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1. 发明申请

US20180196353A1 MULTIPHOTON ABSORPTION LITHOGRAPHY PROCESSING SYSTEM 审中-公开
公开(公告)号：US20180196353A1
公开(公告)日：2018-07-12
申请号：US15498361
申请日：2017-04-26
申请人： National Tsing Hua University
发明人： Chien-Chung Fu , Che-Wei Yeh
IPC分类号： G03F7/20 , G02B27/12 , G02B21/26 , G02B21/00 , G02B3/00
CPC分类号： G02B3/0056 , G02B3/0043 , G02B21/0016 , G02B26/0833 , G03F7/70275 , G03F7/70291 , G03F7/70375
摘要： A multiphoton absorption lithography processing system configured to process a to-be-processed object is provided. The multiphoton absorption lithography processing system includes a femtosecond laser source, a spatial light modulator, a lens array, and a stage. The femtosecond laser source is configured to emit a femtosecond laser beam. The spatial light modulator is configured to modulate the femtosecond laser beam into a modulated beam. The lens array is disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and make the sub-beams be focused on a plurality of position points at the to-be-processed object, so as to form multiphoton absorption reaction at the position points. The stage is configured to carry the to-be-processed object. The stage and the lens array are adapted to move with respect to each other in three dimensions.

2. 发明申请

US20180095258A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
公开(公告)号：US20180095258A1
公开(公告)日：2018-04-05
申请号：US15654766
申请日：2017-07-20
申请人： Carl Zeiss SMT GmbH
发明人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B17/08 , G03F7/20 , G02B1/11
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.

3. 发明申请

US20180017781A1 FRUSTRATED CUBE ASSEMBLY 审中-公开
公开(公告)号：US20180017781A1
公开(公告)日：2018-01-18
申请号：US15639600
申请日：2017-06-30
申请人： Applied Materials, Inc.
发明人： David MARKLE , Thomas L. LAIDIG , Timothy N. THOMAS , Jang Fung CHEN
IPC分类号： G02B26/08 , G02B5/04 , G03F7/20 , G02F1/13
CPC分类号： G02B26/0833 , G02B5/04 , G02F1/1303 , G03F7/7015 , G03F7/70275
摘要： The present disclosure generally relates to frustrated cube assemblies having a first prism having a first surface, a second surface, and a first hypotenuse, and a second prism having a third surface, a fourth surface, and a second hypotenuse. The first and second hypotenuses face one another and are separated by an air gap. The frustrated cube assembly may include a tilted mirror adjacent the second surface. The second surface may be a reflective diffraction grating. Light is reflected to a digital micromirror device (DMD) adjacent to the frustrated cube assembly at a normal incidence angle and through an image projection system along a single optical axis. The direction of light incident on the DMD is such that light reflected from an “on” mirror is directed along the normal to the DMD surface and at 45 degrees to the hypotenuses. The input and output light beams are parallel.

4. 发明申请

US20180003952A1 PROJECTION EXPOSURE DEVICE 审中-公开
公开(公告)号：US20180003952A1
公开(公告)日：2018-01-04
申请号：US15542281
申请日：2016-01-06
申请人： V TECHNOLOGY CO., LTD.
发明人： Michinobu Mizumura
IPC分类号： G02B26/10 , G02B3/00 , G03F7/20
CPC分类号： G02B26/10 , G02B3/0037 , G02B3/0056 , G02B26/101 , G03F7/2008 , G03F7/70241 , G03F7/70275 , G03F7/70358 , H01L21/027
摘要： A projection exposure device projects exposure light onto a substrate via a microlens array. The projection exposure device includes a scanning exposure unit that moves the microlens array along a scanning direction from one end toward another end of the substrate, and a microlens array shift unit that moves the microlens array in a shift direction intersecting with the scanning direction during movement of the microlens array caused by the scanning exposure unit.

5. 发明授权

US09726870B2 Catadioptric projection objective 有权
公开(公告)号：US09726870B2
公开(公告)日：2017-08-08
申请号：US15002492
申请日：2016-01-21
申请人： Carl Zeiss SMT GmbH
发明人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B17/08 , G03F7/20 , G02B1/11
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： A projection objective for microlithography for imaging an object field onto an image field includes: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective including an aperture; and a first folding mirror for deflecting radiation toward a concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; in which the projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and an image plane, and at least one surface of at least one lens in the second partial objective has an antireflection coating including at least six layers.

