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61. 发明授权

US09335277B2 Region-of-interest determination apparatus, observation tool or inspection tool, region-of-interest determination method, and observation method or inspection method using region-of-interest determination method 有权
标题翻译：感兴趣区域确定装置，观察工具或检查工具，感兴趣区域确定方法和使用区域确定方法的观察方法或检查方法
公开(公告)号：US09335277B2
公开(公告)日：2016-05-10
申请号：US14239653
申请日：2012-07-09
申请人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
发明人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
IPC分类号： G06K9/00 , G01N21/95 , G01N23/225 , H01L21/66
CPC分类号： G01N21/9501 , G01N23/2251 , G01N2223/6116 , H01L22/12
摘要： A region-of-interest determination apparatus includes: a calculation unit and a region determination unit. The calculation unit calculates a degree of a defect based on at least a plurality of kinds of defect attribute information regarding defect data. The defect data includes an image corresponding to a defect position detected on a specimen by inspection thereof or an image corresponding to a defect position predicted to be likely to develop a defect on the specimen, where both images are obtained by imaging. The region determination unit extracts the defect data of which the degree is higher than a predetermined level, and determines the region to be observed or inspected on the specimen based on the extracted defect data.
摘要翻译：感兴趣区域确定装置包括：计算单元和区域确定单元。计算单元基于关于缺陷数据的至少多种缺陷属性信息来计算缺陷程度。缺陷数据包括通过检查对应于在样本上检测到的缺陷位置的图像，或者与通过成像获得两个图像而被预测为可能发生样本上的缺陷的缺陷位置相对应的图像。区域确定单元提取程度高于预定水平的缺陷数据，并且基于提取的缺陷数据确定样本上要观察或检查的区域。

62. 发明授权

US09311697B2 Inspection method and device therefor 有权
标题翻译：检验方法及装置
公开(公告)号：US09311697B2
公开(公告)日：2016-04-12
申请号：US13639103
申请日：2011-04-01
申请人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai , Naoki Hosoya
发明人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai , Naoki Hosoya
IPC分类号： G06K9/00 , G06T7/00 , H01L21/66
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method of inspecting an object to be inspected in a semiconductor manufacturing process, for resolving the problem to increase defect detection sensitivity. An image capture means is used to image capture a designated area of the object to be inspected; a defect is detected in the captured image; a circuit pattern is recognized from the captured image; a characteristic value is computed, relating to an image tone and shape, from the detected defect; a characteristic value is computed, relating to the image tone and shape, from the recognized circuit pattern; either a specified defect or circuit pattern is filtered and extracted from the detected defect and the recognized circuit pattern; a mapping characteristic value is determined from the characteristic value of either the filtered and extracted specified defect or circuit pattern; and the distribution of the determined characteristic values is displayed onscreen in a map format.
摘要翻译：公开了一种在半导体制造过程中检查被检查物体的方法，用于解决问题以增加缺陷检测灵敏度。图像捕捉装置用于对要检查的对象的指定区域进行图像捕获; 在捕获的图像中检测到缺陷; 从捕获的图像识别电路图案; 从检测到的缺陷中计算与图像色调和形状相关的特征值; 根据识别的电路图案计算与图像色调和形状相关的特征值; 从检测到的缺陷和识别的电路图案中滤出并提取指定的缺陷或电路图案; 根据滤波和提取的指定缺陷或电路图案的特征值确定映射特征值; 并且以映射格式在屏幕上显示所确定的特征值的分布。

63. 发明授权

US09165356B2 Defect inspection method and defect inspection device 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US09165356B2
公开(公告)日：2015-10-20
申请号：US14238105
申请日：2012-07-06
申请人： Minoru Harada , Atsushi Miyamoto , Takehiro Hirai , Fumihiko Fukunaga
发明人： Minoru Harada , Atsushi Miyamoto , Takehiro Hirai , Fumihiko Fukunaga
IPC分类号： G06K9/00 , G06T7/00 , G01N21/956 , H01L21/66 , G01N21/95 , G01N21/88
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/956 , G01N2021/8861 , G01N2021/8867 , H01L22/12 , H01L22/20
摘要： A defect inspection method for inspecting a defect on a semiconductor wafer, using plural inspection methods includes: merging hot-spot coordinates as coordinates on the semiconductor wafer, designated by a user, or coordinates where a systematic defect can occur, with detected defect coordinates on the semiconductor wafer, acquired from inspection information, after information indicating the type of coordinates are added thereto; deciding an inspection sequence of the coordinates merged with each other; and defect inspection for executing selection using the information indicating the respective types of the coordinates merged with each other, and executing an inspection by selecting an inspection method for every coordinates to be inspected.
摘要翻译：使用多种检查方法检查半导体晶片上的缺陷的缺陷检查方法包括：将由用户指定的半导体晶片上的坐标作为坐标或者发生系统缺陷的坐标合并到检测到的缺陷坐标上从检查信息获取的半导体晶片在附加了表示坐标类型的信息之后; 决定彼此合并的坐标的检查顺序; 以及使用表示彼此合并的坐标的各种类型的信息来执行选择的缺陷检查，并且通过为每个被检查坐标选择检查方法来执行检查。

