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21. 发明申请

US20170311805A9 VIEWING AND PROCESSING MULTISPECTRAL IMAGES 审中-公开
公开(公告)号：US20170311805A9
公开(公告)日：2017-11-02
申请号：US14866973
申请日：2015-09-27
申请人： Thomas Nathan Millikan
发明人： Thomas Nathan Millikan
IPC分类号： A61B5/00 , H04N7/18 , H04N5/232 , G06T7/90 , G01J1/58 , G01J3/02 , G01J3/10 , G01J3/14 , G01J3/28 , G06T7/00 , H04N5/33 , G01J3/51 , G01J3/36 , G01J3/12 , A61B5/11
CPC分类号： A61B5/0075 , A61B5/0071 , A61B5/0077 , A61B5/1112 , A61B5/743 , A61B2560/0242 , A61B2576/00 , G01J1/58 , G01J3/0208 , G01J3/0229 , G01J3/0264 , G01J3/027 , G01J3/10 , G01J3/14 , G01J3/2823 , G01J3/36 , G01J3/513 , G01J2003/1213 , G01J2003/2826 , G06T7/0012 , G06T7/90 , G06T2207/10024 , G06T2207/10048 , G06T2207/30088 , G06T2207/30196 , H04N5/23293 , H04N5/332 , H04N7/18 , H04N7/183
摘要： Multispectral images, including ultraviolet light and its interactions with ultraviolet light-interactive compounds, can be captured, processed, and represented to a user. Ultraviolet-light related information can be conveniently provided to a user to allow the user to have awareness of UV characteristics and the user's risk to UV exposure.

22. 发明授权

US09743483B2 Techniques for lumen maintenance and color shift compensation 有权
公开(公告)号：US09743483B2
公开(公告)日：2017-08-22
申请号：US15093917
申请日：2016-04-08
申请人： OSRAM SYLVANIA Inc.
发明人： Ming Li , Qi Dai , Keng Chen
IPC分类号： G01J1/02 , G01J1/16 , H05B33/08 , G01J1/58
CPC分类号： H05B33/0869 , G01J1/0228 , G01J1/0238 , G01J1/16 , G01J1/58 , G01J2001/1673
摘要： Techniques are disclosed for maintaining consistent lumen output of a lighting assembly over time. By maintaining a consistent lumen output, it is possible to maintain acceptable color stability where color mixing of multiple outputs is used. The lighting assembly may be any lighting configuration that might suffer from lumen depreciation and/or color drift over time, and may include any type(s) of light source(s) that may be monitored and driven accordingly. The lighting assembly, in addition to light source(s), includes a photo detector and a directed light source, such as a laser. The directed light source provides a golden sample for use in calibrating the photo detector, which in turn monitors lumen output of the light source(s). Drive signals are adjusted to account for lumen depreciation of the monitored light source(s).

23. 发明授权

US09702757B2 Light measuring system 有权
公开(公告)号：US09702757B2
公开(公告)日：2017-07-11
申请号：US14804613
申请日：2015-07-21
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Joon Sub Lee , Seung Won Park
IPC分类号： G01J1/04 , G01J1/42 , G01J3/02 , G01J1/58
CPC分类号： G01J1/42 , G01J1/58 , G01J3/0254 , G01J2001/0481 , G01J2001/4252
摘要： A light measuring system including an integrating sphere having an aperture configured by opposing reflectors selectively aligned with complementary reflectors of at least one light source mounting block having a light source mounting region for mounting a light source thereon.

24. 发明授权

US09619907B2 Microparticle analyzing apparatus and data displaying method 有权
公开(公告)号：US09619907B2
公开(公告)日：2017-04-11
申请号：US13089569
申请日：2011-04-19
申请人： Yoshitsugu Sakai
发明人： Yoshitsugu Sakai
IPC分类号： G06T11/20 , G01J1/58 , G01N21/64 , G01N15/14
CPC分类号： G06T11/206 , G01N15/1463 , G01N21/6428 , G01N21/645 , G01N2021/6421 , G01N2021/6423 , G01N2021/6441 , G06T11/001
摘要： Disclosed herein is a microparticle analyzing apparatus including a detecting portion configured to simultaneously detect a fluorescence generated from a microparticle in plural wavelength regions and a displaying portion configured to display thereon detection results in the plural wavelength regions in a form of a spectrum.

