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61. 发明授权

US08582860B2 Signet ring cell detector and related methods 有权
标题翻译： Signet环电池检测器及相关方法
公开(公告)号：US08582860B2
公开(公告)日：2013-11-12
申请号：US12496795
申请日：2009-07-02
申请人： Christopher Malon , Matthew L. Miller , Eric Cosatto
发明人： Christopher Malon , Matthew L. Miller , Eric Cosatto
IPC分类号： G06K9/62
CPC分类号： G06K9/00147 , G01N1/312 , G06T7/0012 , G06T2207/20061 , G06T2207/20081 , G06T2207/20084 , G06T2207/30024
摘要： A detector and method for automatically detecting signet ring cells in an image of a biopsy tissue sample, includes finding in the image, points about which cell membranes appear in radial symmetry; selecting as candidate points, at least ones of the points that have an adjacent nuclei with a predetermined shape feature; and applying a convolutional neural network to the candidate points to determine which of the candidate points are signet ring cells.
摘要翻译：用于在活检组织样本的图像中自动检测印戒细胞的检测器和方法包括在图像中发现关于哪个细胞膜呈径向对称的点; 选择候选点，具有具有预定形状特征的相邻核的点中的至少一个; 以及向所述候选点应用卷积神经网络，以确定所述候选点中的哪一个是所述环形蜂窝小区。

62. 发明授权

US08530393B2 Methods to characterize fracture plugging efficiency for drilling fluids 有权
$Methods to characterize fracture plugging efficiency for drilling fluids$
标题翻译：表征钻井液断裂堵塞效率的方法
公开(公告)号：US08530393B2
公开(公告)日：2013-09-10
申请号：US13150942
申请日：2011-06-01
申请人： Sandeep D. Kulkarni , Sharath Savari , Arunesh Kumar , Matthew L. Miller , Robert Murphy , Dale E. Jamison
发明人： Sandeep D. Kulkarni , Sharath Savari , Arunesh Kumar , Matthew L. Miller , Robert Murphy , Dale E. Jamison
IPC分类号： E21B21/00 , E21B43/22 , E21B43/26 , E21B33/00 , E21B33/13 , C09K8/32
CPC分类号： C09K8/04 , C09K8/32 , C09K2208/08 , C09K2208/18
摘要： Of the many compositions and methods provided herein, one method includes providing a drilling fluid comprising a base drilling fluid and a plurality of particulates, wherein the base drilling fluid without the particulates is characterized by N1(B) and wherein the base drilling fluid with the particulates is characterized by N1(A); and adjusting a concentration of the particulates in the drilling fluid by comparing the value of ΔN1(F) to ΔN1(P) so that ΔN1(F)≧ΔN1(P), wherein ΔN1(F)=|N1(A)|−|N1(B)|.
摘要翻译：在本文提供的许多组合物和方法中，一种方法包括提供包括基础钻井流体和多个颗粒的钻井流体，其中不具有颗粒的基础钻井流体的特征在于N1（B），并且其中基础钻井流体具有颗粒物的特征为N1（A）; 通过将DeltaN1（F）的值与DeltaN1（P）进行比较来调整钻井液中的微粒浓度，使得DeltaN1（F）> = DeltaN1（P），其中ΔN1（F）= | N1（A）| - | N1（B）|。

63. 发明授权

US08357264B2 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator 有权
标题翻译：等离子体反应器，通过源功率或偏置功率RF发生器的同步调制实现等离子体负载阻抗调谐
公开(公告)号：US08357264B2
公开(公告)日：2013-01-22
申请号：US12128963
申请日：2008-05-29
申请人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
发明人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01J37/32935 , H01J37/32091 , H01J37/32183
摘要： In a plasma reactor employing source and bias RF power generators, plasma is stabilized against an engineered transient in the output of either the source or bias power generator by a compensating modulation in the other generator.
摘要翻译：在采用源和偏压射频功率发生器的等离子体反应器中，等离子体通过在另一发生器中的补偿调制而在源极或偏置功率发生器的输出中的设计瞬态稳定。

64. 发明授权

US08337661B2 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator 有权
标题翻译：等离子体反应器，通过同步调制无与伦比的低功率射频发生器，实现等离子体负载阻抗调谐，实现工程瞬变
公开(公告)号：US08337661B2
公开(公告)日：2012-12-25
申请号：US12128926
申请日：2008-05-29
申请人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
发明人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： H01J37/32935 , H01J37/32091 , H01J37/32183
摘要： A plasma reactor for processing a workpiece such as a semiconductor wafer using predetermined transients of plasma bias power or plasma source power has unmatched low power RF generators synchronized to the transients to minimize transient-induced changes in plasma characteristics.
摘要翻译：使用等离子体偏置功率或等离子体源功率的预定瞬变来处理诸如半导体晶片的工件的等离子体反应器具有与瞬变同步的无与伦比的低功率RF发生器，以使等离子体特性的瞬变诱发变化最小化。

