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1. 发明授权

US08369602B2 Length measurement system 有权
标题翻译：长度测量系统
公开(公告)号：US08369602B2
公开(公告)日：2013-02-05
申请号：US12190818
申请日：2008-08-13
申请人： Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
发明人： Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
IPC分类号： G06K9/00
CPC分类号： G06K9/4604 , G06T7/0006 , G06T7/13 , G06T7/60 , G06T2207/10061 , G06T2207/30148
摘要： Disclosed herewith is a length measurement system, which obtains a value closer to its true one when figuring out the size and edge roughness of a pattern from a noise-included pattern image. Among plural band-like regions representing a portion around an edge in an image respectively, the system calculates the dependency of the edge point position on the image processing parameter at each of a narrow width band-like portion and a wide width band-like portion to calculate an image processing condition that calculates each measured value closer to its true value or estimates the true value itself.
摘要翻译：本文公开了一种长度测量系统，当从包含噪声的图案图像中确定图案的尺寸和边缘粗糙度时，其获得接近其真实值的值。在分别表示图像中的边缘周围的多个带状区域中，系统计算边缘点位置对窄幅带状部分和宽幅带状部分中的每一个处的图像处理参数的依赖性以计算更接近其真实值的每个测量值的图像处理条件或估计真实值本身。

2. 发明授权

US07684937B2 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
标题翻译：精细图案特征，其设备和半导体器件制造方法的评估方法
公开(公告)号：US07684937B2
公开(公告)日：2010-03-23
申请号：US12078840
申请日：2008-04-07
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G01B5/28
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.
摘要翻译：设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

3. 发明申请

US20090263024A1 APPARATUS FOR DATA ANALYSIS 有权
标题翻译：数据分析装置
公开(公告)号：US20090263024A1
公开(公告)日：2009-10-22
申请号：US12413631
申请日：2009-03-30
申请人： Atsuko YAMAGUCHI , Hiroki KAWADA
发明人： Atsuko YAMAGUCHI , Hiroki KAWADA
IPC分类号： G06K9/48 , G06T11/20
CPC分类号： G06T11/206 , G01Q30/04 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/30148
摘要： Edge points are extracted by specifying a height (values indicating a distance from a substrate) on a pattern when edges of the pattern are extracted from a CD-SEM image. Further, LER values obtained by the extraction or a Fourier spectrum of the LER are obtained. When the same sample is previously observed with the AFM and the CD-SEM, a size of the LER obtained by specifying a height, an auto-correlation distance of the LER, or an index called the spectrum is obtained from results of the AFM observation. Further, theses indices obtained by specifying image processing conditions for detecting the edge points from the CD-SEM observation result are obtained. Also, it is determined that heights providing values when the values are matched correspond to the image processing conditions and then, the edge points are extracted from the CD-SEM IMAGE instead of the AFM observation by using the image processing conditions.
摘要翻译：通过在从CD-SEM图像提取图案的边缘时，通过指定图案上的高度（表示与基板的距离的值）来提取边缘点。此外，获得通过提取获得的LER值或LER的傅里叶谱。当先前用AFM和CD-SEM观察到相同的样品时，通过AFM观察结果获得通过指定高度，LER的自相关距离或称为光谱的指数获得的LER的大小。此外，获得通过从CD-SEM观察结果指定用于检测边缘点的图像处理条件而获得的索引。此外，确定当值匹配时提供值的高度对应于图像处理条件，然后通过使用图像处理条件从CD-SEM图像而不是AFM观察提取边缘点。

4. 发明申请

US20080215274A1 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
标题翻译：精细图案特征，其设备和半导体器件制造方法的评估方法
公开(公告)号：US20080215274A1
公开(公告)日：2008-09-04
申请号：US12078840
申请日：2008-04-07
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G06F17/18 , G06F19/00 , G01N23/22
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.
摘要翻译：设备提取在制造设备时需要评估的空间频率的组件，或者在细线图案上分析材料或工艺的边缘粗糙度并将其显示为索引。设备在足够长的区域上获取边缘粗糙度的数据，对与操作者在功率谱上设置的空间频率区域相对应的分量进行积分，并将其显示在长度测量SEM上。或者，设备对足够长的区域的边缘粗糙度数据进行分割，通过进行基于理论计算的统计处理和拟合来计算与任意检查区域相对应的长周期粗糙度和短周期粗糙度，并将其显示在长度测量 SEM。

5. 发明授权

US07369703B2 Method and apparatus for circuit pattern inspection 有权
标题翻译：电路图案检查的方法和装置
公开(公告)号：US07369703B2
公开(公告)日：2008-05-06
申请号：US11501843
申请日：2006-08-10
申请人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
发明人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
IPC分类号： G06K9/48 , H04N7/18
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.
摘要翻译：一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组边缘点，其指示图案的边缘的位置二维平面从二维分布数据; 指示图案的边缘的近似边缘; 通过计算边缘点集合和近似边缘之间的差异的边缘波动数据; 以及边缘波动数据的第一部分与边缘波动数据的第二部分之间的相关性。

