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71. 发明授权

US4576679A Method of fabricating a cold shield 失效
标题翻译：制冷挡板的方法
公开(公告)号：US4576679A
公开(公告)日：1986-03-18
申请号：US668681
申请日：1984-11-05
申请人： William J. White
发明人： William J. White
IPC分类号： H01L27/14 , H01L31/0216 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： H01L27/14 , H01L31/02162
摘要： A shield for limiting the radiation received by individual detectors within a detector array of an electromagnetic radiation detection system to the radiation provided to the detectors by the optics of the system. The shield comprises a member of etchable glass having apertures formed therein, the position of the aperture edges being in predetermined relation to the edges of the detectors for shielding the detectors from electromagnetic radiation generated outside the field of view of the optics.
摘要翻译：用于将由电磁辐射检测系统的检测器阵列内的各个检测器接收的辐射限制到由系统的光学器件提供给检测器的辐射的屏蔽。屏蔽件包括具有形成在其中的孔的可蚀刻玻璃的构件，孔边缘的位置与检测器的边缘成预定关系，用于屏蔽检测器免受在光学器件视场外产生的电磁辐射。

72. 发明授权

US4576677A Method and apparatus for regenerating an ammoniacal etching solution 失效
标题翻译：用于再生氨蚀刻溶液的方法和装置
公开(公告)号：US4576677A
公开(公告)日：1986-03-18
申请号：US598087
申请日：1984-04-09
申请人： Wolfgang Faul , Leander Furst , Walter Holzer , Bertel Kastening
发明人： Wolfgang Faul , Leander Furst , Walter Holzer , Bertel Kastening
IPC分类号： C23F1/46 , C23F1/00 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： C23F1/46
摘要： Ammoniacal etching solution containing metal ions as the result of etching is withdrawn from an etching bath and while part of it goes to an electrolysis cell for removal of metal ion, the remainder goes back to the etching bath through a liquid jet pump in which it serves as the working liquid, while the pump sucks in from the electrolysis cell the anodically evolved oxygen. The thorough mixing of the oxygen into the etching solution performed by the pump results in oxidation so rapid that in many cases it becomes unnecessary to suspend catalyst particles in the electrolyte to accelerate the oxidative regeneration of the etching solution. Where use of such particles is still desired, the solution drawn from the etching bath goes through a cylindrical filter unit from which a filtrate is drawn off laterally for the electrolysis cell, while the remainder of the input goes to the jet pump. Controls are provided for using the electrolysis cell only when the metal ion concentration is above a predetermined value, for adding ammonia to the oxygen line in order to maintain a particular value of pH and for controlling the temperature of the electrolyte in the electrolysis cell in order that a desired quantity of water can be condensed from the oxygen line for use in rinsing the work pieces after they are taken out of the etching bath.
摘要翻译：作为蚀刻结果含有金属离子的氨蚀刻溶液从蚀刻浴中取出，并且其一部分进入用于去除金属离子的电解槽，其余部分通过液体喷射泵返回到蚀刻槽作为工作液体，当泵从电解槽吸入阳极放出的氧气。将氧气彻底混合到由泵执行的蚀刻溶液中导致氧化如此快速，使得在许多情况下不需要将催化剂颗粒悬浮在电解质中以加速蚀刻溶液的氧化再生。在仍然需要使用这种颗粒的情况下，从蚀刻浴中抽出的溶液通过圆柱形过滤器单元，其中滤液被横向排出用于电解池，而剩余的输入进入喷射泵。提供了仅当金属离子浓度高于预定值时才使用电解池的控制，以便为了保持特定的pH值和为了控制电解槽中的电解质的温度按顺序向氧线添加氨可以从工作片从蚀刻槽中取出所需量的水从氧气线上冷凝，以用于冲洗工件。

