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    • 21. 发明申请
    • METHODS FOR SYNTHESIS OF GRAPHENE DERIVATIVES AND FUNCTIONAL MATERIALS FROM ASPHALTENES
    • 合成苯甲酸衍生物和功能材料的方法
    • US20160039678A1
    • 2016-02-11
    • US14822822
    • 2015-08-10
    • Olanrewaju W. Tanimola
    • Olanrewaju W. Tanimola
    • C01B31/04C01B31/02C01D5/00C07C211/00C07C205/06C07C309/30
    • C01B32/168C01B32/152C01B32/194C30B7/06C30B7/14C30B29/02C30B29/60
    • Embodiments described are directed to methods for the functionalization of asphaltene materials and to compositions made from functionalized asphaltenes. Disclosed is a method for synthesizing graphene derivatives, such as 2D single crystalline carbon allotropes of graphene and functional materials, such as sulfonic acid and its derivatives. Also disclosed is a method for the transformation of asphaltene into a source of graphene derivatives and functional materials, such as, 0D, 1D, 2D and combinations of 0D and 1D by utilizing chemical substitution reaction mechanism, such as, electrophilic aromatic substitution, nucleophilic aromatic substitution and Sandmeyer mechanism. Also disclosed are novel graphene materials comprising: acetylenic linkage and hydrogenated graphene. These novel materials, which may be produced by these methods, include, e.g.: 2D single crystalline carbon allotropes of graphene with asymmetric unit formulas C7H6N2O4, C6H4N2O4, C7H7O3S− H3O+, C7H7O3SH+, and a 2D single crystal with asymmetric unit formula (Na6O16S4)n.
    • 所描述的实施方案涉及沥青质材料的官能化方法和由官能化沥青质制成的组合物。 公开了石墨烯衍生物的合成方法,例如石墨烯的2D单晶碳同素异形体和功能性材料如磺酸及其衍生物。 还公开了通过利用化学取代反应机理,如亲电芳族取代,亲核芳族化合物,将沥青质转化为石墨烯衍生物和功能材料源,例如0D,1D,2D和0D和1D的组合的方法 替代和Sandmeyer机制。 还公开了新颖的石墨烯材料,包括:炔键和氢化石墨烯。 可以通过这些方法制备的这些新型材料包括例如:具有不对称单元式C7H6N2O4,C6H4N2O4,C7H7O3S-H3O +,C7H7O3SH +的石墨烯的二维单晶碳同素异形体和具有不对称单元配方(Na6O16S4)n的2D单晶 。
    • 24. 发明授权
    • Method for the controlled growth of a graphene film
    • 石墨烯薄膜受控生长的方法
    • US09206509B2
    • 2015-12-08
    • US13124413
    • 2009-10-16
    • Laurent BaratonCostel Sorin CojocaruDidier Pribat
    • Laurent BaratonCostel Sorin CojocaruDidier Pribat
    • B05D5/12B05D3/10B05D3/06B05D3/02C23C14/48C23C14/58B32B38/10C23C16/26C23C16/02C23C16/56C30B25/02C30B29/02
    • C23C16/26C23C16/0281C23C16/56C30B25/02C30B29/02
    • The invention includes a controlled graphene film growth process including the production on the surface of a substrate of a layer of a metal having with carbon a phase diagram such that, above a molar concentration threshold ratio CM/CM+CC, where CM is the molar metal concentration in a metal/carbon mixture and CC is the molar carbon concentration in the mixture, a homogeneous solid solution is obtained. The metal layer is exposed to a controlled flux of carbon atoms or carbon-containing radicals or carbon-containing ions at a temperature such that the molar concentration ratio obtained is greater than the threshold ratio to obtain a solid solution of carbon in the metal. The process further includes an operation for modifying the phase of the mixture into two phases, a metal phase and a graphite phase, leading to the formation of at least a lower graphene film at the metal layer incorporating carbon atoms-substrate interface and an upper graphene film at the surface of the metal layer.
    • 本发明包括受控的石墨烯薄膜生长工艺,其包括在具有碳的金属层的基底的表面上生产相图,使得高于摩尔浓度阈值比CM / CM + CC,其中CM是摩尔 金属/碳混合物中的金属浓度,CC是混合物中的摩尔碳浓度,得到均匀的固溶体。 在使得所得到的摩尔浓度比大于阈值比以获得金属中的固溶体的温度的温度下,将金属层暴露于受控的碳原子或含碳自由基或含碳离子的流量。 该方法还包括将混合物相变成两相的操作,金属相和石墨相,导致在包含碳原子 - 基底界面的金属层和上部石墨烯上形成至少一个下部石墨烯膜 膜在金属层的表面。
    • 30. 发明申请
    • THIN FILM FORMATION
    • 薄膜形成
    • US20150013593A1
    • 2015-01-15
    • US14377173
    • 2013-02-04
    • Universiteit Leiden
    • Guocai Dong
    • C30B25/16C30B29/02H01L21/02
    • C30B25/16B82Y30/00B82Y40/00C01B32/186C23C16/26C30B29/02H01L21/02425H01L21/02433H01L21/02527H01L21/0262
    • A method of forming a graphene film on a surface (20) of a substrate comprises the steps of: (i) locating a carbon source (22) at, or in a vicinity of the surface (20) of the substrate; (ii) controlling ambient conditions at the surface (20) of the substrate to inhibit graphene nucleation on the surface (20); (iii) applying a temporary change of one or more of the ambient conditions at a localised site (30) on the surface (20) of the substrate to initiate graphene nucleation at the localised site (30); (iv) controlling the ambient conditions at the surface (20) of the substrate, following initiation of graphene nucleation at the localised site, to simultaneously inhibit graphene nucleation and enable graphene growth on the surface (20).
    • 在衬底的表面(20)上形成石墨烯膜的方法包括以下步骤:(i)将碳源(22)定位在衬底的表面(20)附近或附近; (ii)控制所述衬底的表面(20)处的环境条件以抑制所述表面(20)上的石墨烯成核; (iii)在衬底的表面(20)上的局部位置(30)处施加一个或多个环境条件的暂时变化,以在所述局部位置(30)处引发石墨烯成核; (iv)在局部位置开始石墨烯成核之后,控制衬底表面(20)处的环境条件,同时抑制石墨烯成核并使表面上的石墨烯生长(20)。