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1. 发明申请

US20230136478A1 METHOD FOR MEASURING A SUBSTRATE FOR SEMICONDUCTOR LITHOGRAPHY 有权
公开(公告)号：US20230136478A1
公开(公告)日：2023-05-04
申请号：US17973645
申请日：2022-10-26
申请人： Carl Zeiss SMT GmbH
发明人： Sven Martin , Oliver Jaeckel
IPC分类号： G03F7/20
摘要： A method for measuring a substrate for semiconductor lithography using a measuring device, wherein the measuring device comprises a recording device for capturing at least a partial region of the substrate and, wherein the distance between the substrate and an imaging optical unit of the recording device is varied while the partial region is captured by the recording device.

2. 发明申请

US20230130187A1 METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRODUCTION SYSTEM, AND METROLOGY SYSTEM FOR CARRYING OUT THE METHOD 有权
公开(公告)号：US20230130187A1
公开(公告)日：2023-04-27
申请号：US17969967
申请日：2022-10-20
申请人： Carl Zeiss SMT GmbH
发明人： Lukas Fischer , Klaus Gwosch , Markus Koch , Mario Laengle , Daniel Pagel
IPC分类号： G03F7/20
摘要： An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out. Then, the object holder is adjusted by actuator means until a coarse target wavefront (W1) is obtained for a coarse actuator position set (X1) in the case of a minimum wavefront deviation between the actual wavefront and the design wavefront (WD). Said coarse target wavefront is then subjected to a fine measurement and the at least one optical component is displaced until a fine target wavefront (W2) is obtained for a fine actuator position set (X2) in the case of a minimum deviation between the actual wavefront setting-in in that case and the design wavefront (WD). This reproduction method allows wavefront deviations of the optical measuring system generated by way of targeted misalignment to provide a good approximation of corresponding deviations of the optical production system.

3. 发明申请

US20230120847A1 METHOD FOR MEASURING A SAMPLE AND MICROSCOPE IMPLEMENTING THE METHOD 有权
公开(公告)号：US20230120847A1
公开(公告)日：2023-04-20
申请号：US17501238
申请日：2021-10-14
申请人： Carl Zeiss SMT GmbH
发明人： Eugen Foca , Amir Avishai , Dmitry Klochkov , Thomas Korb , Jens Timo Neumann , Keumsil Lee
IPC分类号： H01J37/24 , H01J37/28
摘要： The present invention relates to a method for measuring a sample with a microscope, the method comprising the steps of: measuring a tilt of the sample, correcting an orientation of the sample based on the tilt, and scanning the sample.

4. 发明申请

US20230050439A1 IMAGING OPTICAL ARRANGEMENT TO IMAGE AN OBJECT ILLUMINATED BY X-RAYS 有权
公开(公告)号：US20230050439A1
公开(公告)日：2023-02-16
申请号：US17402819
申请日：2021-08-16
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Ruoff , Heiko Feldmann
IPC分类号： G21K7/00 , G01N23/04 , G01N23/083
摘要： An imaging optical arrangement serves to image an object illuminated by X-rays. An imaging optics serves to image a transfer field in a field plane into a detection field in a detection plane. A layer of scintillator material is arranged at the transfer field. A stop is arranged in a pupil plane of the imaging optics. The imaging optics has an optical axis. A center of a stop opening of the stop is arranged at a decentering distance with respect to the optical axis. Such imaging optical arrangement ensures a high quality imaging of the object irrespective of a tilt of X-rays entering the transfer field. The imaging optical arrangement is part of a detection assembly further comprising a detection array and an object mount. Such detection assembly is part of a detection system further comprising a X-ray source.

