专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 外观设计

USD620906S1 Television 有权
公开(公告)号：USD620906S1
公开(公告)日：2010-08-03
申请号：US29353737
申请日：2010-01-13
申请人： Hyung Yuel Kim , Jun Ki Kim , Sang Gi Kim , Mi Sun Park
设计人： Hyung Yuel Kim , Jun Ki Kim , Sang Gi Kim , Mi Sun Park

22. 发明申请

US20090224777A1 SYSTEM FOR TESTING A FLAT PANEL DISPLAY DEVICE AND METHOD THEREOF 有权
标题翻译：用于测试平板显示设备的系统及其方法
公开(公告)号：US20090224777A1
公开(公告)日：2009-09-10
申请号：US12279066
申请日：2007-02-15
申请人： Byung-Uk Kim , Ki-Beom Lee , Yong-Woo Kim , Mi-Sun Park , Jin-Sup Hong , Wy-Yong Kim
发明人： Byung-Uk Kim , Ki-Beom Lee , Yong-Woo Kim , Mi-Sun Park , Jin-Sup Hong , Wy-Yong Kim
IPC分类号： G01R31/302 , G06F19/00
CPC分类号： G02F1/1309
摘要： A system for testing a flat panel display having a flat display panel assembly includes a testing stage for arranging tie flat display panel assembly, a measuring apparatus being disposed on the testing stage and for measuring a spectrum of a transmitted light passing through a measuring region of the flat display panel assembly from a light source, a transporting apparatus for moving the measuring apparatus at a constant acceleration on the testing stage, a defect informing apparatus being electrically connected to the measuring apparatus and for informing an existence of defect, a type of defect, and a severity of defect by processing an electrical signal of the spectrum transmitted from the measuring apparatus.
摘要翻译：一种用于测试具有平面显示面板组件的平板显示器的系统，包括用于布置平面显示面板组件的测试台，测量装置设置在测试台上，并用于测量通过测量区域的测量区域的透射光的光谱来自光源的平面显示面板组件，用于在测试台上以恒定加速度移动测量装置的传送装置，与测量装置电连接并用于通知缺陷的存在的缺陷通知装置，缺陷的类型以及通过处理从测量装置发送的频谱的电信号的缺陷的严重性。

23. 发明授权

US07307259B2 System and method for controlling composition for lithography process in real time using near infrared spectrometer 失效
标题翻译：使用近红外光谱仪实时控制光刻工艺的组成的系统和方法
公开(公告)号：US07307259B2
公开(公告)日：2007-12-11
申请号：US11075806
申请日：2005-03-10
申请人： Ki-Beom Lee , Jae-Ku Lee , Mi-Sun Park , Jong-Min Kim , Min-Gun Lee
发明人： Ki-Beom Lee , Jae-Ku Lee , Mi-Sun Park , Jong-Min Kim , Min-Gun Lee
IPC分类号： G01J5/02
CPC分类号： G01N21/359 , G01N1/2035 , G01N21/05 , G03F7/00 , H01L21/67086 , Y10T436/12
摘要： A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.
摘要翻译：用于制造半导体器件的光刻工艺的用于控制多组分组合物的系统和方法，例如光致抗蚀剂，剥离剂，显影剂，蚀刻剂，更薄的，清洗剂/清洁剂和蚀刻珠粒去除剂，液晶显示器设备等，被公开。该系统包括组合物循环器，用于从保留用于光刻工艺的组合物的储存容器中取出组合物，并通过流动池将抽出的组合物再循环到储罐; 用于测量通过流动池的组合物的吸光度并根据测量的吸光度计算组合物的至少一种组分的浓度的组成分析器; 当所述缺陷部件的浓度低于预定水平时，将供应不足的部件供应到所述储罐的部件供应器; 以及控制器，用于控制组件供应商根据吸光度调节组合物各组分的浓度。

24. 发明授权

US07112795B2 Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer 失效
标题翻译：基于近红外光谱仪控制金属层蚀刻工艺和金属层蚀刻工艺再生蚀刻剂的方法
公开(公告)号：US07112795B2
公开(公告)日：2006-09-26
申请号：US10276703
申请日：2001-03-27
申请人： Ki-Beom Lee , Mi-Sun Park , Jong-Min Kim , Byung-Uk Kim , Chang-Il Oh
发明人： Ki-Beom Lee , Mi-Sun Park , Jong-Min Kim , Byung-Uk Kim , Chang-Il Oh
IPC分类号： G01J5/02
CPC分类号： G01N21/359 , C23F1/00 , C23F1/46 , G01N21/3577 , G11B23/505 , H01L21/32134
摘要： In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.
摘要翻译：在控制用于制造半导体器件或液晶显示器件的金属层蚀刻工艺的方法中，首先用NIR光谱仪分析用于蚀刻金属层的蚀刻剂的组成。然后通过将分析的组合物与参考组合物进行比较来确定蚀刻剂的状态。如果蚀刻剂的使用寿命终止，蚀刻剂将被新的蚀刻剂所取代。相比之下，在蚀刻剂的寿命被遗留的情况下，蚀刻剂被输送到下一个金属层蚀刻工艺。该分析技术可以以类似的方式应用于蚀刻剂再生过程。

25. 发明申请

US20050202564A1 System and method for controlling composition for lithography process in real time using near infrared spectrometer 失效
标题翻译：使用近红外光谱仪实时控制光刻工艺的组成的系统和方法
公开(公告)号：US20050202564A1
公开(公告)日：2005-09-15
申请号：US11075806
申请日：2005-03-10
申请人： Ki-Beom Lee , Jae-Ku Lee , Mi-Sun Park , Jong-Min Kim , Min-Gun Lee
发明人： Ki-Beom Lee , Jae-Ku Lee , Mi-Sun Park , Jong-Min Kim , Min-Gun Lee
IPC分类号： G03F7/32 , G01N1/20 , G03F7/00 , G03F7/26 , H01L21/027 , H01L21/306 , G01N35/08
CPC分类号： G01N21/359 , G01N1/2035 , G01N21/05 , G03F7/00 , H01L21/67086 , Y10T436/12
摘要： A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.
摘要翻译：用于制造半导体器件的光刻工艺的用于控制多组分组合物的系统和方法，例如光致抗蚀剂，剥离剂，显影剂，蚀刻剂，更薄的，清洗剂/清洁剂和蚀刻珠粒去除剂，液晶显示器设备等，被公开。该系统包括组合物循环器，用于从保留用于光刻工艺的组合物的储存容器中取出组合物，并通过流动池将抽出的组合物再循环到储罐; 用于测量通过流动池的组合物的吸光度并根据测量的吸光度计算组合物的至少一种组分的浓度的组成分析器; 当所述缺陷部件的浓度低于预定水平时，将供应不足的部件供应到所述储罐的部件供应器; 以及控制器，用于控制组件供应商根据吸光度调节组合物各组分的浓度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式