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    • 15. 发明申请
    • INTEGRATED CIRCUIT DEVICE AND ELECTRONIC SYSTEM INCLUDING SAME
    • US20220208781A1
    • 2022-06-30
    • US17549924
    • 2021-12-14
    • SAMSUNG ELECTRONICS CO., LTD.
    • SANGBEOM HONG
    • H01L27/11556G11C5/02H01L27/11582
    • An integrated circuit device includes; a semiconductor substrate having a cell region and a connection region, a gate stack including gate electrodes and insulating layers alternately stacked and having a stair-stepped structure in the connection region covered by a cover insulating layer. The gate electrodes extend from the cell region to the connection region to terminate in a corresponding pad portion and include lower gate electrodes disposed in a lower portion of the stair-stepped structure, upper gate electrodes disposed in an upper portion of the stair-stepped structure, and middle gate electrodes disposed between the lower gate electrodes and the upper gate electrodes. A contact plug disposed in the connection region includes; first contact plug portions contacting pad portions of the lower gate electrodes, second contact plug portions contacting pad portions of the middle gate electrodes, and third contact plug portions contacting pad portions of the upper gate electrodes. A second diameter of the second contact plug portions is less than a first diameter of the first contact plug portions, and the second diameter is less than a third diameter of the third contact plug portions.