25. 发明授权

US09575302B2 Stimulated emission depletion microscopy 有权
标题翻译：受激发射耗尽显微镜
公开(公告)号：US09575302B2
公开(公告)日：2017-02-21
申请号：US14423188
申请日：2013-08-16
申请人： ISIS Innovation Limited
发明人： Martin Booth , Daniel Burke , Joerg Bewersdorf , Travis J. Gould
IPC分类号： G01J1/58 , G02B21/00 , G02B26/06 , G01N21/63 , G01N21/64
CPC分类号： G02B21/0072 , G01N21/636 , G01N21/6456 , G01N21/6458 , G02B21/0076 , G02B26/06
摘要： Aberrations in stimulated emission depletion microscopy are corrected using an adaptive optics approach using a metric which combines both image sharpness and brightness. Light modulators (22,32) are used to perform aberration correction in one or more of the depletion path (10), the excitation path (12), or the emission path from sample to detector.
摘要翻译：使用结合了图像清晰度和亮度的度量的自适应光学方法来校正受激发射耗尽显微镜中的畸变。光调制器（22,32）用于在耗尽路径（10），激励路径（12）或从样本到检测器的发射路径中的一个或多个中执行像差校正。

26. 发明授权

US09513223B2 Scanning observation apparatus 有权
标题翻译：扫描观察装置
公开(公告)号：US09513223B2
公开(公告)日：2016-12-06
申请号：US14829983
申请日：2015-08-19
申请人： OLYMPUS CORPORATION
发明人： Hiroya Fukuyama
IPC分类号： G01J1/58 , G01T1/10 , G01N21/64 , G02B21/06 , G02B21/36
CPC分类号： G01N21/6456 , G01N2201/10 , G01N2201/121 , G02B21/06 , G02B21/365
摘要： A high-resolution fluorescence image in which an afterimage is suppressed is obtained, even when a fluorescence detection interval is shortened. Provided is a scanning observation apparatus including a scanning unit that spatially scans pulsed excitation light emitted from a light source at prescribed time intervals on a specimen; a fluorescence detecting unit that detects fluorescence generated by exciting a fluorescent substance inside the specimen with the excitation light scanned by the scanning unit, in synchronization with the emission of the excitation light; and a fluorescence correcting unit that subtracts, from a fluorescence intensity detected by the fluorescence detecting unit, an afterimage fluorescence component calculated on the basis of time-sequential fluorescence detected by the fluorescence detecting unit prior thereto, at each scanning position, to correct the fluorescence intensity at the scanning position.
摘要翻译：即使在荧光检测间隔缩短的情况下也能够得到抑制残像的高分辨率的荧光图像。本发明提供一种扫描观察装置，其具备：扫描单元，其以规定的时间间隔在样本上空间扫描从光源发出的脉冲激发光; 荧光检测单元，其与通过所述激发光的发射同步地检测利用所述扫描单元扫描的激发光来激发所述样本内的荧光物质而产生的荧光; 以及荧光校正单元，从荧光检测单元检测出的荧光强度，在每个扫描位置根据荧光检测单元检测到的时间序列荧光计算的余像荧光成分，从而校正荧光在扫描位置的强度。

27. 发明申请

US20160258811A1 METHOD AND SYSTEM FOR DETERMINING ULTRAVIOLET FLUENCE RECEIVED BY A FLUID 有权
标题翻译：用于确定流体接收的超紫外线流体的方法和系统
公开(公告)号：US20160258811A1
公开(公告)日：2016-09-08
申请号：US15036962
申请日：2014-11-12
申请人： TROJAN TECHNOLOGIES
发明人： Mark Adrian Kustermans , Michael Sasges , Ankit Patras , Trisevgeni Trissa Kantzas
IPC分类号： G01J1/58 , A61L2/00 , G01N33/483 , A61L2/10 , G01N33/49 , G01N33/15
CPC分类号： G01J1/58 , A61L2/0005 , A61L2/0047 , A61L2/10 , A61L2202/11 , C02F1/008 , C02F1/32 , G01J1/429 , G01N21/64 , G01N33/15 , G01N33/4833 , G01N33/49 , G01N2201/13
摘要： There is described a method of determining the UV fluence received by a fluid. The method comprises the steps of: (a) irradiating the fluid at an unknown UV fluence; (b) measuring the fluorescence of a test sample of the fluid after irradiation in Step (a) to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) determining the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence. There is also described a system for determining the UV fluence received by a fluid being treated in UV fluid treatment system comprising at least one UV source. The system comprises: (a) a radiation-transparent vessel for receiving a test sample of the fluid after irradiation of the fluid at an unknown UV fluence; (b) a fluorometer for measuring the fluorescence of the test sample received in the radiation-transparent vessel to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) a controller configured to determine the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence.
摘要翻译：描述了确定流体接收的UV注量的方法。该方法包括以下步骤：（a）以未知的UV注量照射流体; （b）在步骤（a）中测量照射后的流体的测试样品的荧光，以产生与测试样品中包含的物质的规定的荧光组合物的浓度成比例的测试信号; 并且（c）通过将测试信号与作为所施加的UV注量的函数的与流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知UV注量的值。还描述了一种用于确定由包含至少一个UV源的UV流体处理系统中被处理的流体接收的UV注量的系统。该系统包括：（a）辐射透明容器，用于在未知的紫外线注量流量的流体照射后接收流体的测试样品; （b）荧光计，用于测量接受在辐射透明容器中的测试样品的荧光，以产生与测试样品中包含的物质的规定荧光组合物的浓度成比例的测试信号; 以及（c）控制器，被配置为通过将测试信号与作为所施加的UV注量的函数的流体中规定的荧光成分的浓度成比例的控制信号的校准曲线进行比较来确定未知的UV注量的值。

