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1. 发明授权

US08624857B2 Haptics effect controller architecture and instruction set 有权
标题翻译：触觉效果控制器架构和指令集
公开(公告)号：US08624857B2
公开(公告)日：2014-01-07
申请号：US13024042
申请日：2011-02-09
申请人： Hugo Cheung , Anand Gupta
发明人： Hugo Cheung , Anand Gupta
IPC分类号： G06F3/041
CPC分类号： G06F3/0416 , G06F3/016 , H03K2217/96062
摘要： A method for generating a desired haptics effect is provided. A haptics effect instruction is generated by a host processor responsive to a touch screen, where the haptics effect instruction corresponds to the desired haptics effect. This haptics effect instruction is received by a haptics driver, and a haptic profile from the haptics effect instruction is generated from the haptics effect instruction. The haptic profile includes at least one of a profile word, a move word, wait/halt word, and a branch word, and a sine wave is generated from the from the haptic profile that corresponds to the desired haptics effect.
摘要翻译：提供了一种产生期望的触觉效果的方法。触觉效果指令由主机处理器响应于触摸屏产生，其中触觉效果指令对应于期望的触觉效果。该触觉效果指令由触觉驱动器接收，并且从触觉效果指令生成来自触觉效果指令的触觉简档。触觉简档包括简档字，移动字，等待/停止字和分支字中的至少一个，并且从对应于期望的触觉效果的触觉简档中产生正弦波。

2. 发明申请

US20120200509A1 HAPTICS EFFECT CONTROLLER ARCHITECTURE AND INSTRUCTION SET 有权
标题翻译： HAPTICS效应控制器结构和指令集
公开(公告)号：US20120200509A1
公开(公告)日：2012-08-09
申请号：US13024042
申请日：2011-02-09
申请人： Hugo Cheung , Anand Gupta
发明人： Hugo Cheung , Anand Gupta
IPC分类号： G06F3/041
CPC分类号： G06F3/0416 , G06F3/016 , H03K2217/96062
摘要： A method for generating a desired haptics effect is provided. A haptics effect instruction is generated by a host processor responsive to a touch screen, where the haptics effect instruction corresponds to the desired haptics effect. This haptics effect instruction is received by a haptics driver, and a haptic profile from the haptics effect instruction is generated from the haptics effect instruction. The haptic profile includes at least one of a profile word, a move word, wait/halt word, and a branch word, and a sine wave is generated from the from the haptic profile that corresponds to the desired haptics effect.
摘要翻译：提供了一种产生期望的触觉效果的方法。触觉效果指令由主机处理器响应于触摸屏产生，其中触觉效果指令对应于期望的触觉效果。该触觉效果指令由触觉驱动器接收，并且从触觉效果指令生成来自触觉效果指令的触觉简档。触觉简档包括简档字，移动字，等待/停止字和分支字中的至少一个，并且从对应于期望的触觉效果的触觉简档中产生正弦波。

3. 发明授权

US06449521B1 Decontamination of a plasma reactor using a plasma after a chamber clean 有权
标题翻译：在室清洁后使用等离子体对等离子体反应器进行去污
公开(公告)号：US06449521B1
公开(公告)日：2002-09-10
申请号：US09156698
申请日：1998-09-18
申请人： Anand Gupta
发明人： Anand Gupta
IPC分类号： G06F1900
CPC分类号： H01J37/32862 , B08B7/0035 , C23C16/4405 , Y10T29/41 , Y10T29/413 , Y10T29/417
摘要： A method and apparatus for reducing fluorine and other sorbable contaminants in plasma reactor used in chemical vapor deposition process such as the deposition of silicon oxide layer by the reaction of TEOS and oxygen. According to the method of the present invention, plasma of an inert gas is maintained in plasma reactor following chamber clean to remove sorbable contaminants such as fluorine. The plasma clean is typically followed by seasoning of the reactor to block or retard remaining contaminants. According to one embodiment of the invention, the combination of chamber clean, plasma clean, and season film is conducted before PECVD oxide layer is deposited on wafer positioned in the plasma reactor.
摘要翻译：用于化学气相沉积工艺中用于还原等离子体反应器中的氟和其它可吸附污染物的方法和装置，例如通过TEOS和氧的反应沉积氧化硅层。根据本发明的方法，惰性气体的等离子体在室清洁之后保持在等离子体反应器中以除去可吸附的污染物如氟。等离子体清洁通常是通过反应器的调味来阻止或延缓剩余的污染物。根据本发明的一个实施例，在PECVD氧化物层沉积在等离子体反应器中的晶片上之前，进行室清洁，等离子体清洁和季节膜的组合。