65. 发明授权

US08135202B2 Automated method and system for nuclear analysis of biopsy images 有权
标题翻译：活检图像的核分析自动化方法和系统
公开(公告)号：US08135202B2
公开(公告)日：2012-03-13
申请号：US12131346
申请日：2008-06-02
申请人： Eric Cosatto , Hans-Peter Graf , Matthew L. Miller
发明人： Eric Cosatto , Hans-Peter Graf , Matthew L. Miller
IPC分类号： G06K9/00
CPC分类号： G06T7/0012 , G06K9/00147 , G06T2207/10056 , G06T2207/20081 , G06T2207/20116 , G06T2207/30024
摘要： An automated method and system for analyzing a digital image of a biopsy to determine whether the biopsy is normal or abnormal, i.e., exhibits some type of disease such as, but not limited to, cancer. In the method and system, a classifier is trained to recognize well formed nuclei outlines from imperfect nuclei outlines in digital biopsy images. The trained classifier may then be used to filter nuclei outlines from one or more digital biopsy images to be analyzed, to obtain the well formed nuclei outlines. The well formed nuclei outlines may then be used to obtain statistics on the size or area of the nuclei for use in determining whether the biopsy is normal or abnormal.
摘要翻译：一种用于分析活组织检查的数字图像以确定活组织检查是正常还是异常的自动化方法和系统，即呈现某种类型的疾病，例如但不限于癌症。在该方法和系统中，训练分类器以识别数字活检图像中不完美核子轮廓的良好形成的细胞核轮廓。然后训练的分类器可用于从要分析的一个或多个数字活检图像中过滤细胞核轮廓，以获得良好形成的细胞核轮廓。然后可以使用良好形成的核轮廓来获得关于核的大小或面积的统计数据，以用于确定活检是否正常或异常。

66. 发明授权

US08123902B2 Gas flow diffuser 失效
标题翻译：气流扩散器
公开(公告)号：US08123902B2
公开(公告)日：2012-02-28
申请号：US11689031
申请日：2007-03-21
申请人： Paul Brillhart , Daniel J. Hoffman , James D. Carducci , Xiaoping Zhou , Matthew L. Miller
发明人： Paul Brillhart , Daniel J. Hoffman , James D. Carducci , Xiaoping Zhou , Matthew L. Miller
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： C23C16/45565 , C23C16/45502 , H01J37/3244 , H01J37/32449 , H01L21/67069 , Y10T137/85938
摘要： A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a chamber body having an interior volume, a substrate support disposed in the interior volume and a gas distribution assembly having an asymmetrical distribution of gas injection ports. In another embodiment, a method for vacuum processing a substrate is provided that includes disposing a substrate on a substrate support within in a processing chamber, flowing process gas into laterally into a space defined above a gas distribution plate positioned in the processing chamber over the substrate, and processing the substrate in the presence of the processing gas.
摘要翻译：提供了一种用于提供流入处理室的方法和装置。在一个实施例中，提供真空处理室，其包括具有内部容积的室主体，设置在内部容积中的基板支撑件和具有气体注入端口的不对称分布的气体分配组件。在另一个实施例中，提供了一种用于真空处理基板的方法，其包括将基板设置在处理室内的基板支撑件上，使处理气体横向流入位于位于处理室中的位于基板上的气体分配板上方的空间在处理气体的存在下处理基板。

67. 发明授权

US08018164B2 Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources 有权
标题翻译：等离子体电抗器采用高速等离子体负载阻抗调谐，调谐不同的不匹配频率源
公开(公告)号：US08018164B2
公开(公告)日：2011-09-13
申请号：US12129155
申请日：2008-05-29
申请人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
发明人： Steven C. Shannon , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
IPC分类号： H01J7/24
CPC分类号： H05H1/36 , H01J37/32082 , H01J37/32183 , H01J37/32935 , H05H1/46
摘要： Fluctuations in a plasma characteristic such as load impedance are compensated by a controller that modulates a stabilization RF generator coupled to the plasma having a frequency suitable for stabilizing the plasma characteristic, the controller being responsive to the fluctuations in the plasma characteristic.
摘要翻译：诸如负载阻抗的等离子体特性的波动由控制器补偿，该控制器调制耦合到具有适于稳定等离子体特性的频率的等离子体的稳定RF发生器，控制器响应于等离子体特性的波动。

