专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US11087956B2 Detection systems in semiconductor metrology tools 有权
公开(公告)号：US11087956B2
公开(公告)日：2021-08-10
申请号：US16453767
申请日：2019-06-26
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Shih-Wei Hung , Jang Jung Lee
IPC分类号： H01J37/244 , H01J37/147 , H01L21/67 , H01L21/66 , G01Q60/40
摘要： A semiconductor metrology tool for analyzing a sample is disclosed. The semiconductor metrology tool includes a particle generation system, a local electrode, a particle capture device, a position detector, and a processor. The particle generation system is configured to remove a particle from a sample. The local electrode is configured to produce an attractive electric field and to direct the removed particle towards an aperture of the local electrode. The particle capture device is configured to produce a repulsive electric field around a region between the sample and the local electrode and to repel the removed particle towards the aperture. The position detector is configured to determine two-dimensional position coordinates of the removed particle and a flight time of the removed particle. The processor is configured to identify the removed particle based on the flight time.

82. 发明授权

US11087955B2 System combination of a particle beam system and a light-optical system with collinear beam guidance, and use of the system combination 有权
公开(公告)号：US11087955B2
公开(公告)日：2021-08-10
申请号：US16939706
申请日：2020-07-27
申请人： Carl Zeiss MultiSEM GmbH
发明人： Dirk Zeidler , Michael Schall , Joerg Jacobi , Michel Le Maire
IPC分类号： H01J37/22 , H01J37/10 , H01J37/147 , H01J37/244 , H01J37/28
摘要： A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

83. 发明申请

US20210233739A1 Charged Particle Beam Apparatus and Adjustment Method for Charged Particle Beam Apparatus 有权
公开(公告)号：US20210233739A1
公开(公告)日：2021-07-29
申请号：US17155308
申请日：2021-01-22
申请人： JEOL Ltd.
发明人： Kazuya Yamazaki
IPC分类号： H01J37/20 , H01J37/18 , H01J37/28 , H01J37/244 , H01J37/26
摘要： A charged particle apparatus includes: a specimen chamber which is maintained at vacuum and in which a specimen is disposed; a preliminary exhaust chamber that is connected to the specimen chamber via a vacuum gate valve; an exhaust device that exhausts the preliminary exhaust chamber; charged particle beam source an optical system; a detector; a transporting device that transports the specimen from the preliminary exhaust chamber to the specimen chamber; and a control unit. The control unit performs: adjustment processing in which at least one of the optical system and the detector is adjusted in a state where the specimen is housed in the preliminary exhaust chamber; and transporting processing which is performed after the adjustment processing and in which the vacuum gate valve is opened and the transporting device transports the specimen to the specimen chamber.

84. 发明授权

US11075056B2 Scanning electron microscope objective lens system and method for specimen observation 有权
公开(公告)号：US11075056B2
公开(公告)日：2021-07-27
申请号：US15779763
申请日：2018-05-02
申请人： Focus-eBeam Technology (Beijing) Co., Ltd.
发明人： Shuai Li , Wei He
IPC分类号： H01J37/28 , H01J37/244 , H01J37/145
摘要： A scanning electron microscope objective lens system is disclosed, which includes: a magnetic lens, a deflection device, a deflection control electrode, specimen to be observed, and a detection device; in which, The opening of the pole piece of the magnetic lens faces to the specimen; the deflection device is located in the magnetic lens, which includes at least one sub-deflector; the deflection control electrode is located between the detection device and the specimen, and the deflection control electrode is used to change the direction of the primary electron beam and the signal electrons generating from the specimen; the detection device comprises the first sub-detector for detecting the back-scattered electrons and the second sub-detector for detecting the second electrons. A specimen detection method is also disclosed.

85. 发明申请

US20210225608A1 ELECTRONIC MICROSCOPE DEVICE 有权
公开(公告)号：US20210225608A1
公开(公告)日：2021-07-22
申请号：US15734367
申请日：2018-06-14
申请人： HITACHI HIGH-TECH CORPORATION
发明人： Takahiro NISHIHATA , Mayuka OSAKI , Wei SUN , Takuma YAMAMOTO
IPC分类号： H01J37/21 , H01J37/22 , H01J37/244
摘要： In the present invention, an electro-optical condition generation unit includes: a condition setting unit that sets, as a plurality of electro-optical conditions, a plurality of electro-optical conditions in which the combinations of the aperture angle and the focal-point height for an electron beam are different; an index calculating unit that determines a measurement-performance index in the electro-optical conditions set by the condition setting unit; and a condition deriving unit that derives an electro-optical condition, including an aperture angle and a focal-point height, so that the measurement-performance index determined by the index calculating unit becomes a prescribed value.

