专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US6128208A Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US6128208A
公开(公告)日：2000-10-03
申请号：US401185
申请日：1999-09-23
申请人： Niichi Itoh , Yasunobu Nakase , Tetsuya Watanabe , Chikayoshi Morishima
发明人： Niichi Itoh , Yasunobu Nakase , Tetsuya Watanabe , Chikayoshi Morishima
IPC分类号： H01L27/10 , H01L21/8242 , H01L27/108 , G11C5/02
CPC分类号： H01L27/10844 , H01L27/10897
摘要： Provided is a semiconductor memory having a layout structure in which a memory cell has excellent patterning controllability. A pattern of element components (active regions 10 to 15 and 21 to 23 and polysilicon regions 31 to 42) of a memory cell for one memory cell unit of a memory cell array region 1 is identical to that of a dummy cell of a peripheral dummy cell region 3, and both patterns present a line symmetrical relationship with respect to a boundary line BC1. In addition, a pattern of the memory cell for one memory cell unit of the memory cell array region 1 is identical to that of a dummy cell of a power wiring region 2, and both patterns present a line symmetrical relationship with respect to a boundary line BC2.
摘要翻译：提供一种具有布局结构的半导体存储器，其中存储单元具有优异的图案化可控性。存储单元阵列区域1的一个存储单元单元的存储单元的元件部件（有源区域10至15和21至23以及多晶硅区域31至42）的图案与外围虚拟元件的虚设单元相同单元区域3，并且两个图案相对于边界线BC1呈现线对称关系。此外，存储单元阵列区域1的一个存储单元单元的存储单元的图案与电力布线区域2的虚设单元的图案相同，并且两个图案相对于边界线呈现线对称关系 BC2。

72. 发明授权

US6002989A System for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss value 失效
标题翻译：基于得出的频率函数和损失值，检查装置的检查频率被复位以最小化预期总损耗的质量控制系统
公开(公告)号：US6002989A
公开(公告)日：1999-12-14
申请号：US831298
申请日：1997-04-01
申请人： Masataka Shiba , Kenji Watanabe , Toshimitsu Hamada , Seiji Ishikawa , Naoki Go , Toshiaki Yachi , Tetsuya Watanabe , Takahiro Jingu
发明人： Masataka Shiba , Kenji Watanabe , Toshimitsu Hamada , Seiji Ishikawa , Naoki Go , Toshiaki Yachi , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/84 , B23Q41/08 , G05B19/418 , G06Q50/00 , G06Q50/04 , H01L21/66 , G06F15/18
CPC分类号： H01L22/20 , G05B19/41875 , H01L22/12 , H01L2924/0002 , Y02P90/14 , Y02P90/18 , Y02P90/22
摘要： Inspection apparatuses of an inspection apparatus group are connected to a network and transfer inspected result to a data collection system. The same wafer selected from a specific process is inspected by the different inspection apparatuses and the inspected data are collected and analyzed to calculate a correlation degree among the inspection apparatuses. On the other hand, the course of occurrence of failures in the same process can be analyzed to thereby calculate an average occurrence frequency of failures. An optimum inspection apparatus and inspection frequency are successively obtained on the basis of calculated results of an inter-apparatus correlation degree calculation process and a failure occurrence frequency calculation process, so that a feeding method of wafers to the inspection apparatus group is indicated through an inspection apparatus group management system. In the manufacturing of electronic components, complicated conditions such as the optimum inspection apparatus to be applied, the inspection frequency and the like can be set easily and the expected total loss value can be minimized to improve the economical efficiency of inspection remarkably.
摘要翻译：检查装置组的检查装置连接到网络并将检查结果传送到数据收集系统。通过不同的检查装置检查从具体处理中选出的相同的晶片，收集和分析检查数据，以计算检查装置之间的相关度。另一方面，可以分析相同处理中的故障发生的过程，从而计算故障的平均发生频率。基于设备间相关度计算处理和故障发生频率计算处理的计算结果连续获得最佳检查装置和检查频率，从而通过检查来指示晶片向检查装置组的馈送方法设备组管理系统。在电子部件的制造中，可以容易地设定诸如要应用的最佳检查装置等复杂的条件，并且可以将预期的总损失值最小化，从而提高检查的经济性。