68. 发明申请

US20110165347A1 DIELECTRIC FILM FORMATION USING INERT GAS EXCITATION 失效
标题翻译：使用入侵气体激励的电介质膜形成
公开(公告)号：US20110165347A1
公开(公告)日：2011-07-07
申请号：US12874886
申请日：2010-09-02
申请人： Matthew L. Miller , Jang-Gyoo Yang
发明人： Matthew L. Miller , Jang-Gyoo Yang
IPC分类号： H05H1/24
CPC分类号： H01L21/02222 , C23C16/045 , C23C16/345 , C23C16/452 , C23C16/56 , H01J37/32357 , H01J37/32449 , H01J2237/3327 , H01L21/02164 , H01L21/0217 , H01L21/02274 , H01L21/02326
摘要： Methods of forming a silicon-and-nitrogen-containing layers and silicon oxide layers are described. The methods include the steps of mixing a carbon-free silicon-containing precursor with plasma effluents, and depositing a silicon-and-nitrogen-containing layer on a substrate. The silicon-and-nitrogen-containing layers may be made flowable or conformal by selection of the flow rate of excited effluents from a remote plasma region into the substrate processing region. The plasma effluents are formed in a plasma by flowing inert gas(es) into the plasma. The silicon-and-nitrogen-containing layer may be converted to a silicon-and-oxygen-containing layer by curing and annealing the film.
摘要翻译：描述形成含硅和氮的层和氧化硅层的方法。所述方法包括将无碳含硅前体与等离子体流出物混合，以及在衬底上沉积含硅和氮的层的步骤。可以通过选择从远程等离子体区域到基板处理区域的激发流出物的流量来使含硅和氮的层可流动或共形。等离子体流出物通过将惰性气体流入等离子体而形成在等离子体中。通过固化和退火膜可以将含硅和氮的层转化为含硅和氧的层。

69. 发明授权

US07968469B2 Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity 有权
标题翻译：在具有可变高度接地返回路径的等离子体反应器中处理工件的方法以控制等离子体离子密度均匀性
公开(公告)号：US07968469B2
公开(公告)日：2011-06-28
申请号：US11733984
申请日：2007-04-11
申请人： Kenneth S. Collins , Hiroji Hanawa , Kartik Ramaswamy , Douglas A. Buchberger, Jr. , Shahid Rauf , Kallol Bera , Lawrence Wong , Walter R. Merry , Matthew L. Miller , Steven C. Shannon , Andrew Nguyen , James P. Cruse , James Carducci , Troy S. Detrick , Subhash Deshmukh , Jennifer Y. Sun
发明人： Kenneth S. Collins , Hiroji Hanawa , Kartik Ramaswamy , Douglas A. Buchberger, Jr. , Shahid Rauf , Kallol Bera , Lawrence Wong , Walter R. Merry , Matthew L. Miller , Steven C. Shannon , Andrew Nguyen , James P. Cruse , James Carducci , Troy S. Detrick , Subhash Deshmukh , Jennifer Y. Sun
IPC分类号： H01L21/302
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32165
摘要： A method for processing a workpiece in a plasma reactor chamber includes coupling RF power at a first VHF frequency f1 to a plasma via one of the electrodes of the chamber, and providing a center ground return path for RF current passing directly between the ceiling electrode and the workpiece support electrode for the frequency f1. The method further includes providing a variable height edge ground annular element and providing a ground return path through the edge ground annular element for the frequency f1. The method controls the uniformity of plasma ion density distribution by controlling the distance between the variable height edge ground annular element and one of: (a) height of ceiling electrode or (b) height of workpiece support electrode.
摘要翻译：用于在等离子体反应器室中处理工件的方法包括通过室的电极之一将RFF功率在第一VHF频率f1耦合到等离子体，并且提供用于RF电流的中心接地返回路径，其直接通过天花板电极和工件支撑电极为频率f1。该方法还包括提供可变高度边缘的地面环形元件，并为频率f1提供通过边缘接地环形元件的接地返回路径。该方法通过控制可变高度边缘接地环形元件之间的距离和（a）天花板电极的高度或（b）工件支撑电极的高度来控制等离子体离子密度分布的均匀性。

70. 发明授权

US07955986B2 Capacitively coupled plasma reactor with magnetic plasma control 有权
标题翻译：具有磁等离子体控制的电容耦合等离子体反应器
公开(公告)号：US07955986B2
公开(公告)日：2011-06-07
申请号：US11360944
申请日：2006-02-23
申请人： Daniel J. Hoffman , Matthew L. Miller , Jang Gyoo Yang , Heeyeop Chae , Michael Barnes , Tetsuya Ishikawa , Yan Ye
发明人： Daniel J. Hoffman , Matthew L. Miller , Jang Gyoo Yang , Heeyeop Chae , Michael Barnes , Tetsuya Ishikawa , Yan Ye
IPC分类号： H05H1/40 , C23C16/00 , C23C16/505 , C23C16/52 , H01L21/3065
CPC分类号： H01J37/32091 , H01J37/3244 , H01J37/32623 , H01J37/3266
摘要： A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
摘要翻译：等离子体反应器包括真空外壳，其包括限定真空室的侧壁和顶板，以及腔室内的工件支撑件，并面向天花板以支撑平面工件，工件支撑件和天花板一起限定了工件之间的加工区域支持和天花板。工艺气体入口将工艺气体提供到腔室中。等离子体源功率电极连接到RF功率发生器，用于将等离子体源功率电容耦合到腔室中，以在腔室内维持等离子体。反应器还包括至少第一架空螺线管电磁体，靠近天花板，架空螺线管电磁体，天花板，侧壁和工件支撑件沿着共同的对称轴线定位。电流源连接到第一螺线管电磁体并且在第一螺线管电磁体中提供第一电流，从而在腔室内产生与第一电流有关的磁场，第一电流具有使得磁场增加等离子体离子密度在工件支撑表面附近的对称轴的径向分布的均匀性。

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