64. 发明申请

US20140219546A1 Method and Apparatus for Reviewing Defect 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20140219546A1
公开(公告)日：2014-08-07
申请号：US14347127
申请日：2012-07-06
申请人： Yohei Minekawa , Kenji Nakahira , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
发明人： Yohei Minekawa , Kenji Nakahira , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148
摘要： A method for reviewing defect, comprising the steps of: as an image acquisition step, imaging a surface of a sample using arbitrary image acquisition condition selected from a plurality of image acquisition conditions and obtaining a defect image; as a defect position calculation step, proceeding the defect image obtained by the image acquisition step and calculating a defect position on the surface of the sample; as a defect detection accuracy calculation step, obtaining a defect detection accuracy of the defect position calculated by the defect position calculation step; and as a conclusion determination step, determinating whether the defect detection accuracy obtained by the defect detection accuracy calculation step meets a predetermined requirement or not; wherein until it is determined that the defect detection accuracy obtained by the defect detection accuracy calculation step meets a predetermined in the conclusion determination step, the image acquisition condition is selected from the plurality of image acquisition conditions once again and the image acquisition step, the defect position calculation step, the defect detection accuracy calculation step and the conclusion determination step are repeated.
摘要翻译：一种检查缺陷的方法，包括以下步骤：作为图像获取步骤，使用从多个图像获取条件中选择的任意图像获取条件对样本的表面进行成像并获得缺陷图像; 作为缺陷位置计算步骤，进行通过图像获取步骤获得的缺陷图像，并计算样本表面上的缺陷位置; 作为缺陷检测精度计算步骤，获得由缺陷位置计算步骤计算的缺陷位置的缺陷检测精度; 以及作为结论确定步骤，确定由缺陷检测精度计算步骤获得的缺陷检测精度是否满足预定要求; 其中直到确定由缺陷检测精度计算步骤获得的缺陷检测精度在结论确定步骤中达到预定值时，再次从多个图像获取条件中选择图像获取条件，并且图像获取步骤，缺陷位置计算步骤，重复缺陷检测精度计算步骤和结论确定步骤。

65. 发明申请

US20140198975A1 REGION-OF-INTEREST DETERMINATION APPARATUS, OBSERVATION TOOL OR INSPECTION TOOL, REGION-OF-INTEREST DETERMINATION METHOD, AND OBSERVATION METHOD OR INSPECTION METHOD USING REGION-OF-INTEREST DETERMINATION METHOD 有权
标题翻译：利益区域确定装置，观察工具或检查工具，利益区域确定方法和使用区域确定方法的观察方法或检查方法
公开(公告)号：US20140198975A1
公开(公告)日：2014-07-17
申请号：US14239653
申请日：2012-07-09
申请人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
发明人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N23/2251 , G01N2223/6116 , H01L22/12
摘要： The present invention aims at efficiently determining the partial regions to be inspected with high sensitivity and measured with high accuracy.A region-of-interest determination apparatus includes: a calculation unit which calculates the incidence of a defect based on at least a plurality of kinds of defect attribute information regarding defect data, the defect data including an image corresponding to a defect position detected on a specimen by inspection thereof or an image corresponding to a defect position predicted to be likely to develop a defect on the specimen, both images being obtained by imaging; and a region determination unit which extracts the defect data of which the incidence is higher than a predetermined level, and determines the region to be observed or inspected on the specimen based on the extracted defect data.
摘要翻译：本发明旨在以高灵敏度有效地确定待检查的部分区域并以高精度测量。感兴趣区域确定装置包括：计算单元，其基于关于缺陷数据的至少多种缺陷属性信息来计算缺陷的发生率，所述缺陷数据包括与在通过检查检查样本或与被预测为可能在样本上产生缺陷的缺陷位置相对应的图像，两个图像通过成像获得; 以及区域确定单元，其提取入射高于预定水平的缺陷数据，并且基于所提取的缺陷数据来确定在样本上观察或检查的区域。

66. 发明授权

US08779360B2 Charged particle beam device, defect observation device, and management server 有权
标题翻译：带电粒子束装置，缺陷观察装置和管理服务器
公开(公告)号：US08779360B2
公开(公告)日：2014-07-15
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