4. 发明授权

US06291028B1 Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface 有权
标题翻译：用于改善界面处等离子体增强CVD膜的膜质量的方法和装置
公开(公告)号：US06291028B1
公开(公告)日：2001-09-18
申请号：US09608786
申请日：2000-06-30
申请人： Anand Gupta , Virendra V. S. Rana , Amrita Verma , Mohan K. Bhan , Sudhakar Subrahmanyam
发明人： Anand Gupta , Virendra V. S. Rana , Amrita Verma , Mohan K. Bhan , Sudhakar Subrahmanyam
IPC分类号： C23C16505
CPC分类号： H01J37/32082 , C23C16/401 , H01L21/02131 , H01L21/02274 , H01L21/31629
摘要： A method and apparatus for depositing a layer having improved film quality at an interface. The method includes the steps of introducing an inert gas into a processing chamber and forming a plasma from the inert gas by applying RF power to the chamber at a selected rate of increase. After RF power has reached full power, a process gas including a reactant gas is introduced to deposit the layer. In a preferred embodiment, the reactant gas is tetraethoxysilane. In another preferred embodiment, the process gas further includes fluorine.
摘要翻译：一种用于在界面处沉积具有改进的膜质量的层的方法和装置。该方法包括以下步骤：将惰性气体引入处理室并通过以选定的增加的速率向腔室施加RF功率从惰性气体形成等离子体。在RF功率达到全功率之后，引入包括反应气体的处理气体以沉积该层。在优选的实施方案中，反应气体是四乙氧基硅烷。在另一优选实施方案中，工艺气体还包括氟。

5. 发明授权

US06289843B1 Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface 有权
公开(公告)号：US06289843B1
公开(公告)日：2001-09-18
申请号：US09643320
申请日：2000-08-21
申请人： Anand Gupta , Virendra V. S. Rana , Amrita Verma , Mohan K. Bhan , Sudhakar Subrahmanyam
发明人： Anand Gupta , Virendra V. S. Rana , Amrita Verma , Mohan K. Bhan , Sudhakar Subrahmanyam
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , C23C16/401 , H01L21/02131 , H01L21/02274 , H01L21/31629
摘要： A method and apparatus for depositing a layer having improved film quality at an interface. The method includes the steps of introducing an inert gas into a processing chamber and forming a plasma from the inert gas by applying RF power to the chamber at a selected rate of increase. After RF power has reached full power, a process gas including a reactant gas is introduced to deposit the layer. In a preferred embodiment, the reactant gas is tetraethoxysilane. In another preferred embodiment, the process gas further includes fluorine.

6. 发明授权

US6029369A Methods for spin drying a workpiece 有权
标题翻译：旋转干燥工件的方法
公开(公告)号：US6029369A
公开(公告)日：2000-02-29
申请号：US361672
申请日：1999-07-26
申请人： Jose R. Gonzalez-Martin , Arthur Hamer , Anand Gupta
发明人： Jose R. Gonzalez-Martin , Arthur Hamer , Anand Gupta
IPC分类号： H01L21/00 , H01L21/687 , F26B5/08
CPC分类号： H01L21/68728 , H01L21/67034 , H01L21/68785 , H01L21/68792
摘要： A spin dryer assembly for drying workpieces such as semiconductor wafers includes a workpiece platform for receiving a workpiece to be dried. A motor is coupled to and spins the platform to effect removal of water and particulates from the workpiece. Gripping fingers are pivotally mounted around the platform and securely grip the workpiece during drying. Spring loaded plungers maintain the gripping fingers in a secured position during drying. A cam ring is vertically movable into and out of contact with the gripping fingers to bias the gripping portions of the fingers outwardly to a release position after drying.
摘要翻译：用于干燥诸如半导体晶片的工件的旋转干燥器组件包括用于接收待干燥的工件的工件平台。马达与平台联接并旋转以实现工件的水和微粒的去除。夹紧指状物可枢转地安装在平台周围并在干燥期间牢固地夹紧工件。弹簧加载的柱塞在干燥过程中将夹紧的手指保持在一个固定的位置。凸轮环可以垂直移动进入和脱离与夹紧指状物的接触，以将干燥后的指状物的把持部分向外偏压到释放位置。

