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    • 61. 发明授权
    • Portable electronic device
    • 便携式电子设备
    • US09259182B2
    • 2016-02-16
    • US14518510
    • 2014-10-20
    • Seiko Instruments Inc.
    • Hideki OkudaDai TerasawaTeruo Kato
    • A61B5/0408A61B5/00A41D1/00A41D13/12A61B5/024A61B5/0245
    • A61B5/6804A41D1/002A41D13/1281A61B5/0006A61B5/02438A61B5/0245A61B5/0408A61B5/04085
    • To improve product lifetime as well as to increase wearing feeling, maintainability and productivity, and to suppress manufacturing costs and expenses of the user. A portable electronic device 10 includes a device body 20 arranged inside a garment W and housing an electronic component and a fixing member 30A formed separately from the device body 20 and arranged outside the garment W, which fixes the device body 20 so as to be attached and detached to and from the garment W in a state of sandwiching the garment W between the fixing member 30A and the device bogy 20 from the other side of the garment W. The fixing member 30A is formed so as to be elastically deformed, which is formed in a ring shape surrounding the device body 20. Gaps are provided on both sides of the device body 20 in the radial direction of the fixing member 30A between an inner peripheral surface of the fixing member 30A and the device body 20.
    • 提高产品寿命以及提高穿着感,可维护性和生产率,并且抑制使用者的制造成本和费用。 便携式电子装置10包括设置在衣服W内的装置主体20,并且容纳电子部件和与装置主体20分开形成的固定部件30A,并且配置在衣物W的外侧,固定装置主体20使其附着 并且在从服装W的另一侧将固定构件30A和装置转向架20夹在衣服W之间的状态下与衣服W分离。固定构件30A形成为弹性变形,即 形成为围绕装置主体20的环形形状。在固定构件30A的内周面和装置主体20之间,在固定构件30A的径向方向上在装置主体20的两侧设置间隙。
    • 62. 发明授权
    • Non-volatile semiconductor memory device
    • 非易失性半导体存储器件
    • US09252289B2
    • 2016-02-02
    • US13743485
    • 2013-01-17
    • Seiko Instruments Inc.
    • Ayako InoueKazuhiro Tsumura
    • H01L21/335H01L21/8232H01L29/788H01L49/02G11C16/04
    • H01L29/788G11C16/0408H01L28/20H01L29/7884
    • A non-volatile semiconductor memory device has a semiconductor substrate, an element isolation region disposed in a surface of the semiconductor substrate, a well region disposed along one principal surface of the semiconductor substrate, source and drain regions arranged in the well region, a gate oxide film arranged on the surface of the semiconductor substrate between the source region and the drain region, a floating gate disposed on the gate oxide film, and an insulating film disposed on a surface of the floating gate. A control gate is capacitively coupled to the floating gate disposed through intermediation of the insulating film. A resistive element is serially connected to the control gate. Write characteristics of the non-volatile semiconductor memory device are improved as a result of a delay effect of the resistive element serially connected to the control gate.
    • 非易失性半导体存储器件具有半导体衬底,设置在半导体衬底的表面中的元件隔离区,沿着半导体衬底的一个主表面设置的阱区,布置在阱区中的源极和漏极区,栅极 在所述源极区域和所述漏极区域之间配置在所述半导体衬底的表面上的氧化膜,设置在所述栅极氧化膜上的浮置栅极以及设置在所述浮动栅极的表面上的绝缘膜。 控制栅极电容耦合到通过绝缘膜布置的浮置栅极。 电阻元件串联连接到控制门。 作为串联连接到控制栅极的电阻元件的延迟效果,非易失性半导体存储器件的写入特性得到改善。
    • 64. 发明授权
    • Method of manufacturing a semiconductor device
    • 制造半导体器件的方法
    • US09231081B2
    • 2016-01-05
    • US13779860
    • 2013-02-28
    • Seiko Instruments Inc.
    • Naoto Saitoh
    • H01L21/76H01L29/66H01L29/417H01L29/78H01L29/06H01L29/10
    • H01L29/41741H01L29/0657H01L29/1095H01L29/41766H01L29/66727H01L29/66734H01L29/7809H01L29/7813
    • In a method of manufacturing a semiconductor device, a body region is formed in an epitaxial layer provided on a semiconductor substrate. A part of a semiconductor material forming the body region surface is removed to form a convex-type contact region protruding from the body region surface and to form a shallow trench surrounding the convex-type contact region. A deep trench region is formed so as to extend from the shallow trench surface to inside of the epitaxial layer. A gate insulating film is formed on an inner wall of the deep trench region which is filled with polycrystalline silicon that is held in contact with the gate insulating film. A source region and a body contact region are formed in the shallow trench and the convex-type contact region, respectively, and a silicide layer is formed to connect the source region and the body contact region to each other.
    • 在制造半导体器件的方法中,在设置在半导体衬底上的外延层中形成体区。 形成身体区域表面的半导体材料的一部分被去除以形成从身体区域表面突出的凸型接触区域,并形成围绕凸型接触区域的浅沟槽。 深沟槽区域形成为从浅沟槽表面延伸到外延层的内部。 栅极绝缘膜形成在深沟槽区域的内壁上,该沟槽区域被填充有与栅极绝缘膜保持接触的多晶硅。 分别在浅沟槽和凸型接触区域中形成源极区域和体接触区域,并且形成硅化物层以将源极区域和本体接触区域彼此连接。
    • 67. 发明授权
    • Information processing device and information processing program
    • 信息处理设备和信息处理程序
    • US09158937B2
    • 2015-10-13
    • US13985586
    • 2011-12-08
    • Shinichi Murao
    • Shinichi Murao
    • G06F21/64H04L9/32
    • G06F21/64H04L9/3247H04L2209/68
    • An information processing device manages the protection state of original data by long-term signature data in storage-target data obtained by combining the long-term signature data and the original data. Management information having a management-target value for each management item obtained from the storage-target data recorded therein is acquired. A management-target value of a predetermined management item is acquired from the acquired management information. The acquired management-target value is compared with a value acquired from the storage-target data or a value acquired from the outside to determine the state of management. A result corresponding to the determined state of management is outputted.
    • 信息处理装置通过组合长期签名数据和原始数据而获得的存储目标数据中的长期签名数据来管理原始数据的保护状态。 获取具有从其中记录的存储目标数据获得的每个管理项目的管理目标值的管理信息。 从所获取的管理信息中获取预定管理项目的管理目标值。 将获取的管理目标值与从存储目标数据获取的值或从外部获取的值进行比较以确定管理状态。 输出与确定的管理状态对应的结果。