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1. 发明授权

US07487069B2 Method for generating a control output for a position control loop 有权
标题翻译：用于产生位置控制回路的控制输出的方法
公开(公告)号：US07487069B2
公开(公告)日：2009-02-03
申请号：US11862808
申请日：2007-09-27
申请人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
发明人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
IPC分类号： G05B19/18
CPC分类号： G01D5/285 , G01D5/26 , G01D5/30
摘要： A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).
摘要翻译：一种用于光学检测可移动测试对象（10）的位置的方法，特别是其中由光源（2）产生的测量光束（6）被测试对象（10）反射到其中的位置敏感光检测器（12），其将转换载体转换成与测试对象（10）的位置相对应的信息。本发明使得能够使用简单的光学构造来快速测量反射镜，特别是旋转镜的位置。测量光束（6）通过光学系统（8）聚焦到光检测器（12）上，对应于聚焦测量点的强度分布的几何中心或最大值（I0）的信号基于测量由光检测器（12）获得的值。

2. 发明申请

US20080021671A1 METHOD FOR GENERATING A CONTROL OUTPUT FOR A POSITION CONTROL LOOP 有权
标题翻译：用于产生位置控制环路的控制输出的方法
公开(公告)号：US20080021671A1
公开(公告)日：2008-01-24
申请号：US11862808
申请日：2007-09-27
申请人： Sven VOGLER , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
发明人： Sven VOGLER , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
IPC分类号： G05B19/18
CPC分类号： G01D5/285 , G01D5/26 , G01D5/30
摘要： A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focused onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focused measuring spot is determined based on the measured values obtained by the light detector (12).
摘要翻译：一种用于光学检测可移动测试对象（10）的位置的方法，特别是其中由光源（2）产生的测量光束（6）被测试对象（10）反射到其中的位置敏感光检测器（12），其将转换载体转换成与测试对象（10）的位置相对应的信息。本发明使得能够使用简单的光学构造来快速测量反射镜，特别是旋转镜的位置。测量光束（6）通过光学系统（8）聚焦到光检测器（12）上，对应于聚焦的强度分布的几何中心或最大值（I <0> 0）的信号基于由光检测器（12）获得的测量值来确定测量点。

3. 发明申请

US20110007322A1 METHOD AND ARRANGEMENT FOR DISPLACEMENT 有权
标题翻译：偏移的方法和布置
公开(公告)号：US20110007322A1
公开(公告)日：2011-01-13
申请号：US12922040
申请日：2009-03-10
申请人： Michael Fangerau , Alexander Mangold , Roland Kaplan
发明人： Michael Fangerau , Alexander Mangold , Roland Kaplan
IPC分类号： G01B11/02 , G01B11/26
CPC分类号： G03F7/70258 , G02B26/0875
摘要： A method and apparatus operable for displacing an image, which is transmitted by electromagnetic radiation, perpendicular to the direction of radiation by use of a rotatably disposed radiation-refracting body, located in the path of an imaging beam, having a refractive index that differs from the surrounding medium with regard to the radiation used. The method allows for precise image displacement. The rotation of the radiation-refracting body causing the displacement is measured, and the change of the optical path length caused by the angular change in a further electromagnetic beam utilized for the measurement is determined by evaluating the superimposition of the radiation reflected by a planar reflecting surface with the incident electromagnetic radiation. Part of the electromagnetic measurement beam, which is reflected on the surface of the radiation-refracting body, strikes a measurement unit, which supplies an electrical signal as a function of the incident position of the electromagnetic radiation.
摘要翻译：一种方法和装置，其可操作用于通过使用位于成像光束的路径中的可旋转设置的辐射折射体来移动通过电磁辐射垂直于辐射方向的图像，折射率不同于关于所使用的辐射的周围介质。该方法允许精确的图像位移。测量引起位移的辐射折射体的旋转，并且通过用于测量的另外的电磁束中由角度变化引起的光程长度的变化通过评估由平面反射反射的辐射的叠加来确定表面与入射电磁辐射。在辐射折射体的表面上反射的电磁测量光束的一部分撞击测量单元，该测量单元提供作为电磁辐射的入射位置的函数的电信号。