73. 发明授权

US4575402A Method for fabricating conductors in integrated circuits 失效
标题翻译：在集成电路中制造导体的方法
公开(公告)号：US4575402A
公开(公告)日：1986-03-11
申请号：US701270
申请日：1985-02-13
申请人： Paul J. Marcoux , Eileen M. Murray , Hugh R. Grinolds
发明人： Paul J. Marcoux , Eileen M. Murray , Hugh R. Grinolds
IPC分类号： H01L21/3205 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/338 , B44C1/22 , C03C13/00 , C03C25/06 , C23F1/02
CPC分类号： H01L29/66863 , H01L21/0271 , Y10S438/951
摘要： A technique of patterning a conductive layer for interconnections in integrated circuits is disclosed. The technique enables fine line conductors to be fabricated. In accordance with the invention, a pattern for the conductors is etched into the surface of a substrate through the use of a patterned photoresist layer. The conductive layer is then deposited over the photoresist layer and into the pattern etched into the substrate surface. In intervening steps, only the portions of the conductive layer outside the depression of the pattern in the surface are removed; the portions of the conductive layer within the depression remains intact to provide the pattern of fine line conductors desired.
摘要翻译：公开了在集成电路中图形化用于互连的导电层的技术。该技术可以制造细线导体。根据本发明，通过使用图案化的光致抗蚀剂层，将导体的图案蚀刻到衬底的表面中。然后将导电层沉积在光致抗蚀剂层上并进入蚀刻到衬底表面中的图案中。在介入步骤中，除去表面上图案凹陷外的导电层的部分; 凹陷内的导电层的部分保持完整，以提供所需的细线导体的图案。

74. 发明授权

US4569721A Method for the production of semiconductor lasers 失效
标题翻译：半导体激光器的制造方法
公开(公告)号：US4569721A
公开(公告)日：1986-02-11
申请号：US644437
申请日：1984-08-27
申请人： Toshiro Hayakawa , Nobuyuki Miyauchi , Seiki Yano , Takahiro Suyama
发明人： Toshiro Hayakawa , Nobuyuki Miyauchi , Seiki Yano , Takahiro Suyama
IPC分类号： H01S5/00 , H01S5/223 , H01S5/34 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： B82Y20/00 , H01S5/2232 , H01S5/34 , H01S5/2235
摘要： A method for the production of semiconductor lasers comprising: (a) forming a substrate having a striped portion on its face, said striped portion being formed into a mesa, (b) forming a current blocking layer on each of said striped portion and the remaining face of said substrate, (c) eliminating said current blocking layer only on said striped portion thereby allowing electric current to flow through the substrate and form said striped portion into a terrace or a groove, as a whole, and (d) successively laminating crystal growth layers for laser operation on the whole face of the substrate in strict conformity with said terrace or groove on the face of said substrate, thereby attaining stabilization of the transverse mode of laser oscillation.
摘要翻译：一种制造半导体激光器的方法，包括：（a）在其表面上形成具有条纹部分的基底，所述条纹部分形成台面，（b）在所述条纹部分和剩余部分中形成电流阻挡层（c）仅在所述条纹部分上消除所述电流阻挡层，从而允许电流流过基板，并将所述条纹部分整体形成为平台或槽，以及（d）依次层压晶体在基板的整个表面上激光操作的生长层严格地与所述基板的表面上的所述台面或凹槽相一致，从而实现激光振荡的横向模式的稳定。

75. 发明授权

US4566939A Surface preparation of nickel base alloys for brazing 失效
标题翻译：用于钎焊的镍基合金的表面处理
公开(公告)号：US4566939A
公开(公告)日：1986-01-28
申请号：US694863
申请日：1985-01-25
申请人： Jule A. Miller , Jack W. Lee , Jeffrey Thyssen
发明人： Jule A. Miller , Jack W. Lee , Jeffrey Thyssen
IPC分类号： B23K1/19 , B23K1/20 , B23K35/00 , C23C8/12 , C23G1/19 , C23G1/32 , C25F1/04 , C25F1/12 , B44C1/22 , C03C15/00 , C03C25/06 , C23F1/00
CPC分类号： B23K1/206 , B23K35/004 , C23C8/12 , C23G1/19 , C23G1/32 , C25F1/04 , C25F1/12
摘要： A method is disclosed for the removal of undesirable oxides from the surface of nickel-base or nickel-iron base alloys containing oxidizable aluminum and/or titanium prior to brazing. The alloy is heated in air at an elevated temperature for a time sufficient to form on the alloy surface a bilayered film comprised of a first oxide top layer containing at least titanium or aluminum and a second layer beneath the first comprised of the alloy composition substantially depleted of aluminum and/or titanium. The surface of the alloy is cleaned to remove the first oxide layer whereupon the remaining surface is in condition for brazing.
摘要翻译：公开了一种用于在钎焊之前从含有可氧化铝和/或钛的镍基或镍 - 铁基合金的表面去除不需要的氧化物的方法。该合金在空气中在升高的温度下加热一段足以在合金表面上形成的双层膜，该双层膜包含至少含有钛或铝的第一氧化物顶层和在第一层下面的第二层，该第二层由合金组合物基本上不含的铝和/或钛。清洁合金的表面以除去第一氧化物层，然后剩余表面处于钎焊状态。

