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1. 发明授权

US08390790B2 Method and apparatus for reproducing a programmable mask on a substrate 有权
标题翻译：在基板上再现可编程掩模的方法和装置
公开(公告)号：US08390790B2
公开(公告)日：2013-03-05
申请号：US12594700
申请日：2008-04-04
申请人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
发明人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358
摘要： A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.
摘要翻译：通过可编程掩模将图案在具有感光层的基板上成像，通过照明单元在掩模上产生照明点，并通过光学单元产生单独的像素，形成像素网格在对应于图案的基板上。要在基板上再现的结构边缘被最佳地定位。为此，执行感光层的至少两个曝光处理，其照明点或曝光点彼此偏移。因此，通过随后的曝光处理，用像素填充第一曝光处理的像素网格中的哪些空间与待影响的曝光处理的数量成比例的空间。

2. 发明申请

US20100091256A1 METHOD AND APPARATUS FOR REPRODUCING A PROGRAMMABLE MASK ON A SUBSTRATE 有权
标题翻译：在基板上再现可编程掩模的方法和装置
公开(公告)号：US20100091256A1
公开(公告)日：2010-04-15
申请号：US12594700
申请日：2008-04-04
申请人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
发明人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358
摘要： A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.
摘要翻译：通过可编程掩模将图案在具有感光层的基板上成像，通过照明单元在掩模上产生照明点，并通过光学单元产生单独的像素，形成像素网格在对应于图案的基板上。要在基板上再现的结构边缘被最佳地定位。为此，执行感光层的至少两个曝光处理，其照明点或曝光点彼此偏移。因此，通过随后的曝光处理，用像素填充第一曝光处理的像素网格中的哪些空间与待影响的曝光处理的数量成比例的空间。

3. 发明申请

US20110007322A1 METHOD AND ARRANGEMENT FOR DISPLACEMENT 有权
标题翻译：偏移的方法和布置
公开(公告)号：US20110007322A1
公开(公告)日：2011-01-13
申请号：US12922040
申请日：2009-03-10
申请人： Michael Fangerau , Alexander Mangold , Roland Kaplan
发明人： Michael Fangerau , Alexander Mangold , Roland Kaplan
IPC分类号： G01B11/02 , G01B11/26
CPC分类号： G03F7/70258 , G02B26/0875
摘要： A method and apparatus operable for displacing an image, which is transmitted by electromagnetic radiation, perpendicular to the direction of radiation by use of a rotatably disposed radiation-refracting body, located in the path of an imaging beam, having a refractive index that differs from the surrounding medium with regard to the radiation used. The method allows for precise image displacement. The rotation of the radiation-refracting body causing the displacement is measured, and the change of the optical path length caused by the angular change in a further electromagnetic beam utilized for the measurement is determined by evaluating the superimposition of the radiation reflected by a planar reflecting surface with the incident electromagnetic radiation. Part of the electromagnetic measurement beam, which is reflected on the surface of the radiation-refracting body, strikes a measurement unit, which supplies an electrical signal as a function of the incident position of the electromagnetic radiation.
摘要翻译：一种方法和装置，其可操作用于通过使用位于成像光束的路径中的可旋转设置的辐射折射体来移动通过电磁辐射垂直于辐射方向的图像，折射率不同于关于所使用的辐射的周围介质。该方法允许精确的图像位移。测量引起位移的辐射折射体的旋转，并且通过用于测量的另外的电磁束中由角度变化引起的光程长度的变化通过评估由平面反射反射的辐射的叠加来确定表面与入射电磁辐射。在辐射折射体的表面上反射的电磁测量光束的一部分撞击测量单元，该测量单元提供作为电磁辐射的入射位置的函数的电信号。

4. 发明授权

US09176391B2 Method and arrangement for displacement 有权
标题翻译：位移的方法和布置
公开(公告)号：US09176391B2
公开(公告)日：2015-11-03
申请号：US12922040
申请日：2009-03-10
申请人： Michael Fangerau , Alexander Mangold , Roland Kaplan
发明人： Michael Fangerau , Alexander Mangold , Roland Kaplan
IPC分类号： G01B11/02 , G03F7/20 , G02B26/08
CPC分类号： G03F7/70258 , G02B26/0875
摘要： A method and apparatus operable for displacing an image, which is transmitted by electromagnetic radiation, perpendicular to the direction of radiation by use of a rotatably disposed radiation-refracting body, located in the path of an imaging beam, having a refractive index that differs from the surrounding medium with regard to the radiation used. The method allows for precise image displacement. The rotation of the radiation-refracting body causing the displacement is measured, and the change of the optical path length caused by the angular change in a further electromagnetic beam utilized for the measurement is determined by evaluating the superimposition of the radiation reflected by a planar reflecting surface with the incident electromagnetic radiation. Part of the electromagnetic measurement beam, which is reflected on the surface of the radiation-refracting body, strikes a measurement unit, which supplies an electrical signal as a function of the incident position of the electromagnetic radiation.
摘要翻译：一种方法和装置，其可操作用于通过使用位于成像光束的路径中的可旋转设置的辐射折射体来移动通过电磁辐射垂直于辐射方向的图像，折射率不同于关于所使用的辐射的周围介质。该方法允许精确的图像位移。测量引起位移的辐射折射体的旋转，并且通过用于测量的另外的电磁束中由角度变化引起的光程长度的变化通过评估由平面反射反射的辐射的叠加来确定表面与入射电磁辐射。在辐射折射体的表面上反射的电磁测量光束的一部分撞击测量单元，该测量单元提供作为电磁辐射的入射位置的函数的电信号。

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