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31. 发明授权

US08850809B2 Pulsed plasma engine and method 有权
标题翻译：脉冲等离子体发动机和方法
公开(公告)号：US08850809B2
公开(公告)日：2014-10-07
申请号：US13727348
申请日：2012-12-26
申请人： Heinrich Franz Klostermann
发明人： Heinrich Franz Klostermann
IPC分类号： F01B29/00 , F01K3/00 , F01K5/00 , F01K7/00 , F03H1/00 , H05H1/00 , H02N10/00
CPC分类号： H02N11/006 , F01B29/00 , F02B27/00 , F02C5/00 , F05D2260/16 , H02N10/00 , H02N11/008 , Y02T10/146 , Y10S74/09
摘要： Pulsed plasma engine and method in which a noncombustible gas is introduced into an explosion chamber, the gas is ionized to form a plasma within the chamber, an electrical pulse is applied to the plasma to heat the plasma, the pulse is turned off to produce an explosive pressure pulse in the plasma, and the plasma is confined in the chamber by a magnetic field that directs the pressure pulse toward an output member which is driven by the pressure pulse.
摘要翻译：脉冲等离子体发动机和将不可燃气体引入爆炸室的方法，气体被离子化以在室内形成等离子体，将电脉冲施加到等离子体以加热等离子体，脉冲被关闭以产生等离子体中的爆炸压力脉冲，并且通过磁场将等离子体限制在腔室中，该磁场将压力脉冲引导到由压力脉冲驱动的输出构件。

32. 发明授权

US08841641B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08841641B2
公开(公告)日：2014-09-23
申请号：US13903811
申请日：2013-05-28
申请人： Gigaphoton Inc.
发明人： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
IPC分类号： G01N21/33 , G21K5/02 , H05H1/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
摘要翻译：从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。

33. 发明授权

US08826853B2 Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device 有权
标题翻译：用于将PECVD沉积在容器上的内部阻挡层的装置，该装置包括光学等离子体分析装置
公开(公告)号：US08826853B2
公开(公告)日：2014-09-09
申请号：US11995185
申请日：2006-07-12
申请人： Jean-Michel Rius , Guy Feuilloley
发明人： Jean-Michel Rius , Guy Feuilloley
IPC分类号： C23C16/00 , B05D7/22 , H05H1/00 , H05H1/24 , C23C16/52 , C23C16/04
CPC分类号： H05H1/24 , C23C16/045 , C23C16/52 , H05H1/0025
摘要： An apparatus (1) for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (3), the apparatus comprising: a structure (5) receiving the receptacle (3), said structure (5) defining a plasma-presence zone (18), said structure (5) being provided with an orifice (14) defining an axis (A1) and presenting an inside opening (15) opening out into the plasma-presence zone (18), and an outside opening (16) opening out outside said zone (18); an electromagnetic wave generator; and an optical plasma monitor device (19) including a pick-up (21) placed outside the plasma-presence zone (18) on the axis (A1) of said orifice.
摘要翻译：一种用于将PECVD沉积在容器（3）中的阻挡效应材料的薄层的装置（1），所述装置包括：接收所述容器（3）的结构（5），所述结构（5）限定等离子体 - 存在区域（18），所述结构（5）设置有限定轴线（A1）的孔口（14），并且具有开口进入等离子体存在区域（18）的内部开口（15）和外部开口 16）在所述区域（18）外面打开; 电磁波发生器; 以及包括放置在所述孔口的轴线（A1）上的等离子体存在区域（18）外部的拾取器（21）的光学等离子体监视器装置（19）。

34. 发明授权

US08815350B2 Method for grafting a porous element for leucodepletion 有权
标题翻译：用于接枝多孔元素以进行白藜芦醇的方法
公开(公告)号：US08815350B2
公开(公告)日：2014-08-26
申请号：US12337715
申请日：2008-12-18
申请人： Pascal Marmey , Emilie Bessy , Pierre Lutz , Gregory Henard
发明人： Pascal Marmey , Emilie Bessy , Pierre Lutz , Gregory Henard
IPC分类号： H05H1/00 , A61M1/36 , B05D3/06
CPC分类号： B05D3/06 , A61M1/0209 , A61M1/0218 , A61M1/3633
摘要： A method for grafting a porous element for leucodepletion by adsorption and/or filtration of a biological fluid, such as blood or a blood component, which method comprises the steps of impregnating the porous element with a solution containing a poly(ethylene oxide) having identical or different functional end groups; and applying an ionizing treatment to the impregnated porous element so as to ensure covalent cross-linking between the poly(ethylene oxide) and the porous element.
摘要翻译：用于通过吸附和/或过滤生物流体如血液或血液成分接枝多孔元件以进行白点沉积的方法，该方法包括以下步骤：用含有相同的聚（环氧乙烷）的溶液浸渍多孔元件或不同的功能性端基; 并对浸渍的多孔元件进行电离处理，以确保聚（环氧乙烷）和多孔元件之间的共价交联。

