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    • 23. 发明申请
    • Selective etching of oxides from substrates
    • 从基底中选择性地蚀刻氧化物
    • US20060207968A1
    • 2006-09-21
    • US11370541
    • 2006-03-08
    • Paul MumbauerPaul RomanRobert Grant
    • Paul MumbauerPaul RomanRobert Grant
    • C03C25/68H01L21/306
    • H01L21/31116B81C1/00595B81C1/0092B81C1/00928
    • A method and system for release etching a micro-electrical-mechanical-systems (MEMS) device from a substrate. In one aspect, the invention is a method comprising (a) supporting at least one substrate having a sacrificial oxide and a non-sacrificial material in a process chamber at a pressure and at a temperature; (b) introducing a gas phase mixture comprising a halide-containing species and an alcohol vapor selected from a group consisting of ethanol, 1-propanol, and an aliphatic alcohol having four carbon groups into the process chamber, the gas phase mixture having a volumetric ratio of the halide-containing species to the alcohol vapor of approximately 2 or less; and (c) etching the sacrificial oxide with the gas phase mixture. In another aspect, the invention is a system for carrying out the method.
    • 一种用于从基板释放蚀刻微电子机械系统(MEMS)器件的方法和系统。 在一个方面,本发明是一种方法,其包括(a)在压力和温度下在处理室中支撑具有牺牲氧化物和非牺牲材料的至少一个衬底; (b)将含有卤化物的物质和选自乙醇,1-丙醇和具有四个碳原子的脂族醇的醇蒸气的气相混合物引入处理室,气相混合物具有体积 含卤素物质与醇蒸气的比例约为2或更小; 和(c)用气相混合物蚀刻牺牲氧化物。 另一方面,本发明是一种执行该方法的系统。
    • 26. 发明授权
    • Method and circuit for replicating data in a fiber channel network, or the like
    • 用于在光纤通道网络中复制数据的方法和电路等
    • US06721862B2
    • 2004-04-13
    • US09938313
    • 2001-08-23
    • Robert GrantStephen Trevitt
    • Robert GrantStephen Trevitt
    • G06F1300
    • G06F11/1466G06F11/1464Y10S707/99953Y10S707/99955
    • A Fiber Channel circuit (150) has a Fiber Channel switch (152) that receives data frames on input ports (142) and writes the frames to a data storage device (158) from an output port (156) A port server (162) backs up the frames to a data storage backup device (160) by reading data volumes from the data storage device (158) and writing backup copies of at least some of the read data volumes to the data storage backup device (160) A data monitor (166) receives the frame data from the output port and applies it to the data storage device (158) The data monitor (166) also applies it to the port server (162) The port server (162) identifies frames in the volume that have been changed during the backup process. The identified frames are either reread from the data storage array (158), or from a memory (168) associated with the port server (162), and written to the data storage backup device (160).
    • 光纤通道电路(150)具有在输入端口(142)上接收数据帧的光纤通道交换机(152),并且将帧从输出端口(156)端口服务器(162)写入数据存储设备(158) 通过从数据存储设备(158)读取数据卷并将至少一些读取的数据卷的备份副本写入数据存储备份设备(160)来将框架备份到数据存储备份设备(160)。数据监视器 (166)从输出端口接收帧数据并将其应用于数据存储设备(158)。数据监视器(166)还将其应用于端口服务器(162)。端口服务器(162)识别卷中的帧, 在备份过程中已经更改。 所识别的帧可以从数据存储阵列(158)或从与端口服务器(162)相关联的存储器(168))重新读取,并被写入数据存储备份设备(160)。
    • 29. 发明授权
    • Selective etching of oxides from substrates
    • 从基底中选择性地蚀刻氧化物
    • US07431853B2
    • 2008-10-07
    • US11370541
    • 2006-03-08
    • Paul D. MumbauerPaul RomanRobert Grant
    • Paul D. MumbauerPaul RomanRobert Grant
    • C23F1/00
    • H01L21/31116B81C1/00595B81C1/0092B81C1/00928
    • A method and system for release etching a micro-electrical-mechanical-systems (MEMS) device from a substrate. In one aspect, the invention is a method comprising (a) supporting at least one substrate having a sacrificial oxide and a non-sacrificial material in a process chamber at a pressure and at a temperature; (b) introducing a gas phase mixture comprising a halide-containing species and an alcohol vapor selected from a group consisting of ethanol, 1-propanol, and an aliphatic alcohol having four carbon groups into the process chamber, the gas phase mixture having a volumetric ratio of the halide-containing species to the alcohol vapor of approximately 2 or less; and (c) etching the sacrificial oxide with the gas phase mixture. In another aspect, the invention is a system for carrying out the method.
    • 一种用于从基板释放蚀刻微电子机械系统(MEMS)器件的方法和系统。 在一个方面,本发明是一种方法,其包括(a)在压力和温度下在处理室中支撑具有牺牲氧化物和非牺牲材料的至少一个衬底; (b)将含有卤化物的物质和选自乙醇,1-丙醇和具有四个碳原子的脂族醇的醇蒸气的气相混合物引入处理室,气相混合物具有体积 含卤素物质与醇蒸气的比例约为2或更小; 和(c)用气相混合物蚀刻牺牲氧化物。 另一方面,本发明是一种执行该方法的系统。