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1. 发明授权

US09304077B2 Inspection apparatus and method 有权
标题翻译：检验仪器及方法
公开(公告)号：US09304077B2
公开(公告)日：2016-04-05
申请号：US13166384
申请日：2011-06-22
申请人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
发明人： Lucas Henricus Johannes Stevens , Arno Jan Bleeker
IPC分类号： G01N21/00 , G01N21/17 , G01N21/956
CPC分类号： G01N21/1717 , G01N21/00 , G01N21/95623
摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.
摘要翻译：通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。幽灵反射回到瞳孔平面上的相同点。幽灵反射不影响瞳孔平面的非照明区域中的信号。照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。该目的被布置为用电磁辐射束照射基板。照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

2. 发明申请

US20120038910A1 Inspection Apparatus and Method 有权
标题翻译：检验仪器及方法
公开(公告)号：US20120038910A1
公开(公告)日：2012-02-16
申请号：US13166384
申请日：2011-06-22
申请人： Lucas Henricus Johannes STEVENS , Arno Jan BLEEKER
发明人： Lucas Henricus Johannes STEVENS , Arno Jan BLEEKER
IPC分类号： G01N21/00
CPC分类号： G01N21/1717 , G01N21/00 , G01N21/95623
摘要： Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are reflected back into same point in the pupil plane. The ghost reflections do not interfere with the signal in the non-illuminated area of the pupil plane. An illumination system provides a beam of electromagnetic radiation to illuminate a first area in an illumination pupil plane of the objective. The objective is arranged as to illuminate the substrate with the beam of electromagnetic radiation. The illumination pupil plane is the back projected image of the pupil plane of the objective and is also imaged into the measurement pupil plane at the back focal plane of the objective, via auxiliary optics. A detector is configured to measure an angle resolved spectrum arising from the illumination of the substrate, in a measurement area of the measurement pupil plane of the objective excluding an area corresponding to the first area.
摘要翻译：通过使用用于照明的部分光瞳和除了被照明的光瞳面的区域之外的测量，从角度分辨光谱测量中排除反射折射式散射仪物镜中的鬼反射。幽灵反射回到瞳孔平面上的相同点。幽灵反射不影响瞳孔平面的非照明区域中的信号。照明系统提供电磁辐射束以照射物镜的照明光瞳平面中的第一区域。该目的被布置为用电磁辐射束照射基板。照明光瞳平面是物镜的光瞳平面的背投影像，并且还通过辅助光学器件在物镜的后焦平面处成像到测量光瞳平面中。检测器被配置为测量除了与第一区域相对应的区域之外的物镜的测量光瞳平面的测量区域中由基板照射产生的角度分辨光谱。

3. 发明授权

US08054467B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US08054467B2
公开(公告)日：2011-11-08
申请号：US12805852
申请日：2010-08-20
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01J3/45
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译：通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

4. 发明申请

US20110043777A1 TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME 审中-公开
标题翻译：目标材料，源，EUV光刻设备及使用其的器件制造方法
公开(公告)号：US20110043777A1
公开(公告)日：2011-02-24
申请号：US12933668
申请日：2009-03-20
申请人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
发明人： Vladimir Mihailovitc Krivtsun , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Johannes Hubertus Josephina Moors , Sergey Churilov , Denis Glushkov
IPC分类号： G03B27/54 , G03F7/20 , C22C28/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.
摘要翻译：目标材料被配置为用于构造和布置成产生具有极紫外范围波长的辐射束的源。目标材料包括配置成改变Gd的熔融温度的Gd基组合物。

5. 发明授权

US07728956B2 Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 有权
标题翻译：使用存储图案变化数据的数据缓冲器在衬底上利用多个管芯设计的平版印刷设备和器件制造方法
公开(公告)号：US07728956B2
公开(公告)日：2010-06-01
申请号：US11098607
申请日：2005-04-05
申请人： Arno Jan Bleeker , Kars Zeger Troost , Adrianus Johannes Henricus Maas
发明人： Arno Jan Bleeker , Kars Zeger Troost , Adrianus Johannes Henricus Maas
IPC分类号： G03B27/32
CPC分类号： G03F7/70508 , G03F7/70275 , G03F7/70291
摘要： A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.
摘要翻译：提供了一种光刻系统和方法，其允许在不显着增加数据路径硬件的成本的情况下生成基本设备设计的变化。光刻设备包括独立可控元件阵列，控制系统，第一数据缓冲器和第二数据缓冲器。控制系统向独立可控元件阵列提供控制信号。第一数据缓冲器存储对应于要暴露在基板上的多个区域上的图案的图案数据。第二数据缓冲器存储对应于图案的一部分的至少一个改变的图案变化数据。控制系统被配置为使得图案的至少一个变化在图案变化数据的基板上的一个区域上露出。