86. 发明申请

US20210208290A1 PHOTODETECTOR CONFIGURATIONS 有权
公开(公告)号：US20210208290A1
公开(公告)日：2021-07-08
申请号：US16732573
申请日：2020-01-02
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Pavel Margulis
IPC分类号： G01T1/17 , G01T1/20 , H01J37/244 , H01J37/28
摘要： A device and method for detecting radiation comprising: a radiation-sensitive surface composed of an array of electrically inter-isolated radiation-sensitive elements (e.g. avalanche photodiode (APD), PIN diode, or scintillation sensor), each radiation-sensitive element is adapted to generate an electric current in response to absorbing radiation; an array of conversion circuits, each conversion circuit electrically coupled to a respective radiation-sensitive element and configured to generate an output signal indicative of the current generated by the radiation-sensitive element coupled thereto; and one or more summation arrangements, each summation arrangement coupled to a respective group of the conversion circuits, and configured to produce a summation result indicative of the radiation absorbed by respective group of the conversion circuits. The radiation-sensitive surface may be shaped as a dome-shape surface. The radiation-sensitive elements may be associated with radiation-sensitive planes such that all of the radiation-sensitive elements are directed toward a focal point on an inspected surface.

87. 发明授权

US11051771B2 Stationary intraoral tomosynthesis imaging systems, methods, and computer readable media for three dimensional dental imaging 有权
公开(公告)号：US11051771B2
公开(公告)日：2021-07-06
申请号：US15423743
申请日：2017-02-03
申请人： Xintek, Inc.
发明人： Jianping Lu , Otto Z. Zhou , Andrew Tucker , Jing Shan , Brian Gonzales
IPC分类号： A61B6/14 , A61B6/06 , A61B6/00 , H01J37/244 , A61B6/02 , A61B90/00 , A61B6/08 , G01T7/00
摘要： Intraoral three-dimensional (3D) tomosynthesis imaging systems, methods, and non-transitory computer readable media are used to generate one or more two-dimensional (2D) x-ray projection images and to reconstruct, using a computing platform, the one or more 2D x-ray projection images into one or more 3D images of an object, such as teeth of a patient, which can then be displayed on a monitor in order to enhance diagnostic accuracy of dental disease. The intraoral 3D tomosynthesis imaging system can include a wall-mountable control unit connected to one end of an articulating arm, the other end of which is connected to an x-ray source, which is configured to generate x-ray radiation that is acquired by an x-ray detector held at a desired position by an x-ray detector holder that is removably coupled to a collimator at an emission region of the x-ray source.

88. 发明授权

US11049689B2 Systems and methods for charged particle beam modulation 有权
公开(公告)号：US11049689B2
公开(公告)日：2021-06-29
申请号：US16559459
申请日：2019-09-03
申请人： ASML Netherlands B.V.
发明人： Ehud Shaked , Martinus Maassen
IPC分类号： H01J37/26 , H01J37/28 , H01J37/24 , H01J37/14 , H01J37/04 , H01J37/244 , H01J37/147
摘要： Systems and methods for conducting charged particle beam modulation are disclosed. According to certain embodiments, a charged particle beam apparatus generates a plurality of charged particle beams. A modulator may be configured to receive the plurality of charged particle beams and generate a plurality of modulated charged particle beams. A detector may be configured to receive the plurality of modulated charged particle beams.

89. 发明申请

US20210175048A1 TECHNIQUES FOR DETERMINING AND CORRECTING FOR EXPECTED DOSE VARIATION DURING IMPLANTATION OF PHOTORESIST-COATED SUBSTRATES 有权
公开(公告)号：US20210175048A1
公开(公告)日：2021-06-10
申请号：US17093468
申请日：2020-11-09
申请人： APPLIED Materials, Inc.
发明人： Eric Donald Wilson , George Gammel
IPC分类号： H01J37/317 , H01J37/256 , H01J37/244 , H01J37/304
摘要： A method, including using an implant recipe to perform an implant by scanning an ion beam along a first axis over a substrate, coated with a photoresist layer, while the substrate is scanned along a perpendicular axis; measuring an implant current (I) during the implant, using a first detector, positioned to a side of a substrate position; determining a value of a difference ratio (I−B)/(B), based upon the implant current, where B is current measured by the first detector, during a calibration at base pressure; determining a plurality of values of a current ratio (CR) for the plurality of instances, based upon the difference ratio, the current ratio being a ratio of the implant current to a current measured by a second detector, positioned over the substrate position, during the calibration; and adjusting scanning the ion beam, scanning of the substrate, or a combination thereof, based upon the current ratio.

90. 发明申请

US20210173310A1 DEVICE AND METHOD FOR PROCESSING A MICROSTRUCTURED COMPONENT 有权
公开(公告)号：US20210173310A1
公开(公告)日：2021-06-10
申请号：US17116127
申请日：2020-12-09
申请人： Carl Zeiss SMT GmbH
发明人： Nicole Auth , Timo Luchs , Joachim Welte
IPC分类号： G03F7/20 , H01J37/244 , H01J37/08
摘要： The invention relates to a device and a method for processing a microstructured component, in particular for microlithography. A device for processing a microstructured component comprises an ion beam source for applying an ion beam to at least regions of the component, wherein an ion energy of this ion beam is no more than 5 keV, and a detector for detecting particles backscattered at the component.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式