73. 发明授权

US5959213A Semiconductor differential pressure measuring device 失效
标题翻译：半导体差压测量装置
公开(公告)号：US5959213A
公开(公告)日：1999-09-28
申请号：US891105
申请日：1997-07-10
申请人： Kyoichi Ikeda , Tetsuya Watanabe , Satoshi Fukuhara , Takashi Yoshida , Hideo Tsukamoto
发明人： Kyoichi Ikeda , Tetsuya Watanabe , Satoshi Fukuhara , Takashi Yoshida , Hideo Tsukamoto
IPC分类号： G01L9/00 , G01L9/06 , G01L13/02 , G01L19/04 , G01L9/04
CPC分类号： G01L13/025 , G01L15/00 , G01L9/0054 , G01L9/045
摘要： A semiconductor differential pressure measuring device comprising two measurement diaphragms and two detection sensors provided in a semiconductor substrate using micromachining techniques, and a computing circuit which computes the differences between the two sensor outputs, wherein a communicating hole is provided for applying pressure to each diaphragm so that the diaphragms operate in opposite phases by differential pressure, and two detecting sensors are provided on each diaphragm for detecting displacement or strain of each diaphragm caused by the differential pressure applied to the respective diaphragm, whereby detecting the differences in displacement or strain cancels the static pressure error and temperature error so that the invention has excellent temperature and static pressure characteristics, and whereby the computing circuit comprises a bridge using the two detecting sensors, which substantially reduces the cost of the device.
摘要翻译：一种半导体差压测量装置，包括使用微加工技术设置在半导体衬底中的两个测量膜片和两个检测传感器，以及计算电路，其计算两个传感器输出之间的差异，其中设置有用于向每个隔膜施加压力的连通孔膜片通过差压在相反的相位下工作，并且在每个隔膜上设置两个检测传感器，用于检测由施加到各个隔膜的差压引起的每个隔膜的位移或应变，由此检测位移或应变的差异消除了静态压力误差和温度误差，使得本发明具有优异的温度和静压特性，并且由此计算电路包括使用两个检测传感器的桥，这大大降低了装置的成本。

74. 发明授权

US5880828A Surface defect inspection device and shading correction method therefor 失效
标题翻译：表面缺陷检查装置及其阴影校正方法
公开(公告)号：US5880828A
公开(公告)日：1999-03-09
申请号：US898598
申请日：1997-07-22
申请人： Hisato Nakamura , Yoshio Morishige , Tetsuya Watanabe
发明人： Hisato Nakamura , Yoshio Morishige , Tetsuya Watanabe
IPC分类号： G01N21/94 , G01N21/00
CPC分类号： G01N21/94
摘要： A surface defect inspection device according to the present invention is provided with an average value calculating means in which an article corresponding to an object to be inspected having a multiplicity of substantially uniformly distributed standard particles deposited thereon is scanned in a main scanning direction as a defect inspection object, detection values of the standard particles at every detecting pixel are obtained based on detection signals obtained from an optical sensor at respective scanning positions while assuming the standard particles as being defects and average values of every detecting pixel with regard to the detection values obtained at the respective scanning positions are calculated, and a shading correction means in which detection values of every detecting pixel obtained when the object to be inspected is inspected are subjected to shading correction for every detecting pixel based on the calculated average values of every detecting pixel.
摘要翻译：根据本发明的表面缺陷检查装置设置有平均值计算装置，其中与主要扫描方向上扫描具有沉积在其上的多个大致均匀分布的标准颗粒的待检查对象的物品作为缺陷检测对象中，基于从各个扫描位置处的光学传感器获得的检测信号，将标准粒子作为缺陷而得到的各检测像素的标准粒子的检测值，以及所获取的检测值的每个检测像素的平均值计算各扫描位置，并且根据所计算出的每个检测像素的平均值，对检测对象物检测出的每个检测像素的检测值进行阴影校正，对每个检测像素进行阴影校正。

75. 发明授权

US5724132A Extraneous substance inspection apparatus for patterned wafer 失效
标题翻译：用于图案化晶片的外来物质检查装置
公开(公告)号：US5724132A
公开(公告)日：1998-03-03
申请号：US736582
申请日：1996-10-24
申请人： Yoshio Morishige , Hisato Nakamura , Tetsuya Watanabe
发明人： Yoshio Morishige , Hisato Nakamura , Tetsuya Watanabe
IPC分类号： G01R31/311 , H01L21/66 , G01N21/00
CPC分类号： G01R31/311 , H01L22/12
摘要： An extraneous substance inspection apparatus includes a level conversion circuit for converting a level of an extraneous substance detection signal obtained from a position in a first chip into one of multi-valued levels. A judging circuit determines the existence or absence of an extraneous substance by comparing a signal indicative of one of the multi-valued levels with another signal indicative of a converted level obtained by converting a detection signal detected at a similar position in another chip adjacent to the first chip.
摘要翻译：一种外来物质检查装置包括：电平转换电路，用于将从第一芯片中的位置获得的外来物质检测信号的电平转换为多值电平。判断电路通过将指示多值电平之一的信号与表示通过转换在与其相邻的另一芯片中的相似位置处检测到的检测信号而获得的转换电平的另一信号进行比较来确定外来物质的存在或不存在第一芯片

