D25/02 , B22D27/00 , B23K26/38 , B23K26/40 , B23K2103/15 , C23C8/00 , C23C8/10 , C23C8/42 , C23C8/80 , C23C26/00 , C23C28/04 , C23C28/30 , C23C30/00
摘要： Stents or scaffolds made from magnesium or magnesium alloys including additives or barrier coatings that modify the corrosion rate of the stent are disclosed. Methods of forming barrier coatings that modify the corrosion rate of the stent are disclosed.
摘要翻译：公开了由镁或镁合金制成的支架或支架，包括改变支架腐蚀速率的添加剂或阻隔涂层。公开了形成改变支架腐蚀速率的阻挡涂层的方法。

17. 发明申请

US20130244057A1 MAGNETIC HEAD 有权
标题翻译：磁头
公开(公告)号：US20130244057A1
公开(公告)日：2013-09-19
申请号：US13423761
申请日：2012-03-19
申请人： Darin D. Lindig
发明人： Darin D. Lindig
IPC分类号： G11B5/33 , C23C22/73 , C23C8/00
CPC分类号： G11B5/3163 , B82Y10/00 , G11B5/3909 , G11B2005/3996
摘要： A magnetic storage and retrieval system and a manufacturing technique thereof are disclosed herein. A chemical reaction is triggered upon a surface of each Metallic layer of a plurality of metallic layers disposed on a substrate. It is also determined whether a metallic material of the surface has transformed to a new metallic material that is more chemically resistant than the metallic material.
摘要翻译：本文公开了磁存储和检索系统及其制造技术。在设置在基板上的多个金属层的每个金属层的表面上触发化学反应。还确定表面的金属材料是否已经转变成比金属材料更耐化学性的新的金属材料。

18. 发明授权

US08388767B2 Carbonitriding low manganese medium carbon steel 有权
标题翻译：碳氮共渗低锰中碳钢
公开(公告)号：US08388767B2
公开(公告)日：2013-03-05
申请号：US10936239
申请日：2004-09-08
申请人： Huaxin Li , Silvio M. Yamada
发明人： Huaxin Li , Silvio M. Yamada
IPC分类号： C23C8/00 , C23C22/00
CPC分类号： C23C8/34 , C23C8/32
摘要： A method for processing a low manganese steel is more cost effective and improves residual stress, bending fatigue, and surface characteristics for driveline components. The low manganese steel comprises in combination, by weight, about 0.30-0.75% carbon (C) and 0.15-0.40% manganese (Mn), with the balance being essentially iron (Fe). The method for processing the low manganese steel includes carbonitriding the low manganese steel at temperatures between 1600° F. to 1750° F. for a time period of about three to six hours. The low manganese steel is subsequently quenched in a water based solution that is kept at room temperature. The process provides the low manganese steel with an irregular case profile with a core hardness of no more than 50 Rockwell C and a surface hardness of approximately 58-63 Rockwell C. Further, the process provides the low manganese steel with little or no intergranular oxidation or surface high temperature transformation product.
摘要翻译：一种处理低锰钢的方法更具成本效益，并改善传动系部件的残余应力，弯曲疲劳和表面特性。低锰钢按重量计包含约0.30-0.75％的碳（C）和0.15-0.40％的锰（Mn），余量基本上是铁（Fe）。用于处理低锰钢的方法包括在1600°F至1750°F之间的温度下将低锰钢碳氮共渗约3-6小时。随后将低锰钢在保持在室温的水溶液中淬灭。该方法为低锰钢提供不规则的外形轮廓，其核心硬度不超过50洛氏硬度，表面硬度约为58-63洛氏硬度C.此外，该方法提供了少量或不含晶间氧化的低锰钢或表面高温转化产物。

19. 发明申请

US20120261162A1 METHOD FOR MANUFACTURING ELECTRODE STRUCTURE, ELECTRODE STRUCTURE, AND CAPACITOR 审中-公开
标题翻译：电极结构，电极结构和电容器的制造方法
公开(公告)号：US20120261162A1
公开(公告)日：2012-10-18
申请号：US13513958
申请日：2011-03-30
申请人： Kunihiko Nakayama , Zenya Ashitaka , Hidetoshi Inoue , Miho Suzuki
发明人： Kunihiko Nakayama , Zenya Ashitaka , Hidetoshi Inoue , Miho Suzuki
IPC分类号： H01B5/00 , C23C28/00 , C23C8/00 , B05D5/12 , B05D3/02
CPC分类号： H01G9/0032 , H01G9/042 , H01G9/045 , H01G9/07
摘要： Provided are an electrode structure capable of suppressing a leakage current, having a high capacitance, allowing an electrical short circuit caused through contact with an electrolyte to be suppressed, and operable to be applied as an anode of a capacitor; a method for manufacturing the electrode structure; and a capacitor including the electrode structure. The method for manufacturing the electrode structure includes: a covering layer formation step of forming on a surface of an aluminum material a covering layer of a dielectric precursor including valve metal; and a reduction heating step of heating in a reducing atmosphere including no carbon the aluminum material having the covering layer formed thereon. The electrode structure includes: an aluminum material; a covering layer being formed on a surface of the aluminum material, including valve metal, and having an electrically conductive portion; and an interposing layer being formed between the aluminum material and the covering layer and including aluminum and oxygen.
摘要翻译：提供一种能够抑制具有高电容的漏电流的电极结构，允许抑制与电解质接触引起的电短路，并可操作地作为电容器的阳极施加; 电极结构体的制造方法; 以及包括电极结构的电容器。电极结构体的制造方法包括：覆盖层形成工序，在铝材的表面上形成包含阀金属的电介质前体的覆盖层; 以及还原加热步骤，其在不含碳的还原气氛中加热其上形成有覆盖层的铝材料。电极结构包括：铝材料; 覆盖层形成在铝材的表面上，包括阀金属，并具有导电部分; 并且在铝材料和覆盖层之间形成包括铝和氧的中介层。

20. 发明授权

US08273318B2 Surface modifying carbon nanotube material, manufacturing method therefor, electronic component and electronic device 有权
标题翻译：表面改性碳纳米管材料，其制造方法，电子元件和电子器件
公开(公告)号：US08273318B2
公开(公告)日：2012-09-25
申请号：US12052265
申请日：2008-03-20
申请人： Koji Asano
发明人： Koji Asano
IPC分类号： D01F9/12 , C23C8/00 , C23C14/28
CPC分类号： H01L51/0049 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C01B32/174 , C01B2202/06 , C01B2202/26 , C01B2202/34 , H01L23/3677 , H01L23/373 , H01L23/552 , H01L2924/0002 , H01L2924/00
摘要： A carbon nanotube material is exposed to ultraviolet rays, and a silicon-containing compound capable of modifying the surface of the carbon nanotube material in combination with the ultraviolet rays is supplied to thereby modify the surface of the carbon nanotube material.
摘要翻译：碳纳米管材料暴露于紫外线，并且提供能够与紫外线组合来改变碳纳米管材料的表面的含硅化合物，从而改变碳纳米管材料的表面。

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