76. 发明授权

US4564417A Method of manufacturing an optical coupling device 失效
标题翻译：制造光耦合装置的方法
公开(公告)号：US4564417A
公开(公告)日：1986-01-14
申请号：US538964
申请日：1983-10-04
申请人： Josef Schoen , Rudolf Hoffmann
发明人： Josef Schoen , Rudolf Hoffmann
IPC分类号： G02B6/26 , C03C25/10 , C03C25/68 , G02B6/04 , G02B6/40 , G02B6/44 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： C03C25/68 , G02B6/403
摘要： A method of forming an optical coupling device having plug pins received in a sleeve with one of the plug pins supporting a single waveguide and the other plug pin supporting a bundle of optical waveguides, characterized by providing the waveguides, etching the waveguides to form an end zone of a thin thickness connecting by a tapering transition zone having increasing thickness to the original cladding thickness of the optical waveguides, assembling the waveguides in an optical bundle with the end zones being arranged with the smallest spacing therebetween. Preferably, each of the plug pins has a bore with a small portion adjacent the end of the pin which corresponds to the diameter of the end zones of the bundle of waveguides.
摘要翻译：一种形成具有插头销的光耦合装置的方法，所述插头销接收在套筒中，其中一个插头插脚支撑单个波导，另一个插头支撑一束光波导，其特征在于提供波导，蚀刻波导以形成端部通过具有增加的厚度的锥形过渡区域与光波导的原始包层厚度连接的薄厚度的区域，将波导组装在光束中，端部区域以最小的间隔布置。优选地，每个插头销具有孔，其邻近销的端部具有小的部分，其对应于波导束的端部区域的直径。

77. 发明授权

US4555302A Method and apparatus for ultrasonic etching of printing plates 失效
标题翻译：印版超声波蚀刻的方法和装置
公开(公告)号：US4555302A
公开(公告)日：1985-11-26
申请号：US644177
申请日：1984-08-24
申请人： John C. Urbanik
发明人： John C. Urbanik
IPC分类号： G03F7/30 , B44C1/22 , B41C1/00 , C03C15/00 , C03C25/06
CPC分类号： G03F7/3014
摘要： Method and apparatus for etching light-sensitive photopolymerizable surfaces of printing plates. The apparatus includes a bath of etching fluid (32), a conveyor (38,40,42,52) for conveying printing plates (10) in a prescribed path (54), and transducers (46) mounted above the plates as they are conveyed within the bath and capable of forming longitudinal waves in the etching fluid at generally right angles to the surface of the printing plates. The invention is characterized by directing cleaning fluid between the acoustical radiating surface of the transducers (46) and the surface of the plates (10) in such a manner that the surface to be etched is swept with cleaning fluid of a sufficient velocity and volume as to prevent substantial cavitational erosion of the surface to be etched.
摘要翻译：用于蚀刻印版的光敏光聚合表面的方法和装置。该设备包括蚀刻流体浴（32），用于在规定路径（54）中传送印版（10）的传送器（38,40,42,52）以及安装在板上方的换能器（46）在洗涤槽内传送并且能够在蚀刻流体中形成与印版的表面大致成直角的纵波。本发明的特征在于将清洁流体引导在换能器（46）的声学辐射表面和板（10）的表面之间，使得待蚀刻的表面用足够的速度和体积的清洗流体扫掠以防止待蚀刻表面的大量气蚀。