6. 发明授权

US07499146B2 Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping 有权
标题翻译：平版印刷设备和器件制造方法，集成电路，平板显示器以及补罐方法
公开(公告)号：US07499146B2
公开(公告)日：2009-03-03
申请号：US11252877
申请日：2005-10-19
申请人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Louis Markoya , Neal Callan , Nicholas K. Eib
发明人： Kars Zeger Troost , Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Louis Markoya , Neal Callan , Nicholas K. Eib
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70358
摘要： The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.
摘要翻译：同时调节独立可控元件的倾斜和位置，以实现更大范围的对比度。这也可以用于补偿单独可控元件的拔罐。可以通过在一定范围的值范围内可操作的两个电极来实现对独立可控元件的位置和倾斜的同时调节。

7. 发明申请

US20090033897A1 Limiting a Portion of a Patterning Device Used to Pattern A Beam 有权
标题翻译：限制用于对光束进行图案化的图案化装置的一部分
公开(公告)号：US20090033897A1
公开(公告)日：2009-02-05
申请号：US12127480
申请日：2008-05-27
申请人： Arno Jan BLEEKER
发明人： Arno Jan BLEEKER
IPC分类号： G03B27/42
CPC分类号： G03F7/70066 , G03F7/70291 , G03F7/70425
摘要： A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
摘要翻译：使用系统和方法来限制用于对衬底进行图案化的可编程图案形成装置的比例。这样做使得要暴露在基板上的重复图案的尺寸是通过图案化的光束在基板上暴露的图案的尺寸的整数倍。

8. 发明授权

US07459710B2 Lithographic apparatus, method for calibrating and device manufacturing method 有权
标题翻译：光刻设备，校准方法及器件制造方法
公开(公告)号：US07459710B2
公开(公告)日：2008-12-02
申请号：US11705147
申请日：2007-02-12
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G01N21/86
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70591
摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
摘要翻译：为了校准具有可编程图案形成装置的光刻设备，使用具有大于对应于可编程图案形成装置的单个像素的点的尺寸的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。像素被单独或分组选择性地激活。

9. 发明申请

US20080259291A1 Pellicle, lithographic apparatus and device manufacturing method 有权
标题翻译：薄膜，光刻设备和器件制造方法
公开(公告)号：US20080259291A1
公开(公告)日：2008-10-23
申请号：US11785744
申请日：2007-04-19
申请人： Vadim Yevgenyevich Banine , Arno Jan Bleeker
发明人： Vadim Yevgenyevich Banine , Arno Jan Bleeker
IPC分类号： G03B27/42
CPC分类号： G03F7/70958 , G03F1/62 , G03F7/70191 , G03F7/70916 , G03F7/70983
摘要： A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
摘要翻译：用于在EUV范围内工作的集成电路设备的防护薄膜组件包括交替层的多层结构。防护薄膜组件被构造和布置成反射或吸收不想要的辐射并拦截碎片以增强辐射束的光谱纯度。

10. 发明授权

US07379579B2 Imaging apparatus 有权
标题翻译：成像设备
公开(公告)号：US07379579B2
公开(公告)日：2008-05-27
申请号：US10496630
申请日：2002-11-27
申请人： Karel Diederick Van Der Mast , Arno Jan Bleeker
发明人： Karel Diederick Van Der Mast , Arno Jan Bleeker
IPC分类号： G06K9/00
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70425
摘要： An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a beam splitter located between the programmable patterning device and the substrate table configured to divert aside a portion of the patterned beam; and an image detector configured to analyze the portion of the patterned beam.
摘要翻译：一种成像装置，具有配置成调节波长等于或小于365nm的辐射束的照明器; 用于支撑可编程图案形成装置的支撑结构，所述可编程图案形成装置被配置为根据期望图案对所述光束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 位于所述可编程图案形成装置和所述衬底台之间的分束器，其被配置为将所述图案化束的一部分转向旁边; 以及被配置为分析图案化束的部分的图像检测器。

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