28. 发明授权

US09377405B2 Evaluation circuit for an optoelectronic detector and method for recording fluorescence events 有权
标题翻译：用于光电子检测器的评估电路和用于记录荧光事件的方法
公开(公告)号：US09377405B2
公开(公告)日：2016-06-28
申请号：US14348261
申请日：2012-09-20
申请人： Carl Zeiss Microscopy GmbH
发明人： Gunter Möhler , Dietmar Schmidt , Oliver Holub , Robert Hauschild
IPC分类号： G01J1/58 , G01N21/64 , G01J3/28 , G02B21/00 , G01J1/44 , G01J3/44
CPC分类号： G01N21/64 , G01J1/44 , G01J3/2889 , G01J3/44 , G01N21/6408 , G01N21/6458 , G02B21/0076 , G02B21/0084
摘要： An improved evaluation circuit which allows high sensitivity in an economical manner. For this purpose, a shift register having at least one data input, a clock input, a plurality of register stages and at least one data output is provided, wherein the output of the analog-to-digital converter is connected to the data input of the shift register. With a shift register, fluorescent light and scattered light can be temporally distinguished in an economical manner.
摘要翻译：改进的评估电路，以经济的方式允许高灵敏度。为此，提供具有至少一个数据输入，时钟输入，多个寄存器级和至少一个数据输出的移位寄存器，其中模数转换器的输出连接到移位寄存器。通过移位寄存器，可以以经济的方式在时间上区分荧光灯和散射光。

29. 发明授权

US09354529B2 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element 有权
标题翻译：用于具有反射光学元件的微光刻的投影曝光工具中的布置
公开(公告)号：US09354529B2
公开(公告)日：2016-05-31
申请号：US13561502
申请日：2012-07-30
申请人： Dirk Heinrich Ehm , Maarten van Kampen , Stefan-Wolfgang Schmidt , Vadim Yevgenyevich Banine , Erik Loopstra
发明人： Dirk Heinrich Ehm , Maarten van Kampen , Stefan-Wolfgang Schmidt , Vadim Yevgenyevich Banine , Erik Loopstra
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G01J1/58 , G02B5/08
CPC分类号： G03F7/70891 , G01J1/58 , G02B5/0891 , G03F7/70316 , G03F7/70558 , G03F7/7085 , G03F7/70958
摘要： An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).
摘要翻译：用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

30. 发明授权

US09316589B2 Method for evaluating oxide semiconductor thin film, and method for quality control of oxide semiconductor thin film 有权
标题翻译：氧化物半导体薄膜的评价方法以及氧化物半导体薄膜的质量控制方法
公开(公告)号：US09316589B2
公开(公告)日：2016-04-19
申请号：US14760023
申请日：2013-09-04
申请人： Kobe Steel, Ltd.
发明人： Kazushi Hayashi , Toshihiro Kugimiya , Tomoya Kishi , Aya Miki
IPC分类号： F21V9/16 , G01J1/58 , G01T1/10 , G21H3/02 , G21K5/00 , H01J65/06 , G01N21/64 , H01L21/66 , H01L29/24 , H01L29/66 , H01L29/786
CPC分类号： G01N21/6489 , H01L22/12 , H01L29/24 , H01L29/66969 , H01L29/78693
摘要： This method for evaluating an oxide semiconductor thin film includes evaluating the stress stability of an oxide semiconductor thin film on the basis of the light emission intensity of luminescent light excited when radiating an electron beam or excitation light at a sample at which the oxide semiconductor thin film is formed. The stress stability of the oxide semiconductor thin film is evaluated on the basis of the light emission intensity (L1) observed in the range of 1.6-1.9 eV of the luminescent light excited from the oxide semiconductor thin film.
摘要翻译：该氧化物半导体薄膜的评价方法包括以下方式评价氧化物半导体薄膜的应力稳定性：基于在使氧化物半导体薄膜的样品照射电子束或激发光时激发的发光的发光强度形成了。基于在从氧化物半导体薄膜激发的发光光的1.6-1.9eV的范围内观察到的发光强度（L1）来评价氧化物半导体薄膜的应力稳定性。

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