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21. 发明授权

US07643426B1 Path selection in a network 有权
标题翻译：网络中的路径选择
公开(公告)号：US07643426B1
公开(公告)日：2010-01-05
申请号：US11412442
申请日：2006-04-27
申请人： Sung-Ju Lee , Sujata Banerjee , Puneet Sharma , Sujoy Basu
发明人： Sung-Ju Lee , Sujata Banerjee , Puneet Sharma , Sujoy Basu
IPC分类号： H04L12/28
CPC分类号： H04L45/123 , H04L45/02 , H04L45/128 , H04L45/64
摘要： A path in a network is selected by selecting candidate overlay paths between two nodes in the network based on a static network metric determined for each of a plurality of overlay paths. A time sensitive network metric is determined for each of the candidate overlay paths, and a path is selected from the candidate overlay paths based on the time sensitive network metrics.
摘要翻译：通过基于为多个覆盖路径中的每一个确定的静态网络度量来选择网络中的两个节点之间的候选覆盖路径来选择网络中的路径。为每个候选覆盖路径确定时间敏感网络度量，并且基于时间敏感网络度量从候选覆盖路径中选择路径。

22. 发明申请

US20080063706A1 Methods and Medicaments for Administration of Ibuprofen 有权
标题翻译：布洛芬治疗方法和药物
公开(公告)号：US20080063706A1
公开(公告)日：2008-03-13
申请号：US11779204
申请日：2007-07-17
申请人： George Tidmarsh , Barry Golombik , Puneet Sharma
发明人： George Tidmarsh , Barry Golombik , Puneet Sharma
IPC分类号： A61K31/19 , A61K31/425 , A61K9/20 , A61P43/00
CPC分类号： A61K31/426 , A61K9/2054 , A61K9/2059 , A61K9/5084 , A61K31/19 , A61K31/192 , A61K31/425 , A61K2300/00
摘要： A method for administration of ibuprofen to a subject in need of ibuprofen treatment is provided, in which an oral dosage form comprising a therapeutically effective amount of ibuprofen and a therapeutically effective amount of famotidine is administered three times per day.
摘要翻译：提供了将布洛芬给予需要布洛芬治疗的受试者的方法，其中包含治疗有效量的布洛芬和治疗有效量的法莫替丁的口服剂型每天施用三次。

23. 发明申请

US20080025231A1 Machine learning approach for estimating a network path property 有权
标题翻译：用于估计网络路径属性的机器学习方法
公开(公告)号：US20080025231A1
公开(公告)日：2008-01-31
申请号：US11496409
申请日：2006-07-31
申请人： Puneet Sharma , Rita Wouhaybi , Sujata Banerjee
发明人： Puneet Sharma , Rita Wouhaybi , Sujata Banerjee
IPC分类号： H04J1/16
CPC分类号： H04L41/12 , H04L43/00 , H04L43/0829 , H04L43/0852
摘要： A network path property for nodes in a network is estimated using machine learning techniques. Network path property measurements for paths between nodes and a subset of node in the network are received. Using machine learning, the network path property for the nodes is estimated based on the network path property measurements.
摘要翻译：使用机器学习技术来估计网络中节点的网络路径属性。接收节点之间的路径和网络中节点子集的网络路径属性测量。使用机器学习，基于网络路径属性测量来估计节点的网络路径属性。

24. 发明申请

US20070161251A1 PITCH REDUCED PATTERNS RELATIVE TO PHOTOLITHOGRAPHY FEATURES 失效
标题翻译：相对于光刻特征的PITCH减少图案
公开(公告)号：US20070161251A1
公开(公告)日：2007-07-12
申请号：US11681027
申请日：2007-03-01
申请人： Luan Tran , William Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer Abatchev , Gurtej Sandhu , D. Durcan
发明人： Luan Tran , William Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer Abatchev , Gurtej Sandhu , D. Durcan
IPC分类号： H01L21/302
CPC分类号： H01L21/0338 , H01L21/0337 , H01L21/3086 , H01L21/3088
摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the second pattern. Pitch multiplication is accomplished by patterning a photoresist and then etching that pattern into an amorphous carbon layer. Sidewall spacers are then formed on the sidewalls of the amorphous carbon. The amorphous carbon is removed, leaving behind the sidewall spacers, which define the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited around the spacers to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is then is transferred to the BARC. The combined pattern made out by the first pattern and the second pattern is transferred to an underlying amorphous silicon layer and the pattern is subjected to a carbon strip to remove BARC and photoresist material. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, having features of difference sizes, is then etched into the underlying substrate through the amorphous carbon hard mask layer.
摘要翻译：通过使用通过组合两个单独形成的图案形成的掩模蚀刻衬底来形成集成电路的不同尺寸的特征。间距乘法用于形成第一图案的相对较小的特征以及用于形成第二图案的较大特征的常规光刻。间距倍增通过对光致抗蚀剂进行图案化，然后将该图案蚀刻成无定形碳层来实现。然后在无定形碳的侧壁上形成侧壁间隔物。去除无定形碳，留下限定第一掩模图案的侧壁间隔物。然后将底部抗反射涂层（BARC）沉积在间隔物周围以形成平坦表面，并且在BARC上形成光致抗蚀剂层。接下来通过常规光刻法将光致抗蚀剂图案化以形成第二图案，然后将其转印到BARC。通过第一图案和第二图案形成的组合图案被转印到下面的非晶硅层，并且图案经受碳带以去除BARC和光致抗蚀剂材料。然后将组合图案转移到氧化硅层，然后转移到无定形碳掩模层。具有不同尺寸特征的组合掩模图案然后通过无定形碳硬掩模层蚀刻到下面的衬底中。