76. 发明授权

US5375473A Semiconductor type differential pressure measurement apparatus and method for manufacturing the same 失效
标题翻译：半导体型差压测量装置及其制造方法
公开(公告)号：US5375473A
公开(公告)日：1994-12-27
申请号：US110582
申请日：1993-08-24
申请人： Kyoichi Ikeda , Tetsuya Watanabe , Hideo Tsukamoto , Takahiro Kudo , Kouji Nagai , Satoshi Fukuhara
发明人： Kyoichi Ikeda , Tetsuya Watanabe , Hideo Tsukamoto , Takahiro Kudo , Kouji Nagai , Satoshi Fukuhara
IPC分类号： G01L9/00 , G01L19/06 , G01L9/04
CPC分类号： G01L19/0618 , G01L19/0636 , G01L9/0042 , G01L9/0055
摘要： A semiconductor type differential pressure measurement apparatus is disclosed comprising a measuring diaphragm having its periphery fixed, and two measuring chambers, each having a predetermined spacing along both surfaces of the measuring diaphragm, and which detects differential pressure within allowable limits of measurement. When an overpressure is applied, the diaphragm is stopped by a wall of a measuring chamber to prevent the diaphragm from being damaged by overpressure, so that no additional mechanism is required to prevent damage from overpressure. One embodiment utilizes an additional chamber and overhang to reduce overpressure. Another embodiment utilizes a measuring chamber having the two sides of the diaphragm exposed to the ambient to eliminate need for a pressure resistant casing. In a further embodiment, injected impurities serve as a terminal.
摘要翻译：本发明公开了一种半导体型差压测量装置，其包括其周边固定的测量膜片和两个测量室，每个测量室沿着测量膜片的两个表面具有预定的间隔，并且在允许的测量限度内检测差压。当施加过压时，隔膜被测量室的壁阻挡，以防止隔膜被过压损坏，因此不需要额外的机构来防止过压损坏。一个实施例利用附加的腔室和突出部来降低过压。另一个实施例使用具有暴露于环境的隔膜的两侧的测量室，以消除对耐压外壳的需要。在另一个实施方案中，注入的杂质用作终端。

77. 发明授权

US5167557A Method for manufacturing a shadow mask 失效
标题翻译：制造阴影面膜的方法
公开(公告)号：US5167557A
公开(公告)日：1992-12-01
申请号：US638818
申请日：1991-01-08
申请人： Hiroyuki Teramoto , Kimio Hashizume , Tetsuya Watanabe , Hideya Ito
发明人： Hiroyuki Teramoto , Kimio Hashizume , Tetsuya Watanabe , Hideya Ito
IPC分类号： C21D6/00 , C23C8/36 , C23C8/80 , H01J9/14 , H01J29/07
CPC分类号： C21D6/001 , C23C8/36 , C23C8/80 , H01J9/142
摘要： A method for manufacturing a shadow mask is used for color television picture tubes and the like. The surface of a shadow mask body, made of Fe-Ni type alloy, is ion-nitriding processed so as to make the most of the low thermal expansion property inherent in the alloy. The result is that the color purity degradation caused by the thermal expansion at temperature increases of the mask, and by the resonance of the mask itself, can be prevented, thereby realizing a shadow mask serving to render a highly refined CRT.
摘要翻译：用于制造荫罩的方法用于彩色电视显像管等。由Fe-Ni型合金制成的荫罩体的表面进行离子氮化处理，以充分发挥合金中固有的低热膨胀性能。其结果是，可以防止由于掩模温度升高引起的色纯度劣化，并且可以防止掩模本身的共振，从而实现用于形成高度精炼的CRT的荫罩。