4. 发明申请

US20070021939A1 Method for generating a control output for a position control loop 审中-公开
标题翻译：用于产生位置控制回路的控制输出的方法
公开(公告)号：US20070021939A1
公开(公告)日：2007-01-25
申请号：US11528328
申请日：2006-09-28
申请人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
发明人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
IPC分类号： G05B19/18
CPC分类号： G01D5/285 , G01D5/26 , G01D5/30
摘要： A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
摘要翻译：一种用于光学检测可移动测试对象（10）的位置的方法，特别是其中由光源（2）产生的测量光束（6）被测试对象（10）反射到其中的位置敏感光检测器（12），其将转换载体转换成与测试对象（10）的位置相对应的信息。本发明使得可以使用简单的光学构造来快速测量反射镜，特别是旋转镜的位置。测量光束（6）通过光学系统（8）聚焦到光检测器（12）上，对应于聚焦的光束（6）的强度分布的几何中心或最大值（I <0> 基于由光检测器（12）获得的测量值来确定测量点。

5. 发明授权

US08390790B2 Method and apparatus for reproducing a programmable mask on a substrate 有权
标题翻译：在基板上再现可编程掩模的方法和装置
公开(公告)号：US08390790B2
公开(公告)日：2013-03-05
申请号：US12594700
申请日：2008-04-04
申请人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
发明人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358
摘要： A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.
摘要翻译：通过可编程掩模将图案在具有感光层的基板上成像，通过照明单元在掩模上产生照明点，并通过光学单元产生单独的像素，形成像素网格在对应于图案的基板上。要在基板上再现的结构边缘被最佳地定位。为此，执行感光层的至少两个曝光处理，其照明点或曝光点彼此偏移。因此，通过随后的曝光处理，用像素填充第一曝光处理的像素网格中的哪些空间与待影响的曝光处理的数量成比例的空间。

6. 发明申请

US20110273688A1 METHOD AND DEVICE FOR IMAGING A RADIATION-SENSITIVE SUBSTRATE 有权
标题翻译：用于成像辐射敏感基板的方法和装置
公开(公告)号：US20110273688A1
公开(公告)日：2011-11-10
申请号：US13130245
申请日：2009-10-23
申请人： Roelof Wijnaendts Van Resandt , Roland Kaplan
发明人： Roelof Wijnaendts Van Resandt , Roland Kaplan
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70283 , G03F7/70308 , G03F7/70358 , G03F7/70466
摘要： A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.
摘要翻译：一种用于对辐射敏感衬底成像的方法和装置，其中使用具有衬底辐射敏感的波长的相干辐射将可编程模板投影到辐射敏感衬底上。具有图像格栅的可编程模板的整体图像由声光或电光偏转单元同时移位，使得多个突起在不同位置处撞击基板，使得在图像网格中产生精细的部分网格基质。

7. 发明申请

US20050122495A1 Method and device for imaging a mask onto a substrate 审中-公开
标题翻译：用于将掩模成像到基底上的方法和装置
公开(公告)号：US20050122495A1
公开(公告)日：2005-06-09
申请号：US10511226
申请日：2003-04-11
申请人： Roland Kaplan , Juergen Sollner
发明人： Roland Kaplan , Juergen Sollner
IPC分类号： G03F9/00 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70358 , G03F7/70791 , G03F7/70991
摘要： The invention relates to a method for imaging a mask (1) onto a substrate (2) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the invention is to create a method and a device which enable the mask (1) and the smaller structures thereof to be imaged onto the substrate (2) in a precise manner, with high functional reliability, and which enable the distortions of the substrate (2) to be corrected. To this end, the illuminating unit (8) and the optical unit (9) are displaced in relation to the mask (1) and the substrate (2), distortions of the substrate (2) are detected, and the imaging of the mask (1) is distorted according to the detected distortions by means of the optical unit (9) and is adapted to the distortions of the substrate (2).
摘要翻译：本发明涉及通过照明单元（8）和光学单元（9）将掩模（1）成像到基板（2）上的方法。本发明还涉及一种用于执行该方法的装置。本发明的目的是创造一种使掩模（1）及其较小结构以精确的方式精确地成像到基板（2）上的方法和装置，具有高功能可靠性，并且能够使要校正的基板（2）。为此，照明单元（8）和光学单元（9）相对于掩模（1）和基板（2）移位，检测基板（2）的失真，并且掩模的成像（1）通过光学单元（9）根据检测到的失真而变形，并适应于基板（2）的变形。