35. 发明授权

US08785892B2 Laser-produced-plasma EUV light source 有权
标题翻译：激光产生的等离子体EUV光源
公开(公告)号：US08785892B2
公开(公告)日：2014-07-22
申请号：US13493871
申请日：2012-06-11
申请人： Alexander I. Ershov , Igor V. Fomenkov
发明人： Alexander I. Ershov , Igor V. Fomenkov
IPC分类号： H05H1/00 , H05H1/24 , G21K5/04
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了设备和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

36. 发明授权

US08759677B2 Hermetically sealed housing for electronic components and manufacturing method 有权
标题翻译：电子元器件密封外壳及制造方法
公开(公告)号：US08759677B2
公开(公告)日：2014-06-24
申请号：US12993299
申请日：2009-05-26
申请人： Christian Bauer , Hans Krueger , Juergen Portmann , Alois Stelzl
发明人： Christian Bauer , Hans Krueger , Juergen Portmann , Alois Stelzl
IPC分类号： H01J5/00 , H01J15/00 , H05K5/06 , H05H1/00 , H05K7/00 , H05K7/10 , H05K7/12
CPC分类号： H01L23/06 , B81B7/0077 , B81C2203/0136 , H01L23/053 , H01L23/10 , H01L2924/0002 , H01L2924/01079 , H01L2924/09701 , H01L2924/12044 , H01L2924/3011 , H01L2924/00
摘要： Frames (3) applied on a wafer (1) are leveled and covered with a covering film, such that gas-tight housings are formed for component structures (5), in particular for filter or MEMS structures. Inner columns (4) can be provided for supporting the housing and for the ground connection; outer columns (4) can be provided for the electrical connection and are connected to the component structures by means of conductor tracks (6) that are electrically insulated from the frames (3).
摘要翻译：施加在晶片（1）上的框架（3）被平整并用覆盖膜覆盖，使得形成用于组件结构（5）的气密壳体，特别是用于过滤器或MEMS结构。可以提供内柱（4）用于支撑壳体和接地连接; 可以为电连接提供外柱（4），并且通过与框架（3）电绝缘的导体轨道（6）连接到部件结构。

37. 发明授权

US08758866B2 Process for producing composite of metal and resin 有权
标题翻译：金属和树脂复合材料的生产工艺
公开(公告)号：US08758866B2
公开(公告)日：2014-06-24
申请号：US12979717
申请日：2010-12-28
申请人： Hideyuki Imai , Yoshinori Nagamori , Shinichi Takeda
发明人： Hideyuki Imai , Yoshinori Nagamori , Shinichi Takeda
IPC分类号： H05H1/00 , B05D3/00 , B29C71/02 , B29C71/04 , B29C45/14 , B29C65/00 , B29K81/00 , B29K705/02
CPC分类号： B29C45/14311 , B29C66/71 , B29C66/7212 , B29C66/7392 , B29C2045/14885 , B29K2081/04 , B29K2705/02 , B29K2705/10 , B29K2077/00 , B29K2309/08 , B29K2023/04 , B29K2023/10 , B29K2025/04 , B29K2067/006 , B29K2027/06 , B29K2025/06 , B29K2023/12 , B29K2023/06
摘要： The metal part is one where a carboxyl group or an amino group, or a hydroxyl group is imparted onto the surface. On the other hand, the resin part is one into which an adhesiveness modifier containing an epoxy group is blended. A process for producing a composite of metal and resin, wherein the metal part and the resin part are bonded by interaction of the carboxyl group or the amino group, or the hydroxyl group with the epoxy group.
摘要翻译：金属部分是表面上赋予羧基或氨基或羟基的部分。另一方面，树脂部分是混合含有环氧基的粘合性改性剂的树脂部分。一种金属和树脂复合体的制造方法，其中金属部分和树脂部分通过羧基或氨基或羟基与环氧基的相互作用结合。