78. 发明授权

US5123282A Vibrating type pressure measuring device 失效
标题翻译：振动式压力测量装置
公开(公告)号：US5123282A
公开(公告)日：1992-06-23
申请号：US694709
申请日：1991-05-02
申请人： Kyoichi Ikeda , Tetsuya Watanabe , Takahiro Kudo , Akio Fujita , Hideo Tsukamoto , Nobuaki Kohno , Hideaki Kuwayama
发明人： Kyoichi Ikeda , Tetsuya Watanabe , Takahiro Kudo , Akio Fujita , Hideo Tsukamoto , Nobuaki Kohno , Hideaki Kuwayama
IPC分类号： G01L9/00 , G01P15/08 , G01P15/097 , G01P15/10
CPC分类号： G01P15/097 , G01L9/0019 , G01P15/0802
摘要： A vibrating type pressure measuring device having good shock wave proof measuring characteristics, high frequency response, good temperature characteristics, and can be readily miniaturized, wherein pressure to be measured is applied to a silicon diaphragm provided in an internal vacant space of a housing, and a magnetic field is applied by a DC current magnetic field applying device to a vibrator beam arranged in the inside of the diaphragm, with a gap therebetween kept in vacuum, and fixed to the diaphragm at both ends, and detects the changes in natural frequency of the vibrator beam caused by the pressure to be measured. The diaphragm and/or vibrator beam are constructed so one or the other or both have rough or uneven surfaces so as to prevent any adhesion therebetween.
摘要翻译：一种振动式压力测量装置，具有良好的抗震波测量特性，高频响应，良好的温度特性，并且可以容易地小型化，其中待测量的压力被施加到设置在壳体的内部空闲空间中的硅膜片，以及通过直流电流磁场施加装置将磁场施加到布置在隔膜内部的振动子束，其间保持真空的间隙，并且固定在两端的隔膜上，并检测其自身频率的变化由测量的压力引起的振动器光束。隔膜和/或振动器梁被构造成一个或另一个或两者具有粗糙或不均匀的表面，以防止它们之间的任何粘附。

79. 再颁专利

USRE31236E Method of removing sulfur dioxide from combustion exhaust gas 失效
标题翻译：从燃烧废气中除去二氧化硫的方法
公开(公告)号：USRE31236E
公开(公告)日：1983-05-10
申请号：US136531
申请日：1980-04-02
申请人： Shigeru Saitoh , Tetsuya Watanabe , Koji Konno , Kunihide Yaguchi , Kenji Kodama , Tamostu Miyamori
发明人： Shigeru Saitoh , Tetsuya Watanabe , Koji Konno , Kunihide Yaguchi , Kenji Kodama , Tamostu Miyamori
IPC分类号： B01D53/50 , B01D53/77 , C01F11/46
CPC分类号： B01D53/501 , C01F11/464
摘要： A method of removing sulfur dioxide from combustion exhaust gas containing sulfur dioxide by contacting the exhaust gas with an aqueous solution containing at least one organic acid salt expressed by the formulaRCOOM(wherein R represents H, CH.sub.3, C.sub.2 H.sub.5 or C.sub.3 H.sub.7, and M represents an alkali metal or NH.sub.4) to efficiently dissolve sulfur dioxide contained in the gas in the form of a sulfite in the aqueous solution by reacting the sulfur dioxide with the salt. The resultant solution which dissolves the sulfite may be contacted with a calcium compound for producing calcium sulfite by reaction of the sulfite with the calcium compound thereby effectively removing the sulfur dioxide in the form of calcium sulfite from the combustion exhaust gas. Alternatively, the sulfite-dissolving aqueous solution may be contacted with oxygen or air for oxidizing the sulfite contained in the solution into a sulfate, followed by contacting the sulfate, which is now dissolved in the aqueous solution, with a calcium compound. The sulfate is satisfactorily reacted with the calcium compound to produce calcium sulfate and thus sulfur dioxide may be effectively ultimately removed in the form of calcium sulfate from the combustion exhaust gas.

80. 发明授权

US3987149A Method for removing sulfur dioxide from exhaust gas 失效
标题翻译：从排气中去除二氧化硫的方法
公开(公告)号：US3987149A
公开(公告)日：1976-10-19
申请号：US536166
申请日：1974-12-24
申请人： Shigeru Saitoh , Kenji Kodama , Tamotsu Miyamori , Tetsuya Watanabe , Koji Konno , Kunihide Yaguchi
发明人： Shigeru Saitoh , Kenji Kodama , Tamotsu Miyamori , Tetsuya Watanabe , Koji Konno , Kunihide Yaguchi
IPC分类号： B01D53/48 , B01D53/50 , B01D53/77 , C01F11/46 , C23F14/02 , C01B17/00
CPC分类号： B01D53/507 , B01D53/48
摘要： A sulfur dioxide-containing exhaust gas is scrubbed by contact with an aqueous solution containing an alkali salt of an organic acid to dissolve sulfur dioxide in the aqueous solution in the form of alkali sulfite. The alkali sulfite in the solution is converted by oxidation into alkali sulfate, which is contacted for reaction with a calcium compound to form calcium sulfate. The calcium sulfate so formed is separated by filtration from the aqueous solution for recovery while the filtrate is recycled for use as the aqueous solution for scrubbing the exhaust gas. The concentration of alkali sulfite in the scrubbing aqueous solution is maintained at a level of less than 1% to ensure efficient removal of sulfur dioxide from the exhaust gas in the form of calcium sulfate.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式