8. 发明授权

US06639179B2 Apparatus for producing microbore holes 有权
标题翻译：用于生产微孔的装置
公开(公告)号：US06639179B2
公开(公告)日：2003-10-28
申请号：US10052912
申请日：2002-01-23
申请人： Sven Vogler , Roland Kaplan
发明人： Sven Vogler , Roland Kaplan
IPC分类号： B23K2638
CPC分类号： B23K26/042 , B23K26/03 , B23K26/06 , B23K26/0853 , B23K26/382 , B23K26/705 , B23K2103/50 , H05K1/0269 , H05K3/0008 , H05K3/0026
摘要： A method of producing microbore holes in a multi-layer substrate (5), preferably a printed circuit board substrate, that is displaced below writing optics (4) by an XY stage (6), using the optics to generate a spot from a light source (1), preferably a laser. The method reduces the treatment time and preferably compensates for distortions in the substrate material. To this end, the position of the spot within a working field is changed simultaneously with the treatment positions by electronically controlled, movable mirrors. The position of the substrate is determined by an interferometer (9, 11), and the signals corresponding to the substrate position are processed by a suitable computer system (16) to obtain an actual position of the table system. The computer system (16) is preferably provided with all bore hole coordinates and additional information such as bore hole diameter, especially in tabular form.
摘要翻译：一种在多层基板（5）中产生微孔的方法，优选印刷电路板基板，其通过XY平台（6）在写入光学器件（4）之下移位，使用光学器件从光产生光点源（1），优选为激光。该方法减少了处理时间并且优选地补偿了基板材料中的变形。为此，通过电子控制的可移动反射镜，在工作区域内的位置与治疗位置同时改变。衬底的位置由干涉仪（9,11）确定，并且与衬底位置相对应的信号由合适的计算机系统（16）处理以获得桌子系统的实际位置。计算机系统（16）优选地具有所有钻孔坐标和附加信息，例如钻孔直径，特别是以表格形式。

9. 发明申请

US20100091256A1 METHOD AND APPARATUS FOR REPRODUCING A PROGRAMMABLE MASK ON A SUBSTRATE 有权
标题翻译：在基板上再现可编程掩模的方法和装置
公开(公告)号：US20100091256A1
公开(公告)日：2010-04-15
申请号：US12594700
申请日：2008-04-04
申请人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
发明人： Alexander Mangold , Udo Becker , Steffen Diez , Roland Kaplan
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358
摘要： A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.
摘要翻译：通过可编程掩模将图案在具有感光层的基板上成像，通过照明单元在掩模上产生照明点，并通过光学单元产生单独的像素，形成像素网格在对应于图案的基板上。要在基板上再现的结构边缘被最佳地定位。为此，执行感光层的至少两个曝光处理，其照明点或曝光点彼此偏移。因此，通过随后的曝光处理，用像素填充第一曝光处理的像素网格中的哪些空间与待影响的曝光处理的数量成比例的空间。

10. 发明申请

US20060106552A1 Method for generating a control output for a position control loop 审中-公开
标题翻译：用于产生位置控制回路的控制输出的方法
公开(公告)号：US20060106552A1
公开(公告)日：2006-05-18
申请号：US11314344
申请日：2005-12-22
申请人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
发明人： Sven Vogler , Roland Kaplan , Robert Weikert , Roelof Wijnaendts-Van-Resandt
IPC分类号： G01B5/28 , G06F19/00
CPC分类号： G01D5/285 , G01D5/26 , G01D5/30
摘要： A method for optically detecting the position of a moveable test object (10), especially a mirror or reflector, in which a measuring beam (6) produced by a light source (2) is reflected by the test object (10 and reaches a position-sensitive light detector (12) which carrier out a conversion into information corresponding to the position of the test object (10). The invention enables the position of mirrors, especially rotating mirrors, to be quickly measured optically using a simple optical construction. The measuring beam (6) is focussed onto the light detector (12) by an optical system (8). A signal corresponding to the geometric center or the maximum (I0) of the intensity distribution of the focussed measuring spot is determined based on the measured values obtained by the light detector (12).
摘要翻译：一种用于光学检测可移动测试对象（10）的位置的方法，特别是其中由光源（2）产生的测量光束（6）被测试对象（10）反射到其中的位置敏感光检测器（12），其将转换载体转换成与测试对象（10）的位置相对应的信息。本发明使得能够使用简单的光学构造来快速测量反射镜，特别是旋转镜的位置。测量光束（6）通过光学系统（8）聚焦到光检测器（12）上，对应于聚焦的光束（6）的强度分布的几何中心或最大值（I <0> 基于由光检测器（12）获得的测量值来确定测量点。

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