78. 发明授权

US4544444A Reactive ion etching of tin oxide films using silicon tetrachloride reactant gas 失效
标题翻译：使用四氯化硅反应气体对氧化锡膜进行反应离子蚀刻
公开(公告)号：US4544444A
公开(公告)日：1985-10-01
申请号：US640938
申请日：1984-08-15
申请人： Shih-Chia Chang
发明人： Shih-Chia Chang
IPC分类号： C04B41/53 , C04B41/91 , H01L31/18 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： C04B41/009 , C04B41/5346 , C04B41/91 , H01L31/1884 , Y02E10/50
摘要： High resolution patterns can be etched in tin oxide films in one step using reactive ion etching when the reactant gas consists essentially of silicon tetrachloride (SiCl.sub.4).
摘要翻译：当反应物气体基本上由四氯化硅（SiCl 4）组成时，可以使用反应离子蚀刻在一个步骤中在氧化锡膜中蚀刻高分辨率图案。

79. 发明授权

US4539070A Exposure of photo resist 失效
标题翻译：曝光抗蚀剂
公开(公告)号：US4539070A
公开(公告)日：1985-09-03
申请号：US563837
申请日：1983-12-21
申请人： Richard Jarocinski , William R. Keaton , Joseph L. Magennis
发明人： Richard Jarocinski , William R. Keaton , Joseph L. Magennis
IPC分类号： G03F1/48 , G03F1/62 , G03F7/20 , H05K3/00 , C23F1/02 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： G03F1/62 , G03F1/48 , G03F7/2008 , G03F7/70583 , H05K3/0082
摘要： A method and apparatus for limiting the interference caused by shadows of minute particles of opaque matter that settles on the surface of an assembly of a metal substrate, a resist and an overlay by placing a second glass overlay on top of the assembly to raise the surface to a level where the shadows of any particles resting there will be diffused.
摘要翻译：一种用于限制由不透明物质的微小颗粒的阴影引起的干扰的方法和装置，其通过将第二玻璃覆盖物放置在组件的顶部上而沉积在金属基底，抗蚀剂和覆盖层的组件的表面上，以使表面到一个水平，任何在这里的颗粒的阴影将被扩散。

80. 发明授权

US4536250A Method of making liquid jet recording head 失效
标题翻译：制造液体喷射记录头的方法
公开(公告)号：US4536250A
公开(公告)日：1985-08-20
申请号：US600150
申请日：1984-04-13
申请人： Masami Ikeda , Hiroto Matsuda , Makoto Shibata , Hiroto Takahashi
发明人： Masami Ikeda , Hiroto Matsuda , Makoto Shibata , Hiroto Takahashi
IPC分类号： B41J2/05 , B41J2/16 , H05B3/10 , H05K3/06 , C23F1/02 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： H05K3/064 , B41J2/1603 , B41J2/1604 , B41J2/1628 , B41J2/1629 , B41J2/1631 , H05B3/10 , H05K2203/0577 , H05K2203/1476
摘要： A method of making a liquid jet recording head having a liquid discharge section including orifice means for discharging the liquid to form flying droplets thereof and liquid passage means communicating with said orifice means and having a thermally acting portion for causing a thermal energy to act on the liquid to form the liquid droplets, and electro-thermal converting means including a heat generating resistive layer on a substrate, at least one pair of opposed electrodes electrically connected with said heat generating resistive layer and a heat generating part between said electrodes, which method comprises the steps of forming the electrodes and heat generating portion through at least first and second etching processes, a photoresist pattern formed by the first etching process having a width smaller than those of photoresist patterns formed by the second and successive etching processes.
摘要翻译：一种具有液体喷射记录头的方法，该液体喷射部分包括用于排出液体以形成其飞沫的孔口装置和与所述孔口装置连通并具有热作用部分的液体通道装置，该热作用部分用于使热能作用在液体以形成液滴;以及电热转换装置，其包括在基板上的发热电阻层，与所述发热电阻层电连接的至少一对相对电极和所述电极之间的发热部分，所述方法包括通过至少第一和第二蚀刻工艺形成电极和发热部分的步骤，通过第一蚀刻工艺形成的光刻胶图案的宽度小于通过第二次和连续蚀刻工艺形成的光致抗蚀剂图案的宽度。

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