25. 发明申请

US20070115844A1 Routing a service query in an overlay network 有权
标题翻译：在覆盖网络中路由服务查询
公开(公告)号：US20070115844A1
公开(公告)日：2007-05-24
申请号：US11006041
申请日：2004-12-07
申请人： Sujoy Basu , Sujata Banerjee , Puneet Sharma , Sung-Ju Lee
发明人： Sujoy Basu , Sujata Banerjee , Puneet Sharma , Sung-Ju Lee
IPC分类号： H04J1/16
CPC分类号： H04L67/104 , H04L67/1068 , H04L67/1093 , H04L67/16 , H04L67/322 , H04L67/327
摘要： A query including a plurality of attributes and attribute values for a desired service is received. The query is routed to a destination in the overlay network using different attributes in the query.
摘要翻译：接收包括所需服务的多个属性和属性值的查询。使用查询中的不同属性将查询路由到覆盖网络中的目标。

26. 发明申请

US20060211260A1 Pitch reduced patterns relative to photolithography features 有权
标题翻译：相对于光刻特征的间距减小
公开(公告)号：US20060211260A1
公开(公告)日：2006-09-21
申请号：US11214544
申请日：2005-08-29
申请人： Luan Tran , William Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi (Jenny) Bai , Zhiping Yin , Paul Morgan , Mirzafer Abatchev , Gurtej Sandhu , D. Durcan
发明人： Luan Tran , William Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi (Jenny) Bai , Zhiping Yin , Paul Morgan , Mirzafer Abatchev , Gurtej Sandhu , D. Durcan
IPC分类号： H01L21/31
CPC分类号： H01L21/0338 , H01L21/0337 , H01L21/3086 , H01L21/3088
摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the second pattern. Pitch multiplication is accomplished by patterning a photoresist and then etching that pattern into an amorphous carbon layer. Sidewall spacers are then formed on the sidewalls of the amorphous carbon. The amorphous carbon is removed, leaving behind the sidewall spacers, which define the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited around the spacers to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is then is transferred to the BARC. The combined pattern made out by the first pattern and the second pattern is transferred to an underlying amorphous silicon layer and the pattern is subjected to a carbon strip to remove BARC and photoresist material. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, having features of difference sizes, is then etched into the underlying substrate through the amorphous carbon hard mask layer.
摘要翻译：通过使用通过组合两个单独形成的图案形成的掩模蚀刻衬底来形成集成电路的不同尺寸的特征。间距乘法用于形成第一图案的相对较小的特征以及用于形成第二图案的较大特征的常规光刻。间距倍增通过对光致抗蚀剂进行图案化，然后将该图案蚀刻成无定形碳层来实现。然后在无定形碳的侧壁上形成侧壁间隔物。去除无定形碳，留下限定第一掩模图案的侧壁间隔物。然后将底部抗反射涂层（BARC）沉积在间隔物周围以形成平坦表面，并且在BARC上形成光致抗蚀剂层。接下来通过常规光刻法将光致抗蚀剂图案化以形成第二图案，然后将其转印到BARC。通过第一图案和第二图案形成的组合图案被转印到下面的非晶硅层，并且图案经受碳带以去除BARC和光致抗蚀剂材料。然后将组合图案转移到氧化硅层，然后转移到无定形碳掩模层。具有不同尺寸特征的组合掩模图案然后通过无定形碳硬掩模层蚀刻到下面的衬底中。

27. 发明申请

US20050243835A1 Assigning WAN links to subflows based on WAN link characteristics and application preferences 有权
标题翻译：根据WAN链路特性和应用程序优先级，将WAN链路分配给子流
公开(公告)号：US20050243835A1
公开(公告)日：2005-11-03
申请号：US10835404
申请日：2004-04-30
申请人： Puneet Sharma , Sung-Ju Lee , John Brassil , Kang Shin
发明人： Puneet Sharma , Sung-Ju Lee , John Brassil , Kang Shin
IPC分类号： H04L12/28 , H04L12/56
CPC分类号： H04L12/2874 , H04L12/5692 , H04L47/125 , H04L47/803 , H04L2212/00
摘要： WAN link preferences for subflows of an application flow are determined. The characteristics of WAN links operable to transmit the subflows are also determined. The WAN link preferences are compared to the WAN link characteristics, and the subflows are assigned to the WAN links based on the comparison.
摘要翻译：确定应用程序流的子流的WAN链接首选项。还确定了可操作以传送子流的WAN链路的特性。将WAN链路首选项与WAN链路特性进行比较，并根据比较将子流分配给WAN链路。