6. 发明授权

US09703207B1 System and method for reducing dynamic range in images of patterned regions of semiconductor wafers 有权
公开(公告)号：US09703207B1
公开(公告)日：2017-07-11
申请号：US13544480
申请日：2012-07-09
申请人： Daniel L. Cavan , Grace Chen
发明人： Daniel L. Cavan , Grace Chen
IPC分类号： G03B27/68 , G01N21/95 , G03F7/20
CPC分类号： G03F7/70275 , G01N21/8806 , G01N21/9501 , G03F7/70291 , G03F7/70516 , G03F7/7055
摘要： The present invention includes generating illumination, providing a spatial light modulator (SLM) configured to selectably illuminate one or more portions of a surface of a wafer using the generated illumination, receiving a sets of wafer pattern data indicative of one or more patterns of the wafer, translating the wafer along a direction, selectably controlling a pixel configuration of the SLM to control an illumination pattern on the surface of the wafer, a first pixel configuration illuminating a first set of regions of the wafer at an illumination level, an additional pixel configuration illuminating an additional set of regions at an additional illumination level, wherein a pixel pattern of the SLM based on the received sets of wafer pattern data is configured to move across a surface of the SLM synchronously with the pattern of the translated wafer, and detecting illumination from the surface of the wafer.

7. 发明申请

US20160349628A1 ROTATABLE FRAME, LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM, METHOD FOR FOCUSING RADIATION AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可旋转框架，光刻设备，投影系统，聚焦辐射和装置制造方法
公开(公告)号：US20160349628A1
公开(公告)日：2016-12-01
申请号：US15235542
申请日：2016-08-12
申请人： ASML Netherlands B.V.
发明人： Arno Jan BLEEKER , Thomas Josephus Maria CASTENMILLER , Pieter Willem Herman DEJAGER , Heine Melle MULDER , Koen Jacobus Johannes ZAAL , Theodorus Petrus Maria CADEE , Danny Maria Hubertus PHILIPS , Ruud Antonius Catharina Maria BEERENS , Roger Anton Marie TIMMERMANS
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
摘要： A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
摘要翻译：配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。

8. 发明授权

US09507271B1 System and method for manufacturing multiple light emitting diodes in parallel 有权
标题翻译：并联制造多个发光二极管的系统和方法
公开(公告)号：US09507271B1
公开(公告)日：2016-11-29
申请号：US13225405
申请日：2011-09-03
申请人： Jang Fung Chen , Thomas Laidig
发明人： Jang Fung Chen , Thomas Laidig
IPC分类号： G03B27/44 , G03F7/20
CPC分类号： G03F7/70433 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/70475 , G03F7/70508 , G03F7/70791
摘要： System and method for manufacturing multiple light emitting diodes in parallel are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, providing one or more substrates corresponding to multiple LEDs to be manufactured, receiving mask data to be written to the one or more substrates corresponding to the multiple LEDs, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the plurality substrates of the multiple LEDs, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the plurality substrates of the multiple LEDs in parallel.
摘要翻译：公开了并联制造多个发光二极管的系统和方法。在一个实施例中，该方法包括提供一种成像写入器系统，其包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，提供对应于待制造的多个LED的一个或多个基板，写入到与多个LED对应的一个或多个基板，处理掩模数据以形成与多个LED的多个基板相对应的多个分割的掩模数据图案，分配一个或多个SLM成像单元以处理每个分割的掩模数据图案，并且控制多个SLM成像单元将多个分割的掩模数据图案并行写入多个LED的多个基板。

9. 发明授权

US09383652B2 Light-exposure device 有权
标题翻译：曝光装置
公开(公告)号：US09383652B2
公开(公告)日：2016-07-05
申请号：US14001863
申请日：2012-02-02
申请人： Koichi Kajiyama , Michinobu Mizumura , Makoto Hatanaka
发明人： Koichi Kajiyama , Michinobu Mizumura , Makoto Hatanaka
IPC分类号： G03B27/42 , G03F7/20 , G02B3/00
CPC分类号： G03F7/70191 , G02B3/0056 , G03F7/70275 , G03F7/70358
摘要： A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
摘要翻译：曝光装置设置有微透镜阵列，其上以规定的规则排列多个微透镜，在该微透镜上引入透过光源和掩模的曝光光，以解析基板上的直立等倍放大图像。在达到规定位置时，用来自光源的脉冲激光对衬底进行照射，然后依次露出衬底，并且在衬底的曝光区域的整个区域暴露之后，微透镜阵列与微透镜阵列之间的相对位置关系该掩模在垂直方向依次切换微透镜的水平间距的量，然后进行随后的曝光。从而能够以短的曝光周期时间进行高精度，高分辨率的曝光。

10. 发明授权

US09372412B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US09372412B2
公开(公告)日：2016-06-21
申请号：US14839663
申请日：2015-08-28
申请人： ASML NETHERLANDS B.V.
发明人： Erwin John Van Zwet , Pieter Willem Herman De Jager , Johannes Onvlee , Erik Christiaan Fritz
IPC分类号： G03B27/32 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70366 , G03F7/70275 , G03F7/70391 , G03F7/704 , G03F7/70491 , G03F7/70883
摘要： A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

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