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    • 4. 发明授权
    • Method for fabricating a thin film transistor with an organic passivation layer
    • 制造具有有机钝化层的薄膜晶体管的方法
    • US08551825B2
    • 2013-10-08
    • US13155972
    • 2011-06-08
    • Bo Hyun LeeJae Seok HeoWoong Gi Jun
    • Bo Hyun LeeJae Seok HeoWoong Gi Jun
    • H01L21/00
    • H01L27/1248G02F1/136227
    • A thin film transistor (TFT) array substrate and a method for fabricating the thin film transistor (TFT) array substrate is disclosed, wherein a passivation layer is directly subjected to exposing and patterning processes without using any photoresist, thereby simplifying the fabrication process and ensuring reduced preparation costs. In particular, the method comprises a thin film transistor (TFT) array comprising: forming a gate line and a gate electrode on a substrate; forming a semiconductor layer to be insulated from the gate electrode, and overlapped with a portion of the gate electrode; forming a source electrode and a drain electrode on both sides of the semiconductor layer, respectively, while forming a data line intersecting with the gate line; forming a passivation layer over an entire upper surface of the substrate including the source electrode and the drain electrode using a sol compound of a metal alkoxide having a photosensitive group X and a silicon alkoxide having a photosensitive group Y; light-exposing and developing the passivation layer to form a contact hole through which the drain electrode is exposed; and forming a pixel electrode to be in contact with the drain electrode through the contact hole.
    • 公开了薄膜晶体管(TFT)阵列基板和制造薄膜晶体管(TFT)阵列基板的方法),其中钝化层直接进行曝光和图案化处理,而不使用任何光致抗蚀剂,从而简化制造工艺并确保 降低准备成本。 特别地,该方法包括薄膜晶体管(TFT)阵列,其包括:在基板上形成栅极线和栅电极; 形成与所述栅电极绝缘的半导体层,并与所述栅电极的一部分重叠; 在形成与栅极线相交的数据线的同时分别在半导体层的两侧形成源电极和漏电极; 使用具有感光性基团X的金属醇盐和具有感光性基团Y的硅醇盐的溶胶化合物,在包含源电极和漏电极的基板的整个上表面上形成钝化层; 曝光和显影钝化层以形成漏电极暴露的接触孔; 以及通过接触孔形成与漏电极接触的像素电极。
    • 10. 发明申请
    • THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FABRICATING THE SAME
    • 薄膜晶体管阵列基板及其制造方法
    • US20110237010A1
    • 2011-09-29
    • US13155972
    • 2011-06-08
    • Bo Hyun LeeJae Seok HeoWoong Gi Jun
    • Bo Hyun LeeJae Seok HeoWoong Gi Jun
    • H01L33/62
    • H01L27/1248G02F1/136227
    • A thin film transistor (TFT) array substrate and a method for fabricating the thin film transistor (TFT) array substrate is disclosed, wherein a passivation layer is directly subjected to exposing and patterning processes without using any photoresist, thereby simplifying the fabrication process and ensuring reduced preparation costs. In particular, the method comprises a thin film transistor (TFT) array comprising: forming a gate line and a gate electrode on a substrate; forming a semiconductor layer to be insulated from the gate electrode, and overlapped with a portion of the gate electrode; forming a source electrode and a drain electrode on both sides of the semiconductor layer, respectively, while forming a data line intersecting with the gate line; forming a passivation layer over an entire upper surface of the substrate including the source electrode and the drain electrode using a sol compound of a metal alkoxide having a photosensitive group X and a silicon alkoxide having a photosensitive group Y; light-exposing and developing the passivation layer to form a contact hole through which the drain electrode is exposed; and forming a pixel electrode to be in contact with the drain electrode through the contact hole.
    • 公开了薄膜晶体管(TFT)阵列基板和制造薄膜晶体管(TFT)阵列基板的方法),其中钝化层直接进行曝光和图案化处理,而不使用任何光致抗蚀剂,从而简化制造工艺并确保 降低准备成本。 特别地,该方法包括薄膜晶体管(TFT)阵列,其包括:在基板上形成栅极线和栅电极; 形成与所述栅电极绝缘的半导体层,并与所述栅电极的一部分重叠; 在形成与栅极线相交的数据线的同时分别在半导体层的两侧形成源电极和漏电极; 使用具有感光性基团X的金属醇盐和具有感光性基团Y的硅醇盐的溶胶化合物,在包含源电极和漏电极的基板的整个上表面上形成钝化层; 曝光和显影钝化层以形成漏电极暴露的接触孔; 以及通过接触孔形成与漏电极接触的像素电极。