28. 发明申请

US20050076210A1 Method and system for content downloads via an insecure communications channel to devices 有权
标题翻译：通过不安全的通信通道向设备下载内容的方法和系统
公开(公告)号：US20050076210A1
公开(公告)日：2005-04-07
申请号：US10679092
申请日：2003-10-03
申请人： David Thomas , Puneet Sharma , Sujata Banerjee , Sung-Ju Lee , Amy Dalal
发明人： David Thomas , Puneet Sharma , Sujata Banerjee , Sung-Ju Lee , Amy Dalal
IPC分类号： H04L9/08 , H04L9/32 , H04L29/06 , H04L29/08 , H04L9/00
CPC分类号： H04L63/0428 , H04L9/0866 , H04L9/3239 , H04L63/18 , H04L67/06 , H04L69/329 , H04L2209/56 , H04L2209/60
摘要： The present teachings provide for a method and system for facilitating content download to one or more remote devices via an insecure communication channel. The method comprises the steps of receiving at least one shared secret from a device via an insecure communications channel, each shared secret encoded and functioning as an identifier for the device, transmitting an encrypted file, from a file server, to the device associated with the encoded shared secret, receiving the shared secret in a plaintext form a via a secure communications channel, receiving a confirmation authorizing the release of a decryption key, and sending a decryption key corresponding to the transmitted file, for which the authorization for the release of the decryption key has been received. The decryption key is encrypted using the shared secret if transmission is via the insecure channel.
摘要翻译：本教导提供了一种用于促进通过不安全通信信道向一个或多个远程设备下载内容的方法和系统。该方法包括以下步骤：经由不安全通信信道从设备接收至少一个共享秘密，每个共享秘密被编码并用作设备的标识符，从文件服务器将加密文件发送到与该文件相关联的设备编码的共享秘密，经由安全通信信道以明文形式a接收共享秘密，接收授权解密密钥的释放的确认，以及发送与所发送的文件相对应的解密密钥，为此，已经收到解密密钥。如果传输是通过不安全的信道，则使用共享密钥对解密密钥进行加密。

29. 发明授权

US06636959B1 Predictor miss decoder updating line predictor storing instruction fetch address and alignment information upon instruction decode termination condition 有权
标题翻译：预测器未命中解码器更新线预测器，在指令解码终止条件下存储指令获取地址和对准信息
公开(公告)号：US06636959B1
公开(公告)日：2003-10-21
申请号：US09416275
申请日：1999-10-14
申请人： James B. Keller , Puneet Sharma , Keith R. Schakel , Francis M. Matus
发明人： James B. Keller , Puneet Sharma , Keith R. Schakel , Francis M. Matus
IPC分类号： G06F938
CPC分类号： G06F9/382 , G06F9/3806 , G06F9/3816 , G06F12/0864 , G06F12/0875 , G06F2212/6082
摘要： A line predictor caches alignment information for instructions. In response to each fetch address, the line predictor provides information for the instruction beginning at the fetch address, as well as alignment information for up to one or more additional instructions subsequent to that instruction. The line predictor may include a memory having multiple entries, each entry storing up to a predefined maximum number of instruction pointers and a fetch address corresponding to the instruction identified by a first one of the instruction pointers. Since the line predictor provides alignment information from one entry per fetch, the line predictor may provide a flow control mechanism for the initial portion of the pipeline within a microprocessor. Each entry may store combinations of instructions which the hardware within the pipeline may handle without creating stalls resulting from the combinations.
摘要翻译：行预测器缓存对齐信息的指令。响应于每个提取地址，行预测器提供从取指址开始的指令的信息，以及在该指令之后的多达一个或多个附加指令的对齐信息。线预测器可以包括具有多个条目的存储器，每个条目存储多达预定义的最大数量的指令指针以及与由指令指针中的第一个标识的指令相对应的读取地址。由于线预测器提供来自每个取出的一个条目的对准信息，因此线预测器可以为微处理器内的流水线的初始部分提供流量控制机制。每个条目可以存储管道内的硬件可以处理的指令的组合，而不会产生由组合产生的停顿。

30. 发明授权

US06379534B1 Pour point depression unit using mild thermal cracker 有权
公开(公告)号：US06379534B1
公开(公告)日：2002-04-30
申请号：US09252760
申请日：1999-02-19
申请人： Gee S. Fung , Philip E. DePalm , Puneet Sharma
发明人： Gee S. Fung , Philip E. DePalm , Puneet Sharma
IPC分类号： C10G700
CPC分类号： C10G9/007 , C10G9/00 , Y10T137/0536
摘要： A method for lowering the cloud/pour point of a waxy crude oil in locations where size and/or weight of the facility may need to be limited (i.e. arctic zones and offshore). The major components of the system comprise a fractionation/quench tower and a reaction furnace. The furnace has sufficient heat input to initiate thermal cracking of wax and the fractionation tower is operated at a temperature sufficient to flash off light hydrocarbons but also low enough to quench thermal cracking reaction. The feed to the furnace comprises a portion of the bottoms stream from the tower and the furnace output is fed back into the tower bottom to be quenched.

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