38. 发明授权

US08747960B2 Processes and systems for engineering a silicon-type surface for selective metal deposition to form a metal silicide 有权
标题翻译：用于工程化硅型表面以进行选择性金属沉积以形成金属硅化物的工艺和系统
公开(公告)号：US08747960B2
公开(公告)日：2014-06-10
申请号：US11513446
申请日：2006-08-30
申请人： Yezdi Dordi , John Boyd , Tiruchirapalli Arunagiri , Johan Vertommen , Fritz C. Redeker , William Thie , Arthur M. Howald
发明人： Yezdi Dordi , John Boyd , Tiruchirapalli Arunagiri , Johan Vertommen , Fritz C. Redeker , William Thie , Arthur M. Howald
IPC分类号： C23C14/02 , H05H1/00
CPC分类号： C23C18/1651 , C23C18/1893 , H01L21/0206 , H01L21/02063 , H01L21/02068 , H01L21/02074 , H01L21/28518 , H01L21/288 , H01L21/32115 , H01L21/32135 , H01L21/32136 , H01L21/67161 , H01L21/67207 , H01L21/76814 , H01L21/7684 , H01L21/76843 , H01L21/76846 , H01L21/76849 , H01L21/76862 , Y02P70/605
摘要： The embodiments fill the need to enhance electro-migration performance, provide lower metal resistivity, and improve silicon-to-metal interfacial adhesion for copper interconnects by providing improved processes and systems that produce a silicon-to-metal interface. An exemplary method of preparing a substrate surface of a substrate to selectively deposit a layer of a metal on a silicon or polysilicon surface of the substrate to form a metal silicide in an integrated system is provided. The method includes removing organic contaminants from the substrate surface in the integrated system, and reducing the silicon or polysilicon surface in the integrated system after removing organic contaminants to convert silicon oxide on the silicon or polysilicon surface to silicon, wherein after reducing the silicon or polysilicon surface, the substrate is transferred and processed in controlled environment to prevent the formation of silicon oxide, the silicon or polysilicon surface is reduced to increase the selectivity of the metal on the silicon surface. The method further includes selectively depositing the layer of the metal on the silicon or polysilicon surface of substrate in the integrated system after reducing the silicon or polysilicon surface. An exemplary system to practice the exemplary method described above is also provided.
摘要翻译：这些实施方案通过提供产生硅 - 金属界面的改进的工艺和系统来满足增强电迁移性能，提供较低金属电阻率以及改进铜互连的硅 - 金属界面粘附的需要。提供了制备衬底的衬底表面以在衬底的硅或多晶硅表面上选择性地沉积金属层以在集成系统中形成金属硅化物的示例性方法。该方法包括从集成系统中的衬底表面去除有机污染物，以及在去除有机污染物之后减少集成系统中的硅或多晶硅表面，以将硅或多晶硅表面上的氧化硅转化为硅，其中在还原硅或多晶硅之后表面，在受控环境中转移和处理衬底以防止形成氧化硅，减少硅或多晶硅表面以增加金属在硅表面上的选择性。该方法还包括在减少硅或多晶硅表面之后，在集成系统中的衬底的硅或多晶硅表面上选择性地沉积金属层。还提供了用于实践上述示例性方法的示例性系统。

39. 发明授权

US08733079B2 Electric thruster for a spacecraft 有权
标题翻译：电子推进器用于航天器
公开(公告)号：US08733079B2
公开(公告)日：2014-05-27
申请号：US12992000
申请日：2009-05-11
申请人： Robert André Laine
发明人： Robert André Laine
IPC分类号： F03H1/00 , H05H1/00 , F02K9/66
CPC分类号： F03H1/0043 , F02K1/004 , Y02T50/671
摘要： The invention relates to an electric thruster for a spacecraft. According to the invention, the thruster (II) comprises a jet generating portion (G1) and a jet accelerating portion (A2), pivotably connected (H1) such that the jet accelerating portion (A2) can rotate in relation to the jet generating portion (G1).
摘要翻译：本发明涉及一种用于航天器的电推进器。根据本发明，推进器（II）包括喷射产生部分（G1）和可旋转地连接（H1）的射流加速部分（A2），使得喷射加速部分（A2）能够相对于射流生成部分（G1）。

40. 发明授权

US08728584B2 Method for patterning polymer surface 有权
标题翻译：图案聚合物表面的方法
公开(公告)号：US08728584B2
公开(公告)日：2014-05-20
申请号：US12576666
申请日：2009-10-09
申请人： Shu-Chen Hsieh
发明人： Shu-Chen Hsieh
IPC分类号： H05H1/00 , C03C15/00 , C03C25/68
CPC分类号： B05D3/145 , B05D5/00 , B05D7/02 , B05D2203/35 , B29C59/14
摘要： The invention provides a method for patterning a polymer surface. A polymer layer is formed on a substrate. A conductive grid with a mesh pattern is placed on the polymer layer. The mesh pattern is transferred to the polymer layer by a plasma treatment. The conductive grid is then removed.
摘要翻译：本发明提供一种图案化聚合物表面的方法。在基板上形成聚合物层。具有网状图案的导电栅格放置在聚合物层上。通过等离子体处理将网状图案转移到聚合物层。然后去除导电栅格。

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