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1. 发明授权

US11619600B2 Surface analyzer 有权
公开(公告)号：US11619600B2
公开(公告)日：2023-04-04
申请号：US17407124
申请日：2021-08-19
申请人： Shimadzu Corporation
发明人： Akira Ogoshi , Takehiro Ishikawa
IPC分类号： G06K9/62 , G01N23/225 , G01N23/2251 , G01N23/2252
摘要： An object of the present invention is to improve the accuracy of clustering by avoiding detection of false clusters when automatically clustering points on a scatter diagram. A surface analyzer according to a first aspect of the present invention includes a measurement unit (1-2, 4-8) configured to acquire a signal reflecting a quantity of a plurality of components or elements that are analysis targets at a plurality of positions on a sample (3), a scatter diagram generation unit (92) configured to generate a binary scatter diagram based on a measurement result by the measurement unit, a clustering unit (94) configured to perform clustering of points in the binary scatter diagram using a method of a density-based clustering, and a parameter adjustment unit (93) configured to adjust a distance threshold by utilizing distribution information on a signal value of the components or the elements on either axis in the binary scatter diagram, the distance threshold being one of parameters to be set in the density-based clustering.

2. 发明授权

US11467084B2 Methods for polysilicon characterization 有权
公开(公告)号：US11467084B2
公开(公告)日：2022-10-11
申请号：US16706008
申请日：2019-12-06
申请人： YANGTZE MEMORY TECHNOLOGIES CO., LTD.
发明人： Junzhan Liu , Chao Shen , Zhiliang Xia , Qiangmin Wei , Lei Li , Hai Song , Bingguo Wang
IPC分类号： H01L21/02 , G01N23/04 , G01N21/31 , G01N21/95 , G01N23/225 , H01L21/66
摘要： Aspects of the disclosure provide methods for polysilicon characterization. The method includes receiving image data of a polysilicon structure formed on a sample substrate. The image data is in a spatial domain and is generated by transmission electron microscopy (TEM). Further, the method includes extracting frequency spectrum of the image data in a frequency domain. Then, the method includes selecting a subset of the frequency spectrum that corresponds to characteristic of first crystal grains that are of a first orientation, and transforming the selected subset of the frequency spectrum to the spatial domain to construct a first spatial image for the first crystal grains of the first orientation.

3. 发明申请

US20220260930A1 Pattern Measurement Device and Pattern Measurement Method 有权
公开(公告)号：US20220260930A1
公开(公告)日：2022-08-18
申请号：US17732969
申请日：2022-04-29
申请人： Hitachi High-Tech Corporation
发明人： Takuma Yamamoto , Hiroya Ohta , Kenji Tanimoto , Yusuke Abe , Tomohiro Tamori , Masaaki Nojiri
IPC分类号： G03F7/20 , G01B15/04 , G01N23/225
摘要： A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

4. 发明授权

US11110416B2 Device and apparatus for collecting microbial growth from a semi-solid surface 有权
公开(公告)号：US11110416B2
公开(公告)日：2021-09-07
申请号：US15564364
申请日：2016-04-08
申请人： BECTON DICKINSON AND COMPANY
发明人： Timothy Mark Wiles , Dwight Livingston , Jennifer Singelyn , William Alan Fox , Brian Reuben Langhoff , Vikram Patel , Sean Tucker , Ming-hsiung Yeh , Michael A. Brasch
IPC分类号： B01F13/08 , B01L3/00 , G01N23/225 , G01N1/02 , G01N35/10 , B01L3/02 , A61B10/02
摘要： A device for collecting a biological sample from a semi-solid surface. The device has a shaft with a proximate end and a distal end and a tip integrated with the shaft at the proximate end. The tip has a surface adapted to collect microorganisms thereon or release microorganism from, or both, wherein the adapted surface comprises at least one feature of a recess or extension to increase surface area of the tip and collect microorganisms thereon. Examples of such features include microfeatures with dimensions of about 1000 μm or less. Other examples include a pipette tip.

5. 发明授权

US11029148B2 Feed-forward of multi-layer and multi-process information using XPS and XRF technologies 有权
公开(公告)号：US11029148B2
公开(公告)日：2021-06-08
申请号：US16872568
申请日：2020-05-12
申请人： NOVA MEASURING INSTRUMENTS, INC.
发明人： Heath A. Pois , Wei Ti Lee , Lawrence V. Bot , Michael C. Kwan , Mark Klare , Charles Thomas Larson
IPC分类号： G01B15/02 , G01N23/2251 , G01N23/225 , G01N23/223 , G01N23/2273 , G01N23/22
摘要： Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technologies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. The first XPS and XRF intensity signals include information for the first layer and for the substrate. The method also involves determining a thickness of the first layer based on the first XPS and XRF intensity signals. The method also involves combining the information for the first layer and for the substrate to estimate an effective substrate. The method also involves measuring second XPS and XRF intensity signals for a sample having a second layer above the first layer above the substrate. The second XPS and XRF intensity signals include information for the second layer, for the first layer and for the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.