67. 发明授权

US08526710B2 Defect review method and apparatus 有权
公开(公告)号：US08526710B2
公开(公告)日：2013-09-03
申请号：US12292173
申请日：2008-11-13
申请人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai
发明人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T7/0006 , G06T2207/10061 , G06T2207/30148
摘要： A candidate-defect classification method includes the steps of acquiring a scanning electron microscope (SEM) image of a candidate defect detected in an inspection from a sample including a pattern formed thereon, the inspection being preliminarily performed by an other inspection device; computing a feature value of the candidate defect by processing the SEM image; executing defect classification of the candidate defect as any one of a pattern shape defect and an other defect by using the computed feature value; acquiring positional information contained in design data of the pattern with respect to a candidate defect classified as the pattern shape defect; and extracting a systematic defect from among candidate defects classified as the pattern shape defects by performing a comparison of the positional information contained in the design data of the acquired candidate defect to positional information of a portion that has a high probability of causing a pattern formation failure and that has been obtained from the design data of the pattern, the systematic defect being caused due to a layout shape of the pattern, properties of a processor for forming the pattern, or the like.

68. 发明申请

US20130112893A1 CHARGED PARTICLE BEAM DEVICE, DEFECT OBSERVATION DEVICE, AND MANAGEMENT SERVER 有权
标题翻译：充电颗粒光束装置，缺陷观察装置和管理服务器
公开(公告)号：US20130112893A1
公开(公告)日：2013-05-09
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： G01N23/00
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

69. 发明申请

US20110029906A1 REPORT FORMAT SETTING METHOD AND APPARATUS, AND DEFECT REVIEW SYSTEM 有权
标题翻译：报告格式设置方法和装置，以及缺陷审查系统
公开(公告)号：US20110029906A1
公开(公告)日：2011-02-03
申请号：US12901954
申请日：2010-10-11
申请人： Takehiro HIRAI
发明人： Takehiro HIRAI
IPC分类号： G06F3/048
CPC分类号： G06F8/10
摘要： Generated is a template edition screen on which to display components of a report as modules by OSD by use of icons. One of the icons is selected by use of a pointing device including a mouse. By a drag-and-drop operation, the icon is placed at a desired position in an output format setup area formed in the same screen. The icon is set in a desired size by another drag-and-drop operation. Details of a module shown by the icon thus placed can be set up in a detail setup area in the same screen. Information on a format thus set up is retained as a template through a retention function, and accordingly can be used easily by simply calling the information. Moreover, the retained template can be edited as well. This makes it possible not only to create a new template, but also to modify an existing template.
摘要翻译：生成的是一个模板编辑屏幕，通过使用图标，通过OSD显示报告的组件作为模块。通过使用包括鼠标的指示设备来选择其中一个图标。通过拖放操作，将图标放置在同一屏幕中形成的输出格式设置区域中的所需位置。通过另一个拖放操作将图标设置为所需的大小。由此放置的图标所示的模块的细节可以在同一屏幕的详细设置区域中设置。关于通过保留功能将由此设置的格式的信息作为模板保留，因此可以通过简单地调用信息来容易地使用。此外，还可以编辑保留的模板。这样做不仅可以创建新的模板，还可以修改现有的模板。

70. 发明申请

US20100241386A1 Method of Correcting Coordinates, and Defect Review Apparatus 有权
标题翻译：校正坐标和缺陷检查仪的方法
公开(公告)号：US20100241386A1
公开(公告)日：2010-09-23
申请号：US12792795
申请日：2010-06-03
申请人： Takehiro HIRAI , Kazuo Aoki , Kumi Kaneko
发明人： Takehiro HIRAI , Kazuo Aoki , Kumi Kaneko
IPC分类号： G06F19/00
CPC分类号： G01R31/2884
摘要： The present invention provides a method of correcting coordinates so as to quickly and properly arrange a sample in a field of view in a review apparatus for moving a sample stage onto the specified coordinates to review the sample. A review apparatus according to the present invention, which is a review apparatus for moving a sample stage onto coordinates previously calculated by a checking apparatus to review the sample, has a function of retaining a plurality of coordinate correction tables to correct a deviation between a coordinate value previously calculated by a checking apparatus and an actual sample position detected by the review apparatus. The review apparatus evaluates correction accuracy of the plurality of coordinate correction tables and applies one of the coordinate correction tables with the maximum evaluation value.
摘要翻译：本发明提供了一种校正坐标的方法，以便在用于将样品台移动到特定坐标上以检查样品的检查装置中的视场中快速且适当地布置样品。根据本发明的检查装置，其是用于将样本台移动到由检查装置预先计算的坐标以检查样本的检查装置，具有保留多个坐标校正表以校正坐标的偏差的功能先前由检查装置计算的值和由检查装置检测到的实际样品位置。评估装置评估多个坐标校正表的校正精度，并且应用具有最大评估值的坐标校正表中的一个。

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