5. 发明申请

US20230046280A1 DETECTION SYSTEM FOR X-RAY INSPECTION OF AN OBJECT 有权
公开(公告)号：US20230046280A1
公开(公告)日：2023-02-16
申请号：US17402822
申请日：2021-08-16
申请人： Carl Zeiss SMT GmbH , Carl Zeiss X-ray Microscopy Inc.
发明人： Johannes Ruoff , Juan Atkinson Mora , Thomas Anthony Case , Heiko Feldmann , Christoph Hilmar Graf Vom Hagen , Thomas Matthew Gregorich , Gerhard Krampert
IPC分类号： G01N23/18 , G01N23/083 , G01N23/04
摘要： A detection system serves for X-ray inspection of an object. An imaging optical arrangement serves to image the object in an object plane illuminated by X-rays generated by an X-ray source. The imaging optical arrangement comprises an imaging optics to image a transfer field in a field plane into a detection field in a detection plane. A detection array is arranged at the detection field. An object mount holds the object to be imaged and is movable relative to the light source via an object displacement drive along at least one lateral object displacement direction in the object plane. A shield stop with a transmissive shield stop aperture is arranged in an arrangement plane in a light path and is movable via a shield stop displacement drive in the arrangement plane. A control device has a drive control unit, which is in signal connection with the shield stop displacement drive and with the object displacement drive for synchronizing a movement of the shield stop displacement drive and the object displacement drive. The result is an optimization of an X-ray illumination of the object to achieve a high-resolution object imaging.

6. 发明申请

US20230034958A1 ASSEMBLY, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20230034958A1
公开(公告)日：2023-02-02
申请号：US17967481
申请日：2022-10-17
申请人： Carl Zeiss SMT GmbH
发明人： Stefan Troeger , Thomas Gorius
IPC分类号： G03F7/20
摘要： An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.

7. 发明申请

US20230019744A1 INSERT FOR A SOURCE CHAMBER OF AN EUV RADIATION SOURCE 有权
公开(公告)号：US20230019744A1
公开(公告)日：2023-01-19
申请号：US17864939
申请日：2022-07-14
申请人： Carl Zeiss SMT GmbH
发明人： Michael Hagg , Juan Jose Hasbun Wood , Iris Pilch , Christof Metzmacher
IPC分类号： G03F7/20
摘要： An insert for a source chamber of an EUV radiation source has a pressure stage and, spaced apart from it, a stop.

8. 发明授权

US11550225B2 EUV radiation source, insert for an EUV radiation source and insert for an insert for an EUV radiation source 有权
公开(公告)号：US11550225B2
公开(公告)日：2023-01-10
申请号：US17336480
申请日：2021-06-02
申请人： Carl Zeiss SMT GmbH
发明人： Iris Pilch , Juan Jose Hasbun Wood , Christof Metzmacher , Michael Hagg
IPC分类号： G03F7/20 , H05G2/00
摘要： An inner insert for a passage opening in an outer insert for an EUV radiation source is embodied in multiple parts and/or has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da).

9. 发明授权

US11531272B2 Pupil stop for an illumination optical unit of a metrology system 有权
公开(公告)号：US11531272B2
公开(公告)日：2022-12-20
申请号：US17724701
申请日：2022-04-20
申请人： Carl Zeiss SMT GmbH
发明人： Matthias Roesch
IPC分类号： G03F7/20
摘要： A pupil stop serves for use in an illumination optical unit of a metrology system for determining, as a result of illumination and imaging under illumination and imaging conditions corresponding to those of an optical production system, an aerial image of an object to be measured. The pupil stop has two pole passage openings for specifying a respective pole of an illumination of the illumination optical unit specified by the pupil stop. In each case at least one stop web passes through the respective pole passage opening and consequently divides the pole passage opening into a plurality of partial pole openings. This yields a pupil stop with which an accuracy of a convergence of the illumination and imaging conditions of the optical production system to the illumination and imaging conditions of the optical measurement system can be improved.

10. 发明申请

US20220392793A1 METHODS OF CROSS-SECTION IMAGING OF AN INSPECTION VOLUME IN A WAFER 有权
公开(公告)号：US20220392793A1
公开(公告)日：2022-12-08
申请号：US17820117
申请日：2022-08-16
申请人： Carl Zeiss SMT GmbH
发明人： Alex Buxbaum , Eugen Foca , Chuong Huynh , Dmitry Klochkov , Thomas Korb , Jens Timo Neumann , Baohua Niu
IPC分类号： H01L21/67 , H01J37/28 , H01J37/305 , H01J37/22 , G06T7/00 , G06T7/50 , G06T7/30
摘要： The present disclosure relates to dual beam device and three-dimensional circuit pattern inspection techniques by cross sectioning of inspection volumes with large depth extension exceeding 1 μm below the surface of a semiconductor wafer, as well as methods, computer program products and apparatuses for generating 3D volume image data of a deep inspection volume inside a wafer without removal of a sample from the wafer. The disclosure further relates to 3D volume image generation and cross section image alignment methods utilizing a dual beam device for three-dimensional circuit pattern inspection.

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