6. 发明授权

US07366620B2 Evaluation method of fine pattern feature, its equipment, and method of semiconductor device fabrication 有权
公开(公告)号：US07366620B2
公开(公告)日：2008-04-29
申请号：US11185852
申请日：2005-07-21
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G01B19/00 , G06F19/00
CPC分类号： G01B15/08 , G01N23/2251 , G03F7/70625 , H01J2237/223 , H01J2237/2817
摘要： Equipment extracts components of spatial frequency that need to be evaluated in manufacturing a device or in analyzing a material or process out of edge roughness on fine line patterns and displays them as indexes. The equipment acquires data of edge roughness over a sufficiently long area, integrates a components corresponding to a spatial frequency region being set on a power spectrum by the operator, and displays them on a length measuring SEM. Alternatively, the equipment divides the edge roughness data of the sufficiently long area, computes long-period roughness and short-period roughness that correspond to an arbitrary inspection area by performing statistical processing and fitting based on theoretical calculation, and displays them on the length measuring SEM.

7. 发明申请

US20060269121A1 Method and apparatus for circuit pattern inspection 有权
标题翻译：电路图案检查的方法和装置
公开(公告)号：US20060269121A1
公开(公告)日：2006-11-30
申请号：US11501843
申请日：2006-08-10
申请人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
发明人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of said pattern in a two-dimensional plane from said two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge roughness data by calculating a difference between the set of edge points and said approximation edge; and a correlation between a first portion of the edge roughness data and a second portion of the edge roughness data.
摘要翻译：一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组指示所述图案的边缘位置的边缘点，二维平面从所述二维分布数据; 指示图案的边缘的近似边缘; 通过计算所述一组边缘点和所述近似边缘之间的差异的边缘粗糙度数据; 以及边缘粗糙度数据的第一部分与边缘粗糙度数据的第二部分之间的相关性。

8. 发明授权

US07095884B2 Method and apparatus for circuit pattern inspection 有权
公开(公告)号：US07095884B2
公开(公告)日：2006-08-22
申请号：US10071097
申请日：2002-02-11
申请人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
发明人： Atsuko Yamaguchi , Tsuneo Terasawa , Tadashi Otaka , Takashi Iizumi , Osamu Komuro
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： The present invention provides a circuit pattern edge inspection method of finding out a failure in a fabricating process and image distortion in an observing apparatus by analyzing, by a non-destructive inspection, the shape of an edge of a line of a fine pattern in which characteristics of the material, process, and an exposure optical system in a semiconductor fabricating process appear, and performing analysis quantitatively. The method includes a step of detecting a set of edge points indicative of positions of edges of the pattern in a two-dimensional plane by a threshold method; a step of obtaining an approximation line for the set of edge points detected; and a step of obtaining an edge roughness shape and a characteristic by calculating the difference between the set of the edge points and the approximation line. A plurality of values are used as thresholds used for the threshold method.

9. 发明申请

US20060145076A1 High-accuracy pattern shape evaluating method and apparatus 有权
公开(公告)号：US20060145076A1
公开(公告)日：2006-07-06
申请号：US11322559
申请日：2006-01-03
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
IPC分类号： G21K7/00
CPC分类号： G01N23/2251
摘要： A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise.

10. 发明授权

US06654738B2 Computer program embodied on a computer-readable medium for a document retrieval service that retrieves documents with a retrieval service agent computer 有权
标题翻译：包含在用于检索服务代理计算机的文档的文档检索服务的计算机可读介质上的计算机程序
公开(公告)号：US06654738B2
公开(公告)日：2003-11-25
申请号：US10015790
申请日：2001-12-17
申请人： Shingo Nishioka , Makoto Iwayama , Kazuhiro Ono , Akihiko Takano , Yoshiki Niwa , Atsuko Yamaguchi
发明人： Shingo Nishioka , Makoto Iwayama , Kazuhiro Ono , Akihiko Takano , Yoshiki Niwa , Atsuko Yamaguchi
IPC分类号： G06F1730
CPC分类号： G06F17/30696 , G06F17/3061 , Y10S707/99933 , Y10S707/99934 , Y10S707/99935 , Y10S707/99936 , Y10S707/99945
摘要： A document retrieval assistance method has a user interface with an interactive guidance function. In response to a search query, search results including a title list of retrieved documents is displayed alongside a separate display of topic words extracted from the retrieved documents which reflect the search results. In particular, a topic-word graph is displayed alongside a list of titles of the retrieved documents and the interface enables browsing of the documents using the topic words. Further, the interface permits emphasized display of the list of titles of the documents through direct selection of the titles displayed in the list or through selection of the topic words. Further, an associative search can be executed using a selected document to refine the original search results and develop updated displays of the search results and topic words contained in the documents.
摘要翻译：文档检索辅助方法具有具有交互引导功能的用户界面。响应于搜索查询，包括检索到的文档的标题列表的搜索结果显示在从反映搜索结果的检索到的文档中提取的主题词的单独显示。特别地，主题词图形显示在检索到的文档的标题列表旁边，并且该界面使得能够使用主题词浏览文档。此外，界面允许通过直接选择列表中显示的标题或通过选择主题词来强调显示文档的标题列表。此外，可以使用所选择的文档来执行关联搜索，以细化原始搜索结果并开发文档中包含的搜索结果和主题词的更新显示。

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