7. 发明授权

US6020035A Film to tie up loose fluorine in the chamber after a clean process 失效
标题翻译：在清洁过程之后，电影将室内的松散的氟结合起来
公开(公告)号：US6020035A
公开(公告)日：2000-02-01
申请号：US740381
申请日：1996-10-29
申请人： Anand Gupta , Mohan Bhan , Sudhakar Subrahmanyam
发明人： Anand Gupta , Mohan Bhan , Sudhakar Subrahmanyam
IPC分类号： C23C14/56 , C23C16/44 , C23C16/50 , C23C16/509 , C23C16/52 , H01L21/316 , B05D3/06 , B08B5/00 , H05H1/02
CPC分类号： C23C14/564 , C23C16/4404 , C23C16/5096 , C23C16/52 , H01J37/32477 , H01J37/32862 , H01L21/02131 , H01L21/02164 , H01L21/02274 , H01L21/31612 , Y10S438/905
摘要： An improved method of reducing the level of contaminants (e.g., fluorine) absorbed in films deposited within a substrate processing chamber. A seasoning layer is deposited within the substrate processing chamber to cover contaminants that may be absorbed within walls or insulation areas of the chamber interior. The deposited seasoning layer is more stable than prior art seasoning layers and is thus less likely to release the absorbed contaminants into the substrate processing chamber during the subsequent deposition of films. In a preferred embodiment, the seasoning layer is formed from a mixed frequency PECVD process in which the low frequency RF signal is supplied at a high power level to increase ion bombardment and enhance film stability. The increased bombardment favors the formation of stable SiF bonds between silicon and fluorine atoms in the lattice structure of the film rather than unstable SiF.sub.2 or other bonds. When residual fluorine atoms (e.g., fluorine atoms absorbed within the chamber walls) are incorporated into the deposited seasoning layer, fewer loosely bonded fluorine atoms are incorporated into the layer than in prior art silicon oxide seasoning layers. Fewer loosely bonded fluorine atoms in the seasoning film results in fewer contaminants being incorporated into films deposited over substrates in subsequent processing steps.
摘要翻译：一种降低在衬底处理室内沉积的膜中吸收的污染物（例如氟）的水平的改进方法。在基材处理室内沉积调味料层以覆盖可能被吸收在室内部的壁或绝缘区域内的污染物。沉积的调味剂层比现有技术的调味料层更稳定，因此在随后的膜沉积期间不太可能将吸收的污染物释放到基材处理室中。在优选实施例中，调味层由混合频率PECVD工艺形成，其中以高功率水平提供低频RF信号以增加离子轰击并提高膜的稳定性。增加的轰击有利于在膜的晶格结构中硅和氟原子之间形成稳定的SiF键，而不是不稳定的SiF 2或其它键。当剩余的氟原子（例如在室壁内吸收的氟原子）被并入沉积的调味层中时，与现有技术的氧化硅调味层相比，较少的松散键合的氟原子被掺入到该层中。在调味膜中较少松散粘合的氟原子导致在随后的加工步骤中将沉积在基材上的薄膜中的污染物掺入较少。

