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    • 51. 发明申请
    • CHEMICAL PROCESS
    • 化学工艺
    • US20070055077A1
    • 2007-03-08
    • US11554076
    • 2006-10-30
    • Stephen BrownJames Muxworthy
    • Stephen BrownJames Muxworthy
    • C07C313/26
    • C07C201/08C07C303/40C07C311/51C07C205/59
    • A process for the preparation of a compound of general formula I: wherein: R1 is hydrogen or C1-C6 alkyl, C2-C6 alkenyl or C2-C6 alkynyl (any of which may optionally be substituted with one or more substituents selected from halogen and OH) or COOH, COH, COOR , COR6, CONR4R5 or CONHSO2R4; R4 and R5 are each independently hydrogen or C1-C4 alkyl optionally substituted with one or more halogen atoms; R6 is a halogen atom or a group R4; R2 is hydrogen or halo; R3 is C1-C4 alkyl, C2-C4 alkenyl or C2-C4 alkynyl, any of which may optionally be substituted with one or more halogen atoms, or halo; the process comprising reacting a compound of general formula II: wherein R1, R2 and R3 are as defined for general formula I; with a nitrating agent comprising nitric acid or a mixture of nitric and sulphuric acids in the presence of an organic solvent and in the presence of acetic anhydride, characterised in that the molar ratio of acetic anhydride to compound of general formula I is from about 1:1 to 3:1.
    • 制备通式I化合物的方法:其中:R 1是氢或C 1 -C 6烷基,C 1 -C 6烷基, 其中任何一个可以任选被一个或多个C 1 -C 6亚烷基取代, 选自卤素和OH的更多取代基)或COOH,COH,COOR,COR 6,CONR 4,R 5或CONHSO 2, / 4> 4 R 4和R 5各自独立地为氢或任选被一个或多个C 1 -C 4烷基取代的C 1 -C 4烷基 卤原子; R 6是卤素原子或基团R 4; R 2是氢或卤素; R 3是C 1 -C 4烷基,C 2 -C 4烷基,C 1 -C 4烷基,C 2 -C 4烷基, 烯基或C 2 -C 4炔基,其中任何一个可以任选被一个或多个卤素原子或卤素取代; 该方法包括使通式II化合物:其中R 1,R 2和R 3与通式I所定义的反应; 在硝酸和硝酸和硫酸的混合物的存在下,在有机溶剂存在下和在乙酸酐存在下,硝酸化剂的特征在于乙酸酐与通式I的化合物的摩尔比为约1: 1到3:1。
    • 53. 发明申请
    • Method of resistance management for transgenic crops
    • 转基因作物抗性管理方法
    • US20070011773A1
    • 2007-01-11
    • US10551894
    • 2004-03-03
    • Martin CloughAlan McCaffery
    • Martin CloughAlan McCaffery
    • A01H1/00A01H3/00
    • C12N15/8286A01N63/02C12N15/8279Y02A40/162A01N25/00A01N2300/00
    • The present invention provides a method for reducing the incidence of resistance of pests to pesticidal plants. In particular, there is provided a locus at which plant pests feed comprising at least two regions, characterised in that: a) a first region comprises plants which produce at least a first pesticidal toxin; and b) a second region comprises plants which produce at least a second pesticidal toxin; wherein a pest which can develop resistance to the first toxin does not develop resistance to the second toxin, and the first region comprises plants which produce the first toxin but not the second toxin when the plants of the second region produce the second toxin but not the first toxin. In one aspect of the invention, the plant pests are insects. The invention also provides a method for controlling insects.
    • 本发明提供了一种降低害虫对杀虫植物的抗性发生率的方法。 特别地,提供了一种植物害虫进入的场所,其包含至少两个区域,其特征在于:a)第一区域包括产生至少第一种杀虫毒素的植物; 和b)第二区域包括产生至少第二种杀虫毒素的植物; 其中可以产生对第一毒素的抗性的害虫不产生对第二毒素的抗性,并且第一区域包含产生第一毒素而不是第二毒素的植物,当第二区域的植物产生第二毒素而不是第二毒素时 第一毒素 在本发明的一个方面,植物害虫是昆虫。 本发明还提供了一种控制昆虫的方法。