6. 发明授权

US10996147B2 Sample preparation method and sample preparing apparatus 有权
公开(公告)号：US10996147B2
公开(公告)日：2021-05-04
申请号：US16105092
申请日：2018-08-20
申请人： NIKON CORPORATION
发明人： Ichiro Sase
IPC分类号： G01N1/30 , G01N1/44 , G01N23/225 , G01N23/04 , H01J37/20 , G02B21/36 , G02B21/00 , G02B21/06 , G01N1/42 , C12M1/12 , G01N21/64
摘要： A sample preparation method includes: irradiating a first region of a sample with light at a time t1; irradiating a second region different from the first region with the tight at a time t2 after the time t1; and fixing the sample at a time t3 after the time t2. A sample preparing apparatus includes: a light radiating unit that irradiates a first region of a sample with light at time t1 and irradiates a second region different from the first region with the light at a time t2 after the time t1; and a fixing unit that fixes the sample at a time t3 after the time t2.

7. 发明申请

US20200370885A1 FEED-FORWARD OF MULTI-LAYER AND MULTI-PROCESS INFORMATION USING XPS AND XRF TECHNOLOGIES 审中-公开
公开(公告)号：US20200370885A1
公开(公告)日：2020-11-26
申请号：US16872568
申请日：2020-05-12
申请人： NOVA MEASURING INSTRUMENTS, INC.
发明人： Heath A. Pois , Wei Ti Lee , Lawrence V. Bot , Michael C. Kwan , Mark Klare , Charles Thomas Larson
IPC分类号： G01B15/02 , G01N23/2251 , G01N23/225 , G01N23/223 , G01N23/2273
摘要： Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technologies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. The first XPS and XRF intensity signals include information for the first layer and for the substrate. The method also involves determining a thickness of the first layer based on the first XPS and XRF intensity signals. The method also involves combining the information for the first layer and for the substrate to estimate an effective substrate. The method also involves measuring second XPS and XRF intensity signals for a sample having a second layer above the first layer above the substrate. The second XPS and XRF intensity signals include information for the second layer, for the first layer and for the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.

8. 发明授权

US10741359B2 Electron microscope and control method 有权
公开(公告)号：US10741359B2
公开(公告)日：2020-08-11
申请号：US15972744
申请日：2018-05-07
申请人： JEOL Ltd.
发明人： Akira Abe
IPC分类号： H01J37/28 , H01J37/147 , H01J37/22 , H01J37/252 , G01N23/225 , G06T7/00 , G06T7/136 , G06T7/11
摘要： An electron microscope includes: a display control unit which sequentially acquires electron microscope images of a sample and causes a display unit to display the electron microscope images as a live image; an analysis area setting unit which sets an analysis area on the sample based on a designated position on the live image designated by pointing means; and an analysis control unit which performs control for executing elemental analysis of the set analysis area. The analysis area setting unit sets, as the analysis area, an area on the sample which corresponds to a continuous area including the designated position and having brightness comparable to brightness of the designated position.

9. 发明授权

US10697038B2 Grain oriented electrical steel sheet, method for manufacturing grain oriented electrical steel sheets, method for evaluating grain oriented electrical steel sheets, and iron core 有权
公开(公告)号：US10697038B2
公开(公告)日：2020-06-30
申请号：US15514746
申请日：2015-09-11
申请人： JFE STEEL CORPORATION
发明人： Masayasu Nagoshi , Tomohiro Matsushima , Makoto Watanabe , Shigehiro Takajo , Toshito Takamiya , Masanori Uesaka , Takashi Terashima
IPC分类号： C21D9/46 , G01N21/62 , H01F1/18 , C21D8/12 , G01N23/225 , H01F1/16 , C22C38/02 , G01N23/2251 , H01F27/245 , H02K1/02 , H02K1/06
摘要： A grain oriented electrical steel sheet comprising a grain oriented electrical steel sheet having a surface and a forsterite film formed on the surface of the steel sheet, wherein a total area percentage of defective parts scattered on the forsterite film is less than 1.5% relative to a surface area of the forsterite film when viewed from above the surface, and methods for evaluating a grain oriented electrical steel sheet comprising a grain oriented electrical steel sheet having a surface and a forsterite film formed on the surface of the steel sheet.

10. 发明授权

US10663708B2 Correlation microscope 有权
公开(公告)号：US10663708B2
公开(公告)日：2020-05-26
申请号：US15765145
申请日：2016-09-30
申请人： NAKAMURA SANGYO GAKUEN , INTERNATIONAL SCIENCE TECHNOLOGY CO., LTD. , TCK INC.
发明人： Shinichiro Isobe , Takaaki Kanemaru , Shin-ichi Takasu , Koji Kosaka , Takashi Oe
IPC分类号： H01J37/20 , G01N23/00 , G02B21/26 , G01N23/225 , H01J37/16 , H01J37/22 , G02B21/36 , G06K9/62 , G06T7/33 , G06T7/73 , H01J37/18 , G02B21/18 , G01N23/2206 , G06T1/00 , G06K9/20
摘要： Coordinates of a first region extraction window, a first sample stage coordinate, a second sample stage coordinate, and a second region extraction window, including images of one sample stage and an observation target tissues of a sample when the one sample stage is respectively positioned on two microscopes are respectively obtained. Based on difference between the first sample stage coordinate and the second sample stage coordinate, the second sample stage coordinate is corrected. Based on the obtained corrected second sample stage coordinate, the second positioning unit is moved from the second non-observation position to the second observation position where the second region extraction window is located at a position corresponding to the coordinate position of the first region extraction window.

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