8. 发明授权

US5628870A Method for marking a substrate using ionized gas 失效
标题翻译：使用电离气体标记基板的方法
公开(公告)号：US5628870A
公开(公告)日：1997-05-13
申请号：US458961
申请日：1995-06-05
申请人： Yan Ye , Anand Gupta , Yuri S. Uritsky
发明人： Yan Ye , Anand Gupta , Yuri S. Uritsky
IPC分类号： H01L21/68 , H01J37/304 , H01L21/00 , H01L21/02 , H01L23/544 , B44C1/22
CPC分类号： H01L21/67282 , H01J37/3045 , H01L23/544 , H01L2223/54453 , H01L2924/0002
摘要： An apparatus suitable for marking a substrate comprises a holder for holding a substrate and a ground for electrically grounding the substrate. At least one needle electrode has a tip located proximate to the substrate so that there is a gap between the substrate and the tip. A high voltage source provides a current to the electrode tip to ionize the gas in the gap so that the ionized gas can impinge upon and mark the substrate.
摘要翻译：适用于标记衬底的装置包括用于保持衬底的保持器和用于使衬底电接地的接地。至少一个针电极具有位于基底附近的尖端，使得在基底和尖端之间存在间隙。高电压源向电极尖端提供电流以离子化间隙中的气体，使得电离气体可以撞击并标记衬底。

9. 发明授权

US5456796A Control of particle generation within a reaction chamber 失效
标题翻译：控制反应室内的颗粒产生
公开(公告)号：US5456796A
公开(公告)日：1995-10-10
申请号：US71288
申请日：1993-06-02
申请人： Anand Gupta , Yan Ye , Joseph Lanucha
发明人： Anand Gupta , Yan Ye , Joseph Lanucha
IPC分类号： C23C16/50 , C23C16/44 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H05H1/00
CPC分类号： H01J37/32862 , C23C16/4401 , H01J37/32082 , H01J2237/022 , Y10S438/905
摘要： An RF signal is rapidly brought to a high power level prior to the introduction of a wafer into the reaction chamber to initiate a plasma that agitates and circulates any particles within the reaction chamber, thereby allowing effective reaction chamber cleaning; and an RF signal is slowly brought to a high power level to initiate a plasma prior to or during wafer processing to avoid disturbing and circulating such particles during wafer processing, thereby preventing particle induced contamination. A magnetic field may be applied to the reaction chamber to move particles from a plasma sheath/glow region interface to a reaction chamber exhaust line, and thereby prevent such particles from falling onto a processed wafer.
摘要翻译：在将晶片引入反应室之前，RF信号被迅速地达到高功率水平，以启动搅动和循环反应室内的任何颗粒的等离子体，从而允许有效的反应室清洁; 并且将RF信号缓慢地带到高功率水平以在晶片处理之前或期间启动等离子体，以避免在晶片处理期间干扰和循环这种颗粒，从而防止颗粒引起的污染。可以将磁场施加到反应室以将颗粒从等离子体鞘/辉光区界面移动到反应室排气管线，从而防止这些颗粒落到加工的晶片上。

10. 发明申请

US20080210302A1 Methods and apparatus for forming photovoltaic cells using electrospray 有权
标题翻译：使用电喷雾形成光伏电池的方法和装置
公开(公告)号：US20080210302A1
公开(公告)日：2008-09-04
申请号：US11953758
申请日：2007-12-10
申请人： Anand Gupta
发明人： Anand Gupta
IPC分类号： H01L31/04 , H01L31/18
CPC分类号： H01L31/18 , C23C18/1208 , H01G9/20 , H01G9/2027 , H01G9/2031 , H01G9/2036 , H01G9/2054 , H01G9/2059 , H01G9/2063 , H01G9/2068 , H01L27/304 , H01L31/0384 , Y02E10/50 , Y02E10/542 , Y02P70/521
摘要： Methods of forming a photovoltaic structures including nanoparticles are disclosed. The method includes electrospray deposition of nanoparticles. The nanoparticles can include TiO2 nanoparticles and quantum dots. In an example, the nanoparticles are formed on a flexible substrate. In various examples, the flexible substrate is light transparent. Photovoltaic structures and apparatus for forming photovoltaic structures are disclosed.
摘要翻译：公开了形成包括纳米颗粒的光伏结构的方法。该方法包括纳米颗粒的电喷雾沉积。纳米颗粒可以包括TiO 2纳米颗粒和量子点。在一个实例中，纳米颗粒形成在柔性基底上。在各种示例中，柔性基板是透光的。公开了用于形成光伏结构的光伏结构和装置。

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